JP2009260352A5 - - Google Patents
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- Publication number
- JP2009260352A5 JP2009260352A5 JP2009097045A JP2009097045A JP2009260352A5 JP 2009260352 A5 JP2009260352 A5 JP 2009260352A5 JP 2009097045 A JP2009097045 A JP 2009097045A JP 2009097045 A JP2009097045 A JP 2009097045A JP 2009260352 A5 JP2009260352 A5 JP 2009260352A5
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- exposure apparatus
- exposure
- supply port
- cleaning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000007788 liquid Substances 0.000 claims 52
- 238000004140 cleaning Methods 0.000 claims 34
- 238000007654 immersion Methods 0.000 claims 21
- 239000000758 substrate Substances 0.000 claims 18
- 238000000034 method Methods 0.000 claims 10
- 230000003287 optical effect Effects 0.000 claims 10
- 230000002265 prevention Effects 0.000 claims 5
- 239000012530 fluid Substances 0.000 claims 4
- 238000004519 manufacturing process Methods 0.000 claims 2
- 239000003513 alkali Substances 0.000 claims 1
- 238000011084 recovery Methods 0.000 claims 1
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US7113208P | 2008-04-14 | 2008-04-14 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009260352A JP2009260352A (ja) | 2009-11-05 |
| JP2009260352A5 true JP2009260352A5 (zh) | 2013-07-18 |
Family
ID=41387282
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009097045A Withdrawn JP2009260352A (ja) | 2008-04-14 | 2009-04-13 | 露光装置、クリーニング方法、及びデバイス製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2009260352A (zh) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL1036709A1 (nl) | 2008-04-24 | 2009-10-27 | Asml Netherlands Bv | Lithographic apparatus and a method of operating the apparatus. |
| NL2005610A (en) | 2009-12-02 | 2011-06-06 | Asml Netherlands Bv | Lithographic apparatus and surface cleaning method. |
| US20120062858A1 (en) * | 2010-04-02 | 2012-03-15 | Nikon Corporation | Cleaning method, device manufacturing method, exposure apparatus, and device manufacturing system |
-
2009
- 2009-04-13 JP JP2009097045A patent/JP2009260352A/ja not_active Withdrawn
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