JP2009527926A5 - - Google Patents

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Publication number
JP2009527926A5
JP2009527926A5 JP2008556487A JP2008556487A JP2009527926A5 JP 2009527926 A5 JP2009527926 A5 JP 2009527926A5 JP 2008556487 A JP2008556487 A JP 2008556487A JP 2008556487 A JP2008556487 A JP 2008556487A JP 2009527926 A5 JP2009527926 A5 JP 2009527926A5
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JP
Japan
Prior art keywords
implant
source
integrated circuit
region
indicator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2008556487A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009527926A (ja
Filing date
Publication date
Priority claimed from US11/360,925 external-priority patent/US7635920B2/en
Application filed filed Critical
Publication of JP2009527926A publication Critical patent/JP2009527926A/ja
Publication of JP2009527926A5 publication Critical patent/JP2009527926A5/ja
Pending legal-status Critical Current

Links

JP2008556487A 2006-02-23 2007-01-09 集積回路製造時に方向性を表示するための方法と装置 Pending JP2009527926A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/360,925 US7635920B2 (en) 2006-02-23 2006-02-23 Method and apparatus for indicating directionality in integrated circuit manufacturing
PCT/US2007/060257 WO2007100929A2 (en) 2006-02-23 2007-01-09 Method and apparatus for indicating directionality in integrated circuit manufacturing

Publications (2)

Publication Number Publication Date
JP2009527926A JP2009527926A (ja) 2009-07-30
JP2009527926A5 true JP2009527926A5 (enExample) 2011-08-04

Family

ID=38427329

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008556487A Pending JP2009527926A (ja) 2006-02-23 2007-01-09 集積回路製造時に方向性を表示するための方法と装置

Country Status (6)

Country Link
US (2) US7635920B2 (enExample)
JP (1) JP2009527926A (enExample)
KR (1) KR101357906B1 (enExample)
CN (1) CN101438405B (enExample)
TW (1) TWI433207B (enExample)
WO (1) WO2007100929A2 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI368963B (en) * 2008-07-18 2012-07-21 Inotera Memories Inc An analysis method of wafer's ion implant
US7829939B1 (en) * 2009-04-20 2010-11-09 International Business Machines Corporation MOSFET including epitaxial halo region
JP5561823B2 (ja) * 2010-02-05 2014-07-30 ルネサスエレクトロニクス株式会社 半導体装置の製造方法および半導体装置
CN102509726A (zh) * 2011-11-14 2012-06-20 上海宏力半导体制造有限公司 具有加密结构的ip模块及其制造方法
TWI466296B (zh) * 2012-07-31 2014-12-21 瑞昱半導體股份有限公司 半導體元件及其形成方法
US20150087131A1 (en) * 2013-09-20 2015-03-26 Infineon Technologies Ag Method for processing a chip
US10002800B2 (en) * 2016-05-13 2018-06-19 International Business Machines Corporation Prevention of charging damage in full-depletion devices
CN109950133B (zh) * 2019-03-14 2021-07-27 北京大学深圳研究生院 一种便于识别的碳化硅外延片圆片制备方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60195923A (ja) * 1984-03-17 1985-10-04 Sumitomo Electric Ind Ltd メサ方向を表示した半導体ウエハおよびチツプ並びにその製法
JPS62113462A (ja) * 1985-11-12 1987-05-25 Nec Corp 半導体装置
US4973217A (en) 1987-02-09 1990-11-27 Svg Lithography Systems, Inc. Wafer handling system
JPH06350042A (ja) * 1993-06-08 1994-12-22 Sony Corp トランジスタの製造方法
US5686345A (en) 1996-01-30 1997-11-11 International Business Machines Corporation Trench mask for forming deep trenches in a semiconductor substrate, and method of using same
US5742041A (en) 1996-05-29 1998-04-21 Intermec Corporation Method and apparatus for locating and decoding machine-readable symbols, including data matrix symbols
US6190980B1 (en) 1998-09-10 2001-02-20 Advanced Micro Devices Method of tilted implant for pocket, halo and source/drain extension in ULSI dense structures
KR100289810B1 (ko) * 1999-05-10 2001-05-15 김영환 반도체 소자 제조를 위한 할로 이온 주입 방법
US6194278B1 (en) * 1999-06-21 2001-02-27 Infineon Technologies North America Corp. Device performance by employing an improved method for forming halo implants
US6842538B2 (en) 2001-03-23 2005-01-11 Shih-Jong J. Lee Automatic detection of alignment or registration marks
US6742708B2 (en) 2001-06-07 2004-06-01 Hewlett-Packard Development Company, L.P. Fiducial mark patterns for graphical bar codes
US6745708B2 (en) * 2001-12-19 2004-06-08 Conocophillips Company Method and apparatus for improving the efficiency of a combustion device
JP2004103612A (ja) * 2002-09-04 2004-04-02 Toshiba Corp 半導体装置とその製造方法
US6911660B2 (en) 2002-10-02 2005-06-28 Varian Semiconductor Equipment Associates, Inc. Method of measuring ion beam angles
US6833307B1 (en) * 2002-10-30 2004-12-21 Advanced Micro Devices, Inc. Method for manufacturing a semiconductor component having an early halo implant
US7138318B2 (en) * 2003-05-28 2006-11-21 Advanced Micro Devices, Inc. Method of fabricating body-tied SOI transistor having halo implant region underlying hammerhead portion of gate

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