JP2009507366A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2009507366A5 JP2009507366A5 JP2008528432A JP2008528432A JP2009507366A5 JP 2009507366 A5 JP2009507366 A5 JP 2009507366A5 JP 2008528432 A JP2008528432 A JP 2008528432A JP 2008528432 A JP2008528432 A JP 2008528432A JP 2009507366 A5 JP2009507366 A5 JP 2009507366A5
- Authority
- JP
- Japan
- Prior art keywords
- exposure apparatus
- projection exposure
- optical element
- layers
- refractive index
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 230000003287 optical effect Effects 0.000 claims 7
- 239000000463 material Substances 0.000 claims 4
- 238000000576 coating method Methods 0.000 claims 3
- 239000006117 anti-reflective coating Substances 0.000 claims 2
- 239000011248 coating agent Substances 0.000 claims 2
- 230000010287 polarization Effects 0.000 claims 2
- 230000005540 biological transmission Effects 0.000 claims 1
- 238000005286 illumination Methods 0.000 claims 1
- 239000011253 protective coating Substances 0.000 claims 1
- 210000001747 pupil Anatomy 0.000 claims 1
- 238000002834 transmittance Methods 0.000 claims 1
- 230000000007 visual effect Effects 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102005041938A DE102005041938A1 (de) | 2005-09-03 | 2005-09-03 | Mikrolithographische Projektionsbelichtungsanlage |
| PCT/EP2006/008605 WO2007025783A2 (de) | 2005-09-03 | 2006-09-04 | Mikrolithographische projektionsbelichtungsanlage |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009507366A JP2009507366A (ja) | 2009-02-19 |
| JP2009507366A5 true JP2009507366A5 (OSRAM) | 2009-10-08 |
Family
ID=37421186
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008528432A Ceased JP2009507366A (ja) | 2005-09-03 | 2006-09-04 | マイクロリソグラフィック投影露光装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (4) | US20080297754A1 (OSRAM) |
| JP (1) | JP2009507366A (OSRAM) |
| KR (1) | KR20080039469A (OSRAM) |
| DE (1) | DE102005041938A1 (OSRAM) |
| WO (1) | WO2007025783A2 (OSRAM) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102005041938A1 (de) | 2005-09-03 | 2007-03-08 | Carl Zeiss Smt Ag | Mikrolithographische Projektionsbelichtungsanlage |
| JP2008135127A (ja) * | 2006-11-29 | 2008-06-12 | Konica Minolta Opto Inc | 光学素子及び光ピックアップ装置 |
| US7929115B2 (en) | 2007-06-01 | 2011-04-19 | Carl Zeiss Smt Gmbh | Projection objective and projection exposure apparatus for microlithography |
| DE102009037077B3 (de) * | 2009-08-13 | 2011-02-17 | Carl Zeiss Smt Ag | Katadioptrisches Projektionsobjektiv |
| CN109068044B (zh) * | 2018-09-28 | 2023-11-03 | 武汉华星光电技术有限公司 | 光学组件以及显示装置 |
| CN117192908B (zh) * | 2023-08-22 | 2024-04-09 | 安徽国芯智能装备有限公司 | 一种直写式光刻机涨缩一致的补偿方法 |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6285443B1 (en) * | 1993-12-13 | 2001-09-04 | Carl-Zeiss-Stiftung | Illuminating arrangement for a projection microlithographic apparatus |
| JPH08148411A (ja) * | 1994-11-24 | 1996-06-07 | Nikon Corp | 投影露光装置 |
| JP3924806B2 (ja) * | 1996-06-10 | 2007-06-06 | 株式会社ニコン | 反射防止膜 |
| US6404499B1 (en) * | 1998-04-21 | 2002-06-11 | Asml Netherlands B.V. | Lithography apparatus with filters for optimizing uniformity of an image |
| EP0952491A3 (en) | 1998-04-21 | 2001-05-09 | Asm Lithography B.V. | Lithography apparatus |
| US6243203B1 (en) * | 1998-04-24 | 2001-06-05 | U.S. Philips Corporation | Optical system with anti-reflection coating |
| EP0994368A3 (en) * | 1998-10-13 | 2000-05-03 | Nikon Corporation | Anti-reflective films, optical elements and reduction-projection exposure apparatus utilizing same |
| JP2000357654A (ja) * | 1998-10-13 | 2000-12-26 | Nikon Corp | 反射防止膜、光学素子、露光装置、及び電子物品 |
| KR20010086056A (ko) * | 1999-09-30 | 2001-09-07 | 시마무라 기로 | 다층 박막을 갖는 광학소자 및 그것을 구비한 노광장치 |
| KR100709045B1 (ko) * | 1999-11-05 | 2007-04-18 | 아사히 가라스 가부시키가이샤 | 자외 및 진공자외 영역의 반사방지 기초체 |
| JP2002189101A (ja) * | 2000-12-21 | 2002-07-05 | Nikon Corp | 反射防止膜、光学素子及び露光装置 |
| WO2003003429A1 (en) * | 2001-06-28 | 2003-01-09 | Nikon Corporation | Projection optical system, exposure system and method |
| DE10144243A1 (de) * | 2001-09-05 | 2003-03-20 | Zeiss Carl | Zoom-System für eine Beleuchtungseinrichtung |
| DE10240598A1 (de) * | 2002-08-27 | 2004-03-25 | Carl Zeiss Smt Ag | Optisches Abbildungssystem, insbesondere katadioptrisches Reduktionsobjektiv |
| DE10258715B4 (de) * | 2002-12-10 | 2006-12-21 | Carl Zeiss Smt Ag | Verfahren zur Herstellung eines optischen Abbildungssystems |
| JP2004302113A (ja) * | 2003-03-31 | 2004-10-28 | Nikon Corp | 反射防止膜、光学部材、光学系及び投影露光装置、並びに反射防止膜の製造方法 |
| DE10329793A1 (de) * | 2003-07-01 | 2005-01-27 | Carl Zeiss Smt Ag | Projektionsobjektiv für eine mikrolithographische Projektionsbelichtungsanlage |
| WO2005069078A1 (en) * | 2004-01-19 | 2005-07-28 | Carl Zeiss Smt Ag | Microlithographic projection exposure apparatus with immersion projection lens |
| KR101199076B1 (ko) | 2004-06-04 | 2012-11-07 | 칼 짜이스 에스엠티 게엠베하 | 강도 변동이 보상된 투사 시스템 및 이를 위한 보상 요소 |
| DE102005041938A1 (de) | 2005-09-03 | 2007-03-08 | Carl Zeiss Smt Ag | Mikrolithographische Projektionsbelichtungsanlage |
| US7518797B2 (en) * | 2005-12-02 | 2009-04-14 | Carl Zeiss Smt Ag | Microlithographic exposure apparatus |
-
2005
- 2005-09-03 DE DE102005041938A patent/DE102005041938A1/de not_active Withdrawn
-
2006
- 2006-09-04 JP JP2008528432A patent/JP2009507366A/ja not_active Ceased
- 2006-09-04 KR KR1020087005239A patent/KR20080039469A/ko not_active Ceased
- 2006-09-04 WO PCT/EP2006/008605 patent/WO2007025783A2/de not_active Ceased
-
2008
- 2008-02-14 US US12/031,595 patent/US20080297754A1/en not_active Abandoned
-
2011
- 2011-05-20 US US13/112,357 patent/US9733395B2/en not_active Expired - Fee Related
-
2014
- 2014-07-15 US US14/331,392 patent/US20140320955A1/en not_active Abandoned
-
2017
- 2017-07-24 US US15/657,624 patent/US20170322343A1/en not_active Abandoned
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP6770037B2 (ja) | 液晶プロジェクター | |
| JP6790831B2 (ja) | 光学フィルタ及び撮像装置 | |
| JP2021500629A (ja) | 光学リターダセグメント | |
| JP2008502127A5 (OSRAM) | ||
| JP2012215790A (ja) | 反射防止膜及び光学素子 | |
| CN101470226A (zh) | 消色差的光偏振空间分布转换器 | |
| JP7566107B2 (ja) | 広帯域可視光反射体 | |
| JP6180089B2 (ja) | 光学素子及びそれを用いた投影型映像表示装置 | |
| JP2011228699A (ja) | 反射光学要素、投影系及び投影露光装置 | |
| Born et al. | Off-axis metasurfaces for folded flat optics | |
| CN110320670A (zh) | 全介质反射型高效超薄分束器及其制备方法与应用 | |
| TWI514097B (zh) | 可由偏振調控重建影像的多光學維度超穎全像片 | |
| Kou et al. | Wideband antireflection coatings by combining interference multilayers with structured top layers in mid infrared spectral | |
| JP2005340459A5 (OSRAM) | ||
| Yang et al. | Broadband polarizers using dual-layer metallic nanowire grids | |
| US12461288B2 (en) | Rainbow reduction for waveguide displays | |
| Li et al. | Near-infrared transmittance enhancement using fully conformal antireflective structured surfaces on microlenses fabricated by direct laser writing | |
| JP2009507366A (ja) | マイクロリソグラフィック投影露光装置 | |
| JP2007156485A5 (OSRAM) | ||
| JP2014130352A (ja) | 光学フィルムおよびこれを備える有機発光表示装置 | |
| Neder | Wide-angle, broadband graded metasurface for back reflection | |
| JP2019040199A (ja) | 光学フィルムおよびこれを備える有機発光表示装置 | |
| WO2018021883A1 (ko) | 편광자 보호용 광학 필름, 이를 포함하는 편광판 및 화상 표시 장치 | |
| CN118891564A (zh) | 透镜部及积层薄膜 | |
| CN118805123A (zh) | 显示系统及积层薄膜 |