JP2009146984A - Method of manufacturing electrode foil for electrolytic capacitor - Google Patents
Method of manufacturing electrode foil for electrolytic capacitor Download PDFInfo
- Publication number
- JP2009146984A JP2009146984A JP2007320725A JP2007320725A JP2009146984A JP 2009146984 A JP2009146984 A JP 2009146984A JP 2007320725 A JP2007320725 A JP 2007320725A JP 2007320725 A JP2007320725 A JP 2007320725A JP 2009146984 A JP2009146984 A JP 2009146984A
- Authority
- JP
- Japan
- Prior art keywords
- foil
- etching
- cleaning
- treatment
- hydration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Chemical Treatment Of Metals (AREA)
Abstract
Description
本発明は、電解コンデンサ用電極箔の製造方法に関するものである。 The present invention relates to a method for producing an electrode foil for an electrolytic capacitor.
アルミニウム電解コンデンサ用電極箔は、実効面積を拡大して単位面積当たりの静電容量を増大させるため、化学的または電気化学的なエッチング処理が行われている。また、化成前に熱酸化皮膜や水和酸化皮膜を予め生成させておくと、化成箔の静電容量が高くなることが知られている(例えば、非特許文献1参照)。 The electrode foil for an aluminum electrolytic capacitor is subjected to chemical or electrochemical etching in order to increase the effective area and increase the capacitance per unit area. Moreover, it is known that when a thermal oxide film or a hydrated oxide film is generated in advance before chemical conversion, the capacitance of the chemical conversion foil increases (for example, see Non-Patent Document 1).
エッチング後の水和処理は、アルミニウム箔の表面に水酸化皮膜を形成することにより陽極酸化皮膜の膜質を向上させることを目的とするものである。通常はアルミニウム箔を高温の純水中に浸漬することにより行われているが、高温の純水中にアミンを添加したもので処理する方法(例えば、特許文献1参照)も知られている。 The purpose of the hydration treatment after etching is to improve the film quality of the anodized film by forming a hydroxide film on the surface of the aluminum foil. Usually, it is performed by immersing an aluminum foil in high-temperature pure water, but a method of treating with a high-temperature pure water to which an amine is added (for example, see Patent Document 1) is also known.
近年、電解コンデンサの小形化に伴い、単位面積当りの静電容量を増大させる必要があり、そのためエッチング後の水和処理において、より良質の水和皮膜を形成することが重要となる。しかしながら、従来の方法では、必要な静電容量を得るのに十分ではなかった。 In recent years, with the miniaturization of electrolytic capacitors, it is necessary to increase the capacitance per unit area. Therefore, it is important to form a higher quality hydrated film in the hydration treatment after etching. However, the conventional method has not been sufficient to obtain the necessary capacitance.
すなわち、温水での水和処理を低圧用のアルミニウム箔に用いた場合、水和反応の制御が困難なため、目詰まりによって表面積が減少し、静電容量の低下を引き起こす場合がある。よって、低圧用のアルミニウム箔を、温水で水和処理した場合でも、水和反応を制御でき、目詰まりによる表面積減少が抑えられ、静電容量低下が発生しない電解コンデンサ用アルミニウム電極箔の製造方法が求められていた。 That is, when a hydration treatment with warm water is used for a low-pressure aluminum foil, it is difficult to control the hydration reaction, so that the surface area may be reduced due to clogging, resulting in a decrease in capacitance. Therefore, even when a low-pressure aluminum foil is hydrated with warm water, the hydration reaction can be controlled, the surface area reduction due to clogging can be suppressed, and the capacitance reduction does not occur. Was demanded.
本発明は、上記の課題を解決するもので、アルミニウム箔をエッチング箔とするエッチング工程と、該エッチング箔を洗浄液で洗浄する洗浄工程と、洗浄後の前記エッチング箔に対して水和処理と熱処理とを行う後処理工程とを有する電解コンデンサ用電極箔の製造方法において、前記水和処理が硝酸イオンを含むアルカリ性水溶液への浸漬処理であることを特徴とする電解コンデンサ用電極箔の製造方法である。 The present invention solves the above-mentioned problem, an etching process using an aluminum foil as an etching foil, a cleaning process for cleaning the etching foil with a cleaning liquid, and a hydration treatment and a heat treatment for the etching foil after cleaning. A method for producing an electrode foil for an electrolytic capacitor, wherein the hydration treatment is an immersion treatment in an alkaline aqueous solution containing nitrate ions. is there.
また、前記アルカリ性水溶液中の硝酸イオンの濃度が0.1〜0.7mol/Lであることを特徴とする電解コンデンサ用電極箔を製造方法である。 The method for producing an electrode foil for an electrolytic capacitor is characterized in that the concentration of nitrate ions in the alkaline aqueous solution is 0.1 to 0.7 mol / L.
そして、前記硝酸イオンを含むアルカリ性水溶液のpHが、9〜11で、温度が40〜60℃であることを特徴とする電解コンデンサ用電極箔の製造方法である。 And the pH of the alkaline aqueous solution containing the said nitrate ion is 9-11, and temperature is 40-60 degreeC, It is a manufacturing method of the electrode foil for electrolytic capacitors characterized by the above-mentioned.
上記のとおり、本発明は、エッチング箔を得るエッチング工程と、該エッチング箔を洗浄する洗浄工程と、洗浄後の前記エッチング箔に対して水和処理と熱処理とを行う後処理工程とを有する電解コンデンサ用電極箔の製造工程において、水和処理を、硝酸イオンを含むアルカリ性水溶液に浸漬して行うことにより、低圧用の電極箔を、温水で水和処理した場合でも、水和反応を制御でき、目詰まりによる表面積減少を防止できるので、静電容量の高い電極箔を製造できる。 As described above, the present invention provides an electrolytic process including an etching process for obtaining an etching foil, a cleaning process for cleaning the etching foil, and a post-processing process for performing hydration treatment and heat treatment on the etched foil after cleaning. In the production process of capacitor electrode foils, hydration can be controlled by immersing in an alkaline aqueous solution containing nitrate ions, even when low pressure electrode foils are hydrated with warm water. Since the surface area reduction due to clogging can be prevented, an electrode foil having a high electrostatic capacity can be produced.
以下、本発明による実施例を説明する。まず、エッチング工程は、塩酸(10.0wt%)と硫酸(1.0wt%)とを混合した水溶液中で、波形:正弦波、周波数:50Hz、電流密度:0.5A/dm2として、アルミニウム原箔(箔幅500mm)に電気化学エッチングを行った。
次に、洗浄工程において、硝酸によるケミカル洗浄にてエッチング箔に付着した塩素分等の不純物を除去した後水洗し、続いて以下の後処理工程を経てエッチング箔を得た。
Examples according to the present invention will be described below. First, in the etching process, in an aqueous solution in which hydrochloric acid (10.0 wt%) and sulfuric acid (1.0 wt%) are mixed, the waveform is sine wave, the frequency is 50 Hz, the current density is 0.5 A / dm 2 , and aluminum is used. Electrochemical etching was performed on the original foil (foil width 500 mm).
Next, in the cleaning step, impurities such as chlorine adhering to the etching foil were removed by chemical cleaning with nitric acid, followed by washing with water, and then an etching foil was obtained through the following post-processing steps.
上記のエッチング箔を、表1に示す硝酸イオンを含むアルカリ性水溶液に浸漬後、400℃で熱処理を行った。ここで、硝酸イオンとしては硝酸ナトリウム、アルカリ性水溶液としては水酸化ナトリウム水溶液を用いた。
その後、温度85℃、8.0wt%アジピン酸アンモニウム水溶液中で20Vの電圧を印加して化成を行った後、静電容量を測定し、表1の結果を得た。
なお、水和処理の比較条件は、下記のとおりとした。
[実施例1〜5]硝酸ナトリウム濃度比較:各々0.05、0.1、0.2、0.7、1.0mol/L
[実施例6〜10]水和処理液の液温比較:各々35、40、45、60、65℃
[実施例11〜14]水和処理液のpH比較:各々8、9、11、12
The etching foil was immersed in an alkaline aqueous solution containing nitrate ions shown in Table 1, and then heat treated at 400 ° C. Here, sodium nitrate was used as nitrate ion, and sodium hydroxide aqueous solution was used as alkaline aqueous solution.
Then, after forming by applying a voltage of 20 V in a 8.0 wt% ammonium adipate aqueous solution at a temperature of 85 ° C., the capacitance was measured and the results shown in Table 1 were obtained.
The comparative conditions for the hydration treatment were as follows.
[Examples 1 to 5] Sodium nitrate concentration comparison: 0.05, 0.1, 0.2, 0.7, and 1.0 mol / L, respectively
[Examples 6 to 10] Liquid temperature comparison of hydration liquids: 35, 40, 45, 60, and 65 ° C, respectively
[Examples 11 to 14] pH comparison of hydration liquids: 8, 9, 11, 12 respectively
比較例1として、硝酸ナトリウムを含まない水酸化ナトリウム水溶液にエッチング箔を浸漬し乾燥したものに化成処理を施し、静電容量を測定した。さらに比較例2〜6として、硝酸ナトリウムを添加しない水酸化ナトリウム水溶液の液温を変えてエッチング箔を浸漬し乾燥したものに化成処理を行い、静電容量を測定した。
また、従来例として55℃の温水中に1分間浸漬して水和させ、乾燥したものに化成処理を施し、静電容量を測定した。
さらに、比較例7、8として、水和処理液を純水とし、硝酸ナトリウム濃度0.1、0.2mol/Lとし、従来例と同じpH=7に設定したものについても、同様の化成処理を行い、静電容量を測定した。
上記の測定結果を表1に示す。
As Comparative Example 1, a chemical conversion treatment was performed on a product obtained by immersing an etching foil in an aqueous sodium hydroxide solution not containing sodium nitrate and drying it, and the capacitance was measured. Furthermore, as Comparative Examples 2 to 6, the solution temperature of the sodium hydroxide aqueous solution to which sodium nitrate was not added was changed, and the etching foil was immersed and dried, then subjected to chemical conversion treatment, and the capacitance was measured.
In addition, as a conventional example, it was immersed in warm water at 55 ° C. for 1 minute to be hydrated, and the dried one was subjected to chemical conversion treatment, and the capacitance was measured.
Further, as Comparative Examples 7 and 8, the same chemical conversion treatment was applied to those in which the hydration solution was pure water, the sodium nitrate concentration was 0.1 and 0.2 mol / L, and the same pH = 7 as in the conventional example was set. And the capacitance was measured.
The measurement results are shown in Table 1.
[硝酸ナトリウム濃度比較]
表1から分かるように、比較例5の静電容量を100とした場合、実施例2〜4の硝酸ナトリウム濃度を0.1〜0.7mol/Lとすると、比較例5に比べて静電容量を向上させることができる。0.05mol/Lの実施例1では、十分な効果が得られない。また、1.0mol/Lの実施例5では、反応が過度になり静電容量が減少してしまう。
[Sodium nitrate concentration comparison]
As can be seen from Table 1, when the electrostatic capacity of Comparative Example 5 is 100, the sodium nitrate concentration of Examples 2 to 4 is 0.1 to 0.7 mol / L. Capacity can be improved. In Example 1 of 0.05 mol / L, a sufficient effect cannot be obtained. Moreover, in Example 5 of 1.0 mol / L, reaction will become excessive and an electrostatic capacitance will reduce.
[水和処理液の液温比較]
表1から分かるように、実施例7〜9の液温が40〜60℃、好ましくは45〜60℃において比較例5に比べて静電容量を向上させることができる。温度が35℃の実施例6では、十分な効果が得られない。また、温度が65℃の実施例10では、微細なピットを埋めてしまうので、静電容量が低下する。
また、硝酸ナトリウムを添加しない比較例2〜4(液温35〜45℃)、比較例6(液温65℃)では、比較例5(液温60℃)より静電容量が劣ることが確認できた。
[Comparison of hydration liquid temperature]
As can be seen from Table 1, when the liquid temperatures of Examples 7 to 9 are 40 to 60 ° C., preferably 45 to 60 ° C., the capacitance can be improved as compared with Comparative Example 5. In Example 6 where the temperature is 35 ° C., a sufficient effect cannot be obtained. Further, in Example 10 at a temperature of 65 ° C., the fine pits are filled, so that the capacitance decreases.
Further, in Comparative Examples 2 to 4 (liquid temperature of 35 to 45 ° C.) without adding sodium nitrate and Comparative Example 6 (liquid temperature of 65 ° C.), it was confirmed that the capacitance was inferior to that of Comparative Example 5 (liquid temperature of 60 ° C.). did it.
[水和処理液のpH比較]
表1から分かるように、実施例12、13のpH=9〜11では、pH=8の実施例11、pH=12の実施例14に比べて静電容量を向上させることができる。pH=8では、十分な効果が得られず、pH=12では、表面の溶解により静電容量が減少してしまう。
さらに、比較例7、8として、従来例と同じpH=7に設定し、硝酸ナトリウム濃度0.1、0.2mol/Lとしたものにおいても、従来例と比べて静電容量が改善されていないことが確認できた。
[PH comparison of hydration solution]
As can be seen from Table 1, at pH = 9 to 11 in Examples 12 and 13, the capacitance can be improved compared to Example 11 at pH = 8 and Example 14 at pH = 12. At pH = 8, a sufficient effect cannot be obtained, and at pH = 12, the capacitance decreases due to dissolution of the surface.
Furthermore, as Comparative Examples 7 and 8, the same pH as in the conventional example was set to 7, and the sodium nitrate concentrations of 0.1 and 0.2 mol / L were improved in capacitance compared to the conventional example. It was confirmed that there was no.
なお、上記実施例では、硝酸イオンとして硝酸ナトリウム、アルカリ性水溶液として水酸化ナトリウム水溶液を使用したが、これに限定されるものではなく、硝酸イオンとして硝酸、硝酸カリウム等の硝酸塩を使用することができ、アルカリ性水溶液としては水酸化カリウム水溶液、アンモニア水やアルミン酸ナトリウム水溶液、炭酸ナトリウム水溶液等を使用することができる。 In the above example, sodium nitrate was used as the nitrate ion, and the aqueous sodium hydroxide solution was used as the alkaline aqueous solution. As alkaline aqueous solution, potassium hydroxide aqueous solution, ammonia water, sodium aluminate aqueous solution, sodium carbonate aqueous solution, etc. can be used.
また、本発明は上記実施例に限定されるものではなく、エッチング箔の硝酸イオンを含むアルカリ性水溶液への浸漬による水和処理(後処理)を、公知の前処理工程、エッチング工程、洗浄工程と適宜組み合わせて行ってもよい。 Moreover, this invention is not limited to the said Example, The hydration process (post-process) by immersion to the alkaline aqueous solution containing the nitrate ion of etching foil is made into a well-known pre-processing process, an etching process, and a washing process. You may perform combining suitably.
Claims (3)
前記水和処理が硝酸イオンを含むアルカリ性水溶液への浸漬処理であることを特徴とする電解コンデンサ用電極箔の製造方法。 Electrode for electrolytic capacitors having an etching process using an aluminum foil as an etching foil, a cleaning process for cleaning the etching foil with a cleaning liquid, and a post-processing process for performing hydration treatment and heat treatment on the etched foil after cleaning. In the foil manufacturing method,
The method for producing an electrode foil for an electrolytic capacitor, wherein the hydration treatment is an immersion treatment in an alkaline aqueous solution containing nitrate ions.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007320725A JP2009146984A (en) | 2007-12-12 | 2007-12-12 | Method of manufacturing electrode foil for electrolytic capacitor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007320725A JP2009146984A (en) | 2007-12-12 | 2007-12-12 | Method of manufacturing electrode foil for electrolytic capacitor |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2009146984A true JP2009146984A (en) | 2009-07-02 |
Family
ID=40917291
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007320725A Pending JP2009146984A (en) | 2007-12-12 | 2007-12-12 | Method of manufacturing electrode foil for electrolytic capacitor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2009146984A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105702465A (en) * | 2016-01-18 | 2016-06-22 | 南通海星电子股份有限公司 | Method for manufacturing electrode foil of UPS |
CN107275079A (en) * | 2017-07-07 | 2017-10-20 | 新疆西部宏远电子有限公司 | A kind of processing method of solid-state capacitor electrode foil |
CN110783107A (en) * | 2019-11-07 | 2020-02-11 | 南通海星电子股份有限公司 | Method for manufacturing high-mechanical-property low-voltage electrode foil |
CN113764191A (en) * | 2021-09-14 | 2021-12-07 | 南通海星电子股份有限公司 | An inhibitor for Al (OH)3Method for manufacturing low-voltage electrode foil formed by crystallization |
-
2007
- 2007-12-12 JP JP2007320725A patent/JP2009146984A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105702465A (en) * | 2016-01-18 | 2016-06-22 | 南通海星电子股份有限公司 | Method for manufacturing electrode foil of UPS |
CN107275079A (en) * | 2017-07-07 | 2017-10-20 | 新疆西部宏远电子有限公司 | A kind of processing method of solid-state capacitor electrode foil |
CN110783107A (en) * | 2019-11-07 | 2020-02-11 | 南通海星电子股份有限公司 | Method for manufacturing high-mechanical-property low-voltage electrode foil |
CN110783107B (en) * | 2019-11-07 | 2021-06-29 | 南通海星电子股份有限公司 | Method for manufacturing high-mechanical-property low-voltage electrode foil |
CN113764191A (en) * | 2021-09-14 | 2021-12-07 | 南通海星电子股份有限公司 | An inhibitor for Al (OH)3Method for manufacturing low-voltage electrode foil formed by crystallization |
CN113764191B (en) * | 2021-09-14 | 2022-08-30 | 南通海星电子股份有限公司 | An inhibitor for Al (OH) 3 Method for manufacturing low-voltage electrode foil formed by crystallization |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2009146984A (en) | Method of manufacturing electrode foil for electrolytic capacitor | |
JP2009135343A (en) | Method of manufacturing aluminum electrode foil for electrolytic capacitor | |
JP2007103798A (en) | Method of forming aluminum electrode foil for electrolytic capacitor | |
JP4520385B2 (en) | Method for producing aluminum electrode foil for electrolytic capacitor | |
JP2007273839A (en) | Method for manufacturing electrode foil for electrolytic capacitor | |
JP2008140904A (en) | Manufacturing method of aluminum electrode foil for electrolytic capacitor | |
JP4811939B2 (en) | Formation method of electrode foil for electrolytic capacitor | |
JP2009105242A (en) | Method of manufacturing electrode foil for electrolytic capacitor | |
JP3582451B2 (en) | Manufacturing method of anode foil for aluminum electrolytic capacitor | |
JP4709069B2 (en) | Method for producing aluminum electrode foil for electrolytic capacitor | |
JP2007036048A (en) | Manufacturing method of electrode foil for aluminum electrolytic capacitor | |
JP4163022B2 (en) | Manufacturing method of etching foil for electrolytic capacitor | |
JP4291603B2 (en) | Method for producing anode foil for medium and high pressure aluminum electrolytic capacitor | |
JP2008112877A (en) | Manufacturing method of electrode foil for electrolytic capacitor | |
JP4690171B2 (en) | Method for producing aluminum electrode foil for electrolytic capacitor | |
JP2007273903A (en) | Method for fabricating electrode foil for electrolytic capacitor | |
JP4338444B2 (en) | Manufacturing method of etching foil for electrolytic capacitor | |
JP2005175330A (en) | Manufacturing method of anode foil for aluminum electrolytic capacitor | |
JP4758827B2 (en) | Method for producing electrode foil for electrolytic capacitor | |
JPH08241832A (en) | Manufacture of electrode foil for aluminum electrolytic capacitor | |
JP2011066032A (en) | Method of manufacturing electrode foil for electrolytic capacitor | |
JP2007067172A (en) | Manufacturing method of aluminum electrode foil for electrolytic capacitor | |
JP2009130067A (en) | Method for manufacturing electrolytic capacitor etching foil | |
TW403923B (en) | The etch method of cathode foil in the aluminum electrolysis capacitor | |
JP2005142343A (en) | Method of manufacturing electrode foil for aluminum electrolytic capacitor |