JP2009141314A5 - - Google Patents

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JP2009141314A5
JP2009141314A5 JP2008148918A JP2008148918A JP2009141314A5 JP 2009141314 A5 JP2009141314 A5 JP 2009141314A5 JP 2008148918 A JP2008148918 A JP 2008148918A JP 2008148918 A JP2008148918 A JP 2008148918A JP 2009141314 A5 JP2009141314 A5 JP 2009141314A5
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Prior art keywords
tape
peeling
wafer
protective
protective tape
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JP2008148918A
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JP5061324B2 (en
JP2009141314A (en
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Priority to JP2008148918A priority Critical patent/JP5061324B2/en
Priority claimed from JP2008148918A external-priority patent/JP5061324B2/en
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Publication of JP2009141314A5 publication Critical patent/JP2009141314A5/ja
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Claims (7)

裏面側をダイシングテープを介してダイシングフレームにマウントされたウエハの表面側に貼り付けられた保護テープに剥離テープを貼り付けてから前記保護テープを剥離テープと一体に取り去るウエハの保護テープの剥離方法において、
長尺状で前記ウエハよりも細幅の剥離テープをウエハ表面の外周縁部に接近させ、
前記ウエハ外側に位置する剥離テープをダイシングテープより離反するよう傾斜した状態で保持しながら、前記保護テープの剥離始端部外周縁部に沿って剥離テープをそのほぼ全幅にわたって熱圧着し、
前記剥離テープとウエハの少なくとも一方を剥離テープの長さ方向に沿って水平動させて、前記剥離テープの熱圧着部付近を略180°折り返し、
続いて前記剥離テープの供給側と回収側部分を固定した後、
前記剥離ユニットとウエハを剥離テープの長さ方向に沿って相対的に移動させて、ウエハ上から保護テープを剥離し、
前記保護テープの剥離途中で前記剥離テープの固定状態を解除した後、前記剥離テープと保護テープとを巻き取って回収し、
前記保護テープの剥離終端部付近で前記保護テープをウエハに対して離反させることを特徴とするウエハの保護テープの剥離方法。
A method for peeling off a protective tape on a wafer, wherein a peeling tape is attached to a protective tape attached to the front side of a wafer whose back side is mounted on a dicing frame via a dicing tape, and then the protective tape is removed together with the peeling tape. In
Than the wafer elongated to approximate release tape narrow on the outer peripheral edge portion of the wafer surface,
While maintaining the inclined state to away from the peeling tape dicing tape located outside the wafer, peeling the tape was thermocompression over its entire width along the outer peripheral edge of the peeling starting end of the protection tape,
The release tape and with at least one of the wafer is horizontally moving along the length of the peeling tape, to return folded around thermocompression bonded portions of the peeling tape approximately 180 °,
After fixing the recovery side portion and the supply side of the release tape subsequently,
Relatively moving the peeling unit and the wafer along the length direction of the peeling tape to peel off the protective tape from the wafer;
After releasing the fixed state of the peeling tape in the middle of peeling of the protective tape, the reeling tape and the protective tape are wound up and collected,
A method for peeling off a protective tape from a wafer, wherein the protective tape is separated from the wafer in the vicinity of a peeling termination portion of the protective tape.
熱圧着ヒータの圧着後、ウエハ外側に位置する剥離テープを下から支えつつその張力を緩和させた状態で熱圧着ヒータの圧着を解くことを特徴とする請求項1に記載のウエハの保護テープの剥離方法。 After crimping of the thermocompression bonding heater, the protection of the wafer according to claim 1, characterized in that solving the crimping of thermocompression bonding the heater peeling tape located outside the wafer in a state of relaxed the tension of their being supported from below Tape peeling method. ウエハからの保護テープの剥離工程の中盤から終盤にかけて、ウエハの剥離後端側から保護テープに向けてエアブローを行い、保護テープを浮かせてダイシングテープに接しないようにしたことを特徴とする請求項1又は2に記載のウエハの保護テープの剥離方法。   The air tape is blown toward the protective tape from the rear end side of the wafer peeling from the middle stage to the final stage of the peeling process of the protective tape from the wafer, and the protective tape is lifted so as not to contact the dicing tape. 3. A method for peeling off a wafer protective tape according to 1 or 2. 裏面側をダイシングテープを介してダイシングフレームにマウントされたウエハを吸着保持する剥離テーブルと、前記剥離テーブル上のウエハの表面側に貼り付けられた保護テープに剥離テープを貼り付けてから前記保護テープを剥離テープと一体に取り去る剥離ユニットとからなるウエハの保護テープの剥離装置において、
前記剥離テーブルと剥離ユニットとは、前記ウエハ表面に対しての相対的な接近離反動と、前記剥離テープの長さ方向に沿った相対的な水平動が自在に設けられ
前記剥離ユニットは、長尺状で前記ウエハよりも細幅の剥離テープを供給及び回収する剥離テープ走行機構と、
前記剥離テープをウエハ表面の外周縁部に接近させた際、剥離テープをウエハより外側の位置でダイシングテープより離反するよう傾斜させた状態で保持すると共に、前記保護テープの剥離を開始する際に、前記剥離テープの供給側と回収側を固定する剥離テープ保持機構と、
前記保護テープの剥離始端部外周縁部に沿って前記剥離テープのほぼ全幅にわたって熱圧着する熱圧着ヒータと、
前記剥離テープに対して進退動可能に構成され、進出位置では、前記ウエハの外側に位置する剥離テープの下側に位置して剥離テープを下方から支持すると共に、前記剥離ユニットと剥離テーブルを剥離テープの長さ方向に沿って相対的に水平動させる際に、前記ウエハ外側に位置する剥離テープをウエハ上面側に押し戻して、剥離テープに略180°の折り返しを形成し、退去位置では、前記剥離テープの幅方向外側に向けて退去するガイドピンとを有することを特徴とするウエハの保護テープの剥離装置。
The protective tape backside and the separation table for attracting and holding the mounted wafer dicing frame via the dicing tape from the paste the peeling tape to the protective tape joined to the surface side of the wafer on the peeling table In the wafer protective tape peeling device comprising a peeling unit that removes the peeling tape and the wafer,
Wherein the peeling table and stripping units, the relative proximity away recoil of respect to the wafer surface, the relative horizontal movement along the length direction of the release tape is provided freely,
The peeling unit includes a peeling tape running mechanism for supplying and recovering the release tape narrow than the wafer with elongated,
When the peeling tape is brought close to the outer peripheral edge of the wafer surface, the peeling tape is held in an inclined state so as to be separated from the dicing tape at a position outside the wafer, and when the peeling of the protective tape is started. A release tape holding mechanism for fixing the supply side and the recovery side of the release tape;
And thermocompression bonding the heater you thermocompression over substantially the entire width of the release tape along the outer peripheral edge of the peeling starting end of the protective tape,
It is configured to be movable back and forth with respect to the peeling tape. At the advanced position, the peeling tape is positioned below the peeling tape located outside the wafer to support the peeling tape from below, and the peeling unit and the peeling table are peeled off. When moving relatively horizontally along the length direction of the tape, the release tape located outside the wafer is pushed back to the upper surface side of the wafer to form a fold of about 180 ° on the release tape. A peeling device for a protective tape on a wafer, comprising a guide pin that moves away toward the outside in the width direction of the peeling tape .
ウエハの剥離後端側から剥離工程中の保護テープに向けてエアブローを行い、保護テープを浮かせてダイシングテープに接しないようにしたエアブロー装置を有することを特徴とする請求項4に記載のウエハの保護テープの剥離装置。   5. The wafer according to claim 4, further comprising: an air blow device that blows air from a rear end side of the wafer toward a protective tape in a peeling process, and floats the protective tape so as not to contact the dicing tape. Protective tape peeling device. 剥離テーブルは、ウエハ載置部分が周囲より盛り上がっていることを特徴とする請求項4又は5に記載のウエハの保護テープの剥離装置。   6. The apparatus for peeling off a wafer protective tape according to claim 4, wherein the peeling table has a wafer mounting portion raised from the periphery. 剥離テーブルの吸着部分は、ダイシングテープの外径よりも小さく、且つ、ダイシングフレームのダイシングテープ貼付下面の一部に跨るように形成されていることを特徴とする請求項4乃至6のいずれか1項に記載のウエハの保護テープの剥離装置。   The adsorption part of the peeling table is smaller than the outer diameter of the dicing tape and is formed so as to straddle part of the lower surface of the dicing frame attached to the dicing frame. The apparatus for peeling off a protective tape for a wafer according to the item.
JP2008148918A 2007-11-13 2008-06-06 Wafer protective tape peeling method and apparatus Active JP5061324B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008148918A JP5061324B2 (en) 2007-11-13 2008-06-06 Wafer protective tape peeling method and apparatus

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2007294695 2007-11-13
JP2007294695 2007-11-13
JP2008148918A JP5061324B2 (en) 2007-11-13 2008-06-06 Wafer protective tape peeling method and apparatus

Publications (3)

Publication Number Publication Date
JP2009141314A JP2009141314A (en) 2009-06-25
JP2009141314A5 true JP2009141314A5 (en) 2011-08-04
JP5061324B2 JP5061324B2 (en) 2012-10-31

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Families Citing this family (12)

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Publication number Priority date Publication date Assignee Title
JP4740297B2 (en) * 2008-09-04 2011-08-03 リンテック株式会社 MOUNTING DEVICE AND MOUNTING METHOD
JP4740298B2 (en) * 2008-09-04 2011-08-03 リンテック株式会社 Sheet peeling apparatus and peeling method
JP5203888B2 (en) * 2008-10-22 2013-06-05 リンテック株式会社 Sheet peeling apparatus and peeling method
JP5203895B2 (en) * 2008-11-12 2013-06-05 リンテック株式会社 Sheet peeling apparatus and peeling method
JP5381821B2 (en) * 2010-03-10 2014-01-08 三菱電機株式会社 Protective tape peeling method and protective tape peeling apparatus
JP5687647B2 (en) 2012-03-14 2015-03-18 株式会社東芝 Semiconductor device manufacturing method and semiconductor manufacturing apparatus
JP5945158B2 (en) * 2012-05-14 2016-07-05 リンテック株式会社 Sheet peeling apparatus and peeling method
JP2014212158A (en) * 2013-04-17 2014-11-13 株式会社ディスコ Method for exfoliating protective tape
KR101507829B1 (en) * 2014-08-06 2015-04-07 주식회사 도원비전 Demounting Device of Film and System with this apparatus
CN107180767B (en) * 2017-06-16 2023-11-03 深圳市骄冠科技实业有限公司 Radio frequency chip chain belt and manufacturing process thereof
JP7320696B2 (en) * 2018-09-19 2023-08-04 株式会社タカトリ Adhesive tape supply device and supply method, sheet material peeling device and peeling method
CN112259494B (en) * 2020-10-21 2023-10-31 英特尔产品(成都)有限公司 Apparatus and method for removing a wafer from dicing tape attached to a wafer frame

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4204653B2 (en) * 1997-06-20 2009-01-07 リンテック株式会社 Sheet peeling apparatus and method
JP2003152058A (en) * 2001-11-13 2003-05-23 Lintec Corp Wafer transfer apparatus
JP2004304133A (en) * 2003-04-01 2004-10-28 Lintec Corp Wafer treatment device
JP4550510B2 (en) * 2004-07-27 2010-09-22 リンテック株式会社 Sheet peeling apparatus and peeling method
JP4326519B2 (en) * 2005-03-31 2009-09-09 日東電工株式会社 Protective tape peeling method and apparatus using the same
JP2007173495A (en) * 2005-12-22 2007-07-05 Matsushita Electric Ind Co Ltd Apparatus and method for peeling off adhesive tape

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