JP2010223903A5 - - Google Patents

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Publication number
JP2010223903A5
JP2010223903A5 JP2009074273A JP2009074273A JP2010223903A5 JP 2010223903 A5 JP2010223903 A5 JP 2010223903A5 JP 2009074273 A JP2009074273 A JP 2009074273A JP 2009074273 A JP2009074273 A JP 2009074273A JP 2010223903 A5 JP2010223903 A5 JP 2010223903A5
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vol
opt
soc
applied optics
optics
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JP2009074273A
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JP5328437B2 (ja
JP2010223903A (ja
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Priority to JP2009074273A priority Critical patent/JP5328437B2/ja
Priority claimed from JP2009074273A external-priority patent/JP5328437B2/ja
Priority to EP10156669.3A priority patent/EP2233905A3/en
Priority to US12/728,878 priority patent/US8786863B2/en
Publication of JP2010223903A publication Critical patent/JP2010223903A/ja
Publication of JP2010223903A5 publication Critical patent/JP2010223903A5/ja
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ＡＰＰＬＩＥＤ ＯＰＴＩＣＳ／Ｖｏｌ．２３，Ｎｏ．１１／１９８４，ｐｐ１７６０−１７６４ Ｊ．Ｏｐｔ．Ｓｏｃ．Ａｍ．／Ｖｏｌ．７２，Ｎｏ．1／１９８２，ｐｐ１５６−１６０
JP2009074273A 2009-03-25 2009-03-25 透過波面測定方法、屈折率分布測定方法、光学素子の製造方法、及び透過波面測定装置 Expired - Fee Related JP5328437B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2009074273A JP5328437B2 (ja) 2009-03-25 2009-03-25 透過波面測定方法、屈折率分布測定方法、光学素子の製造方法、及び透過波面測定装置
EP10156669.3A EP2233905A3 (en) 2009-03-25 2010-03-16 Transmitted wavefront measuring method, refractive-index distribution measuring method, method of manufacturing optical element, and transmitted wavefront measuring apparatus
US12/728,878 US8786863B2 (en) 2009-03-25 2010-03-22 Transmitted wavefront measuring method, refractive-index distribution measuring method, and transmitted wavefront measuring apparatus that calculate a frequency distribution and obtain a transmitted wavefront of the object based on a primary frequency spectrum in the frequency distribution

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009074273A JP5328437B2 (ja) 2009-03-25 2009-03-25 透過波面測定方法、屈折率分布測定方法、光学素子の製造方法、及び透過波面測定装置

Publications (3)

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JP2010223903A JP2010223903A (ja) 2010-10-07
JP2010223903A5 true JP2010223903A5 (ja) 2012-05-17
JP5328437B2 JP5328437B2 (ja) 2013-10-30

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JP2009074273A Expired - Fee Related JP5328437B2 (ja) 2009-03-25 2009-03-25 透過波面測定方法、屈折率分布測定方法、光学素子の製造方法、及び透過波面測定装置

Country Status (3)

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US (1) US8786863B2 (ja)
EP (1) EP2233905A3 (ja)
JP (1) JP5328437B2 (ja)

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JP5008650B2 (ja) * 2008-12-25 2012-08-22 キヤノン株式会社 屈折率分布計測方法及び屈折率分布計測装置
JP4968966B2 (ja) * 2009-12-07 2012-07-04 キヤノン株式会社 屈折率分布の計測方法および計測装置
JP4895409B2 (ja) 2010-05-25 2012-03-14 キヤノン株式会社 屈折率分布計測方法および屈折率分布計測装置
JP5021054B2 (ja) 2010-05-25 2012-09-05 キヤノン株式会社 屈折率分布計測方法および屈折率分布計測装置
JP5008763B2 (ja) 2010-12-03 2012-08-22 キヤノン株式会社 屈折率分布計測方法、屈折率分布計測装置および光学素子の製造方法
JP5675382B2 (ja) * 2011-01-14 2015-02-25 キヤノン株式会社 シアリング干渉測定装置
JP5725874B2 (ja) * 2011-01-14 2015-05-27 キヤノン株式会社 シアリング干渉測定装置およびその校正方法
GB201107053D0 (en) 2011-04-27 2011-06-08 Univ Sheffield Improvements in providing image data
JP5885405B2 (ja) * 2011-06-13 2016-03-15 キヤノン株式会社 撮像装置、干渉縞解析プログラム及び干渉縞解析方法
GB201201140D0 (en) 2012-01-24 2012-03-07 Phase Focus Ltd Method and apparatus for determining object characteristics
GB201207800D0 (en) 2012-05-03 2012-06-13 Phase Focus Ltd Improvements in providing image data
US8918746B1 (en) * 2013-09-04 2014-12-23 Globalfoundries Inc. Cut mask aware contact enclosure rule for grating and cut patterning solution
EP3315948B1 (de) * 2016-10-26 2019-09-04 Heraeus Quarzglas GmbH & Co. KG Verfahren zur ermittlung des brechzahlprofils eines zylinderförmigen optischen gegenstandes
JP7277101B2 (ja) 2018-10-11 2023-05-18 キヤノン株式会社 収差推定方法、収差推定装置、プログラムおよび記憶媒体
US11788927B2 (en) 2021-02-26 2023-10-17 Heraeus Quartz North America Llc Evaluation of preforms with non-step-index refractive-index-profile (RIP)
CN113984222B (zh) * 2021-10-28 2024-06-14 中山光子科学中心 光栅压缩器波前畸变在线测量装置及测量方法

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JP4968966B2 (ja) 2009-12-07 2012-07-04 キヤノン株式会社 屈折率分布の計測方法および計測装置
JP5021054B2 (ja) 2010-05-25 2012-09-05 キヤノン株式会社 屈折率分布計測方法および屈折率分布計測装置
JP4895409B2 (ja) 2010-05-25 2012-03-14 キヤノン株式会社 屈折率分布計測方法および屈折率分布計測装置
JP5008763B2 (ja) 2010-12-03 2012-08-22 キヤノン株式会社 屈折率分布計測方法、屈折率分布計測装置および光学素子の製造方法

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