JP2010189703A5 - - Google Patents
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- Publication number
- JP2010189703A5 JP2010189703A5 JP2009035080A JP2009035080A JP2010189703A5 JP 2010189703 A5 JP2010189703 A5 JP 2010189703A5 JP 2009035080 A JP2009035080 A JP 2009035080A JP 2009035080 A JP2009035080 A JP 2009035080A JP 2010189703 A5 JP2010189703 A5 JP 2010189703A5
- Authority
- JP
- Japan
- Prior art keywords
- film
- film forming
- wall surface
- forming method
- piezoelectric
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 17
- 239000007788 liquid Substances 0.000 claims 8
- 239000000758 substrate Substances 0.000 claims 8
- 230000015572 biosynthetic process Effects 0.000 claims 6
- 239000000470 constituent Substances 0.000 claims 4
- 238000010438 heat treatment Methods 0.000 claims 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 2
- 229910052788 barium Inorganic materials 0.000 claims 2
- 229910052793 cadmium Inorganic materials 0.000 claims 2
- 238000000151 deposition Methods 0.000 claims 2
- 230000005684 electric field Effects 0.000 claims 2
- 239000007789 gas Substances 0.000 claims 2
- 229910052745 lead Inorganic materials 0.000 claims 2
- 229910052749 magnesium Inorganic materials 0.000 claims 2
- 229910052755 nonmetal Inorganic materials 0.000 claims 2
- 229910052760 oxygen Inorganic materials 0.000 claims 2
- 239000001301 oxygen Substances 0.000 claims 2
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- 229910052797 bismuth Inorganic materials 0.000 claims 1
- 229910052791 calcium Inorganic materials 0.000 claims 1
- 229910052804 chromium Inorganic materials 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- 229910052733 gallium Inorganic materials 0.000 claims 1
- 229910052735 hafnium Inorganic materials 0.000 claims 1
- 229910052738 indium Inorganic materials 0.000 claims 1
- 229910052742 iron Inorganic materials 0.000 claims 1
- 229910052747 lanthanoid Inorganic materials 0.000 claims 1
- 150000002602 lanthanoids Chemical class 0.000 claims 1
- 229910052748 manganese Inorganic materials 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 229910052750 molybdenum Inorganic materials 0.000 claims 1
- 229910052759 nickel Inorganic materials 0.000 claims 1
- 229910052758 niobium Inorganic materials 0.000 claims 1
- 229910052700 potassium Inorganic materials 0.000 claims 1
- 229910052706 scandium Inorganic materials 0.000 claims 1
- 229910052708 sodium Inorganic materials 0.000 claims 1
- 238000004544 sputter deposition Methods 0.000 claims 1
- 229910052712 strontium Inorganic materials 0.000 claims 1
- 229910052715 tantalum Inorganic materials 0.000 claims 1
- 229910052718 tin Inorganic materials 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 claims 1
- 229910052721 tungsten Inorganic materials 0.000 claims 1
- 229910052720 vanadium Inorganic materials 0.000 claims 1
- 238000001947 vapour-phase growth Methods 0.000 claims 1
- 229910052725 zinc Inorganic materials 0.000 claims 1
- 229910052726 zirconium Inorganic materials 0.000 claims 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009035080A JP5410780B2 (ja) | 2009-02-18 | 2009-02-18 | 成膜方法、成膜装置、圧電体膜、圧電素子、及び液体吐出装置 |
| EP10152540.0A EP2221395B1 (en) | 2009-02-18 | 2010-02-03 | Film formation method. |
| US12/707,520 US8563091B2 (en) | 2009-02-18 | 2010-02-17 | Film formation method, film formation device, piezoelectric film, piezoelectric device and liquid discharge device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009035080A JP5410780B2 (ja) | 2009-02-18 | 2009-02-18 | 成膜方法、成膜装置、圧電体膜、圧電素子、及び液体吐出装置 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012156690A Division JP5475843B2 (ja) | 2012-07-12 | 2012-07-12 | 成膜方法、成膜装置、圧電体膜、圧電素子、及び液体吐出装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010189703A JP2010189703A (ja) | 2010-09-02 |
| JP2010189703A5 true JP2010189703A5 (https=) | 2012-08-30 |
| JP5410780B2 JP5410780B2 (ja) | 2014-02-05 |
Family
ID=42021021
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009035080A Active JP5410780B2 (ja) | 2009-02-18 | 2009-02-18 | 成膜方法、成膜装置、圧電体膜、圧電素子、及び液体吐出装置 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US8563091B2 (https=) |
| EP (1) | EP2221395B1 (https=) |
| JP (1) | JP5410780B2 (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011089748A1 (ja) | 2010-01-21 | 2011-07-28 | 株式会社ユーテック | Ｐｂｎｚｔ強誘電体膜、ゾルゲル溶液、成膜方法及び強誘電体膜の製造方法 |
| JP5776890B2 (ja) * | 2010-11-16 | 2015-09-09 | セイコーエプソン株式会社 | 液体噴射ヘッド及び液体噴射装置並びに圧電素子 |
| JP5790922B2 (ja) * | 2011-04-22 | 2015-10-07 | セイコーエプソン株式会社 | 圧電素子、液体噴射ヘッド、液体噴射装置、超音波デバイス及びセンサー |
| US9437806B2 (en) * | 2013-12-02 | 2016-09-06 | Canon Kabushiki Kaisha | Piezoelectric thin film, method of manufacturing the same, piezoelectric thin film manufacturing apparatus and liquid ejection head |
| RU2718467C1 (ru) * | 2018-11-12 | 2020-04-08 | Общества с ограниченной ответсвеностью "СИКЛАБ" | Способ получения эпитаксиальных пленок феррита висмута методом молекулярного наслаивания |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR940006708B1 (ko) * | 1989-01-26 | 1994-07-25 | 세이꼬 엡슨 가부시끼가이샤 | 반도체 장치의 제조 방법 |
| US5006706A (en) * | 1989-05-31 | 1991-04-09 | Clemson University | Analytical method and apparatus |
| JPH10335097A (ja) * | 1997-03-31 | 1998-12-18 | Hitachi Ltd | プラズマ処理装置およびプラズマ処理方法 |
| DK0908924T3 (da) * | 1997-10-08 | 2003-09-29 | Cockerill Rech & Dev | Indretning til dannelse af en coating på et substrat ved kondensation |
| JP3126698B2 (ja) * | 1998-06-02 | 2001-01-22 | 富士通株式会社 | スパッタ成膜方法、スパッタ成膜装置及び半導体装置の製造方法 |
| JP3820333B2 (ja) * | 1999-11-19 | 2006-09-13 | 株式会社アルバック | 放電プラズマ処理装置 |
| DE602005002060T2 (de) * | 2004-01-27 | 2007-12-13 | Matsushita Electric Industrial Co., Ltd., Kadoma | Piezoelektrisches Element und dessen Herstellungsverfahren sowie Tintenstrahldruckkopf und -aufzeichnungsgerät mit demselben |
| KR100814454B1 (ko) * | 2004-03-26 | 2008-03-17 | 닛신덴키 가부시키 가이샤 | 실리콘 도트 형성방법 및 실리콘 도트 형성장치 |
| US7863611B2 (en) * | 2004-11-10 | 2011-01-04 | Canon Kabushiki Kaisha | Integrated circuits utilizing amorphous oxides |
| JP4142705B2 (ja) * | 2006-09-28 | 2008-09-03 | 富士フイルム株式会社 | 成膜方法、圧電膜、圧電素子、及び液体吐出装置 |
| JP4142706B2 (ja) | 2006-09-28 | 2008-09-03 | 富士フイルム株式会社 | 成膜装置、成膜方法、絶縁膜、誘電体膜、圧電膜、強誘電体膜、圧電素子および液体吐出装置 |
| JP2008248362A (ja) * | 2007-03-30 | 2008-10-16 | Fujifilm Corp | セレン蒸着装置 |
| JP2008179894A (ja) * | 2008-01-21 | 2008-08-07 | Fujifilm Corp | 成膜装置、成膜方法、絶縁膜、誘電体膜、圧電膜、強誘電体膜、圧電素子および液体吐出装置 |
-
2009
- 2009-02-18 JP JP2009035080A patent/JP5410780B2/ja active Active
-
2010
- 2010-02-03 EP EP10152540.0A patent/EP2221395B1/en active Active
- 2010-02-17 US US12/707,520 patent/US8563091B2/en not_active Expired - Fee Related
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