JP5361239B2 - 露光装置及びデバイス製造方法 - Google Patents

露光装置及びデバイス製造方法 Download PDF

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Publication number
JP5361239B2
JP5361239B2 JP2008101815A JP2008101815A JP5361239B2 JP 5361239 B2 JP5361239 B2 JP 5361239B2 JP 2008101815 A JP2008101815 A JP 2008101815A JP 2008101815 A JP2008101815 A JP 2008101815A JP 5361239 B2 JP5361239 B2 JP 5361239B2
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JP
Japan
Prior art keywords
light source
illumination
light
exposure
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2008101815A
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English (en)
Japanese (ja)
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JP2009253167A (ja
JP2009253167A5 (enExample
Inventor
哲也 山本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2008101815A priority Critical patent/JP5361239B2/ja
Priority to US12/407,310 priority patent/US9063406B2/en
Priority to TW98111010A priority patent/TW201003323A/zh
Publication of JP2009253167A publication Critical patent/JP2009253167A/ja
Publication of JP2009253167A5 publication Critical patent/JP2009253167A5/ja
Application granted granted Critical
Publication of JP5361239B2 publication Critical patent/JP5361239B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/72—Controlling or varying light intensity, spectral composition, or exposure time in photographic printing apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Led Device Packages (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Led Devices (AREA)
JP2008101815A 2008-04-09 2008-04-09 露光装置及びデバイス製造方法 Expired - Fee Related JP5361239B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2008101815A JP5361239B2 (ja) 2008-04-09 2008-04-09 露光装置及びデバイス製造方法
US12/407,310 US9063406B2 (en) 2008-04-09 2009-03-19 Exposure apparatus and a method of manufacturing a device that conduct exposure using a set light source shape
TW98111010A TW201003323A (en) 2008-04-09 2009-04-02 Exposure apparatus and method of manufacturing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008101815A JP5361239B2 (ja) 2008-04-09 2008-04-09 露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2009253167A JP2009253167A (ja) 2009-10-29
JP2009253167A5 JP2009253167A5 (enExample) 2011-06-23
JP5361239B2 true JP5361239B2 (ja) 2013-12-04

Family

ID=41163719

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008101815A Expired - Fee Related JP5361239B2 (ja) 2008-04-09 2008-04-09 露光装置及びデバイス製造方法

Country Status (3)

Country Link
US (1) US9063406B2 (enExample)
JP (1) JP5361239B2 (enExample)
TW (1) TW201003323A (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009010560A1 (de) * 2009-02-17 2010-08-26 Carl Zeiss Smt Ag Projektionsbelichtungsverfahren, Projektionsbelichtungsanlage, Laserstrahlungsquelle und Bandbreiten-Einengungsmodul für eine Laserstrahlungsquelle
CN102289155A (zh) * 2011-08-12 2011-12-21 中国科学技术大学 一种基于紫外led光源的光刻机
JP6057072B2 (ja) * 2013-03-22 2017-01-11 ウシオ電機株式会社 光源装置
NL2014572B1 (en) 2015-04-01 2017-01-06 Suss Microtec Lithography Gmbh Method for regulating a light source of a photolithography exposure system and exposure assembly for a photolithography device.
US10345714B2 (en) * 2016-07-12 2019-07-09 Cymer, Llc Lithography optics adjustment and monitoring
CN108121163B (zh) 2016-11-29 2019-10-25 上海微电子装备（集团）股份有限公司 一种光源曝光剂量控制系统及控制方法
JP2024077101A (ja) * 2022-11-28 2024-06-07 ウシオ電機株式会社 照明光学系、露光装置、照射方法、及び部品の製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3904034B2 (ja) * 1995-11-17 2007-04-11 株式会社ニコン 露光装置
WO1999052130A1 (en) * 1998-04-07 1999-10-14 Nikon Corporation Exposure method, exposure apparatus, method of producing the same, device, and method of fabricating the same
JP2002231613A (ja) * 2001-02-05 2002-08-16 Nikon Corp 露光方法及び装置並びにマスク及びその製造方法
JP4546019B2 (ja) * 2002-07-03 2010-09-15 株式会社日立製作所 露光装置
DE10230652A1 (de) * 2002-07-08 2004-01-29 Carl Zeiss Smt Ag Optische Vorrichtung mit einer Beleuchtungslichtquelle
JP2004274011A (ja) * 2003-01-16 2004-09-30 Nikon Corp 照明光源装置、照明装置、露光装置、及び露光方法
JP2005294473A (ja) * 2004-03-31 2005-10-20 Canon Inc 露光装置、デバイス製造方法及びデバイス
JP2006019412A (ja) 2004-06-30 2006-01-19 Canon Inc 露光装置及びデバイスの製造方法
JP5088665B2 (ja) * 2006-04-12 2012-12-05 セイコーエプソン株式会社 画像表示装置

Also Published As

Publication number Publication date
JP2009253167A (ja) 2009-10-29
US20090257038A1 (en) 2009-10-15
US9063406B2 (en) 2015-06-23
TW201003323A (en) 2010-01-16

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