JP2010021376A - Production process of electrode foil for electrolytic capacitor - Google Patents

Production process of electrode foil for electrolytic capacitor Download PDF

Info

Publication number
JP2010021376A
JP2010021376A JP2008180825A JP2008180825A JP2010021376A JP 2010021376 A JP2010021376 A JP 2010021376A JP 2008180825 A JP2008180825 A JP 2008180825A JP 2008180825 A JP2008180825 A JP 2008180825A JP 2010021376 A JP2010021376 A JP 2010021376A
Authority
JP
Japan
Prior art keywords
foil
etching
aluminum
cleaning
steam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2008180825A
Other languages
Japanese (ja)
Other versions
JP4970369B2 (en
Inventor
雅樹 ▲高▼澤
Masaki Takazawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nichicon Corp
Original Assignee
Nichicon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nichicon Corp filed Critical Nichicon Corp
Priority to JP2008180825A priority Critical patent/JP4970369B2/en
Publication of JP2010021376A publication Critical patent/JP2010021376A/en
Application granted granted Critical
Publication of JP4970369B2 publication Critical patent/JP4970369B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a production method of an electrode foil for an electrolytic capacitor, which removes and replaces chlorine ion adhering to the foil while minimizing dissolution of a foil surface layer after etching, and can produce a high powered foil by improving chemical conversion property. <P>SOLUTION: This production method of an electrode foil for an electrolytic capacitor has: an etching process of surface roughening a foil made of aluminum or an aluminum alloy; and a chemical cleaning process of dipping the foil in a cleaning liquid, wherein it has: a primary steaming process of exposing the foil to a steam before the chemical cleaning process, the steam obtained by heating up a cleaning liquid; and a secondary steaming process of exposing the foil to a steam after the chemical cleaning process, the steam obtained by heating up the cleaning liquid. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、電解コンデンサ用エッチング箔の製造方法に関するものである。さらに詳しくは、エッチング工程後のエッチング箔に対する処理技術・皮膜形成技術に関するものである。   The present invention relates to a method for producing an electrolytic capacitor etching foil. More specifically, the present invention relates to a processing technique / film formation technique for an etching foil after the etching process.

電解コンデンサ用エッチング箔を製造するにあたっては、エッチング液中でアルミニウムまたはアルミニウム合金からなる箔を化学的または/および電気化学的にエッチングして表面を粗面化する。
その際、エッチング液には、塩素イオンの他、リン酸、硝酸、硫酸、シュウ酸等を配合することもある。
エッチング後の箔表面には、塩素イオンを含むエッチング皮膜が形成されており、この皮膜内に存在する塩素イオンは、誘電体皮膜の形成を妨げるとともに電解コンデンサにおいては、漏れ電流の増大、腐食、耐電圧の低下などを引き起こし、電解コンデンサの信頼性を低下させる。
When manufacturing an electrolytic capacitor etching foil, a foil made of aluminum or an aluminum alloy is chemically or / and electrochemically etched in an etching solution to roughen the surface.
In that case, phosphoric acid, nitric acid, sulfuric acid, oxalic acid, etc. may be mix | blended with an etching liquid other than a chlorine ion.
An etched film containing chlorine ions is formed on the surface of the foil after etching. Chlorine ions existing in the film hinder the formation of the dielectric film and increase leakage current, corrosion, Reduces the withstand voltage, etc., and reduces the reliability of the electrolytic capacitor.

そこで、エッチング工程の後、エッチング箔をリン酸、硝酸、硫酸等を含む洗浄液に浸漬して、エッチング箔の表層を溶解させる化学洗浄工程が行われる(例えば、非特許文献1参照)。   Therefore, after the etching process, a chemical cleaning process is performed in which the etching foil is immersed in a cleaning solution containing phosphoric acid, nitric acid, sulfuric acid, and the like to dissolve the surface layer of the etching foil (for example, see Non-Patent Document 1).

永田伊佐也著、「電解液陰極アルミニウム電解コンデンサ」、日本蓄電器工業株式会社、平成9年2月24日、第2版第1刷(P247−249)Isaya Nagata, “Electrolytic Cathode Aluminum Electrolytic Capacitor”, Nippon Denki Kogyo Kogyo Co., Ltd., February 24, 1997, 2nd edition, 1st printing (P247-249)

しかしながら、エッチング箔をリン酸、硝酸、硫酸などを含む溶液に浸漬してエッチング箔の表層を溶解させると、エッチング皮膜に加えて、アルミニウム箔の地金部分も溶解し、エッチング倍率が低下してしまう。   However, when the etching foil is immersed in a solution containing phosphoric acid, nitric acid, sulfuric acid, etc., and the surface layer of the etching foil is dissolved, in addition to the etching film, the base metal portion of the aluminum foil is also dissolved, and the etching magnification is reduced. End up.

以上の問題点に鑑みて、本発明の課題は、エッチング工程後、エッチング箔表層の溶解を最小限にしつつ、エッチング箔に付着している塩素イオンを除去し、陽極酸化(化成)工程に、より良質の誘電体皮膜を形成することのできる電解コンデンサ用電極箔の製造方法を提供することにある。   In view of the above problems, the object of the present invention is to remove chlorine ions adhering to the etching foil while minimizing the dissolution of the etching foil surface layer after the etching step, and to the anodic oxidation (chemical conversion) step. An object of the present invention is to provide a method for producing an electrode foil for an electrolytic capacitor capable of forming a better quality dielectric film.

上記課題を解決するために、本発明に係る電解コンデンサ用電極箔の製造方法は、アルミニウムまたはアルミニウム合金からなる箔をエッチング液中で粗面化するエッチング工程と、該箔を洗浄液に浸漬処理する化学洗浄工程とを有する電解コンデンサ用エッチング箔の製造方法において、
前記化学洗浄工程の前に前記洗浄液を加熱して得られる蒸気に曝す第1蒸気処理工程と、前記化学洗浄工程の後に前記洗浄液を加熱して得られる蒸気に曝す第2蒸気処理工程とを有することを特徴とする。
In order to solve the above-mentioned problems, an electrolytic capacitor electrode foil manufacturing method according to the present invention includes an etching step of roughening a foil made of aluminum or an aluminum alloy in an etching solution, and immersing the foil in a cleaning solution. In the method for producing an electrolytic foil etching foil having a chemical cleaning step,
A first steam treatment step in which the cleaning solution is exposed to steam obtained by heating the cleaning solution before the chemical cleaning step; and a second steam treatment step in which the cleaning solution is exposed to steam obtained by heating after the chemical cleaning step. It is characterized by that.

前記「第1蒸気処理」により、洗浄液から発生する蒸気によって、洗浄液浸漬処理による反応を惹起し易くすることができ、塩素イオン除去を促進させる効果がある。また、化学洗浄でのエッチング箔の表層の溶解を最小限に抑えることができる。前記「化学洗浄」により、前記エッチング工程にて付着し、陽極酸化(化成)工程において悪影響を与える塩素イオンの除去および置換をすることができる。前記の第1蒸気処理および化学洗浄を行った後に「第2蒸気処理」を行うことにより、形成された皮膜の質を向上させることができる。   By the “first steam treatment”, the steam generated from the cleaning liquid can easily cause a reaction by the cleaning liquid immersion process, and the effect of promoting the removal of chlorine ions is obtained. Further, the dissolution of the surface layer of the etching foil by chemical cleaning can be minimized. By the “chemical cleaning”, chlorine ions that adhere in the etching process and have an adverse effect in the anodizing (chemical conversion) process can be removed and replaced. By performing the “second steam treatment” after the first steam treatment and the chemical cleaning, the quality of the formed film can be improved.

また、前記洗浄液は、pHが2〜4であることを特徴とする。
このような酸性度の高い洗浄液を用いれば、洗浄液中の硝酸イオン等の濃度が上がり、蒸気中の含有量も増加し、塩素イオンの除去および置換を短時間で行うことができる。なお、pHの調整には硝酸を用いる。
The cleaning liquid has a pH of 2 to 4.
When such a highly acidic cleaning solution is used, the concentration of nitrate ions and the like in the cleaning solution increases, the content in the steam increases, and chlorine ions can be removed and replaced in a short time. Nitric acid is used for adjusting the pH.

さらに、前記洗浄液は、硝酸アルミニウム、亜硝酸アルミニウム、シュウ酸アルミニウム、およびリン酸アルミニウムのうちの少なくとも1つを含むことを特徴とする。
かかる処理液は、主となるカチオンがアルミニウムイオンであるため、化学平衡の関係から、アルミニウム箔の地金部分を溶解させたとしても、最小限で抑えることができる。
Further, the cleaning liquid contains at least one of aluminum nitrate, aluminum nitrite, aluminum oxalate, and aluminum phosphate.
Since the main cations of this treatment liquid are aluminum ions, even if the base metal part of the aluminum foil is dissolved, it can be suppressed to a minimum from the relationship of chemical equilibrium.

そして、前記洗浄液は、0.01〜30.0wt%のアルミニウム塩を含むことを特徴とする。   The cleaning liquid contains 0.01 to 30.0 wt% aluminum salt.

前記第1および第2蒸気処理工程の蒸気は、化学洗浄工程で使用する洗浄液から蒸発した蒸気を用いる。   As the steam in the first and second steam treatment processes, steam evaporated from the cleaning liquid used in the chemical cleaning process is used.

前記エッチング工程は、少なくとも前記アルミニウム箔にトンネル状ピットを発生させる第1段エッチング工程と、該第1段エッチング工程で発生したピットの孔径を拡大するための第2段エッチング工程とを有し、
前記第2段エッチング工程では、塩素イオンに加えて、硝酸イオン、硫酸イオン、リン酸イオンおよび有機酸イオンのうちの少なくとも1つを含むエッチング液を用いる。
The etching step includes at least a first-stage etching step for generating tunnel-like pits in the aluminum foil, and a second-stage etching step for expanding the hole diameter of the pits generated in the first-stage etching step,
In the second stage etching step, an etching solution containing at least one of nitrate ions, sulfate ions, phosphate ions and organic acid ions in addition to chlorine ions is used.

また、アルミニウム箔を交流エッチングまたは直流エッチングすると、多数の深い孔(例えば、直径=10〜1600nm、深さ=直径の50〜2000倍の孔)が空いたエッチング皮膜が形成され、かかる多数の孔に塩素イオンが残留するが、第1蒸気処理、化学洗浄、第2蒸気処理の前記3工程を組み合わせることにより、かかる塩素イオンを除去および置換することができる。また、その際、エッチング皮膜の微量の溶解は、陽極酸化(化成)工程の際、好適に機能するため、エッチング倍率が低下することはない。   Further, when the aluminum foil is subjected to AC etching or DC etching, an etching film having a large number of deep holes (for example, a diameter = 10 to 1600 nm, a depth = a hole 50 to 2000 times the diameter) is formed, and such a large number of holes are formed. Chlorine ions remain, but the chlorine ions can be removed and replaced by combining the three steps of the first steam treatment, the chemical cleaning, and the second steam treatment. At that time, a very small amount of dissolution of the etching film functions suitably during the anodic oxidation (chemical conversion) step, so that the etching magnification does not decrease.

本発明において、電解コンデンサ用電極箔として、中高圧用(定格電圧が160WV以上の電解コンデンサ用)のエッチング箔を製造する場合、前記エッチング工程では、前記アルミニウム箔にトンネル状ピットを発生させる第1段エッチング工程と、該第1段エッチング工程で発生したピットの孔径を拡大するための第2段エッチング工程とを行う。
前記第2段エッチング工程では、塩素イオンに加えて、硝酸イオン、硫酸イオン、リン酸イオンおよび有機酸イオン(シュウ酸イオン、スルホン酸など)のうちの少なくとも1つを含むエッチング液を用いる。
前記第2段エッチング工程において、このようなエッチング液を用い、アルミニウム箔を陽極として直流エッチングを行うと、エッチング箔の表面に塩素イオンを多量に含むエッチング皮膜が形成されやすいが、本発明を適用することにより、エッチング皮膜の塩素イオンを除去し、溶解を抑制し、かつ化成に有効なピット形態にすることができる。
In the present invention, when manufacturing an etching foil for medium and high voltage (for an electrolytic capacitor having a rated voltage of 160 WV or more) as an electrode foil for an electrolytic capacitor, in the etching step, a tunnel-like pit is generated in the aluminum foil. A step etching step and a second step etching step for enlarging the hole diameter of the pit generated in the first step etching step are performed.
In the second stage etching step, an etching solution containing at least one of nitrate ion, sulfate ion, phosphate ion and organic acid ion (oxalate ion, sulfonic acid, etc.) in addition to chlorine ion is used.
In the second-stage etching step, when such etching solution is used and direct current etching is performed using an aluminum foil as an anode, an etching film containing a large amount of chlorine ions is easily formed on the surface of the etching foil, but the present invention is applied. By doing so, chlorine ions in the etching film can be removed, dissolution can be suppressed, and a pit form effective for chemical conversion can be obtained.

上記のように構成することで、本発明によれば、エッチング皮膜中の塩素イオンを除去しながらピット形態を維持でき、エッチング倍率は低下せずに静電容量の向上したエッチング箔を得ることができる。   By configuring as described above, according to the present invention, it is possible to maintain the pit form while removing chlorine ions in the etching film, and to obtain an etching foil having improved capacitance without decreasing the etching magnification. it can.

以下、図面に基づいて、本発明の実施の形態を詳細に説明する。   Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

図1は、本発明による電解コンデンサ用エッチング箔の製造方法を示す工程フロー図である。
図2は、本発明による電解コンデンサ用エッチング箔製造工程のうち、第1蒸気処理工程、化学洗浄工程、第2蒸気処理工程の状態を示す説明図である。
FIG. 1 is a process flow diagram showing a method for producing an electrolytic capacitor etching foil according to the present invention.
FIG. 2 is an explanatory diagram showing the states of the first steam treatment process, the chemical cleaning process, and the second steam treatment process in the electrolytic capacitor etching foil manufacturing process according to the present invention.

図1に示すように、本発明による電解コンデンサ用エッチング箔の製造方法は、脱脂処理工程ST1、第1段エッチング工程ST3、第2段エッチング工程ST5、第1蒸気処理工程ST7、化学洗浄工程ST8、第2蒸気処理工程ST9、純水処理処理工程ST10、乾燥熱処理工程ST11を順に行う。   As shown in FIG. 1, the manufacturing method of the electrolytic capacitor etching foil according to the present invention includes a degreasing process ST1, a first stage etching process ST3, a second stage etching process ST5, a first steam treatment process ST7, and a chemical cleaning process ST8. The second steam treatment process ST9, the pure water treatment process ST10, and the drying heat treatment process ST11 are sequentially performed.

(脱脂処理工程)ST1
脱脂処理工程ST1では、アルミニウム箔を、例えば水酸化ナトリウム、リン酸、リン酸ナトリウム、またはこれらにケイ酸ナトリウムを加えた溶液に浸漬し脱脂した。
箔には、圧延工程で使用される油、汚れが付着しており、当該付着部分では、エッチング工程でムラが発生するので、充分に脱脂処理する必要がある。次に、上記処理後のアルミニウム箔に対して水洗工程ST2を行った。
(Degreasing process) ST1
In the degreasing treatment step ST1, the aluminum foil was degreased by immersing it in, for example, sodium hydroxide, phosphoric acid, sodium phosphate, or a solution obtained by adding sodium silicate thereto.
Oil and dirt used in the rolling process are attached to the foil, and unevenness occurs in the attached part in the etching process, so that it is necessary to sufficiently degrease the foil. Next, water washing process ST2 was performed with respect to the aluminum foil after the said process.

(第1段エッチング工程)ST3
次に、第1段エッチング工程ST3では、アルミニウム箔を陽極としてエッチング液中で直流電解を行い、アルミニウム箔にトンネル状ピットを発生させた後、水洗工程ST4を行った。
第1段エッチング工程ST3では、例えば、液温80℃、硫酸3.5mol/L、塩化アルミニウム0.50mol/Lのエッチング液中で、アルミニウム箔を陽極にして、電流密度150mA/cm、電気量20C/cmの条件で電解エッチングを行った。
(First stage etching process) ST3
Next, in the first stage etching step ST3, direct current electrolysis was performed in an etching solution using an aluminum foil as an anode to generate tunnel-like pits in the aluminum foil, and then a water washing step ST4 was performed.
In the first-stage etching step ST3, for example, in an etching solution having a liquid temperature of 80 ° C., sulfuric acid of 3.5 mol / L, and aluminum chloride of 0.50 mol / L, an aluminum foil is used as an anode, a current density of 150 mA / cm 2 , It was subjected to electrolytic etching in the conditions of an amount 20C / cm 2.

(第2段エッチング工程)ST5
次に、第2段エッチング工程ST5では、アルミニウム箔を陽極としてエッチング液中で直流電解を行い、第1段エッチング工程ST3で発生させたトンネル状ピットの孔径を拡大させた後、水洗工程ST6を行った。
第2段エッチング工程ST5では、例えば、塩酸0.10〜0.60mol/Lを主体とした水溶液に、硝酸イオン、硫酸イオン、リン酸イオンおよび有機酸イオンのうちの少なくとも1つを含むエッチング液を用いた。
例えば、塩酸0.10〜0.60mol/Lを主体とした水溶液に、硝酸イオン、硫酸イオン、リン酸イオンおよび有機酸イオン(シュウ酸イオン、スルホン酸など)のうちの少なくとも1つを0.005〜0.05mol/L配合したエッチング液を用い、液温70〜90℃、電流密度15〜35mA/cmの条件で電解エッチングを行った。
(Second stage etching process) ST5
Next, in the second stage etching step ST5, direct current electrolysis is performed in an etching solution using an aluminum foil as an anode to increase the diameter of the tunnel-like pit generated in the first stage etching step ST3, and then the water washing step ST6 is performed. went.
In the second stage etching step ST5, for example, an etching solution containing at least one of nitrate ion, sulfate ion, phosphate ion and organic acid ion in an aqueous solution mainly composed of hydrochloric acid 0.10 to 0.60 mol / L. Was used.
For example, at least one of nitrate ion, sulfate ion, phosphate ion and organic acid ion (oxalate ion, sulfonic acid, etc.) is added to an aqueous solution mainly composed of 0.10 to 0.60 mol / L of hydrochloric acid. Electrolytic etching was performed under the conditions of a liquid temperature of 70 to 90 ° C. and a current density of 15 to 35 mA / cm 2 using an etching liquid containing 005 to 0.05 mol / L.

(第1蒸気処理工程(第1工程))ST7
このようにして得たアルミニウム箔の表面では、エッチング中に形成された皮膜(エッチング皮膜)中にエッチング液に用いた塩素イオンが含まれているので、本発明では、エッチングしたアルミニウム箔を、洗浄液を加熱して得られる蒸気に曝してエッチング皮膜中の塩素イオンを除去・置換しやすくする第1蒸気処理工程ST7を行った。
すなわち、粗面化したアルミニウム箔を、エッチング皮膜が溶解し易い液中ではなく、化学洗浄成分を含んだ蒸気中を通過させることによって、エッチング皮膜を溶解させずに、塩素イオン除去をしやすくするための処理を行った。
その際の第1蒸気処理条件を表1に示す。例えば、4.5wt%硝酸アルミニウム、2.5wt%亜硝酸アルミニウム、0.25wt%シュウ酸アルミニウム、0.25wt%リン酸アルミニウムを混合し、硝酸でpH調整した洗浄液を加熱し、55℃で2.5分間蒸気処理を行った。
(First steam treatment process (first process)) ST7
Since the surface of the aluminum foil thus obtained contains chlorine ions used in the etching solution in the film formed during etching (etching film), in the present invention, the etched aluminum foil is washed with the cleaning liquid. The first steam treatment step ST7 was performed to expose the steam obtained by heating the metal and easily remove and replace chlorine ions in the etching film.
That is, by passing the roughened aluminum foil in a vapor containing a chemical cleaning component rather than in a liquid in which the etching film is easily dissolved, chlorine ions can be easily removed without dissolving the etching film. Was processed for.
Table 1 shows the first steam treatment conditions at that time. For example, 4.5 wt% aluminum nitrate, 2.5 wt% aluminum nitrite, 0.25 wt% aluminum oxalate, and 0.25 wt% aluminum phosphate are mixed, and the cleaning liquid whose pH is adjusted with nitric acid is heated. Steam treatment was performed for 5 minutes.

(化学洗浄工程)ST8
洗浄液として、硝酸アルミニウム、亜硝酸アルミニウム、シュウ酸アルミニウムおよびリン酸アルミニウムを上記と同様の組成で混合し、5.0wt%のアルミニウムイオンを含有させた酸性の水溶液を用い、液温70℃に設定した条件で、化学洗浄工程ST8を3.0分行った。
(Chemical cleaning process) ST8
As the cleaning solution, an acidic aqueous solution in which aluminum nitrate, aluminum nitrite, aluminum oxalate, and aluminum phosphate are mixed in the same composition as above and 5.0 wt% aluminum ions are contained is set to a liquid temperature of 70 ° C. Under the conditions, the chemical cleaning step ST8 was performed for 3.0 minutes.

(第2蒸気処理工程)ST9
化学洗浄工程ST8後のエッチング箔を、第2蒸気処理工程ST9にて、洗浄液を加熱し、55℃で2.5分間蒸気処理を行った。
第1蒸気処理、化学洗浄の後、第2蒸気処理を施すことで、洗浄液による蒸気処理後、塩素イオンの除去・置換を行った箔に対してさらに洗浄液による蒸気処理をすることで、陽極酸化工程で静電容量を向上させる「後処理皮膜」を形成できると考えられる。
(Second steam treatment process) ST9
In the second steam treatment step ST9, the etching foil after the chemical cleaning step ST8 was subjected to steam treatment at 55 ° C. for 2.5 minutes in the second steam treatment step ST9.
After the first steam treatment and chemical cleaning, the second steam treatment is performed. After the steam treatment with the cleaning liquid, the foil from which chlorine ions have been removed and replaced is further subjected to the steam treatment with the cleaning liquid, thereby anodizing. It is thought that a “post-treatment film” that improves the capacitance in the process can be formed.

(純水水洗処理工程)ST10
エッチング箔に対して蒸気処理、皮膜形成を行った後は、純水洗浄工程ST10において、エッチング箔を電導度が1mS/m以下の純水(温度が20〜25℃)で10〜20分間、例えば、15分間水洗した。
(Pure water washing treatment process) ST10
After performing the steam treatment and film formation on the etching foil, in the pure water cleaning step ST10, the etching foil is treated with pure water having a conductivity of 1 mS / m or less (temperature is 20 to 25 ° C.) for 10 to 20 minutes, For example, it was washed with water for 15 minutes.

(乾燥熱処理工程)ST11
次に、乾燥熱処理工程ST11において、エッチング箔を200〜250℃の温度で表面の水を乾燥除去した後、150〜260℃の条件で1〜5分間、加熱乾燥させた。
具体的には、230℃の温度で表面の水を乾燥除去した後、250℃の条件で2分40秒、加熱乾燥させた。このようにして、電解コンデンサ用エッチング箔を得た。
(Dry heat treatment process) ST11
Next, in the drying heat treatment step ST11, the etching foil was dried by removing water on the surface at a temperature of 200 to 250 ° C., and then heated and dried at 150 to 260 ° C. for 1 to 5 minutes.
Specifically, water on the surface was removed by drying at a temperature of 230 ° C., and then heat-dried at 250 ° C. for 2 minutes and 40 seconds. In this way, an etching foil for electrolytic capacitors was obtained.

上記の工程ST1〜ST11により、得られたエッチング箔について、下記の条件で化成を行い、得られた電極箔試料について、V−T特性、静電容量の測定を行った。
なお、処理液組成等の処理条件は、上記とは適宜変更したものについても、検討した。
その結果を表1に示す。
[化成条件]
・化成液 ホウ酸アンモニウム水溶液
・化成電圧 250V、 ・電流密度 0.2A/cm
・温度 85±2℃
[V−T特性測定条件]
標準的手法にて、スパークが発生する直前の電圧を測定した。
[静電容量測定条件]
ホウ酸アンモニウム水溶液中、常温にて標準的手法で測定した。
By the above steps ST1 to ST11, the obtained etching foil was subjected to chemical conversion under the following conditions, and the obtained electrode foil sample was subjected to measurement of VT characteristics and capacitance.
In addition, the treatment conditions such as the treatment liquid composition were also examined as appropriately changed from the above.
The results are shown in Table 1.
[Formation conditions]
-Chemical conversion liquid Ammonium borate aqueous solution-Chemical conversion voltage 250V,-Current density 0.2A / cm 2
・ Temperature 85 ± 2 ℃
[V-T characteristics measurement conditions]
The voltage immediately before the occurrence of spark was measured by a standard method.
[Capacitance measurement conditions]
Measurements were made by standard techniques at room temperature in an aqueous ammonium borate solution.

Figure 2010021376
Figure 2010021376

(本形態の主な効果)
表1より分かるように、ST7(第1蒸気処理工程)、ST8(化学洗浄工程)、ST9(第2蒸気処理工程)をすべて行った実施例1〜9の電極箔試料の電気特性は、第1、第2蒸気処理の何れかを行わなかった比較例1、2、およびこれらの両者を行わなかった従来例より優れている。
これは、エッチング箔を酸性の比較的高温の洗浄液から蒸気として気化された第1蒸気工程中で、次の化学洗浄での塩素イオン除去・置換を促進させる蒸気処理を行い、化学洗浄でアルミニウムの溶解を最小限としつつ、エッチング箔表面に付着している塩素イオンを除去・置換し、その後、第2蒸気中で箔に付着した硝酸、亜硝酸、シュウ酸、およびリン酸のイオンによって、陽極酸化での静電容量向上に効果的なエッチング皮膜の改質を行うことができるためと考えられる。
(Main effects of this form)
As can be seen from Table 1, the electrical characteristics of the electrode foil samples of Examples 1 to 9 in which ST7 (first steam treatment process), ST8 (chemical cleaning process), and ST9 (second steam treatment process) were all performed are as follows. It is superior to the comparative examples 1 and 2 which did not perform any of 1 and 2nd steam processing, and the conventional example which did not perform both of these.
This is because in the first steam process in which the etching foil is vaporized as vapor from an acidic relatively high temperature cleaning solution, steam treatment is performed to promote chlorine ion removal / replacement in the next chemical cleaning. The chlorine ions adhering to the surface of the etching foil are removed and replaced while minimizing dissolution, and then the anode is formed by the ions of nitric acid, nitrous acid, oxalic acid, and phosphoric acid adhering to the foil in the second vapor. This is considered to be because the etching film can be effectively modified to improve the capacitance by oxidation.

また、第1蒸気処理、化学洗浄、第2蒸気処理を行うことで、静電容量を向上させることができるが、表1より洗浄液の濃度(複数の洗浄剤を用いる場合は合計濃度)は、0.01〜30.0wt%とした場合に、静電容量値の向上が著しく、好適である。
さらに、洗浄液のpHは、エッチング皮膜中の塩素イオンを除去するために、酸性溶液とすることが好ましいが、pH2〜4とすることでより高い静電容量が得られるので好適である。
In addition, the capacitance can be improved by performing the first vapor treatment, chemical cleaning, and second vapor treatment, but from Table 1, the concentration of the cleaning liquid (the total concentration when using a plurality of cleaning agents) is: When the content is 0.01 to 30.0 wt%, the capacitance value is remarkably improved, which is preferable.
Further, the pH of the cleaning solution is preferably an acidic solution in order to remove chlorine ions in the etching film, but is preferably 2 to 4 because a higher capacitance can be obtained.

また、アルミニウム箔を交流エッチングまたは直流エッチングすると、多数の深い孔(例えば、直径=10〜1600nm、深さ=直径の約50〜2000倍の孔)が空いたエッチング皮膜が形成され、かかる多数の孔に塩素イオンが残留しているが、本形態では、第1蒸気処理工程、化学洗浄工程によって塩素イオンを除去・置換するため、エッチング皮膜の溶解量をコントロールしエッチングピットの溶解を抑制しながら、塩素イオンの除去・置換を効率よく行うことができる。
従って、本形態によれば、エッチング箔を洗浄液浸漬処理した後も、エッチング箔のエッチング倍率が高く、第2蒸気処理にて良質の後処理皮膜が形成されるため、陽極酸化後の静電容量を向上させることができると考えられる。
それ故、化学洗浄工程のみで、第1および第2蒸気処理工程を行わない従来例に比較して、表1より明らかなように、静電容量値がCV積比で、+1.32〜6.34%向上している。また、比較例1、2よりも改善されている。
Further, when the aluminum foil is subjected to AC etching or DC etching, an etching film in which a large number of deep holes (for example, a diameter = 10 to 1600 nm and a depth = a hole approximately 50 to 2000 times the diameter) is formed is formed. Although chlorine ions remain in the pores, in this embodiment, chlorine ions are removed and replaced by the first steam treatment process and chemical cleaning process, so the amount of etching film dissolved is controlled and dissolution of etching pits is suppressed. In addition, chlorine ions can be removed and replaced efficiently.
Therefore, according to the present embodiment, even after the etching foil is subjected to the cleaning liquid immersion treatment, the etching magnification of the etching foil is high, and a good quality post-treatment film is formed by the second vapor treatment. Can be improved.
Therefore, as compared with the conventional example in which only the chemical cleaning step is performed and the first and second steam treatment steps are not performed, the capacitance value is +1.32 to 6 in terms of the CV product ratio, as is apparent from Table 1. 34% improvement. Moreover, it is improved over Comparative Examples 1 and 2.

前記の第1蒸気処理工程ST7、化学洗浄工程ST8、第2蒸気処理工程ST9を1つの処理層で行う方法を図2に示す。洗浄液が貯留された処理槽3の内部に上下可動式ローラー2、5を配置し、ローラー1、4、7によってエッチング箔を処理槽の中を走行させた。
ここで、ローラー7では洗浄液浸漬処理を行った。その際、上下可動式ローラー2では、第1蒸気処理による時間を制御し、ローラー7では、オーバーフローの位置によって洗浄液浸漬処理時間を制御し、上下可動式ローラー5では、第2蒸気処理による時間を制御した。
また、蒸気は処理槽の上部から吸入し、槽内の中間部に送り出し、加温循環させている。その循環経路内に温度センサを設置し、その雰囲気温度で制御管理している。
そして、槽内部のオーバーフローの位置をいくつか定めることで液面および洗浄液浸漬処理時間の管理をした。このような構成を採用すると、各工程での時間を制御することができる。
FIG. 2 shows a method for performing the first vapor treatment step ST7, the chemical cleaning step ST8, and the second vapor treatment step ST9 in one treatment layer. The vertically movable rollers 2 and 5 were disposed inside the processing tank 3 in which the cleaning liquid was stored, and the etching foil was caused to travel through the processing tank by the rollers 1, 4, and 7.
Here, the roller 7 was subjected to a cleaning liquid immersion treatment. At that time, the vertically movable roller 2 controls the time by the first steam treatment, the roller 7 controls the cleaning liquid immersion treatment time by the overflow position, and the vertically movable roller 5 has the time by the second steam treatment. Controlled.
Moreover, the vapor | steam is suck | inhaled from the upper part of a processing tank, is sent out to the intermediate part in a tank, and is heated and circulated. A temperature sensor is installed in the circulation path and is controlled and managed at the ambient temperature.
And the liquid level and the cleaning liquid immersion treatment time were managed by determining some overflow positions inside the tank. When such a configuration is adopted, the time in each process can be controlled.

(その他の実施の形態)
上記形態では、中高圧用の電解コンデンサ用陽極箔の製造に本発明を適用した例であったが、低圧用の電解コンデンサ用陽極箔の製造に本発明を適用してもよく、電解コンデンサ用陰極箔の製造に本発明を適用してもよい。
また、上記実施例では、洗浄剤を複数種使用したが、単独で用いた場合も同様の効果を得ることができる。
(Other embodiments)
In the above embodiment, the present invention was applied to the production of an anode foil for electrolytic capacitors for medium and high pressures. However, the present invention may be applied to the production of an anode foil for electrolytic capacitors for low pressure. You may apply this invention to manufacture of cathode foil.
Moreover, in the said Example, although multiple types of cleaning agents were used, the same effect can be acquired also when it uses independently.

本発明を適用した電解コンデンサの陽極箔の製造方法を示す工程フロー図である。It is a process flow figure showing the manufacturing method of the anode foil of the electrolytic capacitor to which the present invention is applied. 本発明を適用した電解コンデンサのエッチング箔の製造工程のうち、第1蒸気処理工程、化学洗浄工程、第2蒸気処理工程の状態を示す説明図である。矢印の方向は、箔が進む方向である。It is explanatory drawing which shows the state of a 1st steam processing process, a chemical cleaning process, and a 2nd steam processing process among the manufacturing processes of the etching foil of the electrolytic capacitor to which this invention is applied. The direction of the arrow is the direction in which the foil travels.

符号の説明Explanation of symbols

1、4、7 ローラー
2、5 上下可動式ローラー
3 処理槽
6 液面(オーバーフロー位置による制御)
8 オーバーフロー排水口
1, 4, 7 Roller 2, 5 Vertically movable roller 3 Processing tank 6 Liquid level (control by overflow position)
8 Overflow drain

Claims (4)

アルミニウムまたはアルミニウム合金からなる箔をエッチング液中で粗面化するエッチング工程と、該箔を洗浄液に浸漬処理する化学洗浄工程とを有する電解コンデンサ用エッチング箔の製造方法において、
前記化学洗浄工程の前に前記洗浄液を加熱して得られる蒸気に曝す第1蒸気処理工程と、前記化学洗浄工程の後に前記洗浄液を加熱して得られる蒸気に曝す第2蒸気処理工程とを有することを特徴とする電解コンデンサ用エッチング箔の製造方法。
In the method for producing an etching foil for an electrolytic capacitor, comprising an etching step of roughening a foil made of aluminum or an aluminum alloy in an etching solution, and a chemical cleaning step of immersing the foil in a cleaning solution,
A first steam treatment step in which the cleaning solution is exposed to steam obtained by heating the cleaning solution before the chemical cleaning step; and a second steam treatment step in which the cleaning solution is exposed to steam obtained by heating after the chemical cleaning step. The manufacturing method of the etching foil for electrolytic capacitors characterized by the above-mentioned.
前記洗浄液は、pHが2〜4であることを特徴とする請求項1に記載の電解コンデンサ用エッチング箔の製造方法。   The method of manufacturing an etching foil for an electrolytic capacitor according to claim 1, wherein the cleaning liquid has a pH of 2 to 4. 前記洗浄液が、硝酸アルミニウム、亜硝酸アルミニウム、シュウ酸アルミニウム、およびリン酸アルミニウムのうちの少なくとも1つを含むことを特徴とする請求項2に記載の電解コンデンサ用エッチング箔の製造方法。   The method for manufacturing an etching foil for an electrolytic capacitor according to claim 2, wherein the cleaning liquid contains at least one of aluminum nitrate, aluminum nitrite, aluminum oxalate, and aluminum phosphate. 前記洗浄液の濃度が、0.01〜30.0wt%であることを特徴とする請求項3に記載の電解コンデンサ用エッチング箔の製造方法。   The manufacturing method of the etching foil for electrolytic capacitors according to claim 3, wherein the concentration of the cleaning liquid is 0.01 to 30.0 wt%.
JP2008180825A 2008-07-11 2008-07-11 Manufacturing method of etching foil for electrolytic capacitor Active JP4970369B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008180825A JP4970369B2 (en) 2008-07-11 2008-07-11 Manufacturing method of etching foil for electrolytic capacitor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008180825A JP4970369B2 (en) 2008-07-11 2008-07-11 Manufacturing method of etching foil for electrolytic capacitor

Publications (2)

Publication Number Publication Date
JP2010021376A true JP2010021376A (en) 2010-01-28
JP4970369B2 JP4970369B2 (en) 2012-07-04

Family

ID=41705976

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008180825A Active JP4970369B2 (en) 2008-07-11 2008-07-11 Manufacturing method of etching foil for electrolytic capacitor

Country Status (1)

Country Link
JP (1) JP4970369B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI506682B (en) * 2011-01-13 2015-11-01 Tokyo Electron Ltd Electrode production apparatus and electrode production method and computer storage medium
CN114411157A (en) * 2021-12-31 2022-04-29 乳源县立东电子科技有限公司 Cleaning method for residual chloride ions in aluminum foil and application of cleaning method

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01105525A (en) * 1987-10-19 1989-04-24 Sanyo Electric Co Ltd Manufacture of solid electrolytic capacitor
JPH08293442A (en) * 1995-04-24 1996-11-05 Matsushita Electric Ind Co Ltd Manufacture of electrode foil for aluminum electrolytic capacitor
JP2001085279A (en) * 1999-09-16 2001-03-30 Nichicon Corp Manufacture of electrode foil for aluminum electrolytic capacitor
JP2004193339A (en) * 2002-12-11 2004-07-08 Nichicon Corp Manufacturing method of electrode foil for electrolytic capacitor
JP2005259921A (en) * 2004-03-11 2005-09-22 Nichicon Corp Manufacturing method of etching foil for aluminum electrolytic capacitor

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01105525A (en) * 1987-10-19 1989-04-24 Sanyo Electric Co Ltd Manufacture of solid electrolytic capacitor
JPH08293442A (en) * 1995-04-24 1996-11-05 Matsushita Electric Ind Co Ltd Manufacture of electrode foil for aluminum electrolytic capacitor
JP2001085279A (en) * 1999-09-16 2001-03-30 Nichicon Corp Manufacture of electrode foil for aluminum electrolytic capacitor
JP2004193339A (en) * 2002-12-11 2004-07-08 Nichicon Corp Manufacturing method of electrode foil for electrolytic capacitor
JP2005259921A (en) * 2004-03-11 2005-09-22 Nichicon Corp Manufacturing method of etching foil for aluminum electrolytic capacitor

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI506682B (en) * 2011-01-13 2015-11-01 Tokyo Electron Ltd Electrode production apparatus and electrode production method and computer storage medium
CN114411157A (en) * 2021-12-31 2022-04-29 乳源县立东电子科技有限公司 Cleaning method for residual chloride ions in aluminum foil and application of cleaning method

Also Published As

Publication number Publication date
JP4970369B2 (en) 2012-07-04

Similar Documents

Publication Publication Date Title
JP6768088B2 (en) Etching method of electrode foil for low-voltage aluminum electrolytic capacitors with low contact resistance
CN104499028B (en) A kind of ultra low voltage anodised aluminium foil making method
CN112117128B (en) High-specific-volume and high-strength medium-high voltage corrosion electrode foil and preparation method and application thereof
JP4970369B2 (en) Manufacturing method of etching foil for electrolytic capacitor
JP2007103798A (en) Method of forming aluminum electrode foil for electrolytic capacitor
JP2009135343A (en) Method of manufacturing aluminum electrode foil for electrolytic capacitor
JP5004844B2 (en) Method for producing anode foil for aluminum electrolytic capacitor
JP2009146984A (en) Method of manufacturing electrode foil for electrolytic capacitor
JP4811939B2 (en) Formation method of electrode foil for electrolytic capacitor
JP2007184301A (en) Method of manufacturing electrode foil for electrolytic capacitor
JP2010003996A (en) Method of manufacturing electrode foil for aluminum electrolytic capacitor
JPS5825218A (en) Method of producing low voltage electrolytic condenser electrode foil
JP4576192B2 (en) Method for producing electrode foil for aluminum electrolytic capacitor
JP4344620B2 (en) Manufacturing method of etching foil for electrolytic capacitor
JP2009105242A (en) Method of manufacturing electrode foil for electrolytic capacitor
JP2008282994A (en) Method of manufacturing electrode foil for aluminum electrolytic capacitor
JP6507652B2 (en) Aluminum or aluminum alloy member and method of manufacturing the same
JP2007281246A (en) Manufacturing method of electrolytic capacitor electrode foil
JP4709069B2 (en) Method for producing aluminum electrode foil for electrolytic capacitor
JP2020084262A (en) Method for manufacturing chromium plated component
JP2009087993A (en) Method of manufacturing electrode foil for electrolytic capacitor
JP2007299956A (en) Method for manufacturing cathode foil for electrolytic capacitor
JP4758827B2 (en) Method for producing electrode foil for electrolytic capacitor
JP2005175330A (en) Manufacturing method of anode foil for aluminum electrolytic capacitor
JP2010196131A (en) Method of manufacturing electrode foil for electrolytic capacitor

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20110118

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20120328

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20120403

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20120404

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150413

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Ref document number: 4970369

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250