JP2010232418A - 多層配線板及びその製造方法 - Google Patents
多層配線板及びその製造方法 Download PDFInfo
- Publication number
- JP2010232418A JP2010232418A JP2009078223A JP2009078223A JP2010232418A JP 2010232418 A JP2010232418 A JP 2010232418A JP 2009078223 A JP2009078223 A JP 2009078223A JP 2009078223 A JP2009078223 A JP 2009078223A JP 2010232418 A JP2010232418 A JP 2010232418A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- conductor layer
- resin layer
- metal
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/42—Plated through-holes or plated via connections
- H05K3/425—Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern
- H05K3/427—Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern initial plating of through-holes in metal-clad substrates
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/061—Etching masks
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0347—Overplating, e.g. for reinforcing conductors or bumps; Plating over filled vias
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0355—Metal foils
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0358—Resin coated copper [RCC]
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0388—Other aspects of conductors
- H05K2201/0394—Conductor crossing over a hole in the substrate or a gap between two separate substrate parts
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/02—Details related to mechanical or acoustic processing, e.g. drilling, punching, cutting, using ultrasound
- H05K2203/025—Abrading, e.g. grinding or sand blasting
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/03—Metal processing
- H05K2203/0353—Making conductive layer thin, e.g. by etching
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0502—Patterning and lithography
- H05K2203/054—Continuous temporary metal layer over resist, e.g. for selective electroplating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0562—Details of resist
- H05K2203/0585—Second resist used as mask for selective stripping of first resist
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0703—Plating
- H05K2203/0733—Method for plating stud vias, i.e. massive vias formed by plating the bottom of a hole without plating on the walls
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/002—Etching of the substrate by chemical or physical means by liquid chemical etching
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
- H05K3/0032—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material
- H05K3/0035—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material of blind holes, i.e. having a metal layer at the bottom
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
- H05K3/0032—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material
- H05K3/0038—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material combined with laser drilling through a metal layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0041—Etching of the substrate by chemical or physical means by plasma etching
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0044—Mechanical working of the substrate, e.g. drilling or punching
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/061—Etching masks
- H05K3/064—Photoresists
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/382—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/389—Improvement of the adhesion between the insulating substrate and the metal by the use of a coupling agent, e.g. silane
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/42—Plated through-holes or plated via connections
- H05K3/421—Blind plated via connections
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4652—Adding a circuit layer by laminating a metal foil or a preformed metal foil pattern
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
Abstract
【解決手段】支持基体11に金属層12,13が設けられた両面CCL10の表面に、プライマー樹脂層21と金属層22からなるプライマー付金属箔20を載置し、両者を接合し、プライマー樹脂層21を硬化させる。次に、金属層22側からビアVbを穿設し、その上に金属めっき層30を形成する。次に、エッチダウンした金属めっき層30と金属層22をパターニングした後、今度はそれをマスクとして、プライマー樹脂層21をパターニングする。そして、そのパターニングされたプライマー樹脂層21をマスクとして、両面CCL10の金属層12及び金属めっき層30をパターニングして配線パターンを形成する。
【選択図】図16
Description
Claims (6)
- 絶縁層の少なくとも一面に第1の導体層を形成する工程と、
樹脂層及び第2の導体層からなる積層シートを、前記第1の導体層上に該樹脂層が接するように載置し、該樹脂層を硬化させる工程と、
前記第2の導体層をパターニングする工程と、
前記パターニングされた第2の導体層をマスクとして、前記樹脂層をエッチングする工程と、
少なくとも前記エッチングされた樹脂層をマスクとして、前記第1の導体層をエッチングし、配線パターンを形成する工程と、
を有する多層配線板の製造方法。 - 前記絶縁層は、該絶縁層を貫通する接続孔を有しており、
前記第1の導体層を形成する工程においては、前記接続孔の内部にも第1の導体層を形成する、
請求項1記載の多層配線板の製造方法。 - 絶縁層の一面側及び他面側に第1の導体層を形成する工程と、
樹脂層及び第2の導体層からなる積層シートを、前記絶縁層の一面側に形成された前記第1の導体層上に該樹脂層が接するように載置し、該樹脂層を硬化させる工程と、
前記積層シート、前記絶縁層の一面側に形成された前記第1の導体層、及び、前記絶縁層を貫通する接続孔を形成し、前記絶縁層の他面側に形成された前記第1の導体層を該接続孔の内部に露出させる工程と、
前記第2の導体層上、及び、前記接続孔の内部に第3の導体層を形成する工程と、
前記第2の導体層及び前記第3の導体層をパターニングする工程と、
前記パターニングされた前記第2の導体層及び前記第3の導体層をマスクとして、前記樹脂層をエッチングする工程と、
少なくとも前記エッチングされた樹脂層をマスクとして、前記絶縁層の一面側に形成された前記第1導体層をエッチングし、配線パターンを形成する工程と、
を有する多層配線板の製造方法。 - 前記樹脂層として、前記第1の導体層よりも厚さが薄いものを用いる、
請求項1〜3のいずれか1項記載の多層配線板の製造方法。 - 絶縁層の少なくとも一面に第1の導体層を形成し、
樹脂層及び第2の導体層の積層シートを、前記第1の導体層上に該樹脂層が接するように載置し、該樹脂層を硬化させ、
前記第2の導体層をパターニングし、
前記パターニングされた第2の導体層をマスクとして、前記樹脂層をエッチングし、
少なくとも前記エッチングされた樹脂層をマスクとして、前記第1の導体層をエッチングし、配線パターンを形成する、
ことにより得られる多層配線板。 - 絶縁層の一面側及び他面側に第1の導体層を形成し、
樹脂層及び第2の導体層の積層シートを、前記絶縁層の一面側に形成された前記第1の導体層上に該樹脂層が接するように載置し、該樹脂層を硬化させ、
前記積層シート、前記絶縁層の一面側に形成された前記第1の導体層、及び、前記絶縁層を貫通する接続孔を形成し、前記絶縁層の他面側に形成された前記第1の導体層を該接続孔の内部に露出させ、
前記第2の導体層上、及び、前記接続孔の内部に第3の導体層を形成し、
前記第2の導体層及び前記第3の導体層をパターニングし、
前記パターニングされた前記第2の導体層及び前記第3の導体層をマスクとして、前記樹脂層をエッチングし、
少なくとも前記エッチングされた樹脂層をマスクとして、前記絶縁層の一面側に形成された導体層をエッチングし、配線パターンを形成する、
ことにより得られる多層配線板。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009078223A JP4844904B2 (ja) | 2009-03-27 | 2009-03-27 | 多層配線板及びその製造方法 |
US12/659,893 US8591750B2 (en) | 2009-03-27 | 2010-03-24 | Multilayer wiring board and manufacturing method thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009078223A JP4844904B2 (ja) | 2009-03-27 | 2009-03-27 | 多層配線板及びその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010232418A true JP2010232418A (ja) | 2010-10-14 |
JP4844904B2 JP4844904B2 (ja) | 2011-12-28 |
Family
ID=42782828
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009078223A Expired - Fee Related JP4844904B2 (ja) | 2009-03-27 | 2009-03-27 | 多層配線板及びその製造方法 |
Country Status (2)
Country | Link |
---|---|
US (1) | US8591750B2 (ja) |
JP (1) | JP4844904B2 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20130141372A (ko) | 2012-06-15 | 2013-12-26 | 신꼬오덴기 고교 가부시키가이샤 | 배선 기판 및 그 제조 방법 |
JP2014081636A (ja) * | 2012-10-15 | 2014-05-08 | Samsung Electro-Mechanics Co Ltd | ドライフィルム及びこれを用いる回路基板製造方法 |
CN111096086A (zh) * | 2017-09-18 | 2020-05-01 | 阿莫绿色技术有限公司 | 薄膜电路基板及其制造方法 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5115578B2 (ja) * | 2010-03-26 | 2013-01-09 | Tdk株式会社 | 多層配線板及び多層配線板の製造方法 |
CN102446704B (zh) * | 2010-10-14 | 2013-09-11 | 中芯国际集成电路制造(上海)有限公司 | 双重图形化方法 |
JP5747737B2 (ja) * | 2011-08-26 | 2015-07-15 | 三菱電機株式会社 | 半導体装置とその製造方法 |
JP6711228B2 (ja) * | 2016-09-30 | 2020-06-17 | 日亜化学工業株式会社 | 基板の製造方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11274731A (ja) * | 1998-03-26 | 1999-10-08 | Fujitsu Ltd | 薄膜多層回路基板及びその製造方法 |
JP2001177241A (ja) * | 1999-12-20 | 2001-06-29 | Hitachi Ltd | 多層プリント基板の製造方法 |
JP2002190658A (ja) * | 2000-12-21 | 2002-07-05 | Toppan Printing Co Ltd | プリント配線板の回路形成方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20020083586A1 (en) * | 1998-04-10 | 2002-07-04 | Takahiro Iijima | Process for producing multilayer circuit board |
MY139405A (en) * | 1998-09-28 | 2009-09-30 | Ibiden Co Ltd | Printed circuit board and method for its production |
US20020130103A1 (en) * | 2001-03-15 | 2002-09-19 | Zimmerman Scott M. | Polyimide adhesion enhancement to polyimide film |
JP3879461B2 (ja) * | 2001-09-05 | 2007-02-14 | 日立電線株式会社 | 配線基板及びその製造方法 |
JP2005136282A (ja) | 2003-10-31 | 2005-05-26 | Toppan Printing Co Ltd | 多層配線基板及びその製造方法 |
-
2009
- 2009-03-27 JP JP2009078223A patent/JP4844904B2/ja not_active Expired - Fee Related
-
2010
- 2010-03-24 US US12/659,893 patent/US8591750B2/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11274731A (ja) * | 1998-03-26 | 1999-10-08 | Fujitsu Ltd | 薄膜多層回路基板及びその製造方法 |
JP2001177241A (ja) * | 1999-12-20 | 2001-06-29 | Hitachi Ltd | 多層プリント基板の製造方法 |
JP2002190658A (ja) * | 2000-12-21 | 2002-07-05 | Toppan Printing Co Ltd | プリント配線板の回路形成方法 |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20130141372A (ko) | 2012-06-15 | 2013-12-26 | 신꼬오덴기 고교 가부시키가이샤 | 배선 기판 및 그 제조 방법 |
US9252096B2 (en) | 2012-06-15 | 2016-02-02 | Shinko Electric Industries Co., Ltd. | Wiring substrate and method of manufacturing the same |
JP2014081636A (ja) * | 2012-10-15 | 2014-05-08 | Samsung Electro-Mechanics Co Ltd | ドライフィルム及びこれを用いる回路基板製造方法 |
CN111096086A (zh) * | 2017-09-18 | 2020-05-01 | 阿莫绿色技术有限公司 | 薄膜电路基板及其制造方法 |
US11543748B2 (en) | 2017-09-18 | 2023-01-03 | Amogreentech Co., Ltd. | Thin film circuit substrate and manufacturing method thereof |
CN111096086B (zh) * | 2017-09-18 | 2023-05-02 | 阿莫绿色技术有限公司 | 薄膜电路基板及其制造方法 |
Also Published As
Publication number | Publication date |
---|---|
US8591750B2 (en) | 2013-11-26 |
JP4844904B2 (ja) | 2011-12-28 |
US20100243601A1 (en) | 2010-09-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4844904B2 (ja) | 多層配線板及びその製造方法 | |
US7408261B2 (en) | BGA package board and method for manufacturing the same | |
JP5580135B2 (ja) | プリント配線板の製造方法及びプリント配線板 | |
TWI392428B (zh) | Method for manufacturing double sided flexible printed wiring board | |
JP2007129180A (ja) | プリント配線板、多層プリント配線板及びその製造方法 | |
JP2011119501A (ja) | 多層基板の製造方法 | |
EP2656702B1 (en) | Printed circuit board and method for manufacturing the same | |
JP2010073809A (ja) | プリント配線板の製造方法 | |
JP5049803B2 (ja) | 多層プリント配線板の製造方法、多層プリント配線板 | |
JP2008172151A (ja) | 多層配線基板 | |
US11051410B2 (en) | Component carriers sandwiching a sacrificial structure and having pure dielectric layers next to the sacrificial structure | |
JP2011139010A (ja) | 回路基板およびその製造方法 | |
JP2007266316A (ja) | メッキ回路層付きステンレス転写基材、回路基板、部品内蔵モジュール | |
JP4508141B2 (ja) | ステンレス転写基材、メッキ回路層付きステンレス転写基材 | |
JP2001068856A (ja) | 絶縁樹脂シート及びその製造方法 | |
JP2002252436A (ja) | 両面積層板およびその製造方法 | |
JP2008147532A (ja) | 配線基板の製造方法 | |
KR20140039921A (ko) | 인쇄회로기판의 제조 방법 | |
WO2017046762A1 (en) | Sacrificial structure comprising low-flow material for manufacturing component carriers | |
JP2005045187A (ja) | 回路基板の製造方法、回路基板および多層回路基板 | |
JP2010028107A (ja) | プリント配線基板、及びその製造方法 | |
JP4225009B2 (ja) | 多層配線基板の製造方法およびこれを用いた多層配線基板 | |
JP2006261658A (ja) | 配線基板の製造方法及び配線基板 | |
JP2018182252A (ja) | プリント配線板の製造方法 | |
JP2010232585A (ja) | 多層配線基板およびその製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20100914 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20101215 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20110105 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20110302 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20110916 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20110929 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20141021 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
LAPS | Cancellation because of no payment of annual fees |