JP2009206523A5 - - Google Patents

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Publication number
JP2009206523A5
JP2009206523A5 JP2009137958A JP2009137958A JP2009206523A5 JP 2009206523 A5 JP2009206523 A5 JP 2009206523A5 JP 2009137958 A JP2009137958 A JP 2009137958A JP 2009137958 A JP2009137958 A JP 2009137958A JP 2009206523 A5 JP2009206523 A5 JP 2009206523A5
Authority
JP
Japan
Prior art keywords
electrode
processing gas
dielectric
hole
processing apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2009137958A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009206523A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2009137958A priority Critical patent/JP2009206523A/ja
Priority claimed from JP2009137958A external-priority patent/JP2009206523A/ja
Publication of JP2009206523A publication Critical patent/JP2009206523A/ja
Publication of JP2009206523A5 publication Critical patent/JP2009206523A5/ja
Withdrawn legal-status Critical Current

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JP2009137958A 2009-06-09 2009-06-09 プラズマ処理装置 Withdrawn JP2009206523A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009137958A JP2009206523A (ja) 2009-06-09 2009-06-09 プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009137958A JP2009206523A (ja) 2009-06-09 2009-06-09 プラズマ処理装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2006342297A Division JP2008153147A (ja) 2006-12-20 2006-12-20 プラズマ処理装置

Publications (2)

Publication Number Publication Date
JP2009206523A JP2009206523A (ja) 2009-09-10
JP2009206523A5 true JP2009206523A5 (enExample) 2010-02-12

Family

ID=41148418

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009137958A Withdrawn JP2009206523A (ja) 2009-06-09 2009-06-09 プラズマ処理装置

Country Status (1)

Country Link
JP (1) JP2009206523A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6985758B2 (ja) * 2016-02-26 2021-12-22 国立大学法人大阪大学 プラズマ処理装置
KR102054467B1 (ko) * 2017-06-23 2019-12-11 주식회사 엘지화학 이차전지용 플라즈마 발생장치 및 그를 포함하는 라미네이션 시스템
CN118949278A (zh) * 2019-06-24 2024-11-15 永进生物科技股份有限公司 包括二进气口的电浆装置
JP7648226B1 (ja) * 2023-10-20 2025-03-18 株式会社ジェイテックコーポレーション プラズマｃｖｍ加工方法及びその装置

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