JP2009239294A - 標準パッケージで使用される信頼性が高い強固な第iii族発光ダイオード - Google Patents
標準パッケージで使用される信頼性が高い強固な第iii族発光ダイオード Download PDFInfo
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- JP2009239294A JP2009239294A JP2009125100A JP2009125100A JP2009239294A JP 2009239294 A JP2009239294 A JP 2009239294A JP 2009125100 A JP2009125100 A JP 2009125100A JP 2009125100 A JP2009125100 A JP 2009125100A JP 2009239294 A JP2009239294 A JP 2009239294A
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- light emitting
- emitting diode
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- gallium nitride
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- 150000004767 nitrides Chemical class 0.000 title claims abstract description 22
- 238000004806 packaging method and process Methods 0.000 title abstract 2
- 238000002161 passivation Methods 0.000 claims abstract description 16
- 229910002601 GaN Inorganic materials 0.000 claims description 36
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 claims description 30
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 20
- 239000000758 substrate Substances 0.000 claims description 18
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 16
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 15
- 229910052697 platinum Inorganic materials 0.000 claims description 10
- RNQKDQAVIXDKAG-UHFFFAOYSA-N aluminum gallium Chemical compound [Al].[Ga] RNQKDQAVIXDKAG-UHFFFAOYSA-N 0.000 claims description 8
- 239000004033 plastic Substances 0.000 claims description 5
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 4
- 239000013078 crystal Substances 0.000 claims description 3
- 238000001429 visible spectrum Methods 0.000 claims description 3
- 230000003287 optical effect Effects 0.000 abstract description 6
- 239000000463 material Substances 0.000 description 15
- 239000010931 gold Substances 0.000 description 12
- 229910052737 gold Inorganic materials 0.000 description 9
- 239000010936 titanium Substances 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 8
- 230000007704 transition Effects 0.000 description 7
- 239000011521 glass Substances 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- 229910052719 titanium Inorganic materials 0.000 description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 5
- 238000001228 spectrum Methods 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 235000012239 silicon dioxide Nutrition 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 230000015556 catabolic process Effects 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000007613 environmental effect Effects 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 230000032798 delamination Effects 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 229910052594 sapphire Inorganic materials 0.000 description 2
- 239000010980 sapphire Substances 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910002704 AlGaN Inorganic materials 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 230000001154 acute effect Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000003466 anti-cipated effect Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 229920005570 flexible polymer Polymers 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 239000010985 leather Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 230000036314 physical performance Effects 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 230000005610 quantum mechanics Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 230000002269 spontaneous effect Effects 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium(II) oxide Chemical compound [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/44—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/40—Materials therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/40—Materials therefor
- H01L33/42—Transparent materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48247—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Led Devices (AREA)
- Led Device Packages (AREA)
Abstract
【解決手段】p型第III族窒化物接触層14を有する第III族窒化物ヘテロ接合ダイオード、前記p型接触層に対するオーミック接触16、及び前記オーミック接触上のパシベーション層17を含む。原光出力の少なくとも50%を発光し、85℃の温度で85%の相対湿度の環境において10ミリアンペアで少なくとも1000時間動作させた後の動作電圧が実質的に変化しない特徴を有する。このダイオードを包含するLEDランプも開示される。
【選択図】図3
Description
Claims (14)
- 高信頼性の発光ダイオードであって、このダイオードは:
基板上の緩衝構造上にp型第III族窒化物接触層(14)を有する第III族窒化物ヘテロ接合ダイオード(13);
全記基板に対するオーミック接触(15);を含み、さらに、
前記p型接触層に対する半透明の白金オーミック接触(16);及び
前記白金オーミック接触上の窒化ケイ素パシベーション層(17)
を含むことを特徴とする、ダイオード。 - 前記ダイオードはシングルヘテロ接合ダイオードを含む請求項1記載の高信頼性発光ダイオード。
- 前記ダイオードはダブルヘテロ接合ダイオードを含む請求項1記載の高信頼性発光ダイオード。
- 前記接触層は窒化ガリウムを含む請求項1記載の高信頼性発光ダイオード。
- 可視スペクトルの青色部分で発光する請求項1の発光ダイオード;
赤色発光ダイオード;及び
緑色発光ダイオード
を含むピクセル。 - 20ミリアンペアの順電流入力で800マイクロワットの光出力を生じる請求項1記載の高信頼性発光ダイオード。
- 20ミリアンペアの順電流入力で1600マイクロワットの光出力を生じる請求項1記載の高信頼性発光ダイオード。
- 85℃の温度で85%の相対湿度の環境において10ミリアンペアで少なくとも1000時間動作させた後、少なくとも400マイクロワットの光出力を発光し、かつ、動作電圧が変化しないままである請求項1記載の高信頼性発光ダイオード。
- 前記炭化ケイ素基板は炭化ケイ素の3C,4H,6H,及び15Rのポリタイプからなる群から選ばれる単結晶である請求項1記載の高信頼性発光ダイオード。
- プラスチックレンズ内に請求項1記載のダイオードを包含するLEDランプ。
- 請求項1記載の複数の発光ダイオード、又は請求項5記載の複数のピクセル又は請求項10記載の複数のLEDランプを含む表示装置。
- 前記発光ダイオード又は前記LEDランプは可視スペクトルの青色部分で発光し、そして複数の赤色発光ダイオード又はLEDランプ及び複数の緑色発光ダイオード又はLEDランプを更に含む請求項11記載の表示装置。
- 前記ヘテロ接合ダイオード及び接触層は:
前記緩衝構造上のn型窒化ガリウムエピタキシャル層;
前記窒化ガリウム層上のn型窒化アルミニウムガリウムエピタキシャル層;
前記n型窒化アルミニウムガリウムエピタキシャル層上の補償型n型窒化ガリウム活性層;
前記窒化ガリウム活性層上のp型窒化アルミニウムガリウム層;及び
前記p型窒化アルミニウムガリウム層上のp型窒化ガリウム接触層
を含む請求項1記載の高信頼性発光ダイオード。 - 85℃の温度で85%の相対湿度の環境において10ミリアンペアで少なくとも1000時間動作させた後、少なくとも800マイクロワットの光出力を発光し、かつ、動作電圧が変化しないままである請求項1記載の高信頼性発光ダイオード。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US92040997A | 1997-08-29 | 1997-08-29 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000508147A Division JP4597363B2 (ja) | 1997-08-29 | 1998-08-28 | 標準パッケージで使用される信頼性が高い強固な第iii族発光ダイオード |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009239294A true JP2009239294A (ja) | 2009-10-15 |
JP2009239294A5 JP2009239294A5 (ja) | 2011-02-24 |
Family
ID=25443701
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
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JP2000508147A Expired - Lifetime JP4597363B2 (ja) | 1997-08-29 | 1998-08-28 | 標準パッケージで使用される信頼性が高い強固な第iii族発光ダイオード |
JP2009125100A Ceased JP2009239294A (ja) | 1997-08-29 | 2009-05-25 | 標準パッケージで使用される信頼性が高い強固な第iii族発光ダイオード |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
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JP2000508147A Expired - Lifetime JP4597363B2 (ja) | 1997-08-29 | 1998-08-28 | 標準パッケージで使用される信頼性が高い強固な第iii族発光ダイオード |
Country Status (11)
Country | Link |
---|---|
US (1) | US6946682B2 (ja) |
EP (1) | EP1018169B1 (ja) |
JP (2) | JP4597363B2 (ja) |
KR (1) | KR100651145B1 (ja) |
CN (1) | CN1129192C (ja) |
AT (1) | ATE279789T1 (ja) |
AU (1) | AU9295098A (ja) |
CA (1) | CA2299379C (ja) |
DE (1) | DE69827025T2 (ja) |
ES (1) | ES2226169T3 (ja) |
WO (1) | WO1999010936A2 (ja) |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1142598C (zh) | 1997-07-25 | 2004-03-17 | 日亚化学工业株式会社 | 氮化物半导体发光器件 |
KR100651145B1 (ko) * | 1997-08-29 | 2006-11-28 | 크리 인코포레이티드 | 표준 응용에서 고신뢰성을 위한 강한 3족 질화물 발광다이오드 |
US6825501B2 (en) * | 1997-08-29 | 2004-11-30 | Cree, Inc. | Robust Group III light emitting diode for high reliability in standard packaging applications |
JP3770014B2 (ja) | 1999-02-09 | 2006-04-26 | 日亜化学工業株式会社 | 窒化物半導体素子 |
KR100683877B1 (ko) | 1999-03-04 | 2007-02-15 | 니치아 카가쿠 고교 가부시키가이샤 | 질화물 반도체 레이저소자 |
US6926435B2 (en) * | 2001-08-23 | 2005-08-09 | Wavien, Inc. | Led illumination engine using a reflector |
US6683327B2 (en) | 2001-11-13 | 2004-01-27 | Lumileds Lighting U.S., Llc | Nucleation layer for improved light extraction from light emitting devices |
US6900067B2 (en) | 2002-12-11 | 2005-05-31 | Lumileds Lighting U.S., Llc | Growth of III-nitride films on mismatched substrates without conventional low temperature nucleation layers |
AU2003301057A1 (en) * | 2002-12-20 | 2004-07-22 | Cree, Inc. | Methods of forming semiconductor mesa structures including self-aligned contact layers and related devices |
US20070241352A1 (en) * | 2004-06-18 | 2007-10-18 | Showa Denko K. K. | Group III Nitride Semiconductor Light Emitting Device |
US7432536B2 (en) * | 2004-11-04 | 2008-10-07 | Cree, Inc. | LED with self aligned bond pad |
CN101385145B (zh) | 2006-01-05 | 2011-06-08 | 伊鲁米特克斯公司 | 用于引导来自led的光的分立光学装置 |
US8101961B2 (en) | 2006-01-25 | 2012-01-24 | Cree, Inc. | Transparent ohmic contacts on light emitting diodes with growth substrates |
US7646024B2 (en) * | 2006-08-18 | 2010-01-12 | Cree, Inc. | Structure and method for reducing forward voltage across a silicon carbide-group III nitride interface |
US8087960B2 (en) | 2006-10-02 | 2012-01-03 | Illumitex, Inc. | LED system and method |
US9484499B2 (en) * | 2007-04-20 | 2016-11-01 | Cree, Inc. | Transparent ohmic contacts on light emitting diodes with carrier substrates |
KR20100122485A (ko) | 2008-02-08 | 2010-11-22 | 일루미텍스, 인크. | 발광체층 쉐이핑을 위한 시스템 및 방법 |
TWI362769B (en) | 2008-05-09 | 2012-04-21 | Univ Nat Chiao Tung | Light emitting device and fabrication method therefor |
TW201034256A (en) | 2008-12-11 | 2010-09-16 | Illumitex Inc | Systems and methods for packaging light-emitting diode devices |
US8449128B2 (en) | 2009-08-20 | 2013-05-28 | Illumitex, Inc. | System and method for a lens and phosphor layer |
US8585253B2 (en) | 2009-08-20 | 2013-11-19 | Illumitex, Inc. | System and method for color mixing lens array |
US9660043B2 (en) | 2012-06-04 | 2017-05-23 | Sensor Electronic Technology, Inc. | Ohmic contact to semiconductor layer |
US8969198B2 (en) | 2012-06-04 | 2015-03-03 | Sensor Electronic Technology, Inc. | Ohmic contact to semiconductor layer |
WO2014011964A1 (en) * | 2012-07-12 | 2014-01-16 | Sensor Electronic Technology, Inc. | Metallic contact for optoelectronic semiconductor device |
US9793439B2 (en) | 2012-07-12 | 2017-10-17 | Sensor Electronic Technology, Inc. | Metallic contact for optoelectronic semiconductor device |
US9923118B2 (en) * | 2013-02-25 | 2018-03-20 | Sensor Electronic Technology, Inc. | Semiconductor structure with inhomogeneous regions |
US9412902B2 (en) | 2014-02-22 | 2016-08-09 | Sensor Electronic Technology, Inc. | Semiconductor structure with stress-reducing buffer structure |
US10199535B2 (en) | 2014-02-22 | 2019-02-05 | Sensor Electronic Technology, Inc. | Semiconductor structure with stress-reducing buffer structure |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04264781A (ja) | 1991-02-20 | 1992-09-21 | Eastman Kodak Japan Kk | 発光ダイオードアレイ |
JPH06260680A (ja) * | 1993-03-05 | 1994-09-16 | Nichia Chem Ind Ltd | 窒化ガリウム系化合物半導体発光素子 |
JPH0794783A (ja) * | 1993-09-21 | 1995-04-07 | Nichia Chem Ind Ltd | 窒化ガリウム系化合物半導体発光素子 |
JPH07326823A (ja) * | 1994-05-30 | 1995-12-12 | Canon Inc | 光半導体素子及びその製造方法 |
WO1996009653A1 (en) * | 1994-09-20 | 1996-03-28 | Cree Research Inc. | Vertical geometry light emitting diode with group iii nitride active layer and extended lifetime |
WO1996024167A1 (en) * | 1995-02-03 | 1996-08-08 | Advanced Technology Materials, Inc. | High brightness electroluminescent device emitting in the green to ultraviolet spectrum, and method of making the same |
JPH09191160A (ja) * | 1995-11-06 | 1997-07-22 | Matsushita Electric Ind Co Ltd | 半導体発光素子 |
JP4597363B2 (ja) * | 1997-08-29 | 2010-12-15 | クリー インコーポレイテッド | 標準パッケージで使用される信頼性が高い強固な第iii族発光ダイオード |
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4860069A (en) * | 1983-09-24 | 1989-08-22 | Semiconductor Energy Laboratory Co., Ltd. | Non-single-cry stal semiconductor light emitting device |
US4866005A (en) * | 1987-10-26 | 1989-09-12 | North Carolina State University | Sublimation of silicon carbide to produce large, device quality single crystals of silicon carbide |
JPH0268968A (ja) * | 1988-09-02 | 1990-03-08 | Sharp Corp | 化合物半導体発光素子 |
JP2953468B2 (ja) * | 1989-06-21 | 1999-09-27 | 三菱化学株式会社 | 化合物半導体装置及びその表面処理加工方法 |
JPH04365382A (ja) * | 1991-06-13 | 1992-12-17 | Toshiba Corp | 半導体発光装置及びその駆動方法 |
GB2277405A (en) * | 1993-04-22 | 1994-10-26 | Sharp Kk | Semiconductor colour display or detector array |
DE69425186T3 (de) * | 1993-04-28 | 2005-04-14 | Nichia Corp., Anan | Halbleitervorrichtung aus einer galliumnitridartigen III-V-Halbleiterverbindung und Verfahren zu ihrer Herstellung |
US5416342A (en) * | 1993-06-23 | 1995-05-16 | Cree Research, Inc. | Blue light-emitting diode with high external quantum efficiency |
US5404282A (en) * | 1993-09-17 | 1995-04-04 | Hewlett-Packard Company | Multiple light emitting diode module |
US5393993A (en) * | 1993-12-13 | 1995-02-28 | Cree Research, Inc. | Buffer structure between silicon carbide and gallium nitride and resulting semiconductor devices |
US5592501A (en) * | 1994-09-20 | 1997-01-07 | Cree Research, Inc. | Low-strain laser structures with group III nitride active layers |
US5585648A (en) * | 1995-02-03 | 1996-12-17 | Tischler; Michael A. | High brightness electroluminescent device, emitting in the green to ultraviolet spectrum, and method of making the same |
US5739554A (en) * | 1995-05-08 | 1998-04-14 | Cree Research, Inc. | Double heterojunction light emitting diode with gallium nitride active layer |
US5708280A (en) * | 1996-06-21 | 1998-01-13 | Motorola | Integrated electro-optical package and method of fabrication |
US5813752A (en) * | 1997-05-27 | 1998-09-29 | Philips Electronics North America Corporation | UV/blue LED-phosphor device with short wave pass, long wave pass band pass and peroit filters |
-
1998
- 1998-08-28 KR KR1020007002138A patent/KR100651145B1/ko not_active IP Right Cessation
- 1998-08-28 CN CN98808738A patent/CN1129192C/zh not_active Expired - Lifetime
- 1998-08-28 EP EP98945787A patent/EP1018169B1/en not_active Expired - Lifetime
- 1998-08-28 AT AT98945787T patent/ATE279789T1/de not_active IP Right Cessation
- 1998-08-28 JP JP2000508147A patent/JP4597363B2/ja not_active Expired - Lifetime
- 1998-08-28 AU AU92950/98A patent/AU9295098A/en not_active Abandoned
- 1998-08-28 DE DE69827025T patent/DE69827025T2/de not_active Expired - Lifetime
- 1998-08-28 ES ES98945787T patent/ES2226169T3/es not_active Expired - Lifetime
- 1998-08-28 CA CA002299379A patent/CA2299379C/en not_active Expired - Fee Related
- 1998-08-28 WO PCT/US1998/017849 patent/WO1999010936A2/en active IP Right Grant
-
2003
- 2003-03-21 US US10/393,598 patent/US6946682B2/en not_active Expired - Lifetime
-
2009
- 2009-05-25 JP JP2009125100A patent/JP2009239294A/ja not_active Ceased
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04264781A (ja) | 1991-02-20 | 1992-09-21 | Eastman Kodak Japan Kk | 発光ダイオードアレイ |
JPH06260680A (ja) * | 1993-03-05 | 1994-09-16 | Nichia Chem Ind Ltd | 窒化ガリウム系化合物半導体発光素子 |
JPH0794783A (ja) * | 1993-09-21 | 1995-04-07 | Nichia Chem Ind Ltd | 窒化ガリウム系化合物半導体発光素子 |
JPH07326823A (ja) * | 1994-05-30 | 1995-12-12 | Canon Inc | 光半導体素子及びその製造方法 |
WO1996009653A1 (en) * | 1994-09-20 | 1996-03-28 | Cree Research Inc. | Vertical geometry light emitting diode with group iii nitride active layer and extended lifetime |
WO1996024167A1 (en) * | 1995-02-03 | 1996-08-08 | Advanced Technology Materials, Inc. | High brightness electroluminescent device emitting in the green to ultraviolet spectrum, and method of making the same |
JPH09191160A (ja) * | 1995-11-06 | 1997-07-22 | Matsushita Electric Ind Co Ltd | 半導体発光素子 |
JP4597363B2 (ja) * | 1997-08-29 | 2010-12-15 | クリー インコーポレイテッド | 標準パッケージで使用される信頼性が高い強固な第iii族発光ダイオード |
Also Published As
Publication number | Publication date |
---|---|
ATE279789T1 (de) | 2004-10-15 |
JP2001514451A (ja) | 2001-09-11 |
US6946682B2 (en) | 2005-09-20 |
CA2299379A1 (en) | 1999-03-04 |
CA2299379C (en) | 2006-05-30 |
EP1018169A2 (en) | 2000-07-12 |
EP1018169B1 (en) | 2004-10-13 |
US20040026707A1 (en) | 2004-02-12 |
DE69827025D1 (de) | 2004-11-18 |
CN1129192C (zh) | 2003-11-26 |
AU9295098A (en) | 1999-03-16 |
WO1999010936A3 (en) | 1999-05-14 |
DE69827025T2 (de) | 2005-09-08 |
ES2226169T3 (es) | 2005-03-16 |
KR100651145B1 (ko) | 2006-11-28 |
CN1269056A (zh) | 2000-10-04 |
WO1999010936A2 (en) | 1999-03-04 |
KR20010023492A (ko) | 2001-03-26 |
JP4597363B2 (ja) | 2010-12-15 |
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