JP2009514223A5 - - Google Patents

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Publication number
JP2009514223A5
JP2009514223A5 JP2008537779A JP2008537779A JP2009514223A5 JP 2009514223 A5 JP2009514223 A5 JP 2009514223A5 JP 2008537779 A JP2008537779 A JP 2008537779A JP 2008537779 A JP2008537779 A JP 2008537779A JP 2009514223 A5 JP2009514223 A5 JP 2009514223A5
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JP
Japan
Prior art keywords
thin film
semiconductor material
electron
organic
organic semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2008537779A
Other languages
English (en)
Japanese (ja)
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JP2009514223A (ja
Filing date
Publication date
Priority claimed from US11/263,111 external-priority patent/US7629605B2/en
Application filed filed Critical
Publication of JP2009514223A publication Critical patent/JP2009514223A/ja
Publication of JP2009514223A5 publication Critical patent/JP2009514223A5/ja
Pending legal-status Critical Current

Links

JP2008537779A 2005-10-31 2006-10-16 薄膜トランジスタのためのn型半導体材料 Pending JP2009514223A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/263,111 US7629605B2 (en) 2005-10-31 2005-10-31 N-type semiconductor materials for thin film transistors
PCT/US2006/040750 WO2007053303A2 (en) 2005-10-31 2006-10-16 N-type semiconductor materials for thin film transistors

Publications (2)

Publication Number Publication Date
JP2009514223A JP2009514223A (ja) 2009-04-02
JP2009514223A5 true JP2009514223A5 (https=) 2010-12-16

Family

ID=37882142

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008537779A Pending JP2009514223A (ja) 2005-10-31 2006-10-16 薄膜トランジスタのためのn型半導体材料

Country Status (6)

Country Link
US (2) US7629605B2 (https=)
EP (1) EP1943691A2 (https=)
JP (1) JP2009514223A (https=)
KR (1) KR20080063803A (https=)
TW (1) TW200729571A (https=)
WO (1) WO2007053303A2 (https=)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4921982B2 (ja) * 2004-01-26 2012-04-25 ノースウエスタン ユニバーシティ ペリレンn型半導体及び関連装置
US7629605B2 (en) * 2005-10-31 2009-12-08 Eastman Kodak Company N-type semiconductor materials for thin film transistors
US7422777B2 (en) * 2005-11-22 2008-09-09 Eastman Kodak Company N,N′-dicycloalkyl-substituted naphthalene-based tetracarboxylic diimide compounds as n-type semiconductor materials for thin film transistors
WO2007146250A2 (en) * 2006-06-12 2007-12-21 Northwestern University Naphthalene-based semiconductor materials and methods of preparing and use thereof
EP2089398A2 (en) * 2006-10-25 2009-08-19 Polyera Corporation Organic semiconductor materials and methods of preparing and use thereof
WO2008063609A2 (en) 2006-11-17 2008-05-29 Polyera Corporation Diimide-based semiconductor materials and methods of preparing and using the same
CN101622253B (zh) * 2007-01-08 2015-04-29 破立纪元有限公司 用于制备基于芳烃-双(二羧酰亚胺)的半导体材料的方法和用于制备它们的相关中间体
WO2008091670A2 (en) * 2007-01-24 2008-07-31 Polyera Corporation Organic semiconductor materials and precursors thereof
WO2009108397A1 (en) * 2008-01-07 2009-09-03 The Johns Hopkins University Devices having high dielectric-constant, ionically-polarizable materials
US7649199B2 (en) * 2008-04-11 2010-01-19 Eastman Kodak Company N-type semiconductor materials in thin film transistors and electronic devices
US20110079773A1 (en) * 2009-08-21 2011-04-07 Wasielewski Michael R Selectively Functionalized Rylene Imides and Diimides
US8530270B2 (en) 2010-04-30 2013-09-10 Eastman Kodak Company Methods of preparing semiconductive compositions and devices
US8411489B2 (en) 2010-04-30 2013-04-02 Eastman Kodak Company Semiconducting devices and methods of preparing
US20110269966A1 (en) 2010-04-30 2011-11-03 Deepak Shukla Semiconducting articles
US8314265B2 (en) 2010-04-30 2012-11-20 Eastman Kodak Company Aromatic amic acids or amic esters and compositions
US8404892B2 (en) 2010-05-27 2013-03-26 Eastman Kodak Company Aromatic amic acid salts and compositions
US8692238B2 (en) 2012-04-25 2014-04-08 Eastman Kodak Company Semiconductor devices and methods of preparation
US8779415B2 (en) 2012-11-08 2014-07-15 Eastman Kodak Company Devices containing organic polymeric multi-metallic composites
KR101490104B1 (ko) * 2013-06-12 2015-03-25 경상대학교산학협력단 나프탈렌 다이이미드 유도체 화합물 및 제조방법과 이를 포함하는 유기전자소자
CN106688050B (zh) 2014-06-11 2018-09-18 伊斯曼柯达公司 具有带含硫代硫酸盐聚合物的电介质层的器件
KR102330698B1 (ko) * 2015-09-04 2021-11-23 삼성전자주식회사 유기 광전 소자 및 이미지 센서

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DE2951349A1 (de) 1979-12-20 1981-07-02 Bayer Ag, 5090 Leverkusen Naphthalintetracarbonsaeurediimide als elektrische halbleiter und photoleiter
US4442193A (en) * 1983-02-22 1984-04-10 Eastman Kodak Company Photoconductive compositions and elements containing naphthalene bis-dicarboximide compounds
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DE59608872D1 (de) * 1995-10-12 2002-04-18 Ciba Sc Holding Ag Naphthalinlactamimid-Fluoreszenzfarbstoffe
JP3373783B2 (ja) 1998-05-29 2003-02-04 京セラミタ株式会社 ナフタレンテトラカルボン酸ジイミド誘導体及び電子写真用感光体
JP3559173B2 (ja) * 1998-07-01 2004-08-25 京セラミタ株式会社 負帯電単層型電子写真感光体
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WO2005066718A1 (ja) * 2003-12-26 2005-07-21 Canon Kabushiki Kaisha 電子写真感光体、プロセスカートリッジおよび電子写真装置
JP4921982B2 (ja) * 2004-01-26 2012-04-25 ノースウエスタン ユニバーシティ ペリレンn型半導体及び関連装置
US7629605B2 (en) * 2005-10-31 2009-12-08 Eastman Kodak Company N-type semiconductor materials for thin film transistors

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