JP2009511638A - ホログラフィックストレージのための、カチオン重合をサポートするシロキサン化合物を含む光重合可能な媒体 - Google Patents
ホログラフィックストレージのための、カチオン重合をサポートするシロキサン化合物を含む光重合可能な媒体 Download PDFInfo
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- JP2009511638A JP2009511638A JP2008536798A JP2008536798A JP2009511638A JP 2009511638 A JP2009511638 A JP 2009511638A JP 2008536798 A JP2008536798 A JP 2008536798A JP 2008536798 A JP2008536798 A JP 2008536798A JP 2009511638 A JP2009511638 A JP 2009511638A
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- -1 siloxane compounds Chemical class 0.000 title claims description 44
- 238000010538 cationic polymerization reaction Methods 0.000 title claims description 41
- 238000003860 storage Methods 0.000 title description 6
- 150000001875 compounds Chemical class 0.000 claims abstract description 113
- 239000011230 binding agent Substances 0.000 claims description 146
- 125000004400 (C1-C12) alkyl group Chemical group 0.000 claims description 135
- 229910052736 halogen Inorganic materials 0.000 claims description 104
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 103
- 125000004641 (C1-C12) haloalkyl group Chemical group 0.000 claims description 98
- 150000002367 halogens Chemical class 0.000 claims description 97
- 125000004642 (C1-C12) alkoxy group Chemical group 0.000 claims description 95
- 239000000178 monomer Substances 0.000 claims description 95
- 125000003118 aryl group Chemical group 0.000 claims description 73
- 125000004104 aryloxy group Chemical group 0.000 claims description 69
- 239000002253 acid Substances 0.000 claims description 58
- 239000000203 mixture Substances 0.000 claims description 55
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 55
- 150000002118 epoxides Chemical class 0.000 claims description 53
- 125000001769 aryl amino group Chemical group 0.000 claims description 49
- 125000001931 aliphatic group Chemical group 0.000 claims description 47
- 125000003107 substituted aryl group Chemical group 0.000 claims description 47
- 125000000217 alkyl group Chemical group 0.000 claims description 43
- 125000006710 (C2-C12) alkenyl group Chemical group 0.000 claims description 41
- 230000005855 radiation Effects 0.000 claims description 41
- 125000006711 (C2-C12) alkynyl group Chemical group 0.000 claims description 39
- 125000001424 substituent group Chemical group 0.000 claims description 32
- 125000001624 naphthyl group Chemical group 0.000 claims description 31
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims description 30
- 125000002947 alkylene group Chemical group 0.000 claims description 27
- 125000001072 heteroaryl group Chemical group 0.000 claims description 27
- 238000000034 method Methods 0.000 claims description 27
- 150000001336 alkenes Chemical class 0.000 claims description 25
- 125000005649 substituted arylene group Chemical group 0.000 claims description 20
- 239000004593 Epoxy Substances 0.000 claims description 18
- 238000000926 separation method Methods 0.000 claims description 18
- 229910052739 hydrogen Inorganic materials 0.000 claims description 17
- 239000001257 hydrogen Substances 0.000 claims description 17
- 125000005561 phenanthryl group Chemical group 0.000 claims description 17
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 16
- 125000001725 pyrenyl group Chemical group 0.000 claims description 16
- 125000002178 anthracenyl group Chemical group C1(=CC=CC2=CC3=CC=CC=C3C=C12)* 0.000 claims description 15
- 125000000732 arylene group Chemical group 0.000 claims description 15
- 235000010290 biphenyl Nutrition 0.000 claims description 15
- 239000004305 biphenyl Substances 0.000 claims description 15
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 15
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 claims description 15
- 239000000126 substance Substances 0.000 claims description 14
- 125000002355 alkine group Chemical group 0.000 claims description 13
- 125000003342 alkenyl group Chemical group 0.000 claims description 12
- 125000004986 diarylamino group Chemical group 0.000 claims description 12
- 150000001345 alkine derivatives Chemical class 0.000 claims description 10
- 230000001427 coherent effect Effects 0.000 claims description 10
- 125000004429 atom Chemical group 0.000 claims description 8
- 125000005373 siloxane group Chemical group [SiH2](O*)* 0.000 claims description 8
- 125000003700 epoxy group Chemical group 0.000 claims description 7
- 125000005647 linker group Chemical group 0.000 claims description 7
- 230000004044 response Effects 0.000 claims description 7
- 125000003277 amino group Chemical group 0.000 claims description 6
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 5
- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 claims description 5
- 229910003849 O-Si Inorganic materials 0.000 claims description 4
- 229910003872 O—Si Inorganic materials 0.000 claims description 4
- 150000001925 cycloalkenes Chemical class 0.000 claims description 4
- 125000001622 2-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C(*)C([H])=C([H])C2=C1[H] 0.000 claims description 3
- 125000004179 3-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C(Cl)=C1[H] 0.000 claims description 3
- 125000006539 C12 alkyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 3
- 125000005842 heteroatom Chemical group 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- 229910018557 Si O Inorganic materials 0.000 claims 4
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 claims 4
- YCWSUKQGVSGXJO-NTUHNPAUSA-N nifuroxazide Chemical group C1=CC(O)=CC=C1C(=O)N\N=C\C1=CC=C([N+]([O-])=O)O1 YCWSUKQGVSGXJO-NTUHNPAUSA-N 0.000 claims 3
- 125000005017 substituted alkenyl group Chemical group 0.000 claims 1
- 125000005717 substituted cycloalkylene group Chemical group 0.000 claims 1
- 239000000463 material Substances 0.000 description 46
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 36
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 20
- 238000009472 formulation Methods 0.000 description 15
- 238000002386 leaching Methods 0.000 description 15
- 238000006116 polymerization reaction Methods 0.000 description 15
- 229920000642 polymer Polymers 0.000 description 14
- 238000006243 chemical reaction Methods 0.000 description 12
- 239000000758 substrate Substances 0.000 description 12
- 125000004122 cyclic group Chemical group 0.000 description 11
- 125000003545 alkoxy group Chemical group 0.000 description 10
- 230000001588 bifunctional effect Effects 0.000 description 10
- 229910052757 nitrogen Inorganic materials 0.000 description 10
- 125000004432 carbon atom Chemical group C* 0.000 description 9
- 125000001188 haloalkyl group Chemical group 0.000 description 9
- 239000002904 solvent Substances 0.000 description 9
- RJFCFNWLPJRCLR-UHFFFAOYSA-N 1-prop-2-enylnaphthalene Chemical compound C1=CC=C2C(CC=C)=CC=CC2=C1 RJFCFNWLPJRCLR-UHFFFAOYSA-N 0.000 description 8
- 238000005336 cracking Methods 0.000 description 8
- 230000032798 delamination Effects 0.000 description 8
- 125000005843 halogen group Chemical group 0.000 description 8
- 239000000047 product Substances 0.000 description 8
- 238000003756 stirring Methods 0.000 description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 7
- 238000004458 analytical method Methods 0.000 description 7
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 238000000149 argon plasma sintering Methods 0.000 description 6
- 229910052799 carbon Inorganic materials 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical class I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- 125000002993 cycloalkylene group Chemical group 0.000 description 5
- 238000002329 infrared spectrum Methods 0.000 description 5
- PHLASVAENYNAOW-UHFFFAOYSA-N methyl-bis[[methyl(diphenyl)silyl]oxy]-phenylsilane Chemical compound C=1C=CC=CC=1[Si](C)(C=1C=CC=CC=1)O[Si](C=1C=CC=CC=1)(C)O[Si](C)(C=1C=CC=CC=1)C1=CC=CC=C1 PHLASVAENYNAOW-UHFFFAOYSA-N 0.000 description 5
- 229920001296 polysiloxane Polymers 0.000 description 5
- 125000000304 alkynyl group Chemical group 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
- 238000013500 data storage Methods 0.000 description 4
- 125000000524 functional group Chemical group 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- WZJUBBHODHNQPW-UHFFFAOYSA-N 2,4,6,8-tetramethyl-1,3,5,7,2$l^{3},4$l^{3},6$l^{3},8$l^{3}-tetraoxatetrasilocane Chemical compound C[Si]1O[Si](C)O[Si](C)O[Si](C)O1 WZJUBBHODHNQPW-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- 239000004215 Carbon black (E152) Substances 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 125000000392 cycloalkenyl group Chemical group 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 238000003818 flash chromatography Methods 0.000 description 3
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- 229930195733 hydrocarbon Natural products 0.000 description 3
- 230000001965 increasing effect Effects 0.000 description 3
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- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 3
- 229920006395 saturated elastomer Polymers 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 239000000741 silica gel Substances 0.000 description 3
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- 239000007848 Bronsted acid Substances 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 102100022563 Tubulin polymerization-promoting protein Human genes 0.000 description 2
- 101710158555 Tubulin polymerization-promoting protein Proteins 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
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- 125000004093 cyano group Chemical group *C#N 0.000 description 2
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- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
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- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 2
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- YYMBJDOZVAITBP-UHFFFAOYSA-N rubrene Chemical compound C1=CC=CC=C1C(C1=C(C=2C=CC=CC=2)C2=CC=CC=C2C(C=2C=CC=CC=2)=C11)=C(C=CC=C2)C2=C1C1=CC=CC=C1 YYMBJDOZVAITBP-UHFFFAOYSA-N 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
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- CTTAUEZOEUSYEW-UHFFFAOYSA-N tetrakis[dimethyl(3-naphthalen-1-ylpropyl)silyl] silicate Chemical compound C1=CC=C2C(CCC[Si](C)(C)O[Si](O[Si](C)(C)CCCC=3C4=CC=CC=C4C=CC=3)(O[Si](C)(C)CCCC=3C4=CC=CC=C4C=CC=3)O[Si](C)(CCCC=3C4=CC=CC=C4C=CC=3)C)=CC=CC2=C1 CTTAUEZOEUSYEW-UHFFFAOYSA-N 0.000 description 2
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- LWNGJAHMBMVCJR-UHFFFAOYSA-N (2,3,4,5,6-pentafluorophenoxy)boronic acid Chemical compound OB(O)OC1=C(F)C(F)=C(F)C(F)=C1F LWNGJAHMBMVCJR-UHFFFAOYSA-N 0.000 description 1
- 125000004643 (C1-C12) haloalkoxy group Chemical group 0.000 description 1
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- LCJNYCWJKAWZKZ-UHFFFAOYSA-N 1-prop-1-en-2-ylnaphthalene Chemical compound C1=CC=C2C(C(=C)C)=CC=CC2=C1 LCJNYCWJKAWZKZ-UHFFFAOYSA-N 0.000 description 1
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- YXSRDDUZUIWHEN-UHFFFAOYSA-N 2,4,6,8-tetramethyl-2,4,6,8-tetrakis(3-naphthalen-1-ylpropyl)-1,3,5,7,2,4,6,8-tetraoxatetrasilocane Chemical compound O1[Si](C)(CCCC=2C3=CC=CC=C3C=CC=2)O[Si](C)(CCCC=2C3=CC=CC=C3C=CC=2)O[Si](C)(CCCC=2C3=CC=CC=C3C=CC=2)O[Si]1(C)CCCC1=CC=CC2=CC=CC=C12 YXSRDDUZUIWHEN-UHFFFAOYSA-N 0.000 description 1
- IRVZFACCNZRHSJ-UHFFFAOYSA-N 2,4,6,8-tetramethyl-2,4,6,8-tetraphenyl-1,3,5,7,2,4,6,8-tetraoxatetrasilocane Chemical group O1[Si](C)(C=2C=CC=CC=2)O[Si](C)(C=2C=CC=CC=2)O[Si](C)(C=2C=CC=CC=2)O[Si]1(C)C1=CC=CC=C1 IRVZFACCNZRHSJ-UHFFFAOYSA-N 0.000 description 1
- PGUTTYDMIRSADX-UHFFFAOYSA-N 2,4,6,8-tetramethyl-2-propyl-1,3,5,7,2,4,6,8-tetraoxatetrasilocane Chemical group CCC[Si]1(C)O[SiH](C)O[SiH](C)O[SiH](C)O1 PGUTTYDMIRSADX-UHFFFAOYSA-N 0.000 description 1
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- OCKGFTQIICXDQW-ZEQRLZLVSA-N 5-[(1r)-1-hydroxy-2-[4-[(2r)-2-hydroxy-2-(4-methyl-1-oxo-3h-2-benzofuran-5-yl)ethyl]piperazin-1-yl]ethyl]-4-methyl-3h-2-benzofuran-1-one Chemical compound C1=C2C(=O)OCC2=C(C)C([C@@H](O)CN2CCN(CC2)C[C@H](O)C2=CC=C3C(=O)OCC3=C2C)=C1 OCKGFTQIICXDQW-ZEQRLZLVSA-N 0.000 description 1
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- 125000002091 cationic group Chemical group 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 description 1
- 125000000259 cinnolinyl group Chemical group N1=NC(=CC2=CC=CC=C12)* 0.000 description 1
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- 239000013078 crystal Substances 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- ZWAJLVLEBYIOTI-UHFFFAOYSA-N cyclohexene oxide Chemical group C1CCCC2OC21 ZWAJLVLEBYIOTI-UHFFFAOYSA-N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- DDJSWKLBKSLAAZ-UHFFFAOYSA-N cyclotetrasiloxane Chemical compound O1[SiH2]O[SiH2]O[SiH2]O[SiH2]1 DDJSWKLBKSLAAZ-UHFFFAOYSA-N 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
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- UOUILILVWRHZSH-UHFFFAOYSA-N dimethyl-tris[(dimethyl-$l^{3}-silanyl)oxy]silyloxysilicon Chemical compound C[Si](C)O[Si](O[Si](C)C)(O[Si](C)C)O[Si](C)C UOUILILVWRHZSH-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000003480 eluent Substances 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000003838 furazanyl group Chemical group 0.000 description 1
- 125000004612 furopyridinyl group Chemical group O1C(=CC2=C1C=CC=N2)* 0.000 description 1
- 125000002541 furyl group Chemical group 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 125000004438 haloalkoxy group Chemical group 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004475 heteroaralkyl group Chemical group 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
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- 238000003384 imaging method Methods 0.000 description 1
- 125000002883 imidazolyl group Chemical group 0.000 description 1
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- 230000001939 inductive effect Effects 0.000 description 1
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- 230000003993 interaction Effects 0.000 description 1
- 125000000904 isoindolyl group Chemical group C=1(NC=C2C=CC=CC12)* 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 125000002183 isoquinolinyl group Chemical group C1(=NC=CC2=CC=CC=C12)* 0.000 description 1
- 125000005956 isoquinolyl group Chemical group 0.000 description 1
- 125000001786 isothiazolyl group Chemical group 0.000 description 1
- 125000000842 isoxazolyl group Chemical group 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- OKHRRIGNGQFVEE-UHFFFAOYSA-N methyl(diphenyl)silicon Chemical compound C=1C=CC=CC=1[Si](C)C1=CC=CC=C1 OKHRRIGNGQFVEE-UHFFFAOYSA-N 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- GRVDJDISBSALJP-UHFFFAOYSA-N methyloxidanyl Chemical group [O]C GRVDJDISBSALJP-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001715 oxadiazolyl group Chemical group 0.000 description 1
- 125000002971 oxazolyl group Chemical group 0.000 description 1
- 125000000538 pentafluorophenyl group Chemical group FC1=C(F)C(F)=C(*)C(F)=C1F 0.000 description 1
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- 230000002093 peripheral effect Effects 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-O phosphonium Chemical compound [PH4+] XYFCBTPGUUZFHI-UHFFFAOYSA-O 0.000 description 1
- 125000004592 phthalazinyl group Chemical group C1(=NN=CC2=CC=CC=C12)* 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920003216 poly(methylphenylsiloxane) Polymers 0.000 description 1
- 229920001921 poly-methyl-phenyl-siloxane Polymers 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 125000000561 purinyl group Chemical group N1=C(N=C2N=CNC2=C1)* 0.000 description 1
- 125000003373 pyrazinyl group Chemical group 0.000 description 1
- 125000003226 pyrazolyl group Chemical group 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 125000000714 pyrimidinyl group Chemical group 0.000 description 1
- 125000000168 pyrrolyl group Chemical group 0.000 description 1
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
- 125000005493 quinolyl group Chemical group 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000007151 ring opening polymerisation reaction Methods 0.000 description 1
- 125000006413 ring segment Chemical group 0.000 description 1
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- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
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- 239000007787 solid Substances 0.000 description 1
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- 239000003930 superacid Substances 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 125000003831 tetrazolyl group Chemical group 0.000 description 1
- 125000001113 thiadiazolyl group Chemical group 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- 125000004306 triazinyl group Chemical group 0.000 description 1
- 125000001425 triazolyl group Chemical group 0.000 description 1
- 238000003828 vacuum filtration Methods 0.000 description 1
- 238000001429 visible spectrum Methods 0.000 description 1
Classifications
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- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
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- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
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- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0834—Compounds having one or more O-Si linkage
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- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
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- G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
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- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
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- G11B7/004—Recording, reproducing or erasing methods; Read, write or erase circuits therefor
- G11B7/0065—Recording, reproducing or erasing by using optical interference patterns, e.g. holograms
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- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
- G11B7/245—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing a polymeric component
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- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
- G11B7/249—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing organometallic compounds
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H2001/026—Recording materials or recording processes
- G03H2001/0264—Organic recording material
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- G—PHYSICS
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- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2260/00—Recording materials or recording processes
- G03H2260/12—Photopolymer
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- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
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- G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
- G11B7/246—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing dyes
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Holo Graphy (AREA)
- Epoxy Resins (AREA)
- Silicon Polymers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US72894105P | 2005-10-18 | 2005-10-18 | |
| PCT/US2006/040887 WO2007047840A2 (en) | 2005-10-18 | 2006-10-18 | Photopolymerizable medium comprising siloxane compounds that support cationic polymerization for holographic storage |
Publications (2)
| Publication Number | Publication Date |
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| JP2009511638A true JP2009511638A (ja) | 2009-03-19 |
| JP2009511638A5 JP2009511638A5 (enExample) | 2009-12-03 |
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| US (1) | US20070092804A1 (enExample) |
| EP (1) | EP1937694A2 (enExample) |
| JP (1) | JP2009511638A (enExample) |
| KR (1) | KR20080063499A (enExample) |
| CA (1) | CA2625161A1 (enExample) |
| WO (1) | WO2007047840A2 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8233203B2 (en) * | 2006-02-15 | 2012-07-31 | Semiconductor Energy Laboratory Co., Ltd. | Exposure method and method of manufacturing semiconductor device |
| US8222364B2 (en) * | 2006-04-11 | 2012-07-17 | Dow Corning Corporation | Composition including a siloxane and a method of forming the same |
| US8053145B2 (en) * | 2006-05-30 | 2011-11-08 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing holographic recording medium and method for manufacturing semiconductor device |
| DE102009012665A1 (de) * | 2009-03-13 | 2010-09-16 | Momentive Performance Materials Gmbh | Neue Polyorganosiloxane und deren Verwendungen |
| WO2010107784A1 (en) | 2009-03-16 | 2010-09-23 | Stx Aprilis, Inc. | Methods for activation control of photopolymerization for holographic data storage using at least two wavelengths |
| US9874811B2 (en) | 2015-09-10 | 2018-01-23 | Samsung Electronics Co., Ltd. | Photopolymer composition for holographic recording |
| CN107163931B (zh) * | 2017-05-16 | 2020-05-08 | 北京科技大学 | 荧光共轭寡聚物二氧化硅复合纳米粒子在潜指纹显影中的应用方法 |
| CN107177355B (zh) * | 2017-05-16 | 2020-04-10 | 北京科技大学 | 超高荧光量子产率的共轭寡聚物与二氧化硅荧光复合纳米粒子的制备方法 |
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| JPS5015899A (enExample) * | 1973-05-07 | 1975-02-19 | ||
| JPS61256347A (ja) * | 1985-05-10 | 1986-11-13 | Hitachi Ltd | アルカリ可溶性シロキサン重合体 |
| JPS6429482A (en) * | 1987-07-23 | 1989-01-31 | Toray Silicone Co | Organopolysiloxane hot-melt adhesive |
| JPH03236393A (ja) * | 1990-02-13 | 1991-10-22 | Sumitomo Durez Co Ltd | シリコーン変性フェノール化合物とその製法及びエポキシ誘導体 |
| JPH03275712A (ja) * | 1990-03-26 | 1991-12-06 | Toray Ind Inc | 熱硬化性樹脂組成物 |
| JPH06256364A (ja) * | 1993-03-05 | 1994-09-13 | Nippon Kayaku Co Ltd | 有機ケイ素化合物、その製法及びそれを含有する樹脂組成物 |
| JPH07505914A (ja) * | 1992-04-14 | 1995-06-29 | アラーガン、インコーポレイテッド | ポリシロキサン、その製造法およびそれより製造される高屈折率シリコーン |
| JPH08160605A (ja) * | 1994-12-09 | 1996-06-21 | Shin Etsu Chem Co Ltd | ポジ型レジスト材料 |
| JPH115798A (ja) * | 1997-04-02 | 1999-01-12 | General Electric Co <Ge> | オクタフェニルシクロテトラシロキサンの製造方法 |
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| JP2004507513A (ja) * | 2000-08-28 | 2004-03-11 | アプリリス，インコーポレイテッド | カチオン性重合を行いうる多官能エポキシモノマーを含むホログラフィー蓄積媒体 |
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|---|---|---|---|---|
| JP3604700B2 (ja) * | 1995-10-06 | 2004-12-22 | ポラロイド コーポレイション | ホログラフィ媒体およびプロセス |
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| JP2005017354A (ja) * | 2003-06-23 | 2005-01-20 | Fuji Photo Film Co Ltd | ホログラム記録材料用組成物、ホログラム記録材料及びホログラム記録方法。 |
-
2006
- 2006-10-18 WO PCT/US2006/040887 patent/WO2007047840A2/en not_active Ceased
- 2006-10-18 EP EP06836396A patent/EP1937694A2/en not_active Withdrawn
- 2006-10-18 CA CA002625161A patent/CA2625161A1/en not_active Abandoned
- 2006-10-18 US US11/582,834 patent/US20070092804A1/en not_active Abandoned
- 2006-10-18 KR KR1020087011086A patent/KR20080063499A/ko not_active Withdrawn
- 2006-10-18 JP JP2008536798A patent/JP2009511638A/ja active Pending
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| JPN5008018160; ＸＵ，Ｗ． ｅｔ ａｌ．: 'Ｏｘｙｇｅｎ Ｓｅｎｓｏｒｓ Ｂａｓｅｄ ｏｎ Ｌｕｍｉｎｅｓｃｅｎｃｅ Ｑｕｅｎｃｈｉｎｇ： Ｉｎｔｅｒａｃｔｉｏｎｓ ｏｆ Ｍｅｔａｌ Ｃｏｍｐｌｅｘｅｓ ｗｉｔｈ ｔｈｅ Ｐｏｌｙｍｅｒ Ｓｕｐ' ＡＮＡＬＴＩＣＡＬ ＣＨＥＭＩＳＴＲＹ Ｖ６６ Ｎ２３, 19941201, Ｐ４１３３-４１４１ * |
| JPN5008018162; ＢＩＲＣＨＡＬＬ，Ｊ．Ｍ． ｅｔ ａｌ．: 'Ｏｒｇａｎｏｓｉｌｉｃｏｎ ｃｈｅｍｉｓｔｒｙ． ＶＩＩＩ． ２ （Ｐｅｎｔａｆｌｕｏｒｏｐｈｅｎｙｌ）ｅｔｈｙｌｓｉｌｙｌ ｃｏｍｐｏｕｎｄｓ ａｎｄ ｒｅｌａｔｅｄ ｐｏｌｙｍｅｒｓ' ＪＯＵＲＮＡＬ ＯＦ ＴＨＥ ＣＨＥＭＩＣＡＬ ＳＯＣＩＥＴＹ， ＳＥＣＴＩＯＮ Ａ Ｖ２３, 1971, Ｐ３７６０-３７６４ * |
| JPN5008018165; ＲＹＡＮ，Ｊ．Ｗ． ａｎｄ ＳＰＥＩＥＲ，Ｊ．Ｌ．: 'Ａｄｄｉｔｉｏｎ ｏｆ ｓｉｌｉｃｏｎ ｈｙｄｒｉｄｅｓ ｔｏ ｏｌｅｆｉｎｉｃ ｄｏｕｂｌｅ ｂｏｎｄｓ． ＩＶ． Ｔｈｅ ａｄｄｉｔｉｏｎ ｏｆ ｓｔｙｒｅｎｅ ａｎｄ alpha-ｍｅｔｈｙｌｓｔｙｒ' ＪＯＵＲＮＡＬ ＯＦ ＯＲＧＡＮＩＣ ＣＨＥＭＩＳＴＲＹ Ｖ２４ Ｎ１２, 1959, Ｐ２０５２-２０５３ * |
| JPN5008018167; ＫＡＬＭＹＣＨＫＯＶ，Ｇ．Ｖ． ｅｔ ａｌ．: 'Ｓｙｎｔｈｅｓｉｓ ｏｆ ｔｅｔｒａｋｉｓ（ｄｉｍｅｔｈｙｌｓｉｌｏｘｙ）- ａｎｄ ｔｅｔｒａｋｉｓ（ｄｉｍｅｔｈｙｌｏｒｇａｎｏｓｉｌｏｘｙ）ｓｉｌａｎｅｓ' ＪＯＵＲＮＡＬ ＯＦ ＧＥＮＥＲＡＬ ＣＨＥＭＩＳＴＲＹ ＯＦ ＴＨＥ ＵＳＳＲ Ｖ６２ Ｎ３, 1992, Ｐ５９０ * |
| JPN5008018169; ＣＨＵＧＵＮＯＶ，Ｖ．Ｓ．: 'Ｓｙｎｔｈｅｓｉｓ ａｎｄ ｐｒｏｐｅｒｔｉｅｓ ｏｆ ｔｅｔｒａｋｉｓ（ｔｒｉｂｅｎｚｙｌｓｉｌｏｘｙ）ｓｉｌａｎｅ ａｎｄ ｔｅｔｒａｋｉｓ（ｔｒｉｂｅｎｚｙｌｓｉｌｏｘｙ）ｍｅｔｈａｎｅ' ＪＯＵＲＮＡＬ ＯＦ ＧＥＮＥＲＡＬ ＣＨＥＭＩＳＴＲＹ ＯＦ ＴＨＥ ＵＳＳＲ Ｖ２８, 1958, Ｐ３３３-３３５ * |
| JPN5008018171; ＡＮＤＲＩＡＮＯＶ，Ｋ．Ａ． ｅｔ ａｌ．: 'Ｓｙｎｔｈｅｓｉｓ ａｎｄ ｉｎｖｅｓｔｉｇａｔｉｏｎ ｏｆ ｔｈｅ ｐｒｏｐｅｒｔｉｅｓ ｏｆ ｍｅｔｈｙｌｐｈｅｎｅｔｈｙｌｃｙｃｌｏｓｉｌｏｘａｎｅｓ' ＪＯＵＲＮＡＬ ＯＦ ＧＥＮＥＲＡＬ ＣＨＥＭＩＳＴＲＹ ＯＦ ＴＨＥ ＵＳＳＲ Ｖ４７ Ｎ２, 1977, Ｐ３３５-３３８ * |
| JPN5008018173; ＲＥＩＫＨＳＦＥＬ'Ｄ，Ｖ．Ｏ． ｅｔ ａｌ．: 'Ａｄｄｉｔｉｏｎ ｏｆ ｕｎｓａｔｕｒａｔｅｄ ｃｏｍｐｏｕｎｄｓ ｔｏ ａｌｋｙｌ-ｈｙｄｒｏｃｙｃｌｏｓｉｌｏｘａｎｅｓ' ＪＯＵＲＮＡＬ ＯＦ ＧＥＮＥＲＡＬ ＣＨＥＭＩＳＴＲＹ ＯＦ ＴＨＥ ＵＳＳＲ Ｖ４０ Ｎ５, 1970, Ｐ１０６５-１０６９ * |
| JPN5008018175; ＺＥＩＴＬＥＲ，Ｖ．Ａ．: 'Ｔｅｔｒａｋｉｓ（ｔｒｉｐｈｅｎｙｌｓｉｌｏｘｙ）ｔｉｔａｎｉｕｍ ａｎｄ ｓｏｍｅ ｒｅｌａｔｅｄ ｃｏｍｐｏｕｎｄｓ' ＪＯＵＲＮＡＬ ＯＦ ＴＨＥ ＡＭＥＲＩＣＡＮ ＣＨＥＭＩＣＡＬ ＳＯＣＩＥＴＹ Ｖ７９ Ｎ１７, 19570905, Ｐ４６１６-４６１８ * |
| JPN5008018177; ＰＩＥＲＲＯＮ，Ｅ．Ｄ． ｅｔ ａｌ．: 'Ｓｔｒｕｃｔｕｒｅ ｏｆ ２，４，６，８-ｔｅｔｒａｍｅｔｈｌｙ-２，４，６，８-ｔｅｒｒａｐｈｅｎｙｌｃｙｃｌｏｔｅｔｒａｓｉｌｏｘａｎｅ' ＪＯＵＲＮＡＬ ＯＦ ＨＥＴＥＲＯＣＹＣＬＩＣ ＣＨＥＭＩＳＴＲＹ Ｖ３, 196612, Ｐ５３３-５３４ * |
| JPN5008018179; ＡＮＤＲＩＡＮＯＶ，Ｋ．Ａ． ｅｔ ａｌ．: 'Ｎｕｃｌｅｏｐｈｉｌｉｃ ｒｅａｃｔｉｏｎｓ ｏｆ ｏｒｇａｎｏｃｙｃｌｏｓｉｌａｚａｎｅｓ ｏｆ ｄｉｆｆｅｒｅｎｔ ｓｔｒｕｃｔｕｒｅ' ＪＯＵＲＮＡＬ ＯＦ ＯＲＧＡＮＯＭＥＴＡＬＬＩＣ ＣＨＥＭＩＳＴＲＹ Ｖ１６ Ｎ１, 196601, Ｐ５１-６２ * |
| JPN6012028758; ＧＵＰＴＡ，Ｓ．Ｋ． ａｎｄ ＷＥＢＥＲ，Ｗ．Ｐ．: 'Ｒｕｔｈｅｎｉｕｍ ｃａｔａｌｙｚｅｄ ｃｈｅｍｉｃａｌ ｍｏｄｉｆｉｃａｔｉｏｎ ｏｆ ｐｏｌｙ（ｖｉｎｙｌｍｅｔｈｙｌｓｉｌｏｘａｎｅ） ｗｉｔｈ ９-ａｃｅｔｙｌｐｈｅｎａｎｔｈｒｅｎｅ' Ｐｏｌｙｍｅｒ Ｐｒｅｐｒｉｎｔｓ （Ａｍｅｒｉｃａｎ Ｃｈｅｍｉｃａｌ Ｓｏｃｉｅｔｙ， Ｄｉｖｉｓｉｏｎ ｏｆ Ｐｏｌｙｍｅｒ Ｃｈｅｍｉｓｔｒｙ） ４３（１）, 2002, ６４８-６４９ * |
| JPN6012028761; ＭＡＴＹＪＡＳＺＥＷＳＫＩ，Ｋ． ｅｔ ａｌ．: 'Ｓｙｎｔｈｅｓｉｓ ａｎｄ Ｃｈａｒａｃｔｅｒｉｚａｔｉｏｎ ｏｆ Ｓｔａｒ Ｐｏｌｙｍｅｒｓ ｗｉｔｈ Ｖａｒｙｉｎｇ Ａｒｍ Ｎｕｍｂｅｒ， Ｌｅｎｇｔｈ， ａｎｄ Ｃｏｍｐｏｓｉｔｉｏｎ ｆｒｏ' Ｍａｃｒｏｍｏｌｅｃｕｌｅｓ ３２（２０）, 1999, ６５２６-６５３５ * |
| JPN6012028764; ＦＵＨＲＭＡＮＮ， Ｔ． ｅｔ ａｌ．: 'Ｌｉｇｈｔ-ｉｎｄｕｃｅｄ ｉｓｏｍｅｒｉｚａｔｉｏｎ ａｎｄ ｐｈｏｔｏ-ｏｒｉｅｎｔａｔｉｏｎ ｉｎ ａｚｏ ａｎｄ ｓｔｉｌｂｅｎｅ ｐｏｌｙｍｅｒｓ' Ｐｒｏｃｅｅｄｉｎｇｓ ｏｆ ＳＰＩＥ-Ｔｈｅ Ｉｎｔｅｒｎａｔｉｏｎａｌ Ｓｏｃｉｅｔｙ ｆｏｒ Ｏｐｔｉｃａｌ Ｅｎｇｉｎｅｅｒｉｎｇ ２８５２, 1996, ４２-５２ * |
| JPN6012028767; ＺＵＥＶ，Ｖ．Ｖ． ａｎｄ ＫＡＬＩＮＩＮ，Ａ．Ｖ．: 'Ａ Ｆａｃｉｌｅ ａｎｄ Ｅｆｆｉｃｉｅｎｔ Ｓｙｎｔｈｅｓｉｓ ｏｆ Ｏｒｇａｎｏｃｙｃｌｏｓｉｌｏｘａｎｅｓ' Ｐｈｏｓｐｈｏｒｕｓ， Ｓｕｌｆｕｒ ａｎｄ Ｓｉｌｉｃｏｎ ａｎｄ ｔｈｅ Ｒｅｌａｔｅｄ Ｅｌｅｍｅｎｔｓ １７８（６）, 2003, １２８９-１２９４ * |
Also Published As
| Publication number | Publication date |
|---|---|
| US20070092804A1 (en) | 2007-04-26 |
| KR20080063499A (ko) | 2008-07-04 |
| WO2007047840A3 (en) | 2007-08-09 |
| WO2007047840A2 (en) | 2007-04-26 |
| EP1937694A2 (en) | 2008-07-02 |
| CA2625161A1 (en) | 2007-04-26 |
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