JP2009206523A - プラズマ処理装置 - Google Patents
プラズマ処理装置 Download PDFInfo
- Publication number
- JP2009206523A JP2009206523A JP2009137958A JP2009137958A JP2009206523A JP 2009206523 A JP2009206523 A JP 2009206523A JP 2009137958 A JP2009137958 A JP 2009137958A JP 2009137958 A JP2009137958 A JP 2009137958A JP 2009206523 A JP2009206523 A JP 2009206523A
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- Prior art keywords
- electrode
- plasma
- processing apparatus
- gas
- plasma processing
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- 238000000034 method Methods 0.000 claims abstract description 27
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- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
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- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
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- 229920000106 Liquid crystal polymer Polymers 0.000 description 1
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
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- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
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- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
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- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
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- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- KYKAJFCTULSVSH-UHFFFAOYSA-N chloro(fluoro)methane Chemical compound F[C]Cl KYKAJFCTULSVSH-UHFFFAOYSA-N 0.000 description 1
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- 239000012141 concentrate Substances 0.000 description 1
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- 239000002826 coolant Substances 0.000 description 1
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- 238000001784 detoxification Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
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- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
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- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
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- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000001282 iso-butane Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
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- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
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- 125000004434 sulfur atom Chemical group 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Images
Landscapes
- Plasma Technology (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009137958A JP2009206523A (ja) | 2009-06-09 | 2009-06-09 | プラズマ処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009137958A JP2009206523A (ja) | 2009-06-09 | 2009-06-09 | プラズマ処理装置 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006342297A Division JP2008153147A (ja) | 2006-12-20 | 2006-12-20 | プラズマ処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009206523A true JP2009206523A (ja) | 2009-09-10 |
| JP2009206523A5 JP2009206523A5 (enExample) | 2010-02-12 |
Family
ID=41148418
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009137958A Withdrawn JP2009206523A (ja) | 2009-06-09 | 2009-06-09 | プラズマ処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2009206523A (enExample) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2020514946A (ja) * | 2017-06-23 | 2020-05-21 | エルジー・ケム・リミテッド | 二次電池用プラズマ発生装置及びそれを含むラミネーションシステム |
| JP2020194971A (ja) * | 2016-02-26 | 2020-12-03 | 国立大学法人大阪大学 | プラズマ処理装置 |
| CN112638471A (zh) * | 2019-06-24 | 2021-04-09 | 永进生物科技股份有限公司 | 包括二进气口的电浆装置 |
| JP7648226B1 (ja) | 2023-10-20 | 2025-03-18 | 株式会社ジェイテックコーポレーション | プラズマｃｖｍ加工方法及びその装置 |
| TWI902497B (zh) | 2023-10-20 | 2025-10-21 | 日商Ｊｔｅｃ股份有限公司 | 電漿ｃｖｍ加工方法及其裝置 |
-
2009
- 2009-06-09 JP JP2009137958A patent/JP2009206523A/ja not_active Withdrawn
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2020194971A (ja) * | 2016-02-26 | 2020-12-03 | 国立大学法人大阪大学 | プラズマ処理装置 |
| JP2020514946A (ja) * | 2017-06-23 | 2020-05-21 | エルジー・ケム・リミテッド | 二次電池用プラズマ発生装置及びそれを含むラミネーションシステム |
| CN112638471A (zh) * | 2019-06-24 | 2021-04-09 | 永进生物科技股份有限公司 | 包括二进气口的电浆装置 |
| JP7648226B1 (ja) | 2023-10-20 | 2025-03-18 | 株式会社ジェイテックコーポレーション | プラズマｃｖｍ加工方法及びその装置 |
| WO2025084360A1 (ja) * | 2023-10-20 | 2025-04-24 | 株式会社ジェイテックコーポレーション | プラズマｃｖｍ加工方法及びその装置 |
| JP2025070568A (ja) * | 2023-10-20 | 2025-05-02 | 株式会社ジェイテックコーポレーション | プラズマｃｖｍ加工方法及びその装置 |
| TWI902497B (zh) | 2023-10-20 | 2025-10-21 | 日商Ｊｔｅｃ股份有限公司 | 電漿ｃｖｍ加工方法及其裝置 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20091217 |
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| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20091217 |
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| A761 | Written withdrawal of application |
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