JP2010106350A5 - - Google Patents

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Publication number
JP2010106350A5
JP2010106350A5 JP2008282384A JP2008282384A JP2010106350A5 JP 2010106350 A5 JP2010106350 A5 JP 2010106350A5 JP 2008282384 A JP2008282384 A JP 2008282384A JP 2008282384 A JP2008282384 A JP 2008282384A JP 2010106350 A5 JP2010106350 A5 JP 2010106350A5
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JP
Japan
Prior art keywords
film forming
substrate
heating
sputter
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2008282384A
Other languages
English (en)
Japanese (ja)
Other versions
JP2010106350A (ja
JP5336151B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2008282384A priority Critical patent/JP5336151B2/ja
Priority claimed from JP2008282384A external-priority patent/JP5336151B2/ja
Priority to US12/547,259 priority patent/US20100108495A1/en
Priority to SG200905698-7A priority patent/SG161142A1/en
Priority to CN200910206356XA priority patent/CN101724816B/zh
Publication of JP2010106350A publication Critical patent/JP2010106350A/ja
Publication of JP2010106350A5 publication Critical patent/JP2010106350A5/ja
Application granted granted Critical
Publication of JP5336151B2 publication Critical patent/JP5336151B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2008282384A 2008-10-31 2008-10-31 薄膜形成装置及び磁気記録媒体の製造方法 Active JP5336151B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2008282384A JP5336151B2 (ja) 2008-10-31 2008-10-31 薄膜形成装置及び磁気記録媒体の製造方法
US12/547,259 US20100108495A1 (en) 2008-10-31 2009-08-25 Thin film formation apparatus and magnetic recording medium manufacturing method
SG200905698-7A SG161142A1 (en) 2008-10-31 2009-08-26 Thin film formation apparatus and magnetic recording medium manufacturing method
CN200910206356XA CN101724816B (zh) 2008-10-31 2009-10-15 薄膜形成装置和磁记录介质制造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008282384A JP5336151B2 (ja) 2008-10-31 2008-10-31 薄膜形成装置及び磁気記録媒体の製造方法

Publications (3)

Publication Number Publication Date
JP2010106350A JP2010106350A (ja) 2010-05-13
JP2010106350A5 true JP2010106350A5 (enExample) 2011-09-08
JP5336151B2 JP5336151B2 (ja) 2013-11-06

Family

ID=42130099

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008282384A Active JP5336151B2 (ja) 2008-10-31 2008-10-31 薄膜形成装置及び磁気記録媒体の製造方法

Country Status (4)

Country Link
US (1) US20100108495A1 (enExample)
JP (1) JP5336151B2 (enExample)
CN (1) CN101724816B (enExample)
SG (1) SG161142A1 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8776542B2 (en) * 2009-12-25 2014-07-15 Canon Anelva Corporation Cooling system
TW201137143A (en) * 2010-04-28 2011-11-01 Hon Hai Prec Ind Co Ltd Sputtering system

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4392451A (en) * 1980-12-31 1983-07-12 The Boeing Company Apparatus for forming thin-film heterojunction solar cells employing materials selected from the class of I-III-VI2 chalcopyrite compounds
US4749465A (en) * 1985-05-09 1988-06-07 Seagate Technology In-line disk sputtering system
US4894133A (en) * 1985-11-12 1990-01-16 Virgle L. Hedgcoth Method and apparatus making magnetic recording disk
US5082747A (en) * 1985-11-12 1992-01-21 Hedgcoth Virgle L Magnetic recording disk and sputtering process and apparatus for producing same
US4902398A (en) * 1988-04-27 1990-02-20 American Thim Film Laboratories, Inc. Computer program for vacuum coating systems
JPH0449523A (ja) * 1990-06-18 1992-02-18 Denki Kagaku Kogyo Kk 磁気記録媒体の製造法及びその装置
JPH06195706A (ja) * 1992-12-25 1994-07-15 Hitachi Metals Ltd 薄膜磁気記録ディスクの製造方法
KR100262768B1 (ko) * 1996-04-24 2000-08-01 니시히라 순지 스퍼터성막장치
US6183523B1 (en) * 1997-03-03 2001-02-06 Tokyo Electron Limited Apparatus for thermal control of variously sized articles in vacuum
US5998730A (en) * 1997-05-13 1999-12-07 Canon Kabushiki Kaisha Production method for deposited film, production method for photoelectric conversion element, production apparatus for deposited film, production apparatus for photoelectric conversion element
US6093290A (en) * 1997-05-14 2000-07-25 Canon Kabushiki Kaisha Method of generating a reciprocating plurality of magnetic fluxes on a target
US6197165B1 (en) * 1998-05-06 2001-03-06 Tokyo Electron Limited Method and apparatus for ionized physical vapor deposition
CN1260599A (zh) * 1998-12-22 2000-07-19 佳能株式会社 处理衬底的设备和方法
JP2000307139A (ja) * 1999-04-21 2000-11-02 Fuji Electric Co Ltd 薄膜太陽電池の製造方法及び薄膜電極層形成装置
JP2003013218A (ja) * 2001-06-29 2003-01-15 Canon Inc 長時間スパッタリング方法
EP1556902A4 (en) * 2002-09-30 2009-07-29 Miasole MANUFACTURING DEVICE AND METHOD FOR PRODUCING THIN FILM SOLAR CELLS IN A LARGE SCALE
JP2006521461A (ja) * 2002-12-31 2006-09-21 日本板硝子株式会社 基板クリーニング装置を有するコータおよびそのようなコータを用いたコーティング堆積法
US7967961B2 (en) * 2004-08-30 2011-06-28 Ulvac, Inc Film forming apparatus
JP4534906B2 (ja) * 2005-08-22 2010-09-01 富士電機デバイステクノロジー株式会社 磁気記録媒体およびその製造方法
JP2008176847A (ja) * 2007-01-17 2008-07-31 Showa Denko Kk 薄膜積層体の製造方法、及び薄膜積層体製造装置と磁気記録媒体および磁気記録再生装置
JP4314318B2 (ja) * 2007-10-31 2009-08-12 キヤノンアネルバ株式会社 マグネトロンユニット、マグネトロンスパッタリング装置及び電子デバイスの製造方法
JP2010106349A (ja) * 2008-10-31 2010-05-13 Canon Anelva Corp スパッタ装置、薄膜形成装置及び磁気記録媒体の製造方法

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