JP2009532864A5 - - Google Patents

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Publication number
JP2009532864A5
JP2009532864A5 JP2009502878A JP2009502878A JP2009532864A5 JP 2009532864 A5 JP2009532864 A5 JP 2009532864A5 JP 2009502878 A JP2009502878 A JP 2009502878A JP 2009502878 A JP2009502878 A JP 2009502878A JP 2009532864 A5 JP2009532864 A5 JP 2009532864A5
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JP
Japan
Prior art keywords
optical
output pulse
optical delay
laser
resonators
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2009502878A
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English (en)
Japanese (ja)
Other versions
JP5738528B2 (ja
JP2009532864A (ja
Filing date
Publication date
Priority claimed from US11/394,512 external-priority patent/US7415056B2/en
Application filed filed Critical
Publication of JP2009532864A publication Critical patent/JP2009532864A/ja
Publication of JP2009532864A5 publication Critical patent/JP2009532864A5/ja
Application granted granted Critical
Publication of JP5738528B2 publication Critical patent/JP5738528B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2009502878A 2006-03-31 2007-03-23 共焦点パルス伸長器 Active JP5738528B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/394,512 US7415056B2 (en) 2006-03-31 2006-03-31 Confocal pulse stretcher
US11/394,512 2006-03-31
PCT/US2007/007201 WO2007126693A2 (en) 2006-03-31 2007-03-23 Confocal pulse stretcher

Publications (3)

Publication Number Publication Date
JP2009532864A JP2009532864A (ja) 2009-09-10
JP2009532864A5 true JP2009532864A5 (enExample) 2010-05-13
JP5738528B2 JP5738528B2 (ja) 2015-06-24

Family

ID=38575191

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009502878A Active JP5738528B2 (ja) 2006-03-31 2007-03-23 共焦点パルス伸長器

Country Status (5)

Country Link
US (1) US7415056B2 (enExample)
JP (1) JP5738528B2 (enExample)
KR (1) KR101357012B1 (enExample)
TW (1) TWI343681B (enExample)
WO (1) WO2007126693A2 (enExample)

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US7856044B2 (en) * 1999-05-10 2010-12-21 Cymer, Inc. Extendable electrode for gas discharge laser
US7897947B2 (en) * 2007-07-13 2011-03-01 Cymer, Inc. Laser produced plasma EUV light source having a droplet stream produced using a modulated disturbance wave
US8653437B2 (en) 2010-10-04 2014-02-18 Cymer, Llc EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods
US7671349B2 (en) 2003-04-08 2010-03-02 Cymer, Inc. Laser produced plasma EUV light source
US8654438B2 (en) 2010-06-24 2014-02-18 Cymer, Llc Master oscillator-power amplifier drive laser with pre-pulse for EUV light source
US7643529B2 (en) 2005-11-01 2010-01-05 Cymer, Inc. Laser system
EP1952493A4 (en) * 2005-11-01 2017-05-10 Cymer, LLC Laser system
US7885309B2 (en) * 2005-11-01 2011-02-08 Cymer, Inc. Laser system
US7999915B2 (en) * 2005-11-01 2011-08-16 Cymer, Inc. Laser system
US7778302B2 (en) * 2005-11-01 2010-08-17 Cymer, Inc. Laser system
US20090296755A1 (en) * 2005-11-01 2009-12-03 Cymer, Inc. Laser system
US7630424B2 (en) * 2005-11-01 2009-12-08 Cymer, Inc. Laser system
US7715459B2 (en) * 2005-11-01 2010-05-11 Cymer, Inc. Laser system
US7920616B2 (en) * 2005-11-01 2011-04-05 Cymer, Inc. Laser system
US20090296758A1 (en) * 2005-11-01 2009-12-03 Cymer, Inc. Laser system
US7746913B2 (en) 2005-11-01 2010-06-29 Cymer, Inc. Laser system
US8158960B2 (en) 2007-07-13 2012-04-17 Cymer, Inc. Laser produced plasma EUV light source
US7620080B2 (en) * 2007-08-23 2009-11-17 Corning Incorporated Laser pulse conditioning
US7812329B2 (en) * 2007-12-14 2010-10-12 Cymer, Inc. System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus
US7655925B2 (en) * 2007-08-31 2010-02-02 Cymer, Inc. Gas management system for a laser-produced-plasma EUV light source
US20090250637A1 (en) * 2008-04-02 2009-10-08 Cymer, Inc. System and methods for filtering out-of-band radiation in EUV exposure tools
DE102008036572B4 (de) * 2008-07-31 2013-12-05 Carl Zeiss Laser Optics Gmbh Vorrichtung zum Bearbeiten von optischen Impulsen
US8519366B2 (en) * 2008-08-06 2013-08-27 Cymer, Inc. Debris protection system having a magnetic field for an EUV light source
JP5687488B2 (ja) 2010-02-22 2015-03-18 ギガフォトン株式会社 極端紫外光生成装置
US8462425B2 (en) 2010-10-18 2013-06-11 Cymer, Inc. Oscillator-amplifier drive laser with seed protection for an EUV light source
KR102163606B1 (ko) * 2013-03-27 2020-10-08 고쿠리쓰다이가쿠호진 규슈다이가쿠 레이저 어닐링 장치
WO2015008405A1 (ja) * 2013-07-18 2015-01-22 三菱電機株式会社 ガスレーザ装置
US9525265B2 (en) * 2014-06-20 2016-12-20 Kla-Tencor Corporation Laser repetition rate multiplier and flat-top beam profile generators using mirrors and/or prisms
US9357625B2 (en) * 2014-07-07 2016-05-31 Asml Netherlands B.V. Extreme ultraviolet light source
CN104319615B (zh) * 2014-11-02 2017-12-26 中国科学院光电技术研究所 一种基于双分束元件的准分子激光脉冲展宽装置
US9709897B2 (en) 2015-10-28 2017-07-18 Cymer, Llc Polarization control of pulsed light beam
JP6762364B2 (ja) * 2016-07-26 2020-09-30 ギガフォトン株式会社 レーザシステム
CN109143559B (zh) * 2018-10-23 2023-07-25 广东华奕激光技术有限公司 一种小型化的脉冲展宽器
TW202522128A (zh) 2019-10-16 2025-06-01 美商希瑪有限責任公司 用於減少光斑之堆疊共焦脈衝拉伸器系列
CN118104087A (zh) * 2021-11-24 2024-05-28 极光先进雷射株式会社 脉冲扩展器和电子器件的制造方法

Family Cites Families (13)

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Publication number Priority date Publication date Assignee Title
JP2783890B2 (ja) * 1990-03-08 1998-08-06 東京電力株式会社 レーザ発振器
US6067311A (en) 1998-09-04 2000-05-23 Cymer, Inc. Excimer laser with pulse multiplier
US6625191B2 (en) 1999-12-10 2003-09-23 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6535531B1 (en) 2001-11-29 2003-03-18 Cymer, Inc. Gas discharge laser with pulse multiplier
US6693939B2 (en) * 2001-01-29 2004-02-17 Cymer, Inc. Laser lithography light source with beam delivery
US6704340B2 (en) 2001-01-29 2004-03-09 Cymer, Inc. Lithography laser system with in-place alignment tool
US7230964B2 (en) * 2001-04-09 2007-06-12 Cymer, Inc. Lithography laser with beam delivery and beam pointing control
US7061959B2 (en) 2001-04-18 2006-06-13 Tcz Gmbh Laser thin film poly-silicon annealing system
US7167499B2 (en) 2001-04-18 2007-01-23 Tcz Pte. Ltd. Very high energy, high stability gas discharge laser surface treatment system
US7009140B2 (en) 2001-04-18 2006-03-07 Cymer, Inc. Laser thin film poly-silicon annealing optical system
US6928093B2 (en) * 2002-05-07 2005-08-09 Cymer, Inc. Long delay and high TIS pulse stretcher
US6798812B2 (en) 2002-01-23 2004-09-28 Cymer, Inc. Two chamber F2 laser system with F2 pressure based line selection
JP4416481B2 (ja) 2003-11-18 2010-02-17 ギガフォトン株式会社 光学的パルス伸長器および露光用放電励起ガスレーザ装置

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