JP2004193339A - Manufacturing method of electrode foil for electrolytic capacitor - Google Patents
Manufacturing method of electrode foil for electrolytic capacitor Download PDFInfo
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- JP2004193339A JP2004193339A JP2002359513A JP2002359513A JP2004193339A JP 2004193339 A JP2004193339 A JP 2004193339A JP 2002359513 A JP2002359513 A JP 2002359513A JP 2002359513 A JP2002359513 A JP 2002359513A JP 2004193339 A JP2004193339 A JP 2004193339A
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- Prior art keywords
- etching
- foil
- electrolytic capacitor
- heat treatment
- electrode foil
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- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Abstract
Description
【0001】
【発明の属する技術分野】
本発明は、電解コンデンサ用電極箔の製造方法に関するものであり、特に洗浄方法に関するものである。
【0002】
【従来の技術】
電解コンデンサ用電極箔は、実効面積を拡大して単位面積あたりの静電容量を増大するため、一般的に塩素を含む溶液中にてエッチング処理が行われている。このエッチング処理により、箔表面に塩化物などが付着したエッチング皮膜が形成されるが、この皮膜に存在する塩化物は、化成処理工程やコンデンサ製品中で悪影響を及ぼすため、通常エッチング処理の後には電極箔の表面を水で洗浄後、硫酸などを含む溶液に浸漬させて塩化物とともにエッチング皮膜も溶解除去していた(例えば、非特許文献1参照。)。この酸などの薬品を用いた塩化物除去工程は、一般にケミカル洗浄工程と呼ばれる。
【0003】
【非特許文献1】
永田伊佐也,「電解液陰極アルミニウム電解コンデンサ」,日本蓄電器工業株式会社,平成9年2月24日,p.247−249
【0004】
【発明が解決しようとする課題】
ケミカル洗浄工程は、塩化物を除去するためエッチング皮膜を溶解するが、エッチング皮膜が均一でないため、化成処理工程で問題ない量まで塩化物を除去すると、エッチングピット部まで溶解することになり、容量が低下するという問題があった。また、エッチングピットの溶解によるアルミニウムイオンが、ケミカル洗浄に用いられる薬品を含む新たな皮膜を形成するため、その後の工程や製品信頼性に悪影響をおよぼすという問題もあった。
【0005】
【課題を解決するための手段】
上記課題を解決するため、本発明は、ケミカル洗浄工程前にエッチング皮膜の改質を行うものである。
すなわち、アルミニウムまたはアルミニウム合金箔を塩素イオンを含有するエッチング液中で電気的および/または化学的に粗面化するエッチング工程と、熱処理工程と、箔に付着した塩素イオンを除去するケミカル洗浄工程と順次処理することを特徴とする電解コンデンサ用電極箔の製造方法である。
【0006】
そして、上記熱処理工程の温度が、150〜500℃であることを特徴とする電解コンデンサ用電極箔の製造方法である。
【0007】
さらに、上記熱処理工程の時間が、30秒〜5分であることを特徴とする電解コンデンサ用電極箔の製造方法である。
【0008】
また、上記ケミカル洗浄工程の洗浄液は、硫酸、リン酸または硝酸のうち少なくとも1種を含むことが好ましい。
【0009】
【発明の実施の形態】
本発明は、電解コンデンサの電極箔の製造方法に用いられるもので、電解および/または化学エッチングにより粗面化されたエッチング箔を、ケミカル洗浄工程の前に熱処理工程を実施することによりエッチング皮膜の改質を行い、ケミカル洗浄工程でのエッチング箔の容量低下を抑制することができる。熱処理による容量低下抑制の理論は必ずしも明確ではないが、エッチングにて生成したエッチング皮膜とアルミニウム基材の界面すなわちエッチング皮膜の内側に熱処理により強固な熱酸化皮膜が形成され、熱酸化皮膜によって保護されたエッチングピットはケミカル洗浄工程で溶解せず、不要なエッチング皮膜のみが溶解し、さらに不要な皮膜も生成されにくくなるためと考えられる。
【0010】
【実施例】
以下、本願発明を具体的に説明する。純度99.86%、厚さ50μmのアルミニウム箔の硬質材を用い、塩酸を5.0wt%、リン酸を1.0wt%、塩化アルミニウムを2.0wt%を含む電解液中で40℃にて交流電解エッチングを行った。交流電流として正弦波、20Hz、電流密度を280mA/cm2とした。交流エッチング後純水で洗浄し、表1の条件で熱処理を行った。その後、45℃の3.0wt%リン酸水溶液でケミカル洗浄処理を2分間行い純水洗浄した後乾燥して電解コンデンサ用電極箔とし、未化成静電容量と10wt%アジピン酸アンモニウム水溶液中で20V印加化成後静電容量を測定し表1の結果を得た。
【0011】
【表1】
【0012】
表1よりケミカル洗浄工程前に熱処理を施した本発明による実施例1〜10は、熱処理を施さない従来例より静電容量が高いことが分かる。ここで、熱処理条件が100℃・6分の実施例1および550℃・15秒の実施例10は、その他の実施例より熱処理による効果が少ないことから、熱処理温度は150〜500℃、熱処理時間は30秒〜5分の範囲が好ましい。
【0013】
箔表面の不純物の付着について調べるために、実施例3,4,7および従来例で得られたエッチング箔を純水で10分間煮沸し、イオンクロマトグラフを用いて定量分析を行った結果とリン酸−クロム酸溶液によるエッチング箔の皮膜量の測定結果を表2に示す。
【0014】
【表2】
【0015】
表2より、熱処理した実施例は、従来例と同様に塩素イオンが除去されていることがわかる。さらに、ケミカル洗浄液の成分であるリン酸イオンは、従来例より少なく、本発明は、エッチング箔に付着した不純物を低減できることが分かる。また、エッチング箔の皮膜量も実施例は従来例より低減されている。
【0016】
本発明は実施例に限定されるものではなく、公知のエッチング方法やケミカル洗浄工程後、容量アップや皮膜安定化のための後処理工程を設けてもよい。
【0017】
【発明の効果】
上述の如く、エッチング工程とケミカル洗浄工程との間に熱処理工程を設けることにより、ケミカル洗浄工程での静電容量低下を抑制することで電極箔の高容量化が可能となり、さらに、その後の化成工程や製品信頼性に悪影響を及ぼすことが懸念されるケミカル洗浄液成分の付着やケミカル洗浄による皮膜生成を抑制することができる。[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a method for manufacturing an electrode foil for an electrolytic capacitor, and particularly to a cleaning method.
[0002]
[Prior art]
Electrode foils for electrolytic capacitors are generally subjected to etching in a solution containing chlorine in order to increase the effective area and increase the capacitance per unit area. By this etching process, an etching film with chloride etc. attached to the foil surface is formed, but chloride present in this film has a bad effect in the chemical conversion process and capacitor products. After washing the surface of the electrode foil with water, it was immersed in a solution containing sulfuric acid or the like to dissolve and remove the etching film together with the chloride (for example, see Non-Patent Document 1). This chloride removal step using a chemical such as an acid is generally called a chemical cleaning step.
[0003]
[Non-patent document 1]
Isaya Nagata, "Electrolyte Cathode Aluminum Electrolytic Capacitors", Nippon Denki Co., Ltd., February 24, 1997, p. 247-249
[0004]
[Problems to be solved by the invention]
In the chemical cleaning step, the etching film is dissolved to remove the chloride. However, there was a problem that was reduced. In addition, there is also a problem that aluminum ions due to dissolution of the etching pits form a new film containing a chemical used for chemical cleaning, which adversely affects subsequent processes and product reliability.
[0005]
[Means for Solving the Problems]
In order to solve the above-mentioned problems, the present invention is to modify an etching film before a chemical cleaning step.
That is, an etching step of electrically and / or chemically roughening an aluminum or aluminum alloy foil in an etching solution containing chlorine ions, a heat treatment step, and a chemical cleaning step of removing chloride ions attached to the foil. This is a method for producing an electrode foil for an electrolytic capacitor, which is sequentially processed.
[0006]
And the temperature of the said heat treatment process is 150-500 degreeC, It is the manufacturing method of the electrode foil for electrolytic capacitors characterized by the above-mentioned.
[0007]
Furthermore, there is provided a method for producing an electrode foil for an electrolytic capacitor, wherein the time of the heat treatment step is 30 seconds to 5 minutes.
[0008]
Further, the cleaning liquid in the chemical cleaning step preferably contains at least one of sulfuric acid, phosphoric acid and nitric acid.
[0009]
BEST MODE FOR CARRYING OUT THE INVENTION
The present invention is used in a method for manufacturing an electrode foil of an electrolytic capacitor. The etching film roughened by electrolytic and / or chemical etching is subjected to a heat treatment step before a chemical cleaning step to form an etching film. By performing the modification, it is possible to suppress a decrease in the capacity of the etching foil in the chemical cleaning step. Although the theory of suppression of capacity reduction by heat treatment is not always clear, a strong thermal oxide film is formed by heat treatment at the interface between the etching film formed by etching and the aluminum substrate, that is, inside the etching film, and is protected by the thermal oxide film It is considered that the etched pits did not dissolve in the chemical cleaning step, only the unnecessary etching film was dissolved, and the unnecessary film was hardly generated.
[0010]
【Example】
Hereinafter, the present invention will be specifically described. A hard material of aluminum foil having a purity of 99.86% and a thickness of 50 μm was used at 40 ° C. in an electrolytic solution containing 5.0 wt% of hydrochloric acid, 1.0 wt% of phosphoric acid, and 2.0 wt% of aluminum chloride. AC electrolytic etching was performed. The alternating current was a sine wave, 20 Hz, and the current density was 280 mA / cm 2 . After the AC etching, the substrate was washed with pure water and heat-treated under the conditions shown in Table 1. Thereafter, a chemical cleaning treatment was performed with a 3.0 wt% aqueous phosphoric acid solution at 45 ° C. for 2 minutes, followed by washing with pure water, followed by drying to obtain an electrode foil for an electrolytic capacitor. The capacitance was measured after application and formation, and the results in Table 1 were obtained.
[0011]
[Table 1]
[0012]
From Table 1, it can be seen that Examples 1 to 10 according to the present invention in which heat treatment was performed before the chemical cleaning step had higher capacitance than the conventional example in which no heat treatment was performed. Here, in the heat treatment conditions of Example 1 at 100 ° C. for 6 minutes and Example 10 at 550 ° C. for 15 seconds, the heat treatment effect is less than that of the other examples. Is preferably in the range of 30 seconds to 5 minutes.
[0013]
In order to investigate the adhesion of impurities on the foil surface, the etching foils obtained in Examples 3, 4, and 7 and the conventional example were boiled in pure water for 10 minutes, and the results of quantitative analysis using ion chromatography and phosphorus were performed. Table 2 shows the measurement results of the film amount of the etching foil with the acid-chromic acid solution.
[0014]
[Table 2]
[0015]
From Table 2, it can be seen that in the heat-treated example, chlorine ions were removed as in the conventional example. Furthermore, the amount of phosphate ions, which is a component of the chemical cleaning liquid, is smaller than that of the conventional example, and it can be seen that the present invention can reduce impurities attached to the etching foil. In addition, the coating amount of the etching foil is also reduced in the embodiment compared to the conventional example.
[0016]
The present invention is not limited to the embodiments, and a post-treatment step for increasing the capacity or stabilizing the film may be provided after a known etching method or a chemical cleaning step.
[0017]
【The invention's effect】
As described above, by providing a heat treatment step between the etching step and the chemical cleaning step, it is possible to increase the capacity of the electrode foil by suppressing a decrease in capacitance in the chemical cleaning step. It is possible to suppress the adhesion of a chemical cleaning liquid component, which is likely to adversely affect the process and product reliability, and the formation of a film due to the chemical cleaning.
Claims (3)
Priority Applications (1)
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JP2002359513A JP2004193339A (en) | 2002-12-11 | 2002-12-11 | Manufacturing method of electrode foil for electrolytic capacitor |
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JP2002359513A JP2004193339A (en) | 2002-12-11 | 2002-12-11 | Manufacturing method of electrode foil for electrolytic capacitor |
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JP2004193339A true JP2004193339A (en) | 2004-07-08 |
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JP2002359513A Pending JP2004193339A (en) | 2002-12-11 | 2002-12-11 | Manufacturing method of electrode foil for electrolytic capacitor |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010021376A (en) * | 2008-07-11 | 2010-01-28 | Nichicon Corp | Production process of electrode foil for electrolytic capacitor |
WO2019227903A1 (en) * | 2018-05-31 | 2019-12-05 | 南通海星电子股份有限公司 | Manufacturing method for middle-high voltage corrosion foil for aluminum electrolytic capacitor |
-
2002
- 2002-12-11 JP JP2002359513A patent/JP2004193339A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010021376A (en) * | 2008-07-11 | 2010-01-28 | Nichicon Corp | Production process of electrode foil for electrolytic capacitor |
WO2019227903A1 (en) * | 2018-05-31 | 2019-12-05 | 南通海星电子股份有限公司 | Manufacturing method for middle-high voltage corrosion foil for aluminum electrolytic capacitor |
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