JP2009511638A5 - - Google Patents
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- Publication number
- JP2009511638A5 JP2009511638A5 JP2008536798A JP2008536798A JP2009511638A5 JP 2009511638 A5 JP2009511638 A5 JP 2009511638A5 JP 2008536798 A JP2008536798 A JP 2008536798A JP 2008536798 A JP2008536798 A JP 2008536798A JP 2009511638 A5 JP2009511638 A5 JP 2009511638A5
- Authority
- JP
- Japan
- Prior art keywords
- optionally substituted
- group
- alkyl
- substituted
- independently
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 150000001875 compounds Chemical class 0.000 claims 66
- 125000004400 (C1-C12) alkyl group Chemical group 0.000 claims 47
- 125000004642 (C1-C12) alkoxy group Chemical group 0.000 claims 33
- 125000004641 (C1-C12) haloalkyl group Chemical group 0.000 claims 33
- 229910052736 halogen Inorganic materials 0.000 claims 33
- 150000002367 halogens Chemical class 0.000 claims 33
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 33
- 125000003118 aryl group Chemical group 0.000 claims 28
- 125000001931 aliphatic group Chemical group 0.000 claims 27
- 125000004104 aryloxy group Chemical group 0.000 claims 23
- 239000002253 acid Substances 0.000 claims 18
- 125000003107 substituted aryl group Chemical group 0.000 claims 17
- 125000000217 alkyl group Chemical group 0.000 claims 16
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 16
- 230000005855 radiation Effects 0.000 claims 16
- 125000001769 aryl amino group Chemical group 0.000 claims 15
- 239000000178 monomer Substances 0.000 claims 15
- 125000006711 (C2-C12) alkynyl group Chemical group 0.000 claims 13
- 239000000203 mixture Substances 0.000 claims 13
- 125000006710 (C2-C12) alkenyl group Chemical group 0.000 claims 12
- 125000005649 substituted arylene group Chemical group 0.000 claims 11
- 125000002947 alkylene group Chemical group 0.000 claims 8
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims 8
- 125000001072 heteroaryl group Chemical group 0.000 claims 8
- 125000001624 naphthyl group Chemical group 0.000 claims 8
- 150000002118 epoxides Chemical class 0.000 claims 7
- 229910052739 hydrogen Inorganic materials 0.000 claims 7
- 239000001257 hydrogen Substances 0.000 claims 7
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 7
- 238000000034 method Methods 0.000 claims 7
- 150000001336 alkenes Chemical class 0.000 claims 6
- 125000004429 atom Chemical group 0.000 claims 6
- 239000011230 binding agent Substances 0.000 claims 6
- 238000010538 cationic polymerization reaction Methods 0.000 claims 6
- 230000001427 coherent effect Effects 0.000 claims 6
- 125000005647 linker group Chemical group 0.000 claims 6
- 125000005561 phenanthryl group Chemical group 0.000 claims 6
- -1 polysiloxane group Polymers 0.000 claims 6
- 125000001725 pyrenyl group Chemical group 0.000 claims 6
- 125000005373 siloxane group Chemical group [SiH2](O*)* 0.000 claims 6
- 125000002355 alkine group Chemical group 0.000 claims 5
- 125000004986 diarylamino group Chemical group 0.000 claims 5
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 claims 5
- 229910018557 Si O Inorganic materials 0.000 claims 4
- 125000002178 anthracenyl group Chemical group C1(=CC=CC2=CC3=CC=CC=C3C=C12)* 0.000 claims 4
- 235000010290 biphenyl Nutrition 0.000 claims 4
- 239000004305 biphenyl Substances 0.000 claims 4
- 125000000753 cycloalkyl group Chemical group 0.000 claims 4
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 claims 4
- 125000001424 substituent group Chemical group 0.000 claims 4
- 229910003849 O-Si Inorganic materials 0.000 claims 3
- 229910003872 O—Si Inorganic materials 0.000 claims 3
- 125000003342 alkenyl group Chemical group 0.000 claims 3
- 125000000732 arylene group Chemical group 0.000 claims 3
- 239000004593 Epoxy Substances 0.000 claims 2
- 125000003277 amino group Chemical group 0.000 claims 2
- YCWSUKQGVSGXJO-NTUHNPAUSA-N nifuroxazide Chemical group C1=CC(O)=CC=C1C(=O)N\N=C\C1=CC=C([N+]([O-])=O)O1 YCWSUKQGVSGXJO-NTUHNPAUSA-N 0.000 claims 2
- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 claims 2
- 238000000926 separation method Methods 0.000 claims 2
- 125000001622 2-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C(*)C([H])=C([H])C2=C1[H] 0.000 claims 1
- 125000004179 3-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C(Cl)=C1[H] 0.000 claims 1
- 150000001345 alkine derivatives Chemical class 0.000 claims 1
- 150000001925 cycloalkenes Chemical class 0.000 claims 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims 1
- 125000003700 epoxy group Chemical group 0.000 claims 1
- 125000005842 heteroatom Chemical group 0.000 claims 1
- 229920000642 polymer Polymers 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 125000005017 substituted alkenyl group Chemical group 0.000 claims 1
- 125000005717 substituted cycloalkylene group Chemical group 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US72894105P | 2005-10-18 | 2005-10-18 | |
| PCT/US2006/040887 WO2007047840A2 (en) | 2005-10-18 | 2006-10-18 | Photopolymerizable medium comprising siloxane compounds that support cationic polymerization for holographic storage |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009511638A JP2009511638A (ja) | 2009-03-19 |
| JP2009511638A5 true JP2009511638A5 (enExample) | 2009-12-03 |
Family
ID=37908087
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008536798A Pending JP2009511638A (ja) | 2005-10-18 | 2006-10-18 | ホログラフィックストレージのための、カチオン重合をサポートするシロキサン化合物を含む光重合可能な媒体 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20070092804A1 (enExample) |
| EP (1) | EP1937694A2 (enExample) |
| JP (1) | JP2009511638A (enExample) |
| KR (1) | KR20080063499A (enExample) |
| CA (1) | CA2625161A1 (enExample) |
| WO (1) | WO2007047840A2 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8233203B2 (en) * | 2006-02-15 | 2012-07-31 | Semiconductor Energy Laboratory Co., Ltd. | Exposure method and method of manufacturing semiconductor device |
| WO2007120628A2 (en) * | 2006-04-11 | 2007-10-25 | Dow Corning Corporation | A composition including a siloxane and a method of forming the same |
| US8053145B2 (en) * | 2006-05-30 | 2011-11-08 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing holographic recording medium and method for manufacturing semiconductor device |
| DE102009012665A1 (de) * | 2009-03-13 | 2010-09-16 | Momentive Performance Materials Gmbh | Neue Polyorganosiloxane und deren Verwendungen |
| WO2010107784A1 (en) | 2009-03-16 | 2010-09-23 | Stx Aprilis, Inc. | Methods for activation control of photopolymerization for holographic data storage using at least two wavelengths |
| US9874811B2 (en) | 2015-09-10 | 2018-01-23 | Samsung Electronics Co., Ltd. | Photopolymer composition for holographic recording |
| CN107177355B (zh) * | 2017-05-16 | 2020-04-10 | 北京科技大学 | 超高荧光量子产率的共轭寡聚物与二氧化硅荧光复合纳米粒子的制备方法 |
| CN107163931B (zh) * | 2017-05-16 | 2020-05-08 | 北京科技大学 | 荧光共轭寡聚物二氧化硅复合纳米粒子在潜指纹显影中的应用方法 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3899328A (en) * | 1973-05-07 | 1975-08-12 | Xerox Corp | Active matrix and intrinsic photoconductive polymer of a linear polysiloxane |
| JPS61256347A (ja) * | 1985-05-10 | 1986-11-13 | Hitachi Ltd | アルカリ可溶性シロキサン重合体 |
| JP2614453B2 (ja) * | 1987-07-23 | 1997-05-28 | 東レ・ダウコーニング・シリコーン株式会社 | オルガノポリシロキサン系ホットメルト接着剤 |
| JPH03236393A (ja) * | 1990-02-13 | 1991-10-22 | Sumitomo Durez Co Ltd | シリコーン変性フェノール化合物とその製法及びエポキシ誘導体 |
| JPH03275712A (ja) * | 1990-03-26 | 1991-12-06 | Toray Ind Inc | 熱硬化性樹脂組成物 |
| US5233007A (en) * | 1992-04-14 | 1993-08-03 | Allergan, Inc. | Polysiloxanes, methods of making same and high refractive index silicones made from same |
| JPH06256364A (ja) * | 1993-03-05 | 1994-09-13 | Nippon Kayaku Co Ltd | 有機ケイ素化合物、その製法及びそれを含有する樹脂組成物 |
| JP3094819B2 (ja) * | 1994-12-09 | 2000-10-03 | 信越化学工業株式会社 | ポジ型レジスト材料 |
| WO1997013183A1 (en) * | 1995-10-06 | 1997-04-10 | Polaroid Corporation | Holographic medium and process |
| US6489065B1 (en) * | 1996-05-17 | 2002-12-03 | Polaroid Corporation | Holographic medium and process for use thereof |
| US5739370A (en) * | 1997-04-02 | 1998-04-14 | General Electric Company | Process the production of octaphenylcyclotetrasiloxane |
| US20030157414A1 (en) * | 1997-11-13 | 2003-08-21 | Pradeep K. Dhal | Holographic medium and process for use thereof |
| US6512606B1 (en) * | 1999-07-29 | 2003-01-28 | Siros Technologies, Inc. | Optical storage media and method for optical data storage via local changes in reflectivity of a format grating |
| WO2001058856A1 (en) * | 2000-02-10 | 2001-08-16 | Imation Corp. | Non-linear optically active compounds |
| AU2001286860A1 (en) * | 2000-08-28 | 2002-03-13 | Aprilis, Inc. | Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization |
| JP2005017354A (ja) * | 2003-06-23 | 2005-01-20 | Fuji Photo Film Co Ltd | ホログラム記録材料用組成物、ホログラム記録材料及びホログラム記録方法。 |
-
2006
- 2006-10-18 WO PCT/US2006/040887 patent/WO2007047840A2/en not_active Ceased
- 2006-10-18 CA CA002625161A patent/CA2625161A1/en not_active Abandoned
- 2006-10-18 JP JP2008536798A patent/JP2009511638A/ja active Pending
- 2006-10-18 US US11/582,834 patent/US20070092804A1/en not_active Abandoned
- 2006-10-18 KR KR1020087011086A patent/KR20080063499A/ko not_active Withdrawn
- 2006-10-18 EP EP06836396A patent/EP1937694A2/en not_active Withdrawn
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