JP2009147300A5 - - Google Patents
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- Publication number
- JP2009147300A5 JP2009147300A5 JP2008256544A JP2008256544A JP2009147300A5 JP 2009147300 A5 JP2009147300 A5 JP 2009147300A5 JP 2008256544 A JP2008256544 A JP 2008256544A JP 2008256544 A JP2008256544 A JP 2008256544A JP 2009147300 A5 JP2009147300 A5 JP 2009147300A5
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- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US96051407P | 2007-10-02 | 2007-10-02 | |
| US60/960,514 | 2007-10-02 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009147300A JP2009147300A (ja) | 2009-07-02 |
| JP2009147300A5 true JP2009147300A5 (ja) | 2011-07-14 |
| JP5008630B2 JP5008630B2 (ja) | 2012-08-22 |
Family
ID=40018002
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008256544A Expired - Fee Related JP5008630B2 (ja) | 2007-10-02 | 2008-10-01 | リソグラフィ装置およびデバイス製造方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8994919B2 (ja) |
| EP (1) | EP2045686B1 (ja) |
| JP (1) | JP5008630B2 (ja) |
| KR (1) | KR101023795B1 (ja) |
| CN (1) | CN101441420B (ja) |
| SG (1) | SG151245A1 (ja) |
| TW (1) | TWI390372B (ja) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8164737B2 (en) | 2007-10-23 | 2012-04-24 | Asml Netherlands B.V. | Lithographic apparatus having an active damping subassembly |
| DE102011007917A1 (de) * | 2011-04-21 | 2012-10-25 | Asml Netherlands B.V. | Anordnung zur Aktuierung eines Elementes in einer mikrolithographischen Projektionsbelichtungsanlage |
| DE102011075393B4 (de) * | 2011-05-06 | 2013-08-14 | Carl Zeiss Smt Gmbh | Anordnung zur Aktuierung eines Elementes in einer Projektionsbelichtungsanlage |
| NL2009902A (en) * | 2011-12-27 | 2013-07-01 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
| US10551751B2 (en) | 2012-04-26 | 2020-02-04 | Asml Netherlands B.V. | Lithography apparatus and device manufacturing method |
| US10888707B2 (en) | 2013-03-19 | 2021-01-12 | Genovus Biotechnologies Inc. | Muscle optimization device and method |
| US10322063B2 (en) | 2013-03-19 | 2019-06-18 | Genovus Biotechnologies Inc. | Muscle optimization device and method |
| AU2015231182B2 (en) * | 2014-03-19 | 2019-07-18 | Genovus Biotechnologies Inc. | Muscle optimization device and method |
| US10036963B2 (en) * | 2016-09-12 | 2018-07-31 | Cymer, Llc | Estimating a gain relationship of an optical source |
| US11169450B2 (en) | 2018-04-25 | 2021-11-09 | Asml Netherlands B.V. | Pneumatic support device and lithographic apparatus with pneumatic support device |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2814241B2 (ja) | 1987-09-25 | 1998-10-22 | 株式会社ブリヂストン | 振動制御装置 |
| JPH01138663A (ja) * | 1987-11-26 | 1989-05-31 | Matsushita Electric Ind Co Ltd | ディスク装置の位置決め制御装置 |
| JPH03102683A (ja) * | 1989-09-14 | 1991-04-30 | Fujitsu Ltd | 磁気ディスク装置 |
| JP2774327B2 (ja) * | 1989-10-06 | 1998-07-09 | 日本電信電話株式会社 | 位置決め装置 |
| JPH0661791A (ja) * | 1992-08-04 | 1994-03-04 | Hitachi Ltd | フィルタ回路およびその制御方法 |
| US5371670A (en) * | 1993-02-01 | 1994-12-06 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Three-parameter tunable tilt-integral-derivative (TID) controller |
| JP2001068396A (ja) * | 1999-08-26 | 2001-03-16 | Canon Inc | ステージ制御装置 |
| JP2001221279A (ja) * | 2000-02-09 | 2001-08-17 | Canon Inc | 能動制振装置 |
| JP3961311B2 (ja) * | 2001-01-19 | 2007-08-22 | エーエスエムエル ネザーランズ ビー．ブイ． | リソグラフィ装置およびデバイスの製造方法 |
| FR2825485B1 (fr) * | 2001-05-29 | 2005-02-18 | Alstom | Procede et dispositif de controle de vitesse angulaire d'une chaine electromecanique peu amortie |
| US20030169412A1 (en) * | 2002-03-08 | 2003-09-11 | Hazelton Andrew J. | Reaction frame for a wafer scanning stage with electromagnetic connections to ground |
| TWI230844B (en) * | 2002-06-07 | 2005-04-11 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
| JP4370113B2 (ja) * | 2003-03-18 | 2009-11-25 | オリンパス株式会社 | 可動ミラー装置および光ファイバ装置 |
| US7110083B2 (en) * | 2003-11-19 | 2006-09-19 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| WO2005121901A1 (en) * | 2004-06-09 | 2005-12-22 | Koninklijke Philips Electronics N.V. | System and method for damping structural modes using active vibration control |
| US7265813B2 (en) * | 2004-12-28 | 2007-09-04 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7726452B2 (en) * | 2005-06-02 | 2010-06-01 | Technical Manufacturing Corporation | Systems and methods for active vibration damping |
| TWI313486B (en) * | 2005-07-28 | 2009-08-11 | Nuflare Technology Inc | Position measurement apparatus and method and writing apparatus and method |
| US20070097340A1 (en) * | 2005-10-31 | 2007-05-03 | Nikon Corporation | Active damper with counter mass to compensate for structural vibrations of a lithographic system |
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2008
- 2008-10-01 JP JP2008256544A patent/JP5008630B2/ja not_active Expired - Fee Related
- 2008-10-02 TW TW97137984A patent/TWI390372B/zh not_active IP Right Cessation
- 2008-10-02 SG SG200807529-3A patent/SG151245A1/en unknown
- 2008-10-02 EP EP20080165684 patent/EP2045686B1/en not_active Expired - Fee Related
- 2008-10-02 US US12/244,326 patent/US8994919B2/en not_active Expired - Fee Related
- 2008-10-02 KR KR1020080096972A patent/KR101023795B1/ko not_active IP Right Cessation
- 2008-10-06 CN CN 200810191103 patent/CN101441420B/zh not_active Expired - Fee Related