JP2009286041A5 - - Google Patents
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- Publication number
- JP2009286041A5 JP2009286041A5 JP2008142312A JP2008142312A JP2009286041A5 JP 2009286041 A5 JP2009286041 A5 JP 2009286041A5 JP 2008142312 A JP2008142312 A JP 2008142312A JP 2008142312 A JP2008142312 A JP 2008142312A JP 2009286041 A5 JP2009286041 A5 JP 2009286041A5
- Authority
- JP
- Japan
- Prior art keywords
- compound
- gas barrier
- outermost surface
- cvd method
- barrier film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000004888 barrier function Effects 0.000 claims description 12
- 125000004432 carbon atom Chemical group C* 0.000 claims description 11
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims description 11
- 229910044991 metal oxide Inorganic materials 0.000 claims description 10
- 150000004706 metal oxides Chemical class 0.000 claims description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 8
- 150000001875 compounds Chemical class 0.000 claims description 8
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 8
- 238000004381 surface treatment Methods 0.000 claims description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 4
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 claims description 4
- 150000001334 alicyclic compounds Chemical class 0.000 claims description 4
- 150000007824 aliphatic compounds Chemical class 0.000 claims description 4
- 150000001491 aromatic compounds Chemical class 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 150000002894 organic compounds Chemical class 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 4
- 229910052731 fluorine Inorganic materials 0.000 claims description 2
- 125000001153 fluoro group Chemical group F* 0.000 claims description 2
- 238000010030 laminating Methods 0.000 claims description 2
- 150000003961 organosilicon compounds Chemical class 0.000 claims description 2
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical class [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 claims description 2
- 238000005229 chemical vapour deposition Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 239000000463 material Substances 0.000 description 2
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008142312A JP5223466B2 (ja) | 2008-05-30 | 2008-05-30 | ガスバリア性フィルム及びその製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008142312A JP5223466B2 (ja) | 2008-05-30 | 2008-05-30 | ガスバリア性フィルム及びその製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009286041A JP2009286041A (ja) | 2009-12-10 |
| JP2009286041A5 true JP2009286041A5 (cg-RX-API-DMAC7.html) | 2011-07-14 |
| JP5223466B2 JP5223466B2 (ja) | 2013-06-26 |
Family
ID=41455727
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008142312A Active JP5223466B2 (ja) | 2008-05-30 | 2008-05-30 | ガスバリア性フィルム及びその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5223466B2 (cg-RX-API-DMAC7.html) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5394867B2 (ja) * | 2009-09-17 | 2014-01-22 | 富士フイルム株式会社 | ガスバリア膜およびガスバリアフィルム |
| JP5862565B2 (ja) | 2010-07-27 | 2016-02-16 | コニカミノルタ株式会社 | ガスバリア性フィルム、ガスバリア性フィルムの製造方法及び電子デバイス |
| EP2650121A4 (en) * | 2010-12-06 | 2014-05-07 | Konica Minolta Inc | GASPERRFILM, METHOD FOR THE PRODUCTION OF GASPERRFILMS AND ELECTRONIC DEVICE |
| US10512988B2 (en) | 2014-03-25 | 2019-12-24 | Sumitomo Metal Mining Co., Ltd. | Coated solder material and method for producing same |
| JP6427478B2 (ja) * | 2015-11-04 | 2018-11-21 | 学校法人慶應義塾 | 薄膜積層フィルム、その製造方法及びその製造装置 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001158976A (ja) * | 1999-12-02 | 2001-06-12 | Showa Aluminum Kan Kk | 大気圧低温プラズマにより処理したｄｉ缶及びその製造方法 |
| JP2002225170A (ja) * | 2001-01-30 | 2002-08-14 | Matsushita Electric Ind Co Ltd | 気体遮蔽性フィルム、その製造方法およびそれを用いた真空断熱体 |
| JP2003291247A (ja) * | 2002-04-05 | 2003-10-14 | Matsushita Electric Ind Co Ltd | 複合材料及びその製造方法 |
| JP4438866B2 (ja) * | 2005-06-01 | 2010-03-24 | コニカミノルタビジネステクノロジーズ株式会社 | 中間転写体、中間転写体の製造装置、中間転写体の製造方法、及び画像形成装置 |
-
2008
- 2008-05-30 JP JP2008142312A patent/JP5223466B2/ja active Active
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