SG151245A1 - Lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus and device manufacturing method

Info

Publication number
SG151245A1
SG151245A1 SG200807529-3A SG2008075293A SG151245A1 SG 151245 A1 SG151245 A1 SG 151245A1 SG 2008075293 A SG2008075293 A SG 2008075293A SG 151245 A1 SG151245 A1 SG 151245A1
Authority
SG
Singapore
Prior art keywords
related quantity
device manufacturing
lithographic apparatus
filter unit
position related
Prior art date
Application number
SG200807529-3A
Other languages
English (en)
Inventor
Butler Hans
Der Wijst Marc Wilhelmus Maria Van
Hoon Cornelius Adrianus Lam De
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG151245A1 publication Critical patent/SG151245A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D19/00—Control of mechanical oscillations, e.g. of amplitude, of frequency, of phase
    • G05D19/02—Control of mechanical oscillations, e.g. of amplitude, of frequency, of phase characterised by the use of electric means
SG200807529-3A 2007-10-02 2008-10-02 Lithographic apparatus and device manufacturing method SG151245A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US96051407P 2007-10-02 2007-10-02

Publications (1)

Publication Number Publication Date
SG151245A1 true SG151245A1 (en) 2009-04-30

Family

ID=40018002

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200807529-3A SG151245A1 (en) 2007-10-02 2008-10-02 Lithographic apparatus and device manufacturing method

Country Status (7)

Country Link
US (1) US8994919B2 (ja)
EP (1) EP2045686B1 (ja)
JP (1) JP5008630B2 (ja)
KR (1) KR101023795B1 (ja)
CN (1) CN101441420B (ja)
SG (1) SG151245A1 (ja)
TW (1) TWI390372B (ja)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8164737B2 (en) 2007-10-23 2012-04-24 Asml Netherlands B.V. Lithographic apparatus having an active damping subassembly
DE102011007917A1 (de) * 2011-04-21 2012-10-25 Asml Netherlands B.V. Anordnung zur Aktuierung eines Elementes in einer mikrolithographischen Projektionsbelichtungsanlage
DE102011075393B4 (de) * 2011-05-06 2013-08-14 Carl Zeiss Smt Gmbh Anordnung zur Aktuierung eines Elementes in einer Projektionsbelichtungsanlage
NL2009902A (en) * 2011-12-27 2013-07-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
US10551751B2 (en) 2012-04-26 2020-02-04 Asml Netherlands B.V. Lithography apparatus and device manufacturing method
US10888707B2 (en) 2013-03-19 2021-01-12 Genovus Biotechnologies Inc. Muscle optimization device and method
US10322063B2 (en) 2013-03-19 2019-06-18 Genovus Biotechnologies Inc. Muscle optimization device and method
AU2015231182B2 (en) * 2014-03-19 2019-07-18 Genovus Biotechnologies Inc. Muscle optimization device and method
US10036963B2 (en) * 2016-09-12 2018-07-31 Cymer, Llc Estimating a gain relationship of an optical source
US11169450B2 (en) 2018-04-25 2021-11-09 Asml Netherlands B.V. Pneumatic support device and lithographic apparatus with pneumatic support device

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2814241B2 (ja) 1987-09-25 1998-10-22 株式会社ブリヂストン 振動制御装置
JPH01138663A (ja) * 1987-11-26 1989-05-31 Matsushita Electric Ind Co Ltd ディスク装置の位置決め制御装置
JPH03102683A (ja) * 1989-09-14 1991-04-30 Fujitsu Ltd 磁気ディスク装置
JP2774327B2 (ja) * 1989-10-06 1998-07-09 日本電信電話株式会社 位置決め装置
JPH0661791A (ja) * 1992-08-04 1994-03-04 Hitachi Ltd フィルタ回路およびその制御方法
US5371670A (en) * 1993-02-01 1994-12-06 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Three-parameter tunable tilt-integral-derivative (TID) controller
JP2001068396A (ja) * 1999-08-26 2001-03-16 Canon Inc ステージ制御装置
JP2001221279A (ja) * 2000-02-09 2001-08-17 Canon Inc 能動制振装置
JP3961311B2 (ja) * 2001-01-19 2007-08-22 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置およびデバイスの製造方法
FR2825485B1 (fr) * 2001-05-29 2005-02-18 Alstom Procede et dispositif de controle de vitesse angulaire d'une chaine electromecanique peu amortie
US20030169412A1 (en) * 2002-03-08 2003-09-11 Hazelton Andrew J. Reaction frame for a wafer scanning stage with electromagnetic connections to ground
TWI230844B (en) * 2002-06-07 2005-04-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
JP4370113B2 (ja) * 2003-03-18 2009-11-25 オリンパス株式会社 可動ミラー装置および光ファイバ装置
US7110083B2 (en) * 2003-11-19 2006-09-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2005121901A1 (en) * 2004-06-09 2005-12-22 Koninklijke Philips Electronics N.V. System and method for damping structural modes using active vibration control
US7265813B2 (en) * 2004-12-28 2007-09-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7726452B2 (en) * 2005-06-02 2010-06-01 Technical Manufacturing Corporation Systems and methods for active vibration damping
TWI313486B (en) * 2005-07-28 2009-08-11 Nuflare Technology Inc Position measurement apparatus and method and writing apparatus and method
US20070097340A1 (en) * 2005-10-31 2007-05-03 Nikon Corporation Active damper with counter mass to compensate for structural vibrations of a lithographic system

Also Published As

Publication number Publication date
US20090103066A1 (en) 2009-04-23
KR20090034287A (ko) 2009-04-07
EP2045686A3 (en) 2010-03-10
CN101441420A (zh) 2009-05-27
CN101441420B (zh) 2012-10-24
JP5008630B2 (ja) 2012-08-22
JP2009147300A (ja) 2009-07-02
TWI390372B (zh) 2013-03-21
KR101023795B1 (ko) 2011-03-21
EP2045686B1 (en) 2013-07-31
EP2045686A2 (en) 2009-04-08
US8994919B2 (en) 2015-03-31
TW200925813A (en) 2009-06-16

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