JP2009528663A - 閉じ込められた層を製造するための方法、及び同方法によって製造されたデバイス - Google Patents

閉じ込められた層を製造するための方法、及び同方法によって製造されたデバイス Download PDF

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Publication number
JP2009528663A
JP2009528663A JP2008557249A JP2008557249A JP2009528663A JP 2009528663 A JP2009528663 A JP 2009528663A JP 2008557249 A JP2008557249 A JP 2008557249A JP 2008557249 A JP2008557249 A JP 2008557249A JP 2009528663 A JP2009528663 A JP 2009528663A
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JP
Japan
Prior art keywords
layer
rsa
radiation
organic active
active layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2008557249A
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English (en)
Japanese (ja)
Inventor
デー．ラング チャールズ
ソウリッチ スティーブン
ケイ．テイラー チャールズ
アール．アントン ダグラス
ゲーナーガ アルベルト
エー．サント ポール
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of JP2009528663A publication Critical patent/JP2009528663A/ja
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • H10K71/135—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04L—TRANSMISSION OF DIGITAL INFORMATION, e.g. TELEGRAPHIC COMMUNICATION
    • H04L9/00—Cryptographic mechanisms or cryptographic arrangements for secret or secure communications; Network security protocols
    • H04L9/30—Public key, i.e. encryption algorithm being computationally infeasible to invert or user's encryption keys not requiring secrecy
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computing Systems (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Security & Cryptography (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Signal Processing (AREA)
  • Electroluminescent Light Sources (AREA)
  • Thin Film Transistor (AREA)
  • Solid State Image Pick-Up Elements (AREA)
JP2008557249A 2006-03-02 2006-04-10 閉じ込められた層を製造するための方法、及び同方法によって製造されたデバイス Pending JP2009528663A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US75154906P 2006-03-02 2006-03-02
PCT/US2006/013118 WO2007106101A2 (en) 2006-03-02 2006-04-10 Process for making contained layers and devices made with same

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2012264562A Division JP2013048118A (ja) 2006-03-02 2012-12-03 閉じ込められた層を製造するための方法、及び同方法によって製造されたデバイス

Publications (1)

Publication Number Publication Date
JP2009528663A true JP2009528663A (ja) 2009-08-06

Family

ID=38470737

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2008557249A Pending JP2009528663A (ja) 2006-03-02 2006-04-10 閉じ込められた層を製造するための方法、及び同方法によって製造されたデバイス
JP2012264562A Pending JP2013048118A (ja) 2006-03-02 2012-12-03 閉じ込められた層を製造するための方法、及び同方法によって製造されたデバイス

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2012264562A Pending JP2013048118A (ja) 2006-03-02 2012-12-03 閉じ込められた層を製造するための方法、及び同方法によって製造されたデバイス

Country Status (6)

Country Link
EP (1) EP1989818A4 (zh)
JP (2) JP2009528663A (zh)
KR (1) KR20080108100A (zh)
CN (1) CN101507177B (zh)
TW (1) TW200735435A (zh)
WO (1) WO2007106101A2 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018119164A (ja) * 2013-10-31 2018-08-02 カティーバ， インコーポレイテッド インクジェット印刷のためのポリチオフェン含有インク組成物

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20100106309A (ko) * 2007-10-15 2010-10-01 이 아이 듀폰 디 네모아 앤드 캄파니 용액 처리된 전자 소자
KR20100094475A (ko) * 2007-10-26 2010-08-26 이 아이 듀폰 디 네모아 앤드 캄파니 격납된 층을 제조하기 위한 방법 및 재료, 및 이를 사용하여 제조된 소자
US8772774B2 (en) 2007-12-14 2014-07-08 E. I. Du Pont De Nemours And Company Backplane structures for organic light emitting electronic devices using a TFT substrate

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5416203A (en) * 1977-07-07 1979-02-06 Nippon Paint Co Ltd Dry making method of photosensitive resin plate
JPH09203803A (ja) * 1996-01-25 1997-08-05 Asahi Glass Co Ltd カラーフィルタの製造方法及びそれを用いた液晶表示素子
JP2001237069A (ja) * 2000-02-23 2001-08-31 Dainippon Printing Co Ltd Ｅｌ素子およびその製造方法
JP2004177793A (ja) * 2002-11-28 2004-06-24 Seiko Epson Corp 微細構造物の製造方法およびこの微細構造物の製造方法を用いて製造された自発光素子、光学素子、デバイス並びにこのデバイスを備えた電子機器
JP2004199086A (ja) * 1997-08-08 2004-07-15 Dainippon Printing Co Ltd パターン形成体およびパターン形成方法
JP2004234901A (ja) * 2003-01-28 2004-08-19 Seiko Epson Corp ディスプレイ基板、有機ｅｌ表示装置、ディスプレイ基板の製造方法および電子機器
JP2005093751A (ja) * 2003-09-18 2005-04-07 Dainippon Printing Co Ltd パターニング用基板の製造方法およびパターニング用基板

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5435887A (en) * 1993-11-03 1995-07-25 Massachusetts Institute Of Technology Methods for the fabrication of microstructure arrays
US5392980A (en) * 1993-12-29 1995-02-28 Dell Usa, L.P. Method and apparatus for reworking ball grid array packages to allow reuse of functional devices
DE19500912A1 (de) * 1995-01-13 1996-07-18 Basf Ag Elektrolumineszierende Anordnung
KR20010085420A (ko) * 2000-02-23 2001-09-07 기타지마 요시토시 전계발광소자와 그 제조방법
US6656611B2 (en) * 2001-07-20 2003-12-02 Osram Opto Semiconductors Gmbh Structure-defining material for OLEDs
JP4120584B2 (ja) * 2001-07-26 2008-07-16 日産化学工業株式会社 ポリアミック酸樹脂組成物
JP4231645B2 (ja) * 2001-12-12 2009-03-04 大日本印刷株式会社 パターン形成体の製造方法
US6955773B2 (en) * 2002-02-28 2005-10-18 E.I. Du Pont De Nemours And Company Polymer buffer layers and their use in light-emitting diodes
JP4092261B2 (ja) * 2002-08-02 2008-05-28 三星エスディアイ株式会社 基板の製造方法及び有機エレクトロルミネッセンス素子の製造方法
EP1560068B1 (en) * 2002-11-06 2008-01-23 Asahi Glass Company Ltd. Barrier rib and its method of preparation
CN100365803C (zh) * 2003-02-06 2008-01-30 株式会社新王材料 气密封用盖帽及其制造方法
US7067841B2 (en) * 2004-04-22 2006-06-27 E. I. Du Pont De Nemours And Company Organic electronic devices

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5416203A (en) * 1977-07-07 1979-02-06 Nippon Paint Co Ltd Dry making method of photosensitive resin plate
JPH09203803A (ja) * 1996-01-25 1997-08-05 Asahi Glass Co Ltd カラーフィルタの製造方法及びそれを用いた液晶表示素子
JP2004199086A (ja) * 1997-08-08 2004-07-15 Dainippon Printing Co Ltd パターン形成体およびパターン形成方法
JP2001237069A (ja) * 2000-02-23 2001-08-31 Dainippon Printing Co Ltd Ｅｌ素子およびその製造方法
JP2004177793A (ja) * 2002-11-28 2004-06-24 Seiko Epson Corp 微細構造物の製造方法およびこの微細構造物の製造方法を用いて製造された自発光素子、光学素子、デバイス並びにこのデバイスを備えた電子機器
JP2004234901A (ja) * 2003-01-28 2004-08-19 Seiko Epson Corp ディスプレイ基板、有機ｅｌ表示装置、ディスプレイ基板の製造方法および電子機器
JP2005093751A (ja) * 2003-09-18 2005-04-07 Dainippon Printing Co Ltd パターニング用基板の製造方法およびパターニング用基板

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018119164A (ja) * 2013-10-31 2018-08-02 カティーバ， インコーポレイテッド インクジェット印刷のためのポリチオフェン含有インク組成物

Also Published As

Publication number Publication date
CN101507177A (zh) 2009-08-12
CN101507177B (zh) 2014-08-13
EP1989818A4 (en) 2011-05-18
JP2013048118A (ja) 2013-03-07
WO2007106101A3 (en) 2009-04-16
TW200735435A (en) 2007-09-16
KR20080108100A (ko) 2008-12-11
EP1989818A2 (en) 2008-11-12
WO2007106101A2 (en) 2007-09-20

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