JP2010212328A5 - - Google Patents

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Publication number
JP2010212328A5
JP2010212328A5 JP2009054624A JP2009054624A JP2010212328A5 JP 2010212328 A5 JP2010212328 A5 JP 2010212328A5 JP 2009054624 A JP2009054624 A JP 2009054624A JP 2009054624 A JP2009054624 A JP 2009054624A JP 2010212328 A5 JP2010212328 A5 JP 2010212328A5
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JP
Japan
Prior art keywords
film
semiconductor
forming
electrode
layer
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Granted
Application number
JP2009054624A
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English (en)
Japanese (ja)
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JP5428404B2 (ja
JP2010212328A (ja
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Priority to JP2009054624A priority Critical patent/JP5428404B2/ja
Priority claimed from JP2009054624A external-priority patent/JP5428404B2/ja
Publication of JP2010212328A publication Critical patent/JP2010212328A/ja
Publication of JP2010212328A5 publication Critical patent/JP2010212328A5/ja
Application granted granted Critical
Publication of JP5428404B2 publication Critical patent/JP5428404B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2009054624A 2009-03-09 2009-03-09 薄膜トランジスタ及び薄膜トランジスタの製造方法 Expired - Fee Related JP5428404B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009054624A JP5428404B2 (ja) 2009-03-09 2009-03-09 薄膜トランジスタ及び薄膜トランジスタの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009054624A JP5428404B2 (ja) 2009-03-09 2009-03-09 薄膜トランジスタ及び薄膜トランジスタの製造方法

Publications (3)

Publication Number Publication Date
JP2010212328A JP2010212328A (ja) 2010-09-24
JP2010212328A5 true JP2010212328A5 (zh) 2011-11-17
JP5428404B2 JP5428404B2 (ja) 2014-02-26

Family

ID=42972227

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009054624A Expired - Fee Related JP5428404B2 (ja) 2009-03-09 2009-03-09 薄膜トランジスタ及び薄膜トランジスタの製造方法

Country Status (1)

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JP (1) JP5428404B2 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101344977B1 (ko) 2010-09-29 2014-01-15 파나소닉 주식회사 Ｅｌ 표시 패널, ｅｌ 표시 장치 및 ｅｌ 표시 패널의 제조 방법
KR101348537B1 (ko) 2010-09-29 2014-01-07 파나소닉 주식회사 Ｅｌ 표시 패널, ｅｌ 표시 장치 및 ｅｌ 표시 패널의 제조 방법

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3412277B2 (ja) * 1994-08-23 2003-06-03 カシオ計算機株式会社 薄膜トランジスタおよびその製造方法
JP3865818B2 (ja) * 1996-04-16 2007-01-10 三菱電機株式会社 アクティブマトリクス基板の製法
JP3801687B2 (ja) * 1996-06-06 2006-07-26 三菱電機株式会社 薄膜トランジスタおよびその製法
JP3323889B2 (ja) * 1996-10-28 2002-09-09 三菱電機株式会社 薄膜トランジスタの製造方法
JPH10270701A (ja) * 1997-03-27 1998-10-09 Advanced Display:Kk 薄膜トランジスタおよびその製法
JP2000214485A (ja) * 1999-01-21 2000-08-04 Toshiba Corp アレイ基板および液晶表示素子
JP5212683B2 (ja) * 2007-03-20 2013-06-19 カシオ計算機株式会社 トランジスタパネル及びその製造方法

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