JP2010158236A - Bean sprout growing system, and bean sprout grown by the system - Google Patents
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Abstract
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本発明は、発酵により得られたエタノール（以下、「発酵エタノール」と称することがある）を由来とするエチレンガスを用いてもやしの生育を制御するためのシステム及び該システムにより育成されたもやしに関する。 The present invention relates to a system for controlling the growth of bean sprout using ethylene gas derived from ethanol obtained by fermentation (hereinafter sometimes referred to as “fermented ethanol”) and bean sprout grown by the system. .
従来、もやしの太さを制御する方法としては、石油を原料とする石油精製エチレンで制御する方法が主流であったが、食品であるもやしに石油由来のガスを直接接触させて用いる従来の制御方法は、有機農法志向の消費者を中心に、長期間使用の安全意識上からも抵抗があった。 Conventionally, as a method of controlling the thickness of bean sprout, a method of controlling with petroleum refined ethylene using petroleum as a raw material has been the mainstream, but conventional control using a petroleum-derived gas in direct contact with bean sprout as a food. The method was also resistant from the viewpoint of safety for long-term use, mainly by organic-oriented consumers.
また、従来は石油精製エチレンをボンベ等に充填した市販品を使用し、微量ではあるがそれをもやし育成室に一定量を継続して放出し続けて使用するのが一般的で、石油精製エチレンを正確に濃度制御することには費用や労力をかけなかったが、近年、消費者の安全意識や購買時の選択識別力の向上に伴って、もやしの太さや形状の制御に関する技術が向上し、ガス濃度に関しても正確な濃度制御を行うようになってきた。 Conventionally, it is common to use a commercial product in which oil refined ethylene is filled in a cylinder, etc., and a small amount of it is sprinkled and continuously released into a growing room. However, in recent years, with the improvement of consumer safety awareness and selective discrimination at the time of purchase, the technology for controlling the thickness and shape of bean sprout has improved. As for the gas concentration, accurate concentration control has come to be performed.
エチレンガス濃度測定装置としては、例えば特開平１１−１４８９０７号公報（引用文献１）がある。このエチレンガス濃度測定装置は、ガスセンサーを収納した測定室と、その上流に配置され、乾燥剤を充填した乾燥筒と、乾燥筒の上流に配置されたメンブレンドライヤーと、更に上流に配置され、過マンガン酸カリウム水溶液を充填した洗気瓶とを備え、洗気瓶の上流に設置されたもやし育成室からの被検ガスを、ガスポンプにより測定室に供給するものである。 As an ethylene gas concentration measuring device, for example, there is JP-A-11-148907 (Cited document 1). This ethylene gas concentration measuring apparatus is disposed upstream of a measurement chamber containing a gas sensor, a drying cylinder disposed upstream thereof, a drying cylinder filled with a desiccant, a membrane dryer disposed upstream of the drying cylinder, A cleaning bottle filled with an aqueous potassium permanganate solution is provided, and a test gas from a bean sprout growing chamber installed upstream of the cleaning bottle is supplied to a measurement chamber by a gas pump.
従来のエチレンガス濃度測定装置は、安価な半導体ガスセンサーを用いるため、もやし育成室内の空気サンプル中の気化したエタノールにも反応し検出してしまうという問題があった。有機農法（オーガニック農法）の重要管理項目の一つである「非石油由来性」エチレン（発酵エタノール分解性エチレン）を使用する場合は、発酵により得られたエタノールを由来とするエチレンを使用し、エチレンにエタノールが混入しやすくなるためその問題が顕著になる。そのため、発酵エタノールを由来とするエチレンを使用してもやしの育成を行う場合、精度よく測定し制御するには、未だ改良の余地があった。 Since the conventional ethylene gas concentration measuring apparatus uses an inexpensive semiconductor gas sensor, there is a problem that it reacts and detects vaporized ethanol in an air sample in a bean sprout chamber. When using “non-petroleum-derived” ethylene (fermented ethanol-decomposable ethylene), which is one of the important management items of organic farming (organic farming), use ethylene derived from ethanol obtained by fermentation, The problem becomes prominent because ethanol easily mixes with ethylene. Therefore, there is still room for improvement in order to measure and control with high accuracy when growing bean sprouts using ethylene derived from fermented ethanol.
発酵エタノールを由来とするエチレンは、熱した素焼きの陶器等に発酵エタノールをタイマー等で適宜注入するなどして、適当量のエチレンガスを発生させる方法はあったが、もやしはその種類によって適切なエチレン濃度が異なり、しかもその差は０．１ｐｐｍオーダーの違いといわれている。しかしながら従来のエチレンガス供給装置は、０．１〜５ｐｐｍ程度の濃度で、精度よく濃度管理する必要がある最近のもやし育成には使用することができなかった。 For ethylene derived from fermented ethanol, there was a method of generating an appropriate amount of ethylene gas by appropriately injecting fermented ethanol into a heated unglazed pottery with a timer, etc. The ethylene concentration is different, and the difference is said to be on the order of 0.1 ppm. However, the conventional ethylene gas supply apparatus cannot be used for the recent bean sprouting which needs to be accurately controlled at a concentration of about 0.1 to 5 ppm.
従って、本発明は、発酵エタノール由来のエチレンを用いる場合でも、０．１〜５ｐｐｍ程度の濃度で精度よくエチレンガスの濃度管理を行い、もやしの生育を制御する技術を提供することを目的とする。 Therefore, even when using ethylene derived from fermented ethanol, this invention aims at providing the technique which performs density | concentration management of ethylene gas accurately with the density | concentration of about 0.1-5 ppm, and controls the growth of a bean sprout. .
上記の課題を解決するためになされたものであり、発酵により得られたエタノールを由来とするエチレンを加圧状態で貯蔵するエチレンガス供給部と、もやしを育成するもやし育成室と、前記もやし育成室内のエチレン濃度をガスクロマトグラフを用いて測定し、設定濃度に応じて、前記エチレンガス供給部と前記もやし育成室とのガス圧差を利用して、前記エチレンガス供給部で貯蔵されているエチレンを前記エチレンガス供給部から前記もやし育成室へ供給し、もやし育成室内のエチレン濃度を設定濃度範囲に制御する制御部と、を備えたもやし育成システムを提供するものである。 In order to solve the above problems, an ethylene gas supply unit for storing ethylene derived from ethanol obtained by fermentation in a pressurized state, a bean sprout growing room for growing bean sprout, and the bean sprout growing The ethylene concentration in the room was measured using a gas chromatograph, and the ethylene stored in the ethylene gas supply unit was measured using the gas pressure difference between the ethylene gas supply unit and the bean sprout growing chamber according to the set concentration. A bean sprout growing system comprising: a control unit that supplies the bean sprout growing chamber from the ethylene gas supply unit and controls the ethylene concentration in the bean sprout growing chamber to a set concentration range.
本発明のもやし育成システムによれば、発酵エタノール由来のエチレンを用いる場合でも、０．１〜５ｐｐｍ程度の濃度で精度よくエチレンガスの濃度管理を行い、もやしの生育を制御することができるため、もやしの太さや形状を任意に制御することが可能となる。 According to the bean sprout growing system of the present invention, even when using ethylene derived from fermented ethanol, concentration control of ethylene gas can be accurately performed at a concentration of about 0.1 to 5 ppm, and the growth of bean sprout can be controlled. It becomes possible to arbitrarily control the thickness and shape of the bean sprouts.
次に、本発明の実施形態について、図を参照しつつ更に詳細に説明する。図１は本実施形態のもやし育成システムの概要を示す図である。 Next, embodiments of the present invention will be described in more detail with reference to the drawings. FIG. 1 is a diagram showing an outline of a bean sprout growing system of the present embodiment.
図１に示すように、本実施形態のもやし育成システムは、発酵エタノールを触媒を用いて接触脱水反応させてエチレンを発生させ、発生したエチレンをステンレスタンク容器等に加圧状態で貯蔵するエチレンガス供給部１０と、もやしを育成するもやし育成室２０と、もやし育成室２０内のエチレン濃度をガスクロマトグラフを用いて測定し、設定濃度に応じて、エチレンガス供給部１０ともやし育成室２０とのガス圧差を利用して、エチレンガスをエチレンガス供給部１０から放出し、もやし育成室２０内のエチレン濃度を設定濃度範囲に制御する制御部３０とを備えている。 As shown in FIG. 1, the bean sprout growing system of this embodiment generates ethylene by subjecting fermented ethanol to catalytic dehydration reaction using a catalyst to generate ethylene, and stores the generated ethylene in a pressurized state in a stainless tank container or the like. Supply unit 10, bean sprout growing chamber 20 for growing bean sprout, ethylene concentration in bean sprout growing chamber 20 is measured using a gas chromatograph, and ethylene gas supplying unit 10 and bean sprout growing chamber 20 according to the set concentration A control unit 30 is provided that uses the gas pressure difference to discharge ethylene gas from the ethylene gas supply unit 10 and controls the ethylene concentration in the bean sprout chamber 20 to a set concentration range.
図２にエチレンガス供給部１０の構成を示す。図２に示すように、エチレンガス供給部１０は、発酵エタノールを収容するアルコールタンク１２と、触媒を加熱する加熱器１７を備えたエチレンガス生成タンク１４と、生成されたエチレンガスを加圧状態で貯蔵するエチレンガス貯蔵タンク１６とを備えている。 FIG. 2 shows the configuration of the ethylene gas supply unit 10. As shown in FIG. 2, the ethylene gas supply unit 10 includes an alcohol tank 12 that contains fermented ethanol, an ethylene gas generation tank 14 that includes a heater 17 that heats the catalyst, and the generated ethylene gas in a pressurized state. And an ethylene gas storage tank 16 for storing the product.
アルコールタンク１２、エチレンガス生成タンク１４、エチレンガス貯蔵タンク１６はそれぞれ導管１００，１０１及び１０２で接続されており、各導管１００，１０１及び１０２には、ガスを搬送するためのポンプ１１０及び１２０と、ガスの逆流を防止するための逆止弁１１１、１１２及び１１３が設けられている。また、エチレンガス生成タンク１４とエチレンガス貯蔵タンク１６にはそれぞれタンク内の圧力を測定する圧力計１３０及び１４０が設けられている。 The alcohol tank 12, the ethylene gas generation tank 14, and the ethylene gas storage tank 16 are connected by conduits 100, 101, and 102, respectively, and the conduits 100, 101, and 102 have pumps 110 and 120 for transporting gas. In addition, check valves 111, 112, and 113 are provided for preventing gas backflow. The ethylene gas generation tank 14 and the ethylene gas storage tank 16 are provided with pressure gauges 130 and 140 for measuring the pressure in the tank, respectively.
前記導管１００，１０１及び１０２としては、ステンレス管やポリチューブ等などを挙げることができ、液体やガスを搬送することができればその種類に特に限定はないが、耐熱性を有することが条件となる。 Examples of the conduits 100, 101, and 102 include stainless steel tubes and polytubes, and there are no particular limitations on the type of the conduits as long as they can transport liquids and gases, but they must have heat resistance. .
もやし育成システムを初期状態から作動させる場合又はエチレンガス貯蔵タンク１６の圧力計１４０が設定値を下回った場合に、エチレンガス生成タンク１４の加熱器１７のスイッチがＯＮになる。なお、エチレンガス貯蔵タンク１６の圧力計１４０の設定値は後述するもやし育成室内のエチレンガス濃度に応じて任意に設定することができるが、噴出（吐出）ガス圧で０．０１〜０．２Ｍｐａ程度に設定することが好ましい。 When the bean sprout growing system is operated from the initial state or when the pressure gauge 140 of the ethylene gas storage tank 16 falls below the set value, the switch of the heater 17 of the ethylene gas generation tank 14 is turned on. Note that the set value of the pressure gauge 140 of the ethylene gas storage tank 16 can be arbitrarily set according to the ethylene gas concentration in the bean sprouts described later, but is 0.01 to 0.2 Mpa as the ejection (discharge) gas pressure. It is preferable to set the degree.
加熱器１７のスイッチがＯＮになると、アルコールからエチレンを生成するための触媒１８が加熱される。触媒１８としては、アルコールの脱水反応を触媒できるものであれば特に限定はないが、例えば、酸化アルミニウムなどを使用することができる。触媒１８の量は、２００〜１０００ｇ程度が好ましい。 When the switch of the heater 17 is turned on, the catalyst 18 for generating ethylene from alcohol is heated. The catalyst 18 is not particularly limited as long as it can catalyze a dehydration reaction of alcohol. For example, aluminum oxide or the like can be used. The amount of the catalyst 18 is preferably about 200 to 1000 g.
触媒１８の温度が３００〜３５０℃に達すると、ポンプ１１０のスイッチがＯＮになる。そして、１分間に数ミリリットル（数ｍｌ／ｍｉｎ）の量をポンプ１１０で調整しながら、アルコールタンク１２内の発酵エタノールをエチレンガス生成タンク１４に供給する。発酵エタノールがエチレンガス生成タンク１４に供給されると、発酵エタノールが加熱された接触と反応(触媒作用)してエチレンガスが発生する。 When the temperature of the catalyst 18 reaches 300 to 350 ° C., the switch of the pump 110 is turned on. Then, while adjusting the amount of several milliliters (several ml / min) per minute with the pump 110, the fermented ethanol in the alcohol tank 12 is supplied to the ethylene gas production tank 14. When fermented ethanol is supplied to the ethylene gas generation tank 14, the fermented ethanol reacts with the heated contact (catalysis) to generate ethylene gas.
エチレンガスの発生量が多くなるにつれてエチレンガス生成タンク１４内の圧力が上昇するため、この圧力が設定値に達したことを圧力計１３０が計測したときに、ポンプ１１０のスイッチをＯＦＦにするのと同時に、ポンプ１２０のスイッチがＯＮになる。なお、エチレンガス生成タンク１４の圧力計１３０の設定値は後述するもやし育成室２０内のエチレンガス濃度に応じて任意に設定することができるが、噴出（吐出）ガス圧で０．０１〜０．２Ｍｐａ程度に設定することが好ましい。 Since the pressure in the ethylene gas generation tank 14 increases as the amount of ethylene gas generated increases, when the pressure gauge 130 measures that this pressure has reached the set value, the switch of the pump 110 is turned off. At the same time, the pump 120 is turned on. In addition, although the set value of the pressure gauge 130 of the ethylene gas production tank 14 can be arbitrarily set according to the ethylene gas concentration in the bean sprouts 20 which will be described later, it is 0.01 to 0 in terms of the ejection (discharge) gas pressure It is preferable to set it to about 2 Mpa.
なお、加熱器１７、触媒１８及び圧力計１３０を含むエチレンガス生成タンク１４を、例えばクラッチドア付圧力容器（図示せず）に収容し、内部を気密状態に保持することが好ましい。これにより、エチレンガスの生成効率を高めるとともに、エチレンガス生成タンク１４内の圧力が上昇したときに生成したエチレンガスが外部へ漏出することを防止することができる。 The ethylene gas generation tank 14 including the heater 17, the catalyst 18, and the pressure gauge 130 is preferably accommodated in, for example, a pressure vessel (not shown) with a clutch door, and the inside is preferably kept airtight. As a result, the ethylene gas generation efficiency can be increased, and the ethylene gas generated when the pressure in the ethylene gas generation tank 14 increases can be prevented from leaking to the outside.
ポンプ１２０のスイッチがＯＮになると、エチレンガス生成タンク１４からエチレンガス貯蔵タンク１６にエチレンガスが搬送される。 When the switch of the pump 120 is turned on, ethylene gas is conveyed from the ethylene gas generation tank 14 to the ethylene gas storage tank 16.
そして、ポンプ１２０によってエチレンガス貯蔵タンク１６内の圧力が徐々に加圧状態になっていき、タンク内の圧力が設定値に達したことを圧力計１４０が計測すると、加熱器１７とポンプ１２０のスイッチがＯＦＦになる。なお、エチレンガス貯蔵タンク１６の圧力計１４０の設定値は後述するもやし育成室２０内のエチレンガス濃度に応じて任意に設定することができるが、噴出（吐出）ガス圧で０．０１〜０．２Ｍｐａ程度に設定することが好ましい。 Then, when the pressure in the ethylene gas storage tank 16 is gradually increased by the pump 120 and the pressure gauge 140 measures that the pressure in the tank has reached the set value, the heater 17 and the pump 120 are connected. The switch turns off. In addition, although the set value of the pressure gauge 140 of the ethylene gas storage tank 16 can be arbitrarily set according to the ethylene gas concentration in the bean sprouts 20 which will be described later, it is 0.01 to 0 as the ejection (discharge) gas pressure. It is preferable to set it to about 2 Mpa.
エチレンガス貯蔵タンク１６内の圧力が設定値に達すれば、エチレンガスをそれ以上生成する必要がなくなるため、エチレンガス供給部１０が停止する。生成されたエチレンガスはエチレンガス貯蔵タンク１６に加圧状態で貯蔵され、その後、後述するもやし育成室２０内のエチレンガス濃度に応じて、制御部３０を介してもやし育成室２０にエチレンガスを供給する。 When the pressure in the ethylene gas storage tank 16 reaches the set value, it is not necessary to generate any more ethylene gas, so the ethylene gas supply unit 10 stops. The generated ethylene gas is stored in the ethylene gas storage tank 16 in a pressurized state, and then the ethylene gas is fed into the sprout growing chamber 20 via the control unit 30 according to the ethylene gas concentration in the sprouts growing chamber 20 described later. Supply.
図３に制御部３０の構成を示す。図３に示すように、制御部３０は、制御盤３２と、酸素濃度計３４と、ガスクロマトグラフ３６と、データ処理機３８と、パソコン４０を備えており、それぞれ電気的に接続されている。 FIG. 3 shows the configuration of the control unit 30. As shown in FIG. 3, the control unit 30 includes a control panel 32, an oxygen concentration meter 34, a gas chromatograph 36, a data processor 38, and a personal computer 40, which are electrically connected to each other.
制御盤３２には、弁の開閉により導管１０２と導管１０３との間でエチレンガスの供給を制御するエチレン供給電磁弁３２０が設置されている。また、もやし育成室２０内の空気が導管１０４を介してポンプ１５０で吸引されるようになっており、制御盤に吸引された空気は酸素濃度計３４とガスクロマトグラフ３６に分配される。そして、酸素濃度計３４では吸引された空気の酸素濃度（％）が測定され、そのデータがパソコン４０に送信される。 The control panel 32 is provided with an ethylene supply electromagnetic valve 320 that controls the supply of ethylene gas between the conduit 102 and the conduit 103 by opening and closing the valve. Further, the air in the bean sprout growing chamber 20 is sucked by the pump 150 through the conduit 104, and the air sucked into the control panel is distributed to the oximeter 34 and the gas chromatograph 36. The oxygen concentration meter 34 measures the oxygen concentration (%) of the sucked air and transmits the data to the personal computer 40.
なお、ポンプ１５０は常時駆動させてもやし育成室２０内の酸素濃度やエチレン濃度を常に監視することもできるが、ポンプ１５０を間欠的に駆動させて定期的にもやし育成室２０内の酸素濃度やエチレン濃度を監視するようにしてもよい。いずれの場合でも、酸素濃度やエチレン濃度を測定できる程度の量の空気を吸引すればよいため、ポンプ１５０の能力は１分間に数リッター程度の吸引力があればよい。 Although the pump 150 can be constantly driven, the oxygen concentration and ethylene concentration in the sprout growing chamber 20 can always be monitored. However, the pump 150 can be driven intermittently to periodically sprout the oxygen concentration in the sprout growing chamber 20. The ethylene concentration may be monitored. In any case, since it is sufficient to suck in an amount of air that can measure the oxygen concentration and the ethylene concentration, the capacity of the pump 150 only needs to be about several liters per minute.
一方、ガスクロマトグラフ３６では吸引された空気のエチレン濃度（ｐｐｍ）が測定され、そのデータがデータ処理機３８に送信され、データ処理機３８は計測されたクロマトグラム３６のデータから測定濃度を算出し、それをデジタル信号化し決められたタイミングでパソコン４０に送信する。このシステムのガスクロマトグラフ３６は、従来の赤外吸収ガスセンサー等に比較して、数百倍以上の高精度を有している。そのため、０．０１ｐｐｍのオーダーで、正確な測定が可能である。本実施形態では、もやしの育成に適した０．１〜５ｐｐｍの範囲でエチレン濃度を制御することが好ましい。 On the other hand, in the gas chromatograph 36, the ethylene concentration (ppm) of the sucked air is measured, and the data is transmitted to the data processor 38. The data processor 38 calculates the measured concentration from the data of the measured chromatogram 36. Then, it is converted into a digital signal and transmitted to the personal computer 40 at a predetermined timing. The gas chromatograph 36 of this system has a high accuracy several hundred times or more compared to a conventional infrared absorption gas sensor or the like. Therefore, accurate measurement is possible on the order of 0.01 ppm. In this embodiment, it is preferable to control the ethylene concentration within a range of 0.1 to 5 ppm suitable for bean sprouts.
パソコン４０では予め設定された酸素濃度（Ｏ０）及びエチレン濃度（Ｅ０）と、データ送信された測定酸素濃度（Ｏ１）及び測定エチレン濃度（Ｅ１）が比較計算され、算出された酸素濃度差分（Ｏ＝Ｏ０−Ｏ１）をシロッコファンなどの酸素換気ファン２２の換気作動時間に、またエチレン濃度差分（Ｅ＝Ｅ０−Ｅ１）をエチレン供給電磁弁３２０の開閉時間に換算する。なお、パソコン４０に設定される酸素濃度及びエチレン濃度はもやしの種類やもやしの育成状況に応じて適宜設定することが可能である。 In the personal computer 40, the oxygen concentration (O 0 ) and ethylene concentration (E 0 ) set in advance are compared with the measured oxygen concentration (O 1 ) and measured ethylene concentration (E 1 ) transmitted, and the calculated oxygen concentration is compared. The concentration difference (O = O 0 -O 1 ) is converted into the ventilation operation time of the oxygen ventilation fan 22 such as a sirocco fan, and the ethylene concentration difference (E = E 0 -E 1 ) is converted into the opening / closing time of the ethylene supply solenoid valve 320. To do. The oxygen concentration and the ethylene concentration set in the personal computer 40 can be set as appropriate according to the type of bean sprouts and the bean sprouts growing condition.
そして、パソコン４０から送信された酸素換気ファン２２の換気作動時間に関するデータ及びエチレン供給電磁弁３２０の開閉時間に関するデータが制御盤３２に送信される。 Then, data related to the ventilation operation time of the oxygen ventilation fan 22 and data related to the opening / closing time of the ethylene supply electromagnetic valve 320 transmitted from the personal computer 40 are transmitted to the control panel 32.
データを受信した制御盤３２は、パソコン４０からのデータに基づき、エチレン供給電磁弁３２０の開閉を一定時間行うと共に、後述するもやし育成室２０の酸素換気ファン２２の作動や停止を行う。パソコン４０から送信されるデータと、エチレン供給電磁弁３２０及び酸素換気ファン２２の動作との関係は適宜設定することができるが、例えば、酸素濃度（Ｏ）がマイナスの値を示す場合は酸素換気ファン２２をＯＦＦにし、プラスの値を示す場合はＯＮに制御することができる。また、エチレン濃度（Ｅ）がマイナスの値を示す場合はエチレン供給電磁弁３２０を閉じてエチレンガス貯蔵タンク１６からもやし育成室２０にエチレンが放出しないように制御し、プラスの値を示す場合はエチレン供給電磁弁３２０開いてエチレンガス貯蔵タンク１６からもやし育成室２０にエチレンが放出するように制御することができる。なお、測定酸素濃度が設定酸素濃度より低い時に空気を送入させるため、Ｏ０−Ｏ１≦０の時は換気ファンは稼働しない。同じく、エチレンも設定値より測定値が少ない時、エチレンを注入させるため、Ｅ０−Ｅ１≦０の時はエチレンは供給されない。 The control panel 32 that has received the data opens and closes the ethylene supply electromagnetic valve 320 for a certain period of time based on the data from the personal computer 40 and also activates and deactivates the oxygen ventilation fan 22 in the bean sprout growing chamber 20 described later. The relationship between the data transmitted from the personal computer 40 and the operations of the ethylene supply electromagnetic valve 320 and the oxygen ventilation fan 22 can be set as appropriate. For example, when the oxygen concentration (O) shows a negative value, oxygen ventilation When the fan 22 is turned off and shows a positive value, it can be controlled to be turned on. Further, when the ethylene concentration (E) shows a negative value, the ethylene supply electromagnetic valve 320 is closed so that ethylene is not released from the ethylene gas storage tank 16 to the bean sprout growing chamber 20, and when a positive value is shown. The ethylene supply electromagnetic valve 320 can be opened and controlled so that ethylene is released from the ethylene gas storage tank 16 into the bean sprouts 20. Note that the ventilation fan does not operate when O 0 −O 1 ≦ 0 because air is introduced when the measured oxygen concentration is lower than the set oxygen concentration. Similarly, since ethylene is injected when the measured value of ethylene is smaller than the set value, ethylene is not supplied when E 0 −E 1 ≦ 0.
エチレン貯蔵タンク１６から搬送されたエチレンガスは、制御盤３２に設置されているエチレン供給電磁弁３２０の開閉時間に応じてもやし育成室２０に供給される。上述のように、エチレン貯蔵タンク１６は加圧状態になっているため、制御盤３２内のエチレン供給電磁弁３２０がエチレンガス貯蔵タンク１６の導管１０２ともやし育成室の導管１０３を連通させれば、エチレン貯蔵タンク１６ともやし育成室２０とのガス圧差により、エチレンガスをもやし育成室２０に供給することができる。 The ethylene gas conveyed from the ethylene storage tank 16 is supplied to the sprout growing chamber 20 according to the opening / closing time of the ethylene supply electromagnetic valve 320 installed in the control panel 32. As described above, since the ethylene storage tank 16 is in a pressurized state, if the ethylene supply electromagnetic valve 320 in the control panel 32 communicates with the conduit 102 of the ethylene gas storage tank 16 and the conduit 103 of the growth chamber. The ethylene gas can be supplied to the bean sprout growing chamber 20 by the gas pressure difference between the ethylene storage tank 16 and the bean sprout growing chamber 20.
図４にもやし育成室２０の概要を示す。図４に示すように、もやし育成室２０は、制御部３０に接続され、エチレンガスを搬送するための導管１０３及びもやし育成室２０内の空気を制御部３０に搬送するための導管１０４と、室内に酸素を供給するための酸素換気ファン２２が設置されている。この酸素換気ファンは吸入用と排出用を複数設置することが好ましい。そして、もやし育成床２４にもやし種子が播かれている。もやし育成床２４の数に特に制限はない。本実施例では１つのもやし育成室２０の例を示したが、もやし育成室２０を複数設置してもよい。また、もやし育成室２０のエチレン等のガス濃度を均一にするため、もやし育成室２０内にかき混ぜ用シロッコファンなどの育成室内循環ファン（図示せず）を備えることが好ましい。さらに、空気の循環又は換気を目的として室内に撒水するための撒水装置を備えてもよい。なお、もやし育成室を複数設置する場合、もやし育成室の数に応じて制御盤３２のエチレン供給電磁弁３２０を設ける。 FIG. 4 also shows an outline of the bean growing room 20. As shown in FIG. 4, the bean sprout growing chamber 20 is connected to the control unit 30, a conduit 103 for transporting ethylene gas, and a conduit 104 for transporting the air in the sprout growing chamber 20 to the control unit 30, An oxygen ventilation fan 22 for supplying oxygen into the room is installed. It is preferable to install a plurality of oxygen ventilation fans for suction and discharge. Sprout seeds are sown on the bean sprout growing floor 24. There is no particular limitation on the number of bean sprout growing floors 24. Although the example of one bean sprout growing room 20 was shown in this example, a plurality of bean sprout growing rooms 20 may be installed. Further, in order to make the gas concentration of ethylene or the like in the bean sprout growing chamber 20 uniform, it is preferable to provide a growing indoor circulation fan (not shown) such as a sirocco fan for stirring in the bean sprout growing chamber 20. Further, a water irrigation device for irrigating the room for the purpose of air circulation or ventilation may be provided. When a plurality of bean sprouts are installed, the ethylene supply electromagnetic valve 320 of the control panel 32 is provided according to the number of bean sprouts.
前記導管１０３及び１０４としては、ステンレス管やポリチューブ等などを挙げることができ、液体やガスを搬送することができればその種類に特に限定はない。 Examples of the conduits 103 and 104 include stainless steel tubes and polytubes, and there are no particular limitations on the type of the conduits 103 and 104 as long as they can transport liquids and gases.
なお、もやしの種類は、ブラックマッペ、緑豆、大豆などを挙げることができ、本発明の効果が得られるもやしの種類については特に限定はない。また、エチレンの制御濃度は種子の植物種特有の効果濃度域があるため、種に合わせて濃度を設定することが好ましい。 In addition, as for the kind of bean sprout, black mappe, mung bean, soybean, etc. can be mentioned, and there is no limitation in particular about the kind of bean sprout which can obtain the effect of the present invention. Moreover, since the control density | concentration of ethylene has an effect density area | region peculiar to the plant species of a seed, it is preferable to set a density | concentration according to a seed | species.
制御部３０がもやし育成室２０にエチレンガスを供給するために制御盤３２のエチレン供給電磁弁３２０が開いた状態が継続すると、エチレンガス貯蔵タンク１６内の圧力が低下する。エチレンガス貯蔵タンク１６の圧力計１４０が設定値を下回ると、エチレンガス生成タンク１４の加熱器１７のスイッチがＯＮになり、その後、先述したエチレンガスの生成工程が繰り返される。 If the state in which the ethylene supply electromagnetic valve 320 of the control panel 32 is opened in order for the control unit 30 to supply ethylene gas to the sprout growing chamber 20 continues, the pressure in the ethylene gas storage tank 16 decreases. When the pressure gauge 140 of the ethylene gas storage tank 16 falls below the set value, the switch of the heater 17 of the ethylene gas generation tank 14 is turned on, and then the above-described ethylene gas generation process is repeated.
なお、本実施形態のエチレンガス供給部１０は、アルコールタンク１２とエチレンガス生成タンク１４とエチレンガス貯蔵部１６とから構成された例を示したが、この形態には限定されず、例えば、発酵エタノール由来のエチレンが加圧状態で貯蔵されているガスボンベをエチレンガス供給部として使用することもできる。 In addition, although the ethylene gas supply part 10 of this embodiment showed the example comprised from the alcohol tank 12, the ethylene gas production | generation tank 14, and the ethylene gas storage part 16, it is not limited to this form, For example, fermentation A gas cylinder in which ethylene-derived ethylene is stored under pressure can also be used as the ethylene gas supply unit.
図２〜４に示すもやし育成システムを使用して、具体的にもやし（緑豆もやし）の栽培を行った例を説明する。 The example which cultivated the bean sprouts (mung bean sprouts) specifically using the bean sprout growing system shown in FIGS.
１．エチレンの製造
ステンレス製のエチレンガス貯蔵タンク１４の圧力計１４０を予め０．０２Ｍｐａに設定した。そして、エチレンガス生成タンク１４の加熱器１７としてのマントルヒーターのスイッチをＯＮにし、触媒１８である酸化アルミニウム球（高純度アルミナボール、イウチ社から購入）５００ｇを３５０℃になるまで加熱した。３５０℃に達したときに、ポンプ１１０のスイッチをＯＮにし、１分間に１２ミリリットル（１２ｍｌ／ｍｉｎ）の量の発酵エタノールをアルコールタンク１２からエチレンガス生成タンク１４に供給した。なお、発酵エタノールはアルコール発酵により得られたエタノール（アルコール濃度９９．５％）を使用した。
1. Manufacture of ethylene The pressure gauge 140 of the stainless steel ethylene gas storage tank 14 was previously set to 0.02 Mpa. And the switch of the mantle heater as the heater 17 of the ethylene gas production tank 14 was turned ON, and 500 g of aluminum oxide spheres (high-purity alumina balls, purchased from Iuchi) as the catalyst 18 were heated to 350 ° C. When the temperature reached 350 ° C., the pump 110 was turned on, and fermented ethanol in an amount of 12 ml (12 ml / min) per minute was supplied from the alcohol tank 12 to the ethylene gas generation tank 14. In addition, the ethanol (alcohol concentration 99.5%) obtained by alcohol fermentation was used for fermentation ethanol.
発酵エタノールがエチレンガス生成タンク１４に供給されると、発酵エタノールが加熱された酸化アルミニウム球と反応(触媒作用)してエチレンガスを発生した。エチレンガス生成タンク１４内の圧力が０．０５Ｍｐａに達したことを圧力計１３０が計測したときに、ポンプ１１０のスイッチをＯＦＦにするのと同時に、ポンプ１２０のスイッチをＯＮにした。 When fermented ethanol was supplied to the ethylene gas production tank 14, the fermented ethanol reacted (catalyzed) with the heated aluminum oxide spheres to generate ethylene gas. When the pressure gauge 130 measured that the pressure in the ethylene gas generation tank 14 reached 0.05 MPa, the pump 120 was turned off and the pump 120 was turned on at the same time.
ポンプ１２０のスイッチがＯＮになると、エチレンガス生成タンク１４から３５リッター容量のステンレス製のエチレンガス貯蔵タンク１６にエチレンガスが搬送され、ポンプ１２０によってエチレンガス貯蔵タンク１６内の圧力が徐々に加圧状態になっていった。 When the switch of the pump 120 is turned on, the ethylene gas is transferred from the ethylene gas generation tank 14 to the 35-liter stainless steel ethylene storage tank 16, and the pressure in the ethylene gas storage tank 16 is gradually increased by the pump 120. It became a state.
タンク内の圧力が０．２Ｍｐａに達したことを圧力計１４０が計測したときに、マントルヒーターとポンプ１２０のスイッチをＯＦＦにした。そして、生成されたエチレンガスを加圧状態でエチレンガス貯蔵タンク１６に貯蔵した。 When the pressure gauge 140 measured that the pressure in the tank reached 0.2 MPa, the mantle heater and the pump 120 were turned off. The produced ethylene gas was stored in the ethylene gas storage tank 16 in a pressurized state.
なお、エチレンガス貯蔵タンク１６内の圧力が０．０４Ｍｐａ未満になったことを圧力計１４０が計測したときは、上記の工程を繰り返してエチレンガスを製造した。 In addition, when the pressure gauge 140 measured that the pressure in the ethylene gas storage tank 16 became less than 0.04 Mpa, ethylene gas was manufactured by repeating said process.
２．酸素濃度及びエチレン濃度の制御
連続運転で駆動するサンプル吸引ポンプ１５０を用い、もやし育成室２０内の室内ガスを導管１０４を介してｌ／ｍｉｎの流量で３分間吸引し、吸引したもやし育成室２０内のガスを酸素濃度計３４（チノー社製、製品番号ＭＧ６０００−Ａ００型）とガスクロマトグラフ３６（旧ヤナコ『現ラウンドサイエンス』社製型番ＡＧ−１（Ｆ）型）に分配した。
2. Control of Oxygen Concentration and Ethylene Concentration Using the sample suction pump 150 driven in a continuous operation, the indoor gas in the bean sprout growing chamber 20 is sucked through the conduit 104 at a flow rate of 1 / min for 3 minutes and sucked in the bean sprout growing chamber 20. The gas inside was distributed to an oxygen concentration meter 34 (manufactured by Chino Corporation, product number MG6000-A00 type) and a gas chromatograph 36 (former model number AG-1 (F) type manufactured by former Yanaco “Current Round Science”).
そして、酸素濃度計３４では吸引された室内ガスの酸素濃度（％）を測定し、そのデータがパソコン４０に送信されるようにした。一方、ガスクロマトグラフ３６では吸引された室内ガスのエチレン濃度（ｐｐｍ）を測定し、そのデータをデータ処理機３８（インテグレータークロマトコーダー２１）に送信し、データ処理機３８は計測されたクロマトグラム３６のデータから測定濃度を算出し、それをデジタル信号化しパソコン４０に送信されるようにした。 The oxygen concentration meter 34 measures the oxygen concentration (%) of the sucked indoor gas, and the data is transmitted to the personal computer 40. On the other hand, in the gas chromatograph 36, the ethylene concentration (ppm) of the sucked indoor gas is measured and the data is transmitted to the data processor 38 (integrator chromatocoder 21). The measured concentration was calculated from the data, converted into a digital signal, and transmitted to the personal computer 40.
パソコン４０では酸素濃度（Ｏ０）及びエチレン濃度（Ｅ０）を下記の表１のように設定し、データ送信された酸素濃度（Ｏ１）から、酸素濃度差分（Ｏ＝Ｏ０−Ｏ１）を酸素換気ファン２２としてのシロッコファンの換気作動時間（酸素を供給する時間）を換算した。なお、酸素（空気）の供給は測定酸素濃度が設定酸素濃度より低い時に行うため、Ｏ０−Ｏ１≦０の時は換気ファンは稼働しない。 In the personal computer 40, the oxygen concentration (O 0 ) and the ethylene concentration (E 0 ) are set as shown in Table 1 below, and the oxygen concentration difference (O = O 0 −O 1 ) is determined from the oxygen concentration (O 1 ) transmitted as data. ) Was converted into the ventilation operation time (time for supplying oxygen) of the sirocco fan as the oxygen ventilation fan 22. Since oxygen (air) is supplied when the measured oxygen concentration is lower than the set oxygen concentration, the ventilation fan does not operate when O 0 −O 1 ≦ 0.
また、エチレン濃度（Ｅ０）を下記の表２のように設定し、データ送信されたエチレン濃度（Ｅ１）から、エチレン濃度差分（Ｅ＝Ｅ０−Ｅ１）をエチレン供給電磁弁３２０（ケイヒン社製型番ＭＳＤ０７２０−８ＷＡＧ）の開放時間（エチレンを放出する時間）に換算した。 Further, the ethylene concentration (E 0 ) is set as shown in Table 2 below, and the ethylene concentration difference (E = E 0 -E 1 ) is calculated from the ethylene concentration (E 1 ) transmitted as data by the ethylene supply solenoid valve 320 ( It was converted into the opening time (time for releasing ethylene) of Keihin Corporation model number MSD0720-8WAG.
エチレンガスは、エチレン貯蔵タンク１６内で加圧状態で貯蔵されているため、制御盤３２内のエチレン供給電磁弁３２０が開いてエチレンガス貯蔵タンク１６の導管１０２ともやし育成室の導管１０３が連通したときに、エチレン貯蔵タンク１６ともやし育成室２０とのガス圧差により、エチレンガスが放出される。なお、エチレンガスの供給は測定エチレン濃度が設定エチレン濃度より低い時に行うため、Ｅ０−Ｅ１≦０の時はエチレン供給電磁弁は閉じたままである。 Since ethylene gas is stored in the ethylene storage tank 16 in a pressurized state, the ethylene supply electromagnetic valve 320 in the control panel 32 is opened, and the conduit 103 of the bean sprout chamber communicates with the conduit 102 of the ethylene gas storage tank 16. When this occurs, ethylene gas is released due to a gas pressure difference between the ethylene storage tank 16 and the bean sprout growing chamber 20. Since ethylene gas is supplied when the measured ethylene concentration is lower than the set ethylene concentration, the ethylene supply solenoid valve remains closed when E 0 -E 1 ≦ 0.
３．もやしの栽培
もやし育成室２０のもやし育成床２４には緑豆が植えられており、上記１及び２の工程により、もやし育成室２０の酸素濃度及びエチレン濃度が図５に示すように制御された。その結果、育成９日目で太くてシャキシャキ感の歯ごたえのあるもやしを収穫することができた。
3. Sprout Cultivation Mung beans are planted on the bean sprout growing floor 24 of the bean sprout growing room 20, and the oxygen concentration and ethylene concentration in the bean sprout growing room 20 were controlled by the steps 1 and 2 as shown in FIG. As a result, on the 9th day of cultivation, we were able to harvest thick and crisp bean sprouts.
１０…エチレンガス供給部
１２…アルコールタンク
１４…エチレンガス生成タンク
１６…エチレンガス貯蔵タンク
１７…加熱器
１８…触媒
２０…もやし育成室
２２…酸素換気ファン
２４…もやし育成床
３０…制御部
３２…制御盤
３２０…エチレン供給電磁弁
３４…酸素濃度計
３６…ガスクロマトグラフ
３８…データ処理機
４０…パソコン
１００〜１０４…導管
１１０…ポンプ
１１１〜１１３…逆止弁
１２０…ポンプ
１３０…圧力計
１４０…圧力計
１５０…ポンプ
DESCRIPTION OF SYMBOLS 10 ... Ethylene gas supply part 12 ... Alcohol tank 14 ... Ethylene gas production tank 16 ... Ethylene gas storage tank 17 ... Heater 18 ... Catalyst 20 ... Sprout growth room 22 ... Oxygen ventilation fan 24 ... Sprout growth bed 30 ... Control part 32 ... Control panel 320 ... Ethylene supply solenoid valve 34 ... Oxygen meter 36 ... Gas chromatograph 38 ... Data processor 40 ... Personal computer 100-104 ... Pipe 110 ... Pump 111-113 ... Check valve 120 ... Pump 130 ... Pressure gauge 140 ... Pressure Total 150 ... Pump
Claims (6)
もやしを育成するもやし育成室と、
前記もやし育成室内のエチレン濃度をガスクロマトグラフを用いて測定し、設定濃度に応じて、前記エチレンガス供給部と前記もやし育成室とのガス圧差を利用して、前記エチレンガス供給部で貯蔵されているエチレンを前記エチレンガス供給部から前記もやし育成室へ供給し、もやし育成室内のエチレン濃度を設定濃度範囲に制御する制御部と、
を備えたもやし育成システム。 An ethylene gas supply unit for storing ethylene derived from ethanol obtained by fermentation in a pressurized state;
Bean sprout growing room to grow bean sprout,
The ethylene concentration in the bean sprout growing chamber is measured using a gas chromatograph, and stored in the ethylene gas supply unit using the gas pressure difference between the ethylene gas supply unit and the bean sprout growing chamber according to the set concentration. Supplying ethylene from the ethylene gas supply unit to the bean sprout growing chamber, and controlling the ethylene concentration in the bean sprout growing chamber to a set concentration range;
Bean sprout growing system.
前記アルコールタンクから供給されたエタノールを触媒により脱水反応させてエチレンを発生させるエチレンガス生成タンクと、
発生したエチレンガスを加圧状態で貯蔵するエチレンガス貯蔵タンクと、
を備えてなる、請求項１又は２に記載のもやし育成システム。 The ethylene gas supply unit, an alcohol tank for storing ethanol obtained by fermentation,
An ethylene gas generation tank that generates ethylene by dehydrating the ethanol supplied from the alcohol tank with a catalyst;
An ethylene gas storage tank for storing the generated ethylene gas in a pressurized state;
The bean sprout growing system according to claim 1 or 2, comprising:
前記ガスクロマトグラフが測定したもやし育成室内のエチレンガス濃度に応じて、前記弁を開閉する、請求項１〜３のいずれか１項に記載のもやし育成システム。 The control unit includes a valve for controlling opening and closing of a conduit communicating the ethylene gas supply unit and the bean sprout growing chamber;
The bean sprout growing system according to any one of claims 1 to 3, wherein the valve is opened and closed according to an ethylene gas concentration in a bean sprout growing chamber measured by the gas chromatograph.
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| JP2016202079A (en) * | 2015-04-22 | 2016-12-08 | 太子食品工業株式会社 | Gas phase controlling cultivation method, gas phase controlling cultivation system, and cultivation material |
| KR101902074B1 (en) * | 2016-11-02 | 2018-09-27 | 주식회사 풀무원 | Method for producing mung bean sprouts improved cultivation yield and organic functions |
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