JP4576192B2 - Method for producing electrode foil for aluminum electrolytic capacitor - Google Patents

Method for producing electrode foil for aluminum electrolytic capacitor Download PDF

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JP4576192B2
JP4576192B2 JP2004293156A JP2004293156A JP4576192B2 JP 4576192 B2 JP4576192 B2 JP 4576192B2 JP 2004293156 A JP2004293156 A JP 2004293156A JP 2004293156 A JP2004293156 A JP 2004293156A JP 4576192 B2 JP4576192 B2 JP 4576192B2
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electrolytic capacitor
aluminum electrolytic
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JP2006108395A (en
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陽 石井
竜司 石飛
亮 國米
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Nichicon Capacitor Ltd
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本発明は、アルミニウム電解コンデンサ用電極箔の製造方法に関するものであり、特に均一で溶解しにくい化成皮膜を形成するアルミニウム電解コンデンサ用電極箔の製造方法に関するものである。   The present invention relates to a method for manufacturing an electrode foil for an aluminum electrolytic capacitor, and more particularly to a method for manufacturing an electrode foil for an aluminum electrolytic capacitor that forms a uniform and difficult-to-dissolve chemical conversion film.

一般に、駆動用電解液中の含水量が増加すると、アルミニウム電極箔の表面に形成された化成皮膜は、水和反応を起こして劣化しやすくなるだけでなく、溶質として添加されている各種有機カルボン酸の錯体形成反応が進みやすくなり、溶解反応による電極箔の劣化が促進される。   In general, when the water content in the driving electrolyte increases, the chemical conversion film formed on the surface of the aluminum electrode foil not only tends to deteriorate due to a hydration reaction, but also various organic carboxyls added as solutes. The acid complex formation reaction is facilitated, and the deterioration of the electrode foil due to the dissolution reaction is promoted.

特に、アルミニウム電解コンデンサの駆動用電解液の含水量が30%を超える場合、使用する電極箔の耐水性向上と共に、化成皮膜の耐溶解性向上が求められ、より均一で溶解しにくい化成皮膜の形成が要求されるようになってきている。   In particular, when the water content of the electrolytic solution for driving an aluminum electrolytic capacitor exceeds 30%, it is required to improve the water resistance of the electrode foil used and to improve the dissolution resistance of the chemical conversion film. Formation is now required.

従来、化成皮膜を安定化させるには、化成処理中に発生し、化成皮膜の均一性を阻害する皮膜欠陥部を除去する方法(例えば、熱処理、酸浸漬等。非特許文献1参照)や、アジピン酸アンモニウムで化成した後、リン酸アンモニウムで仕上化成を行い、化成皮膜の耐水性を向上させる方法(例えば、特許文献1参照)等が知られている。   Conventionally, in order to stabilize the chemical conversion film, a method of removing a film defect portion that occurs during the chemical conversion treatment and hinders the uniformity of the chemical conversion film (for example, heat treatment, acid immersion, etc., see Non-Patent Document 1), Known is a method for improving the water resistance of a chemical conversion film (for example, refer to Patent Document 1) and the like after performing chemical conversion with ammonium adipate and then performing chemical conversion with ammonium phosphate.

また、化成前処理として、熱酸化皮膜や、水和酸化皮膜を予め形成しておくと、化成箔の容量や特性が向上することが知られており(例えば、非特許文献1、2参照)、化成箔の容量の向上、化成効率の改善(省電力)、漏れ電流の低減を目的として、抑制剤を溶解した沸騰水中に浸漬したり(例えば、特許文献2参照)、温水に浸漬して水和酸化皮膜を形成する方法や、大気中または、酸素分圧をコントロールした環境下で、加熱処理する方法(例えば、特許文献3〜5参照)、水蒸気雰囲気中で加熱処理する方法(例えば、特許文献6参照)が開示されている。
特開昭52−92360号公報 特公昭57−6250号公報 特開昭53−26960号公報 特許第3446115号公報 特開平11−340102号公報 特許第3407470号公報 永田伊佐也著、「電解液陰極アルミニウム電解コンデンサ(アルミニウム乾式電解コンデンサ増補改訂版)」、日本蓄電器工業株式会社、平成9年2月24日、第2版第1刷、P.192〜204、P.261〜314 永山政一,「第9回ARSコンファレンステキスト」,社団法人表面技術協会,平成4年,P.41
In addition, it is known that when a thermal oxide film or a hydrated oxide film is formed in advance as a chemical pretreatment, the capacity and characteristics of the chemical conversion foil are improved (for example, see Non-Patent Documents 1 and 2). For the purpose of improving the capacity of chemical conversion foil, improving chemical conversion efficiency (power saving), and reducing leakage current, it is immersed in boiling water in which an inhibitor is dissolved (for example, see Patent Document 2) or immersed in warm water. A method of forming a hydrated oxide film, a method of heat treatment in the atmosphere or an environment in which the oxygen partial pressure is controlled (for example, see Patent Documents 3 to 5), a method of heat treatment in a water vapor atmosphere (for example, Patent Document 6) is disclosed.
JP-A-52-92360 Japanese Patent Publication No.57-6250 JP-A-53-26960 Japanese Patent No. 3446115 JP 11-340102 A Japanese Patent No. 3407470 By Nagata Isaya, “Electrolyte Cathode Aluminum Electrolytic Capacitor (Aluminum Dry Type Electrolytic Capacitor Supplement Revised Version)”, Nihon Denki Kogyo Kogyo Co., Ltd., February 24, 1997, 2nd edition, 1st printing, P.A. 192-204, p. 261-314 Nagayama, Seiichi, “9th ARS Conference Text”, Surface Technology Association of Japan, 1992, p. 41

しかしながら、上記の化成前処理のいずれを用いても、駆動用電解液中の含水量が30%を超えるアルミニウム電解コンデンサや、含水量が30%以下であっても高信頼性を求められるアルミニウム電解コンデンサに対しては、化成皮膜の安定化が不十分であり、より均一で溶解しにくい化成皮膜を得ることができる電極箔の製造方法が求められていた。   However, even if any of the above-mentioned chemical pretreatments is used, an aluminum electrolytic capacitor in which the water content in the driving electrolyte exceeds 30%, or aluminum electrolysis that requires high reliability even if the water content is 30% or less For a capacitor, there has been a demand for a method for producing an electrode foil that can provide a conversion film that is insufficiently stabilized and that is more uniform and difficult to dissolve.

本発明は上記課題を解決するもので、アルミニウム原箔をエッチングした後、化成処理するアルミニウム電解コンデンサ用電極箔の製造方法において、
化成処理前に、エッチング箔をアルカリ性溶液中に浸漬して、水洗し、250〜400℃で10秒〜5分間、第1の加熱処理を行い、次に、100〜250℃で10分〜5時間、第2の加熱処理を行い、その後、350〜500℃で10分〜5時間、第3の加熱処理を行った後、化成処理を行うことを特徴とするアルミニウム電解コンデンサ用電極箔の製造方法である。
The present invention solves the above problems, and in the method for producing an electrode foil for an aluminum electrolytic capacitor to be subjected to chemical conversion treatment after etching the aluminum original foil,
Before the chemical conversion treatment, the etching foil is immersed in an alkaline solution, washed with water, subjected to a first heat treatment at 250 to 400 ° C. for 10 seconds to 5 minutes, and then at 100 to 250 ° C. for 10 minutes to 5 minutes. A second heat treatment is performed for a period of time, and then a third heat treatment is performed at 350 to 500 ° C. for 10 minutes to 5 hours, followed by a chemical conversion treatment. Is the method.

また、上記のアルカリ性溶液が、水酸化物イオン、アルミン酸イオン、または炭酸イオンを含む溶液であることを特徴とするアルミニウム電解コンデンサ用電極箔の製造方法である。   The alkaline solution is a solution containing hydroxide ions, aluminate ions, or carbonate ions, and is a method for producing an electrode foil for an aluminum electrolytic capacitor.

さらに、上記アルカリ性溶液のpHが10〜12、温度が40〜60℃であることを特徴とするアルミニウム電解コンデンサ用電極箔の製造方法である。   Furthermore, it is the manufacturing method of the electrode foil for aluminum electrolytic capacitors, wherein pH of the said alkaline solution is 10-12, and temperature is 40-60 degreeC.

そして、第3の加熱処理を、露点30℃以下の雰囲気中で行うことを特徴とするアルミニウム電解コンデンサ用電極箔の製造方法である。   And it is a manufacturing method of the electrode foil for aluminum electrolytic capacitors characterized by performing 3rd heat processing in an atmosphere with a dew point of 30 degrees C or less.

また、第3の加熱処理を、窒素雰囲気中で行うことを特徴とするアルミニウム電解コンデンサ用電極箔の製造方法である。   Moreover, the third heat treatment is performed in a nitrogen atmosphere, and this is a method for producing an electrode foil for an aluminum electrolytic capacitor.

さらに、第3の加熱処理を、二酸化炭素雰囲気中で行うことを特徴とするアルミニウム電解コンデンサ用電極箔の製造方法である。   Furthermore, it is a manufacturing method of the electrode foil for aluminum electrolytic capacitors characterized by performing 3rd heat processing in a carbon dioxide atmosphere.

エッチング箔に上記の化成前処理を施すことにより、均一で、耐溶解性に優れた化成皮膜を得ることができ、含水量30%を超える駆動用電解液に対しても適用可能な電極箔を製造することができる。   By performing the above-mentioned chemical conversion pretreatment on the etching foil, it is possible to obtain a uniform chemical film with excellent dissolution resistance, and an electrode foil that can be applied to a driving electrolytic solution having a water content exceeding 30%. Can be manufactured.

アルミニウム電解コンデンサ用のアルミニウム原箔をエッチングした後、化成処理前に、アルカリ性溶液中に浸漬する。
アルカリ性溶液中への浸漬は、エッチング箔の表面に残存する、薬品の混入した酸化皮膜を除去すると共に、エッチング箔表面に清浄な水酸化皮膜を形成する効果を有する。
使用するアルカリ性溶液としては、不純物元素を含有しない水酸化皮膜を得るため、ケイ酸イオンやリン酸イオン等、アルミニウムの結合しやすい陰イオンを含む溶液ではなく、水酸化物イオンや、アルミン酸イオン、または炭酸イオンのアルカリ性溶液の使用が望ましい。
アルカリ性溶液によるアルミニウム箔の溶解を最小限に抑えるため、アルカリ性溶液のpHを10〜12、温度を40〜60℃に設定することが望ましい。
上記のアルカリ性溶液中への浸漬後、エッチング箔を水洗する。
After etching the aluminum foil for the aluminum electrolytic capacitor, it is immersed in an alkaline solution before chemical conversion treatment.
Immersion in an alkaline solution has an effect of removing an oxide film mixed with chemicals remaining on the surface of the etching foil and forming a clean hydroxide film on the surface of the etching foil.
The alkaline solution to be used is not a solution containing anions that easily bind aluminum such as silicate ions and phosphate ions in order to obtain a hydroxide film containing no impurity elements, but hydroxide ions or aluminate ions. Or the use of an alkaline solution of carbonate ions.
In order to minimize the dissolution of the aluminum foil by the alkaline solution, it is desirable to set the pH of the alkaline solution to 10 to 12 and the temperature to 40 to 60 ° C.
After immersion in the alkaline solution, the etching foil is washed with water.

次に、第1の加熱処理を250〜400℃で10秒〜5分間行い、付着した水分を除去する。
この水分除去により、アルカリ性溶液に浸漬して、活性な状態にあるエッチング箔表面での新たな水和酸化皮膜の生成が抑えられる。
ここで、加熱処理条件を、250℃未満、10秒未満とすると、水分が完全に除去されず、好ましくない。
一方、400℃を超えると、エッチング箔表面の水酸化皮膜が変質し、また、新たな気中酸化皮膜が不均一で孤立した形態で形成されるため(図1参照)、その後の化成において、皮膜欠陥の発生の原因となり、不適である。
また、第1の加熱処理では、水分を多量に蒸発させるため、炉内の水蒸気分圧が高くなる。加熱処理時間が5分を超えると、エッチング箔表面に新たな水和酸化皮膜が生成し、特に、水蒸気により新たに形成される水和酸化皮膜は、エッチング箔のエッチングピット内で、不均一に形成されるため(図2参照)、その後の化成において、化成皮膜が均一でなくなることから、不適である。
Next, the first heat treatment is performed at 250 to 400 ° C. for 10 seconds to 5 minutes to remove the attached moisture.
This moisture removal suppresses the generation of a new hydrated oxide film on the surface of the etching foil immersed in an alkaline solution and in an active state.
Here, when the heat treatment conditions are less than 250 ° C. and less than 10 seconds, moisture is not completely removed, which is not preferable.
On the other hand, when the temperature exceeds 400 ° C., the hydroxide film on the etching foil surface is altered, and a new air oxide film is formed in a non-uniform and isolated form (see FIG. 1). It causes film defects and is not suitable.
In the first heat treatment, a large amount of water is evaporated, so that the partial pressure of water vapor in the furnace is increased. When the heat treatment time exceeds 5 minutes, a new hydrated oxide film is formed on the surface of the etching foil. In particular, the hydrated oxide film newly formed by water vapor is unevenly formed in the etching pits of the etching foil. Since it is formed (see FIG. 2), the chemical conversion film is not uniform in the subsequent chemical conversion.

その後、第2の加熱処理を温度100〜250℃で10分〜5時間行い、短時間の加熱(乾燥)では取り除くことができない、エッチング箔表面に吸着した水分を除去した。
この水分除去により、エッチング箔表面での新たな水和酸化皮膜の生成を抑えながら、微細なエッチングピットに吸着した未反応の水分が除去される。加熱温度は、水の沸点である100℃以上で、水和酸化皮膜の変質が起こらない250℃以下であることが望ましく、加熱時間は、吸着した水分を除去することができる、10分間以上であることが必要であるが、5時間を超えると水和酸化皮膜の溶解が起こるので、好ましくない。
Then, the 2nd heat processing was performed for 10 minutes-5 hours at the temperature of 100-250 degreeC, and the water | moisture content adsorb | sucked to the etching foil surface which cannot be removed by a short time heating (drying) was removed.
This moisture removal removes the unreacted moisture adsorbed on the fine etching pits while suppressing the formation of a new hydrated oxide film on the etching foil surface. The heating temperature is preferably 100 ° C. or higher, which is the boiling point of water, and is preferably 250 ° C. or lower so that the hydrated oxide film is not deteriorated. The heating time is 10 minutes or more, which can remove the adsorbed moisture. Although it is necessary, if it exceeds 5 hours, the hydrated oxide film will dissolve, which is not preferable.

次に、第3の加熱処理を温度350〜500℃で10分〜5時間行い、エッチング箔表面に均一に生成された水酸化皮膜を脱水し、均一な酸化皮膜に転移させる。
その加熱温度は、水酸化皮膜が酸化皮膜に転移する350℃以上で、新たに気中酸化皮膜の生成が起こらない500℃以下が望ましく、その時間は、酸化皮膜に転移するに必要な10分間以上であることが必要であるが、5時間を超えると酸化皮膜の溶解が起こり、漏れ電流大となるので、好ましくない。
そして、第3の加熱処理は、新たな水和皮膜の生成を抑えるために、露点30℃以下の雰囲気中で行うことが望ましい。
また、水酸化皮膜から酸化皮膜への転移は、高温で加熱処理する方が進むが、同時に、酸素との反応により新たな酸化皮膜を生成させるため、特に高温での加熱処理は、窒素雰囲気中または二酸化炭素雰囲気中で行うことが望ましい。
ここで、二酸化炭素は、均一に水酸化皮膜や、酸化皮膜が生成したエッチング箔に対しては、不活性なガスとして作用するが、水酸化皮膜や、酸化皮膜の弱体部では、地金のアルミニウムと反応して還元され、酸化皮膜の生成を促す作用を持つため、エッチング箔表面に、より均一な皮膜を形成する効果を有する。
Next, the third heat treatment is performed at a temperature of 350 to 500 ° C. for 10 minutes to 5 hours to dehydrate the hydroxide film uniformly formed on the surface of the etching foil and transfer it to a uniform oxide film.
The heating temperature is preferably 350 ° C. or higher at which the hydroxide film is transferred to the oxide film, and is preferably 500 ° C. or lower at which no new atmospheric oxide film is generated. The time is 10 minutes necessary for transfer to the oxide film. Although it is necessary to be above, if it exceeds 5 hours, dissolution of the oxide film occurs and the leakage current becomes large, which is not preferable.
The third heat treatment is desirably performed in an atmosphere having a dew point of 30 ° C. or lower in order to suppress generation of a new hydrated film.
In addition, the transition from a hydroxide film to an oxide film proceeds with heat treatment at a high temperature, but at the same time, a new oxide film is formed by reaction with oxygen. Or it is desirable to carry out in a carbon dioxide atmosphere.
Here, carbon dioxide acts as an inert gas on the etching foil in which a hydroxide film or an oxide film is uniformly formed, but in the weakened part of the hydroxide film or oxide film, Since it reacts with aluminum and is reduced to promote the formation of an oxide film, it has the effect of forming a more uniform film on the surface of the etching foil.

その後、アジピン酸アンモニウム溶液中で化成処理を行うが、アジピン酸アンモニウムは、化成用薬品として一般的に使用される薬品のうちで、硼酸やリン酸アンモニウムより分子量が大きいため、化成皮膜への陰イオンの取り込みが抑えられ、均一で溶解しにくい化成皮膜の生成を促す。   After that, chemical conversion treatment is performed in an ammonium adipate solution. Ammonium adipate is a chemical commonly used as a chemical for chemical conversion, and has a higher molecular weight than boric acid and ammonium phosphate. Incorporation of ions is suppressed, and the formation of a conversion film that is uniform and difficult to dissolve is promoted.

以上のことから、本発明の電極箔の製造方法によれば、化成皮膜が均一で溶解しにくくなるため、駆動用電解液の含水量が30%を超えるアルミニウム電解コンデンサや高信頼性を要求されるアルミニウム電解コンデンサ用として、最適な電極箔を提供することができる。   From the above, according to the method for producing an electrode foil of the present invention, the chemical conversion film is uniform and difficult to dissolve. Therefore, an aluminum electrolytic capacitor in which the water content of the driving electrolyte exceeds 30% and high reliability are required. As an aluminum electrolytic capacitor, an optimum electrode foil can be provided.

ここで、得られた化成皮膜の均一性、耐溶解性は、リン酸4%、クロム酸2%、液温85℃の溶液に浸漬して、化成皮膜の溶解速度を測定すること(以下、リン酸クロム酸溶解試験と呼ぶ)により評価できる。
リン酸クロム酸溶解試験は、アルマイトをはじめ、アルミニウムの化成皮膜(陽極酸化皮膜)の評価に、広く利用されている方法で、基材のアルミニウム金属は溶解せず、化成皮膜のみを溶解するため、その重量変化より化成皮膜の均一性、耐溶解性を知ることができる。
Here, the uniformity and dissolution resistance of the obtained chemical conversion film are measured by measuring the dissolution rate of the chemical conversion film by immersing it in a solution of phosphoric acid 4%, chromic acid 2% and a liquid temperature of 85 ° C. It can be evaluated by a phosphate chromic acid dissolution test).
Phosphoric acid chromic acid dissolution test is a widely used method for the evaluation of anodized and aluminum conversion coatings (anodized coatings). It dissolves only the conversion coating without dissolving the aluminum metal of the substrate. From the change in weight, the uniformity of the chemical conversion film and the dissolution resistance can be known.

図3は、リン酸クロム酸溶解試験を実施した場合の化成皮膜の溶解特性と、その皮膜溶解の状態を模式的に示したものである。
化成皮膜は均一であるが、全体的に溶けやすい皮膜である場合は、図3の曲線Aに示すとおり立ち上がりが急峻で、短時間で全溶する。
また、化成皮膜が均一で、かつ全体的に溶けにくい皮膜である場合は、図3の曲線Bに示すとおり、立ち上がりが緩やかであり、溶解に長時間を要する。
FIG. 3 schematically shows the dissolution characteristics of the chemical conversion film and the state of dissolution of the film when the chromic acid phosphate dissolution test is performed.
In the case where the chemical conversion film is uniform but is easy to dissolve as a whole, as shown by the curve A in FIG.
Further, when the chemical film is a uniform film that is difficult to dissolve as a whole, as shown by a curve B in FIG. 3, the rising is slow and it takes a long time to dissolve.

化成皮膜が不均一で、溶けやすい部分と溶けにくい部分が混在した皮膜である場合は、図3の曲線Cに示すとおり、まず、短時間で溶けやすい皮膜が溶解すると共に、溶け残った部分(溶けにくい部分)も一部剥離するため、最初に大きく溶解したあと、徐々に溶解する曲線となる。   In the case where the chemical conversion film is non-uniform and is a film in which a portion that is easy to dissolve and a portion that is difficult to dissolve are mixed, first, as shown by curve C in FIG. Since the part that is difficult to dissolve also peels off, it becomes a curve that dissolves gradually after first dissolving greatly.

また、全溶した場合の皮膜重量(全皮膜重量)に対する、図3に示すある一定の時間(t)での皮膜溶解重量の値を比較すると、この値の小さな条件は皮膜が溶けにくいことを示し、定量的に皮膜の均一性、耐溶解性を知ることができる。   Moreover, when the value of the film dissolution weight at a certain time (t) shown in FIG. 3 is compared with the film weight (total film weight) in the case of complete dissolution, it is found that the film is difficult to dissolve under the condition of this small value. It is possible to know the film uniformity and dissolution resistance quantitatively.

以下、本発明の実施例について詳細に説明する。   Examples of the present invention will be described in detail below.

まず、第1〜第3の加熱処理条件の検討を行った。
公知の方法により、アルミニウム原箔に、エッチング(粗面化)、脱塩素処理を行って、エッチング箔のシート(20cm×50cm)を作製し、pH:11、液温:50℃の水酸化ナトリウムの溶液に3分間浸漬し、水洗した。
その後、表1〜3に示す条件で、第1〜第3の加熱処理条件の検討を順次行い、次いで、アジピン酸アンモニウム:150g/L、液温:85℃で、JEITA RC−2364A 1999年改訂(以下、JEITA法と呼ぶ)に準じて、30Vの定電圧化成を行った。
評価は、リン酸クロム酸溶解試験により行い、5分後の皮膜溶解量と、全溶した場合の皮膜重量(全皮膜重量)との比を重量%(以下、皮膜溶解度と呼ぶ)で表した。
First, the first to third heat treatment conditions were examined.
Etching (roughening) and dechlorination treatment are performed on the aluminum foil by a known method to produce a sheet (20 cm × 50 cm) of the etching foil, and sodium hydroxide having a pH of 11 and a liquid temperature of 50 ° C. Was immersed in the solution for 3 minutes and washed with water.
Thereafter, the first to third heat treatment conditions were sequentially examined under the conditions shown in Tables 1 to 3, and then revised to JEITA RC-2364A 1999 with ammonium adipate: 150 g / L and liquid temperature: 85 ° C. In accordance with (hereinafter referred to as JEITA method), a constant voltage of 30 V was formed.
The evaluation was carried out by a chromic acid phosphate dissolution test, and the ratio of the film dissolution amount after 5 minutes and the film weight when dissolved completely (total film weight) was expressed in weight% (hereinafter referred to as film solubility). .

[実施例1]第1加熱処理条件の検討、表1
第1段階の加熱処理条件は、250〜400℃、10秒〜5分の間で変えて比較した。
第2段階の加熱処理条件は、150℃で2時間、第3段階の加熱処理条件は、400℃で2時間(露点0℃)として固定した。
なお、比較例として、第1段階の温度200℃、450℃の場合、時間5秒、8分の場合についても調査した。
その結果を表1に示す。
[Example 1] Examination of first heat treatment conditions, Table 1
The first stage heat treatment conditions were varied between 250 to 400 ° C. and 10 seconds to 5 minutes for comparison.
The heat treatment conditions for the second stage were fixed at 150 ° C. for 2 hours, and the heat treatment conditions for the third stage were fixed at 400 ° C. for 2 hours (dew point 0 ° C.).
As a comparative example, the case of the first stage temperatures of 200 ° C. and 450 ° C. was also investigated for the time of 5 seconds and 8 minutes.
The results are shown in Table 1.

Figure 0004576192
Figure 0004576192

表1に示すとおり、第1段階の加熱処理は、200℃または5秒の加熱処理では、箔の乾燥が不十分で、不可のものが発生しており、また、450℃、または8分の加熱は、皮膜溶解度が大きくなり、皮膜の均一性、耐溶解性が損なわれている。
よって、第1段階の加熱処理条件は、250〜400℃で10秒〜5分間とするのが適当である。
As shown in Table 1, in the first stage heat treatment, the foil was not sufficiently dried by the heat treatment at 200 ° C. or 5 seconds, and incompleteness occurred, and 450 ° C. or 8 minutes Heating increases the solubility of the film, and the uniformity and dissolution resistance of the film are impaired.
Therefore, it is appropriate that the heat treatment conditions for the first stage are 250 to 400 ° C. and 10 seconds to 5 minutes.

[実施例2]第2加熱処理条件の検討、表2
第1段階の加熱処理条件は、350℃で1分、第3段階の加熱処理条件は、400℃で2時間(露点0℃)として固定し、第2段階の加熱処理条件を100〜250℃、10分〜5時間の間で変えて比較した。
なお、比較例として、第2段階の温度80℃、300℃の場合、時間5分、8時間の場合についても調査した。
その結果を表2に示す。
[Example 2] Investigation of second heat treatment conditions, Table 2
The first stage heat treatment condition is fixed at 350 ° C. for 1 minute, the third stage heat treatment condition is fixed at 400 ° C. for 2 hours (dew point 0 ° C.), and the second stage heat treatment condition is 100 to 250 ° C. The comparison was made by changing between 10 minutes and 5 hours.
As a comparative example, in the case of the second stage temperature of 80 ° C. and 300 ° C., the case of 5 minutes and 8 hours was also investigated.
The results are shown in Table 2.

Figure 0004576192
Figure 0004576192

表2に示すとおり、第2段階の加熱処理は、温度80℃、300℃では、皮膜溶解度が大きくなる。時間については、5分では、加熱温度の低い側で皮膜溶解度が大きくなるものが見られ、また、8時間の加熱処理では、加熱温度の高い側で、皮膜溶解度が大きくなるものが見られた。
よって、第2段階の加熱処理条件は、100〜250℃で10分〜5時間とするのが適当である。
As shown in Table 2, in the second stage heat treatment, the film solubility increases at temperatures of 80 ° C. and 300 ° C. Regarding the time, in 5 minutes, the film solubility increased on the low heating temperature side, and in the 8 hour heat treatment, the film solubility increased on the high heating temperature side. .
Therefore, it is appropriate that the second heat treatment condition is 100 to 250 ° C. for 10 minutes to 5 hours.

[実施例3]第3加熱処理条件の検討、表3
第1段階の加熱処理条件は、350℃で1分、第2段階の加熱処理条件は150℃で2時間として固定し、第3段階の加熱処理条件を、350〜500℃、10分〜5時間(露点0℃)の間で変えて比較した。
なお、比較例として、第3段階の温度300℃、550℃の場合、時間5分、8時間の場合についても調査した。
その結果を表3に示す。
[Example 3] Investigation of third heat treatment conditions, Table 3
The first stage heat treatment condition is fixed at 350 ° C. for 1 minute, the second stage heat treatment condition is fixed at 150 ° C. for 2 hours, and the third stage heat treatment condition is 350 to 500 ° C., 10 minutes to 5 minutes. Comparison was made by changing between times (dew point 0 ° C.).
As a comparative example, the case where the temperature of the third stage was 300 ° C. and 550 ° C. and the time was 5 minutes and 8 hours was also investigated.
The results are shown in Table 3.

Figure 0004576192
Figure 0004576192

表3に示すとおり、第3段階の加熱処理は、温度300℃では、皮膜溶解度が大きくなり、また、550℃の加熱では、皮膜溶解度が大きく、漏れ電流も増大した。時間については、5分では、加熱温度の低い側で、皮膜溶解度が大きくなるものが見られ、8時間の加熱処理では、加熱温度の高い側で、漏れ電流の大きくなるものが見られた。
よって、第3段階の加熱処理条件は、350〜500℃で10分〜5時間とするのが適当である。
As shown in Table 3, in the third stage heat treatment, the film solubility increased at a temperature of 300 ° C., and when heated at 550 ° C., the film solubility increased and the leakage current increased. With respect to the time, 5 minutes showed that the film solubility increased on the low heating temperature side, and 8 hours of heat treatment showed that the leakage current increased on the high heating temperature side.
Therefore, it is appropriate that the third heat treatment condition is 350 to 500 ° C. and 10 minutes to 5 hours.

次に、化成処理前に使用するアルカリ性溶液(種類、pH・温度)の検討を行った。
なお、エッチング箔試料の仕様、処理条件は、実施例1〜3と同様とした。
Next, the alkaline solution (type, pH and temperature) used before the chemical conversion treatment was examined.
The specifications and processing conditions of the etching foil sample were the same as those in Examples 1 to 3.

[実施例4]アルカリ性溶液(種類)の検討、表4
実施例1〜3で使用したものと同仕様のエッチング箔を、表4に示す条件のアルカリ性溶液に3分間浸漬し、水洗したのち、表4に示す条件で、第3段階の加熱処理を行った。アジピン酸アンモニウム150g/L、液温:85℃で、JEITA法に準じて、30Vの定電圧化成を行い、リン酸クロム酸溶解試験を行って、皮膜溶解度を評価した。
その結果を表4に示す。
[Example 4] Examination of alkaline solution (type), Table 4
The etching foil having the same specifications as those used in Examples 1 to 3 was immersed in an alkaline solution having the conditions shown in Table 4 for 3 minutes, washed with water, and then subjected to the third stage heat treatment under the conditions shown in Table 4. It was. In accordance with the JEITA method, a constant voltage of 30 V was formed at 150 g / L of ammonium adipate and the liquid temperature was 85 ° C., and a chromic acid phosphate dissolution test was performed to evaluate the film solubility.
The results are shown in Table 4.

Figure 0004576192
Figure 0004576192

表4に示すとおり、比較例のケイ酸ナトリウム、ケイ酸カリウム、リン酸ナトリウムを使用した場合は、第3段階の加熱処理温度の高いもので皮膜溶解性がやや改善されているが、実施例の水酸化ナトリウムや水酸化カリウム、水酸化カルシウム等の水酸化物イオン、または、アルミン酸ナトリウムやアルミン酸カリウム等のアルミン酸イオン、炭酸ナトリウム等の炭酸イオンを含む溶液を使用したものと比較すると、皮膜溶解性が劣ることが分かる。   As shown in Table 4, when sodium silicate, potassium silicate, and sodium phosphate of comparative examples were used, the film solubility was slightly improved at a high heat treatment temperature in the third stage. Compared to those using a solution containing hydroxide ions such as sodium hydroxide, potassium hydroxide, calcium hydroxide, or aluminate ions such as sodium aluminate or potassium aluminate, or carbonate ions such as sodium carbonate. It can be seen that the film solubility is poor.

[実施例5]アルカリ性溶液のpH・温度検討、表5
実施例1〜3で使用したものと同仕様のエッチング箔を、表5に示す条件のアルカリ性溶液に3分間浸漬し、水洗した後、表5に示す条件で、第3段階の加熱処理を行った。その後の化成条件および皮膜溶解度評価方法は実施例1〜3と同様とした。アジピン酸アンモニウム:150g/L、液温:85℃で、JEITA法に準じて、30Vの定電圧化成を行い、リン酸クロム酸溶解試験を行って、皮膜溶解度を評価した。
その結果を表5に示す。
[Example 5] Examination of pH and temperature of alkaline solution, Table 5
The etching foil having the same specifications as those used in Examples 1 to 3 was immersed in an alkaline solution having the conditions shown in Table 5 for 3 minutes, washed with water, and then subjected to the third stage heat treatment under the conditions shown in Table 5. It was. Subsequent chemical conversion conditions and film solubility evaluation methods were the same as in Examples 1-3. Ammonium adipate: 150 g / L, liquid temperature: 85 ° C. According to the JEITA method, a constant voltage of 30 V was formed, and a phosphate chromic acid dissolution test was performed to evaluate the film solubility.
The results are shown in Table 5.

Figure 0004576192
Figure 0004576192

表5に示すとおり、水酸化ナトリウム、および水酸化カルシウムのいずれの溶液においても、pH:9、液温35℃では、皮膜溶解度が大きくなり、pH:13、液温:70℃では、エッチング箔の溶解反応が進み、化成後の容量の低下が見られる。
よって、アルカリ性溶液のpHは10〜12、温度は40〜60℃とするのが適当である。
As shown in Table 5, in any solution of sodium hydroxide and calcium hydroxide, the film solubility becomes large at pH: 9 and a liquid temperature of 35 ° C., and the etching foil at pH: 13 and liquid temperature: 70 ° C. The dissolution reaction proceeds, and a decrease in capacity after chemical conversion is observed.
Therefore, it is appropriate that the alkaline solution has a pH of 10 to 12 and a temperature of 40 to 60 ° C.

[実施例6]第3の加熱処理条件の露点検討、表6
実施例1〜3で使用したものと同仕様のエッチング箔を、pH:11、液温:50℃の水酸化ナトリウムの溶液に3分浸漬し、水洗したのち、表6に示す条件で、第3段階の加熱処理条件の露点を変えた試料を作製し、アジピン酸アンモニウム:150g/L、液温:85℃で、JEITA法に準じて、30Vの定電圧化成を行い、リン酸クロム酸溶解試験を行って、皮膜溶解度を評価した。
その結果を表6に示す。
[Example 6] Dew point study of third heat treatment conditions, Table 6
Etching foils having the same specifications as those used in Examples 1 to 3 were immersed in a sodium hydroxide solution having a pH of 11 and a liquid temperature of 50 ° C. for 3 minutes, washed with water, and subjected to the conditions shown in Table 6. Samples with different dew points in three stages of heat treatment conditions were prepared, and a constant voltage of 30 V was formed according to the JEITA method at ammonium adipate: 150 g / L, liquid temperature: 85 ° C., and dissolved in chromic phosphate Tests were conducted to evaluate film solubility.
The results are shown in Table 6.

Figure 0004576192
Figure 0004576192

表6に示すとおり、露点−20〜30℃の水蒸気雰囲気中では、皮膜溶解度の値にほとんど変化は見られないが、露点35℃では、全般的に皮膜溶解度が悪化している。
よって、第3の加熱処理条件の露点は30℃以下が適当である。
As shown in Table 6, in the steam atmosphere with a dew point of -20 to 30 ° C, there is almost no change in the film solubility value, but at a dew point of 35 ° C, the film solubility is generally deteriorated.
Therefore, the dew point of the third heat treatment condition is suitably 30 ° C. or less.

[実施例7]第3の加熱処理条件(窒素雰囲気中)の検討、表7
実施例1〜3で使用したものと同仕様のエッチング箔を、pH:11、液温:50℃の水酸化ナトリウムの溶液に3分浸漬し、水洗したのち、表7に示す条件で、第3段階の加熱処理を行い、アジピン酸アンモニウム:150g/L、液温:85℃で、JEITA法に準じて、30Vの定電圧化成を行い、リン酸クロム酸溶解試験を行って、皮膜溶解度を評価した。
その結果を表7に示す。
[Example 7] Investigation of third heat treatment condition (in nitrogen atmosphere), Table 7
Etching foils having the same specifications as those used in Examples 1 to 3 were immersed in a sodium hydroxide solution having a pH of 11 and a liquid temperature of 50 ° C. for 3 minutes, washed with water, and subjected to the conditions shown in Table 7. 3 steps of heat treatment, ammonium adipate: 150 g / L, liquid temperature: 85 ° C., 30 V constant voltage formation according to JEITA method, chromic acid phosphate dissolution test, film solubility evaluated.
The results are shown in Table 7.

Figure 0004576192
Figure 0004576192

表7に示すとおり、窒素雰囲気中で行われた場合、温度500℃または5時間の加熱処理での皮膜溶解度が、空気雰囲気中で行われたものより優れていることが分かる。   As shown in Table 7, when performed in a nitrogen atmosphere, it can be seen that the film solubility in the heat treatment at a temperature of 500 ° C. or 5 hours is superior to that in the air atmosphere.

[実施例8]第3の加熱処理条件(二酸化炭素雰囲気中)の検討、表8
実施例1〜3で使用したものと同仕様のエッチング箔を、pH:11、液温:50℃の水酸化ナトリウムの溶液に3分浸漬し、水洗したのち、表8に示す条件で、第3段階の加熱処理を行い、アジピン酸アンモニウム:150g/L、液温:85℃で、JEITA法に準じて、30Vの定電圧化成を行い、リン酸クロム酸溶解試験を行って、皮膜溶解度を評価した。
その結果を表8に示す。
[Example 8] Investigation of third heat treatment condition (in carbon dioxide atmosphere), Table 8
Etching foils having the same specifications as those used in Examples 1 to 3 were immersed in a sodium hydroxide solution having a pH of 11 and a liquid temperature of 50 ° C. for 3 minutes, washed with water, and subjected to the conditions shown in Table 8. 3 steps of heat treatment, ammonium adipate: 150 g / L, liquid temperature: 85 ° C., 30 V constant voltage formation according to JEITA method, chromic acid phosphate dissolution test, film solubility evaluated.
The results are shown in Table 8.

Figure 0004576192
Figure 0004576192

表8に示すとおり、二酸化炭素雰囲気中で行われた場合、全体的に空気雰囲気中で加熱処理したものと比較して、皮膜溶解度が優れ、温度500℃または5時間の加熱処理での皮膜溶解度の改善効果が、空気雰囲気中で行われたものより優れていることが分かる。   As shown in Table 8, when carried out in a carbon dioxide atmosphere, the film solubility is superior to that obtained by heat treatment in an air atmosphere as a whole, and the film solubility in a heat treatment at a temperature of 500 ° C. or 5 hours. It can be seen that the improvement effect is superior to that performed in the air atmosphere.

[実施例9]アルミニウム電極箔による信頼性確認
実施例1〜3で使用したものと同仕様のエッチング箔を表10に示す条件で、3段階の加熱処理を行い、アジピン酸アンモニウム:150g/リットル、液温:85℃で、JEITA法に皮膜安定化処理(欠陥除去、耐水性処理)を加えた条件にて、30Vの定電圧化成を行い、表9に示す駆動用電解液に、表9記載の条件で浸漬して、皮膜耐電圧の低下度合、ΔVt(初期の耐電圧−浸漬後の耐電圧、JEITA法に準ずる)と皮膜溶解度を比較評価した。
[Example 9] Confirmation of reliability with aluminum electrode foil An etching foil having the same specifications as those used in Examples 1 to 3 was subjected to three stages of heat treatment under the conditions shown in Table 10, and ammonium adipate: 150 g / liter. The liquid temperature was 85 ° C., and a constant voltage formation of 30 V was performed under the conditions in which film stabilization treatment (defect removal, water resistance treatment) was added to the JEITA method. The film was immersed under the conditions described above, and the degree of decrease in the withstand voltage of the film, ΔVt (initial withstand voltage−withstand voltage after immersion, according to JEITA method) and the film solubility were compared and evaluated.

Figure 0004576192
Figure 0004576192

Figure 0004576192
Figure 0004576192

表10に示すとおり、本発明による化成箔を使用したものについて、駆動用電解液の含水量10〜50wt%で比較すると、含水量が多くなるほど特性が若干悪くなるが、従来例よりは格段に改善されていることが分かる。
よって、本発明による均一で溶解しにくい化成皮膜は、駆動用電解液の含水量が30%を超えるアルミニウム電解コンデンサにおいても、電極箔の皮膜劣化を抑えることができ、信頼性を向上したアルミニウム電解コンデンサを提供できる。
As shown in Table 10, when the chemical conversion foil according to the present invention is used, when compared with a water content of 10 to 50 wt% of the driving electrolyte, the characteristics become slightly worse as the water content increases. It turns out that it is improving.
Therefore, the uniform and difficult-to-dissolve chemical conversion film according to the present invention can suppress deterioration of the film of the electrode foil even in an aluminum electrolytic capacitor in which the water content of the driving electrolyte exceeds 30%, thereby improving the reliability of the aluminum electrolysis. Capacitors can be provided.

不均一で孤立した形態で形成された気中酸化皮膜を示す模式図である。It is a schematic diagram which shows the air oxide film formed in the nonuniform and isolated form. エッチング箔のエッチングピット内で、水蒸気により不均一に形成された水和酸化皮膜を示す模式図である。It is a schematic diagram which shows the hydrated oxide film formed nonuniformly by water vapor | steam within the etching pit of etching foil. リン酸クロム酸溶解試験を実施した場合の化成皮膜の溶解特性を示した図である。It is the figure which showed the melt | dissolution characteristic of the chemical conversion film at the time of implementing a phosphoric acid chromic acid melt | dissolution test.

符号の説明Explanation of symbols

1 エッチングピット
2 気中酸化皮膜
3 水和酸化皮膜
A 均一であるが、全体的に溶けやすい化成皮膜の溶解曲線
B 均一で、かつ全体的に溶け難い化成皮膜の溶解曲線
C 不均一で、溶けやすい部分と溶け難い部分が混在した化成皮膜の溶解曲線
DESCRIPTION OF SYMBOLS 1 Etching pit 2 Air oxide film 3 Hydrated oxide film A Dissolution curve B of a chemical film which is uniform but easy to dissolve as a whole C Dissolution curve C of a chemical film which is uniform and difficult to dissolve as a whole Dissolution curve of a conversion coating that contains both easy-to-melt and difficult-to-melt parts

Claims (6)

アルミニウム原箔をエッチングした後、化成処理するアルミニウム電解コンデンサ用電極箔の製造方法において、
化成処理前に、エッチング箔をアルカリ性溶液中に浸漬して、水洗し、
250〜400℃で10秒〜5分間、第1の加熱処理を行い、
次に、100〜250℃で10分〜5時間、第2の加熱処理を行い、
その後、350〜500℃で10分〜5時間、第3の加熱処理を行った後、
化成処理を行うことを特徴とするアルミニウム電解コンデンサ用電極箔の製造方法。
In the method for producing an electrode foil for an aluminum electrolytic capacitor to be subjected to chemical conversion treatment after etching the aluminum raw foil,
Before chemical conversion treatment, the etching foil is immersed in an alkaline solution, washed with water,
First heat treatment is performed at 250 to 400 ° C. for 10 seconds to 5 minutes,
Next, the second heat treatment is performed at 100 to 250 ° C. for 10 minutes to 5 hours,
Then, after performing the third heat treatment at 350 to 500 ° C. for 10 minutes to 5 hours,
A method for producing an electrode foil for an aluminum electrolytic capacitor, characterized by performing a chemical conversion treatment.
請求項1記載のアルカリ性溶液が、水酸化物イオン、アルミン酸イオン、または炭酸イオンを含む溶液であることを特徴とするアルミニウム電解コンデンサ用電極箔の製造方法。   The method for producing an electrode foil for an aluminum electrolytic capacitor, wherein the alkaline solution according to claim 1 is a solution containing hydroxide ions, aluminate ions, or carbonate ions. 請求項1、2記載のアルカリ性溶液のpHが10〜12、温度が40〜60℃であることを特徴とするアルミニウム電解コンデンサ用電極箔の製造方法。   A method for producing an electrode foil for an aluminum electrolytic capacitor, wherein the alkaline solution according to claim 1 or 2 has a pH of 10 to 12 and a temperature of 40 to 60 ° C. 請求項1記載の第3の加熱処理を、露点30℃以下の雰囲気中で行うことを特徴とするアルミニウム電解コンデンサ用電極箔の製造方法。   A method for producing an electrode foil for an aluminum electrolytic capacitor, wherein the third heat treatment according to claim 1 is performed in an atmosphere having a dew point of 30 ° C or lower. 請求項1記載の第3の加熱処理を、窒素雰囲気中で行うことを特徴とするアルミニウム電解コンデンサ用電極箔の製造方法。   The method for producing an electrode foil for an aluminum electrolytic capacitor, wherein the third heat treatment according to claim 1 is performed in a nitrogen atmosphere. 請求項1記載の第3の加熱処理を、二酸化炭素雰囲気中で行うことを特徴とするアルミニウム電解コンデンサ用電極箔の製造方法。   The method for producing an electrode foil for an aluminum electrolytic capacitor, wherein the third heat treatment according to claim 1 is performed in a carbon dioxide atmosphere.
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JP4811939B2 (en) * 2006-10-14 2011-11-09 ニチコン株式会社 Formation method of electrode foil for electrolytic capacitor
JP5004844B2 (en) * 2007-05-25 2012-08-22 ニチコン株式会社 Method for producing anode foil for aluminum electrolytic capacitor
EP2866238B1 (en) 2012-06-22 2017-06-07 Showa Denko K.K. Capacitor production method
JP5798279B1 (en) * 2014-05-01 2015-10-21 昭和電工株式会社 Method for manufacturing tungsten-based capacitor element
US9704652B2 (en) 2014-05-01 2017-07-11 Showa Denko K.K. Method for manufacturing tungsten-based capacitor element
CN105702465B (en) * 2016-01-18 2017-09-29 南通海星电子股份有限公司 A kind of manufacture method of ups power electrode foil

Citations (5)

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Publication number Priority date Publication date Assignee Title
JPH04279017A (en) * 1991-03-07 1992-10-05 Elna Co Ltd Manufacture of electrode foil for aluminum electrolytic capacitor
JPH08241832A (en) * 1995-03-02 1996-09-17 Matsushita Electric Ind Co Ltd Manufacture of electrode foil for aluminum electrolytic capacitor
JPH11340102A (en) * 1998-05-25 1999-12-10 Matsushita Electric Ind Co Ltd Manufacture of electrode foil for aluminum electrolytic capacitor
JP2004006685A (en) * 2002-04-25 2004-01-08 Showa Denko Kk Method of manufacturing aluminum material for electrode of electrolytic capacitor, method of manufacturing electrode material for electrolytic capacitor, and aluminum electrolytic capacitor
JP2004100032A (en) * 2002-07-18 2004-04-02 Showa Denko Kk Manufacturing method of aluminum material for electrolytic capacitor electrode, aluminum material for electrolytic capacitor electrode, and electrode material for electrolytic capacitor

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04279017A (en) * 1991-03-07 1992-10-05 Elna Co Ltd Manufacture of electrode foil for aluminum electrolytic capacitor
JPH08241832A (en) * 1995-03-02 1996-09-17 Matsushita Electric Ind Co Ltd Manufacture of electrode foil for aluminum electrolytic capacitor
JPH11340102A (en) * 1998-05-25 1999-12-10 Matsushita Electric Ind Co Ltd Manufacture of electrode foil for aluminum electrolytic capacitor
JP2004006685A (en) * 2002-04-25 2004-01-08 Showa Denko Kk Method of manufacturing aluminum material for electrode of electrolytic capacitor, method of manufacturing electrode material for electrolytic capacitor, and aluminum electrolytic capacitor
JP2004100032A (en) * 2002-07-18 2004-04-02 Showa Denko Kk Manufacturing method of aluminum material for electrolytic capacitor electrode, aluminum material for electrolytic capacitor electrode, and electrode material for electrolytic capacitor

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