JP2009512173A - 軟ｘ線発生器 - Google Patents

軟ｘ線発生器 Download PDF

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Publication number
JP2009512173A
JP2009512173A JP2008536156A JP2008536156A JP2009512173A JP 2009512173 A JP2009512173 A JP 2009512173A JP 2008536156 A JP2008536156 A JP 2008536156A JP 2008536156 A JP2008536156 A JP 2008536156A JP 2009512173 A JP2009512173 A JP 2009512173A
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JP
Japan
Prior art keywords
anode
ray generator
soft
cathode
assembly
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Ceased
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JP2008536156A
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English (en)
Japanese (ja)
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JP2009512173A5 (enExample
Inventor
ドットン，ロバート
テイラー，ロバート
パナレーラ，エミリオ
シュウ，メイシェン
アントシュコ，ユーリイ
スタンレイ チャップマン，イアン
ピイ． グラトン，フィリッペ
ジョンソン，デイヴィッド
Original Assignee
アルフト インコーポレイテッド
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Application filed by アルフト インコーポレイテッド filed Critical アルフト インコーポレイテッド
Publication of JP2009512173A publication Critical patent/JP2009512173A/ja
Publication of JP2009512173A5 publication Critical patent/JP2009512173A5/ja
Ceased legal-status Critical Current

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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • X-Ray Techniques (AREA)
JP2008536156A 2005-10-18 2006-10-18 軟ｘ線発生器 Ceased JP2009512173A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US72788105P 2005-10-18 2005-10-18
US11/581,954 US7502446B2 (en) 2005-10-18 2006-10-17 Soft x-ray generator
PCT/IB2006/004052 WO2007066239A2 (en) 2005-10-18 2006-10-18 Soft x-ray generator

Publications (2)

Publication Number Publication Date
JP2009512173A true JP2009512173A (ja) 2009-03-19
JP2009512173A5 JP2009512173A5 (enExample) 2009-12-03

Family

ID=37948154

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008536156A Ceased JP2009512173A (ja) 2005-10-18 2006-10-18 軟ｘ線発生器

Country Status (5)

Country Link
US (1) US7502446B2 (enExample)
EP (1) EP1938671A4 (enExample)
JP (1) JP2009512173A (enExample)
CA (1) CA2626127A1 (enExample)
WO (1) WO2007066239A2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012134143A (ja) * 2010-12-21 2012-07-12 Xtreme Technologies Gmbh ガス放電ベースの高周波高電流放電により短波長放射線を発生するための方法および装置

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7809115B2 (en) * 2008-09-09 2010-10-05 The United States Of America As Represented By The Secretary Of The Navy Diode for flash radiography
US20110089777A1 (en) * 2009-10-18 2011-04-21 Ernesto Camilo Rivera Thermally manageable system and electric device
JP2013053850A (ja) * 2010-01-07 2013-03-21 Saitama Medical Univ 円偏光変換装置
CN103077875B (zh) * 2012-12-29 2016-04-13 西北核技术研究所 一种强流小焦斑长寿命真空二极管
CN109860011B (zh) * 2018-12-06 2020-11-06 姚智伟 集成离子泵的x射线管
KR102330120B1 (ko) * 2021-01-28 2021-11-23 어썸레이 주식회사 식물에 전자기파를 조사하는 장치 및 그 방법

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5619855A (en) * 1979-07-27 1981-02-24 Nippon Hoso Kyokai <Nhk> X-ray generator
JPS61138436A (ja) * 1984-12-10 1986-06-25 Hitachi Ltd プラズマ軟ｘ線発生装置
JPS61173496A (ja) * 1985-01-28 1986-08-05 Nippon Telegr & Teleph Corp <Ntt> プラズマｘ線発生装置
JPS63168942A (ja) * 1986-12-27 1988-07-12 Hitachi Ltd プラズマｘ線源
JP2002519815A (ja) * 1998-06-19 2002-07-02 アドバンスト レーザー アンド フュージョン テクノロジー インコーポレイティド 放射（例えばｘ線パルス）発生装置メカニズム
JP2002208294A (ja) * 2001-01-12 2002-07-26 Toshiba Corp リダンダンシーシステムを有する半導体記憶装置

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US3970884A (en) 1973-07-09 1976-07-20 Golden John P Portable X-ray device
US3878394A (en) 1973-07-09 1975-04-15 John P Golden Portable X-ray device
SU748926A1 (ru) 1978-01-09 1980-07-15 Предприятие П/Я В-8584 Рентгеновский генератор
US4201921A (en) 1978-07-24 1980-05-06 International Business Machines Corporation Electron beam-capillary plasma flash x-ray device
US4258262A (en) 1979-05-03 1981-03-24 Bell Telephone Laboratories, Incorporated High-power X-ray source
US4238682A (en) 1979-05-03 1980-12-09 Bell Telephone Laboratories, Incorporated High-power X-ray source
US4368538A (en) 1980-04-11 1983-01-11 International Business Machines Corporation Spot focus flash X-ray source
US4622687A (en) 1981-04-02 1986-11-11 Arthur H. Iversen Liquid cooled anode x-ray tubes
US4577340A (en) 1983-09-19 1986-03-18 Technicare Corporation High vacuum rotating anode X-ray tube
US4625324A (en) 1983-09-19 1986-11-25 Technicare Corporation High vacuum rotating anode x-ray tube
US4612477A (en) 1983-12-22 1986-09-16 Yale University Triggering device for a vacuum arc in a plasma centrifuge
US4618972A (en) 1984-09-07 1986-10-21 At&T Bell Laboratories X-ray source comprising double-angle conical target
JPS61104599A (ja) 1984-10-25 1986-05-22 工業技術院長 プラズマ生成のための放電トリガ−方法
JPS61225798A (ja) 1985-03-29 1986-10-07 三菱電機株式会社 プラズマ発生装置
JPS61233998A (ja) 1985-03-29 1986-10-18 三菱電機株式会社 プラズマ発生装置
JPS62119844A (ja) * 1985-11-20 1987-06-01 Fujitsu Ltd プラズマｘ線発生装置
US4866743A (en) 1987-04-29 1989-09-12 Siemens Aktiengesellschaft Computer tomography apparatus with a closed circulation cooling system
US5054046A (en) * 1988-01-06 1991-10-01 Jupiter Toy Company Method of and apparatus for production and manipulation of high density charge
US4878235A (en) * 1988-02-25 1989-10-31 Varian Associates, Inc. High intensity x-ray source using bellows
US4928296A (en) 1988-04-04 1990-05-22 General Electric Company Apparatus for cooling an X-ray device
US4945562A (en) 1989-04-24 1990-07-31 General Electric Company X-ray target cooling
FR2703556B1 (fr) 1993-03-30 1995-05-19 Centre Nat Rech Scient Générateur impulsionnel de rayons X.
US5442677A (en) 1993-10-26 1995-08-15 Golden; John Cold-cathode x-ray emitter and tube therefor
US6031241A (en) 1997-03-11 2000-02-29 University Of Central Florida Capillary discharge extreme ultraviolet lamp source for EUV microlithography and other related applications
DE19753696A1 (de) 1997-12-03 1999-06-17 Fraunhofer Ges Forschung Vorrichtung und Verfahren zur Erzeugung von Extrem-Ultraviolettstrahlung und weicher Röntgenstrahlung aus einer Gasentladung
US6295332B1 (en) 1999-06-12 2001-09-25 Robert Allen Selzer Method of improving x-ray lithography in the sub 100nm range to create high quality semiconductor devices
US6430260B1 (en) 2000-12-29 2002-08-06 General Electric Company X-ray tube anode cooling device and systems incorporating same
US6804327B2 (en) 2001-04-03 2004-10-12 Lambda Physik Ag Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays
US7127035B2 (en) 2001-08-29 2006-10-24 Kabushiki Kaisha Toshiba Rotary anode type X-ray tube
US6714624B2 (en) 2001-09-18 2004-03-30 Euv Llc Discharge source with gas curtain for protecting optics from particles
DE10151080C1 (de) 2001-10-10 2002-12-05 Xtreme Tech Gmbh Einrichtung und Verfahren zum Erzeugen von extrem ultravioletter (EUV-)Strahlung auf Basis einer Gasentladung
DE10260458B3 (de) 2002-12-19 2004-07-22 Xtreme Technologies Gmbh Strahlungsquelle mit hoher durchschnittlicher EUV-Strahlungsleistung
DE10304936B3 (de) 2003-02-06 2004-10-28 Siemens Ag Drehanode für eine Röntgenröhre mit einem Anodenkörper aus Faserwerkstoff sowie Verfahren zu deren Herstellung
DE10305701B4 (de) 2003-02-07 2005-10-06 Xtreme Technologies Gmbh Anordnung zur Erzeugung von EUV-Strahlung mit hohen Repetitionsraten

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5619855A (en) * 1979-07-27 1981-02-24 Nippon Hoso Kyokai <Nhk> X-ray generator
JPS61138436A (ja) * 1984-12-10 1986-06-25 Hitachi Ltd プラズマ軟ｘ線発生装置
JPS61173496A (ja) * 1985-01-28 1986-08-05 Nippon Telegr & Teleph Corp <Ntt> プラズマｘ線発生装置
JPS63168942A (ja) * 1986-12-27 1988-07-12 Hitachi Ltd プラズマｘ線源
JP2002519815A (ja) * 1998-06-19 2002-07-02 アドバンスト レーザー アンド フュージョン テクノロジー インコーポレイティド 放射（例えばｘ線パルス）発生装置メカニズム
JP2002208294A (ja) * 2001-01-12 2002-07-26 Toshiba Corp リダンダンシーシステムを有する半導体記憶装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012134143A (ja) * 2010-12-21 2012-07-12 Xtreme Technologies Gmbh ガス放電ベースの高周波高電流放電により短波長放射線を発生するための方法および装置

Also Published As

Publication number Publication date
WO2007066239A3 (en) 2007-11-22
EP1938671A4 (en) 2012-05-23
US7502446B2 (en) 2009-03-10
WO2007066239A2 (en) 2007-06-14
CA2626127A1 (en) 2007-06-14
US20070086572A1 (en) 2007-04-19
EP1938671A2 (en) 2008-07-02

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