CN101724816B - 薄膜形成装置和磁记录介质制造方法 - Google Patents

薄膜形成装置和磁记录介质制造方法 Download PDF

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Publication number
CN101724816B
CN101724816B CN200910206356XA CN200910206356A CN101724816B CN 101724816 B CN101724816 B CN 101724816B CN 200910206356X A CN200910206356X A CN 200910206356XA CN 200910206356 A CN200910206356 A CN 200910206356A CN 101724816 B CN101724816 B CN 101724816B
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CN
China
Prior art keywords
substrate
chamber
film
heating
magnetic recording
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Active
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CN200910206356XA
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English (en)
Chinese (zh)
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CN101724816A (zh
Inventor
E·N·阿巴拉
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Canon Anelva Corp
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Canon Anelva Corp
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Publication of CN101724816A publication Critical patent/CN101724816A/zh
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Physical Vapour Deposition (AREA)
CN200910206356XA 2008-10-31 2009-10-15 薄膜形成装置和磁记录介质制造方法 Active CN101724816B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2008282384A JP5336151B2 (ja) 2008-10-31 2008-10-31 薄膜形成装置及び磁気記録媒体の製造方法
JP2008-282384 2008-10-31

Publications (2)

Publication Number Publication Date
CN101724816A CN101724816A (zh) 2010-06-09
CN101724816B true CN101724816B (zh) 2013-08-21

Family

ID=42130099

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200910206356XA Active CN101724816B (zh) 2008-10-31 2009-10-15 薄膜形成装置和磁记录介质制造方法

Country Status (4)

Country Link
US (1) US20100108495A1 (enExample)
JP (1) JP5336151B2 (enExample)
CN (1) CN101724816B (enExample)
SG (1) SG161142A1 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8776542B2 (en) * 2009-12-25 2014-07-15 Canon Anelva Corporation Cooling system
TW201137143A (en) * 2010-04-28 2011-11-01 Hon Hai Prec Ind Co Ltd Sputtering system

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4392451A (en) * 1980-12-31 1983-07-12 The Boeing Company Apparatus for forming thin-film heterojunction solar cells employing materials selected from the class of I-III-VI2 chalcopyrite compounds
US4749465A (en) * 1985-05-09 1988-06-07 Seagate Technology In-line disk sputtering system
US4894133A (en) * 1985-11-12 1990-01-16 Virgle L. Hedgcoth Method and apparatus making magnetic recording disk
US5082747A (en) * 1985-11-12 1992-01-21 Hedgcoth Virgle L Magnetic recording disk and sputtering process and apparatus for producing same
US4902398A (en) * 1988-04-27 1990-02-20 American Thim Film Laboratories, Inc. Computer program for vacuum coating systems
JPH0449523A (ja) * 1990-06-18 1992-02-18 Denki Kagaku Kogyo Kk 磁気記録媒体の製造法及びその装置
JPH06195706A (ja) * 1992-12-25 1994-07-15 Hitachi Metals Ltd 薄膜磁気記録ディスクの製造方法
KR100262768B1 (ko) * 1996-04-24 2000-08-01 니시히라 순지 스퍼터성막장치
US6183523B1 (en) * 1997-03-03 2001-02-06 Tokyo Electron Limited Apparatus for thermal control of variously sized articles in vacuum
US5998730A (en) * 1997-05-13 1999-12-07 Canon Kabushiki Kaisha Production method for deposited film, production method for photoelectric conversion element, production apparatus for deposited film, production apparatus for photoelectric conversion element
US6093290A (en) * 1997-05-14 2000-07-25 Canon Kabushiki Kaisha Method of generating a reciprocating plurality of magnetic fluxes on a target
US6197165B1 (en) * 1998-05-06 2001-03-06 Tokyo Electron Limited Method and apparatus for ionized physical vapor deposition
CN1260599A (zh) * 1998-12-22 2000-07-19 佳能株式会社 处理衬底的设备和方法
JP2000307139A (ja) * 1999-04-21 2000-11-02 Fuji Electric Co Ltd 薄膜太陽電池の製造方法及び薄膜電極層形成装置
JP2003013218A (ja) * 2001-06-29 2003-01-15 Canon Inc 長時間スパッタリング方法
EP1556902A4 (en) * 2002-09-30 2009-07-29 Miasole MANUFACTURING DEVICE AND METHOD FOR PRODUCING THIN FILM SOLAR CELLS IN A LARGE SCALE
JP2006521461A (ja) * 2002-12-31 2006-09-21 日本板硝子株式会社 基板クリーニング装置を有するコータおよびそのようなコータを用いたコーティング堆積法
US7967961B2 (en) * 2004-08-30 2011-06-28 Ulvac, Inc Film forming apparatus
JP4534906B2 (ja) * 2005-08-22 2010-09-01 富士電機デバイステクノロジー株式会社 磁気記録媒体およびその製造方法
JP2008176847A (ja) * 2007-01-17 2008-07-31 Showa Denko Kk 薄膜積層体の製造方法、及び薄膜積層体製造装置と磁気記録媒体および磁気記録再生装置
JP4314318B2 (ja) * 2007-10-31 2009-08-12 キヤノンアネルバ株式会社 マグネトロンユニット、マグネトロンスパッタリング装置及び電子デバイスの製造方法
JP2010106349A (ja) * 2008-10-31 2010-05-13 Canon Anelva Corp スパッタ装置、薄膜形成装置及び磁気記録媒体の製造方法

Also Published As

Publication number Publication date
JP2010106350A (ja) 2010-05-13
CN101724816A (zh) 2010-06-09
JP5336151B2 (ja) 2013-11-06
SG161142A1 (en) 2010-05-27
US20100108495A1 (en) 2010-05-06

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