JP2009253167A5 - - Google Patents

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Publication number
JP2009253167A5
JP2009253167A5 JP2008101815A JP2008101815A JP2009253167A5 JP 2009253167 A5 JP2009253167 A5 JP 2009253167A5 JP 2008101815 A JP2008101815 A JP 2008101815A JP 2008101815 A JP2008101815 A JP 2008101815A JP 2009253167 A5 JP2009253167 A5 JP 2009253167A5
Authority
JP
Japan
Prior art keywords
light source
illumination mode
exposure apparatus
light sources
shape
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2008101815A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009253167A (ja
JP5361239B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2008101815A priority Critical patent/JP5361239B2/ja
Priority claimed from JP2008101815A external-priority patent/JP5361239B2/ja
Priority to US12/407,310 priority patent/US9063406B2/en
Priority to TW98111010A priority patent/TW201003323A/zh
Publication of JP2009253167A publication Critical patent/JP2009253167A/ja
Publication of JP2009253167A5 publication Critical patent/JP2009253167A5/ja
Application granted granted Critical
Publication of JP5361239B2 publication Critical patent/JP5361239B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2008101815A 2008-04-09 2008-04-09 露光装置及びデバイス製造方法 Expired - Fee Related JP5361239B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2008101815A JP5361239B2 (ja) 2008-04-09 2008-04-09 露光装置及びデバイス製造方法
US12/407,310 US9063406B2 (en) 2008-04-09 2009-03-19 Exposure apparatus and a method of manufacturing a device that conduct exposure using a set light source shape
TW98111010A TW201003323A (en) 2008-04-09 2009-04-02 Exposure apparatus and method of manufacturing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008101815A JP5361239B2 (ja) 2008-04-09 2008-04-09 露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2009253167A JP2009253167A (ja) 2009-10-29
JP2009253167A5 true JP2009253167A5 (enExample) 2011-06-23
JP5361239B2 JP5361239B2 (ja) 2013-12-04

Family

ID=41163719

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008101815A Expired - Fee Related JP5361239B2 (ja) 2008-04-09 2008-04-09 露光装置及びデバイス製造方法

Country Status (3)

Country Link
US (1) US9063406B2 (enExample)
JP (1) JP5361239B2 (enExample)
TW (1) TW201003323A (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009010560A1 (de) * 2009-02-17 2010-08-26 Carl Zeiss Smt Ag Projektionsbelichtungsverfahren, Projektionsbelichtungsanlage, Laserstrahlungsquelle und Bandbreiten-Einengungsmodul für eine Laserstrahlungsquelle
CN102289155A (zh) * 2011-08-12 2011-12-21 中国科学技术大学 一种基于紫外led光源的光刻机
JP6057072B2 (ja) * 2013-03-22 2017-01-11 ウシオ電機株式会社 光源装置
NL2014572B1 (en) 2015-04-01 2017-01-06 Suss Microtec Lithography Gmbh Method for regulating a light source of a photolithography exposure system and exposure assembly for a photolithography device.
US10345714B2 (en) * 2016-07-12 2019-07-09 Cymer, Llc Lithography optics adjustment and monitoring
CN108121163B (zh) 2016-11-29 2019-10-25 上海微电子装备（集团）股份有限公司 一种光源曝光剂量控制系统及控制方法
JP2024077101A (ja) * 2022-11-28 2024-06-07 ウシオ電機株式会社 照明光学系、露光装置、照射方法、及び部品の製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3904034B2 (ja) * 1995-11-17 2007-04-11 株式会社ニコン 露光装置
WO1999052130A1 (en) * 1998-04-07 1999-10-14 Nikon Corporation Exposure method, exposure apparatus, method of producing the same, device, and method of fabricating the same
JP2002231613A (ja) * 2001-02-05 2002-08-16 Nikon Corp 露光方法及び装置並びにマスク及びその製造方法
JP4546019B2 (ja) * 2002-07-03 2010-09-15 株式会社日立製作所 露光装置
DE10230652A1 (de) * 2002-07-08 2004-01-29 Carl Zeiss Smt Ag Optische Vorrichtung mit einer Beleuchtungslichtquelle
JP2004274011A (ja) * 2003-01-16 2004-09-30 Nikon Corp 照明光源装置、照明装置、露光装置、及び露光方法
JP2005294473A (ja) * 2004-03-31 2005-10-20 Canon Inc 露光装置、デバイス製造方法及びデバイス
JP2006019412A (ja) 2004-06-30 2006-01-19 Canon Inc 露光装置及びデバイスの製造方法
JP5088665B2 (ja) * 2006-04-12 2012-12-05 セイコーエプソン株式会社 画像表示装置

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