TWI343681B - Confocal pulse stretcher - Google Patents

Confocal pulse stretcher Download PDF

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Publication number
TWI343681B
TWI343681B TW096107346A TW96107346A TWI343681B TW I343681 B TWI343681 B TW I343681B TW 096107346 A TW096107346 A TW 096107346A TW 96107346 A TW96107346 A TW 96107346A TW I343681 B TWI343681 B TW I343681B
Authority
TW
Taiwan
Prior art keywords
gas discharge
laser system
discharge laser
curvature
mirror
Prior art date
Application number
TW096107346A
Other languages
English (en)
Chinese (zh)
Other versions
TW200742208A (en
Inventor
Palash P Das
Thomas Hofmann
Gang Lei
Original Assignee
Cymer Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cymer Inc filed Critical Cymer Inc
Publication of TW200742208A publication Critical patent/TW200742208A/zh
Application granted granted Critical
Publication of TWI343681B publication Critical patent/TWI343681B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0057—Temporal shaping, e.g. pulse compression, frequency chirping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Lasers (AREA)
TW096107346A 2006-03-31 2007-03-03 Confocal pulse stretcher TWI343681B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/394,512 US7415056B2 (en) 2006-03-31 2006-03-31 Confocal pulse stretcher

Publications (2)

Publication Number Publication Date
TW200742208A TW200742208A (en) 2007-11-01
TWI343681B true TWI343681B (en) 2011-06-11

Family

ID=38575191

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096107346A TWI343681B (en) 2006-03-31 2007-03-03 Confocal pulse stretcher

Country Status (5)

Country Link
US (1) US7415056B2 (enExample)
JP (1) JP5738528B2 (enExample)
KR (1) KR101357012B1 (enExample)
TW (1) TWI343681B (enExample)
WO (1) WO2007126693A2 (enExample)

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* Cited by examiner, † Cited by third party
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US7856044B2 (en) * 1999-05-10 2010-12-21 Cymer, Inc. Extendable electrode for gas discharge laser
US7897947B2 (en) * 2007-07-13 2011-03-01 Cymer, Inc. Laser produced plasma EUV light source having a droplet stream produced using a modulated disturbance wave
US8653437B2 (en) 2010-10-04 2014-02-18 Cymer, Llc EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods
US7671349B2 (en) 2003-04-08 2010-03-02 Cymer, Inc. Laser produced plasma EUV light source
US8654438B2 (en) 2010-06-24 2014-02-18 Cymer, Llc Master oscillator-power amplifier drive laser with pre-pulse for EUV light source
US7643529B2 (en) 2005-11-01 2010-01-05 Cymer, Inc. Laser system
EP1952493A4 (en) * 2005-11-01 2017-05-10 Cymer, LLC Laser system
US7885309B2 (en) * 2005-11-01 2011-02-08 Cymer, Inc. Laser system
US7999915B2 (en) * 2005-11-01 2011-08-16 Cymer, Inc. Laser system
US7778302B2 (en) * 2005-11-01 2010-08-17 Cymer, Inc. Laser system
US20090296755A1 (en) * 2005-11-01 2009-12-03 Cymer, Inc. Laser system
US7630424B2 (en) * 2005-11-01 2009-12-08 Cymer, Inc. Laser system
US7715459B2 (en) * 2005-11-01 2010-05-11 Cymer, Inc. Laser system
US7920616B2 (en) * 2005-11-01 2011-04-05 Cymer, Inc. Laser system
US20090296758A1 (en) * 2005-11-01 2009-12-03 Cymer, Inc. Laser system
US7746913B2 (en) 2005-11-01 2010-06-29 Cymer, Inc. Laser system
US8158960B2 (en) 2007-07-13 2012-04-17 Cymer, Inc. Laser produced plasma EUV light source
US7620080B2 (en) * 2007-08-23 2009-11-17 Corning Incorporated Laser pulse conditioning
US7812329B2 (en) * 2007-12-14 2010-10-12 Cymer, Inc. System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus
US7655925B2 (en) * 2007-08-31 2010-02-02 Cymer, Inc. Gas management system for a laser-produced-plasma EUV light source
US20090250637A1 (en) * 2008-04-02 2009-10-08 Cymer, Inc. System and methods for filtering out-of-band radiation in EUV exposure tools
DE102008036572B4 (de) * 2008-07-31 2013-12-05 Carl Zeiss Laser Optics Gmbh Vorrichtung zum Bearbeiten von optischen Impulsen
US8519366B2 (en) * 2008-08-06 2013-08-27 Cymer, Inc. Debris protection system having a magnetic field for an EUV light source
JP5687488B2 (ja) 2010-02-22 2015-03-18 ギガフォトン株式会社 極端紫外光生成装置
US8462425B2 (en) 2010-10-18 2013-06-11 Cymer, Inc. Oscillator-amplifier drive laser with seed protection for an EUV light source
KR102163606B1 (ko) * 2013-03-27 2020-10-08 고쿠리쓰다이가쿠호진 규슈다이가쿠 레이저 어닐링 장치
WO2015008405A1 (ja) * 2013-07-18 2015-01-22 三菱電機株式会社 ガスレーザ装置
US9525265B2 (en) * 2014-06-20 2016-12-20 Kla-Tencor Corporation Laser repetition rate multiplier and flat-top beam profile generators using mirrors and/or prisms
US9357625B2 (en) * 2014-07-07 2016-05-31 Asml Netherlands B.V. Extreme ultraviolet light source
CN104319615B (zh) * 2014-11-02 2017-12-26 中国科学院光电技术研究所 一种基于双分束元件的准分子激光脉冲展宽装置
US9709897B2 (en) 2015-10-28 2017-07-18 Cymer, Llc Polarization control of pulsed light beam
JP6762364B2 (ja) * 2016-07-26 2020-09-30 ギガフォトン株式会社 レーザシステム
CN109143559B (zh) * 2018-10-23 2023-07-25 广东华奕激光技术有限公司 一种小型化的脉冲展宽器
TW202522128A (zh) 2019-10-16 2025-06-01 美商希瑪有限責任公司 用於減少光斑之堆疊共焦脈衝拉伸器系列
CN118104087A (zh) * 2021-11-24 2024-05-28 极光先进雷射株式会社 脉冲扩展器和电子器件的制造方法

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JP2783890B2 (ja) * 1990-03-08 1998-08-06 東京電力株式会社 レーザ発振器
US6067311A (en) 1998-09-04 2000-05-23 Cymer, Inc. Excimer laser with pulse multiplier
US6625191B2 (en) 1999-12-10 2003-09-23 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6535531B1 (en) 2001-11-29 2003-03-18 Cymer, Inc. Gas discharge laser with pulse multiplier
US6693939B2 (en) * 2001-01-29 2004-02-17 Cymer, Inc. Laser lithography light source with beam delivery
US6704340B2 (en) 2001-01-29 2004-03-09 Cymer, Inc. Lithography laser system with in-place alignment tool
US7230964B2 (en) * 2001-04-09 2007-06-12 Cymer, Inc. Lithography laser with beam delivery and beam pointing control
US7061959B2 (en) 2001-04-18 2006-06-13 Tcz Gmbh Laser thin film poly-silicon annealing system
US7167499B2 (en) 2001-04-18 2007-01-23 Tcz Pte. Ltd. Very high energy, high stability gas discharge laser surface treatment system
US7009140B2 (en) 2001-04-18 2006-03-07 Cymer, Inc. Laser thin film poly-silicon annealing optical system
US6928093B2 (en) * 2002-05-07 2005-08-09 Cymer, Inc. Long delay and high TIS pulse stretcher
US6798812B2 (en) 2002-01-23 2004-09-28 Cymer, Inc. Two chamber F2 laser system with F2 pressure based line selection
JP4416481B2 (ja) 2003-11-18 2010-02-17 ギガフォトン株式会社 光学的パルス伸長器および露光用放電励起ガスレーザ装置

Also Published As

Publication number Publication date
KR20080110863A (ko) 2008-12-19
TW200742208A (en) 2007-11-01
KR101357012B1 (ko) 2014-02-03
JP5738528B2 (ja) 2015-06-24
WO2007126693A2 (en) 2007-11-08
WO2007126693A3 (en) 2008-11-27
US7415056B2 (en) 2008-08-19
JP2009532864A (ja) 2009-09-10
US20070237192A1 (en) 2007-10-11

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