JP2009067627A5 - - Google Patents

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Publication number
JP2009067627A5
JP2009067627A5 JP2007237484A JP2007237484A JP2009067627A5 JP 2009067627 A5 JP2009067627 A5 JP 2009067627A5 JP 2007237484 A JP2007237484 A JP 2007237484A JP 2007237484 A JP2007237484 A JP 2007237484A JP 2009067627 A5 JP2009067627 A5 JP 2009067627A5
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JP
Japan
Prior art keywords
cerium oxide
sedimentation volume
weight
stirring
hours
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007237484A
Other languages
English (en)
Japanese (ja)
Other versions
JP4294710B2 (ja
JP2009067627A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2007237484A external-priority patent/JP4294710B2/ja
Priority to JP2007237484A priority Critical patent/JP4294710B2/ja
Priority to US12/514,824 priority patent/US20100058671A1/en
Priority to PCT/JP2008/065937 priority patent/WO2009034905A1/ja
Priority to KR1020097011413A priority patent/KR20090079976A/ko
Priority to DE112008000366T priority patent/DE112008000366T5/de
Publication of JP2009067627A publication Critical patent/JP2009067627A/ja
Publication of JP2009067627A5 publication Critical patent/JP2009067627A5/ja
Publication of JP4294710B2 publication Critical patent/JP4294710B2/ja
Application granted granted Critical
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2007237484A 2007-09-13 2007-09-13 酸化セリウム及びその製造方法 Active JP4294710B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2007237484A JP4294710B2 (ja) 2007-09-13 2007-09-13 酸化セリウム及びその製造方法
DE112008000366T DE112008000366T5 (de) 2007-09-13 2008-09-04 Ceroxid und Verfahren zu dessen Herstellung
PCT/JP2008/065937 WO2009034905A1 (ja) 2007-09-13 2008-09-04 酸化セリウム及びその製造方法
KR1020097011413A KR20090079976A (ko) 2007-09-13 2008-09-04 산화세륨 및 그 제조 방법
US12/514,824 US20100058671A1 (en) 2007-09-13 2008-09-04 Cerium oxide and method for producing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007237484A JP4294710B2 (ja) 2007-09-13 2007-09-13 酸化セリウム及びその製造方法

Publications (3)

Publication Number Publication Date
JP2009067627A JP2009067627A (ja) 2009-04-02
JP2009067627A5 true JP2009067627A5 (enExample) 2009-05-14
JP4294710B2 JP4294710B2 (ja) 2009-07-15

Family

ID=40451914

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007237484A Active JP4294710B2 (ja) 2007-09-13 2007-09-13 酸化セリウム及びその製造方法

Country Status (5)

Country Link
US (1) US20100058671A1 (enExample)
JP (1) JP4294710B2 (enExample)
KR (1) KR20090079976A (enExample)
DE (1) DE112008000366T5 (enExample)
WO (1) WO2009034905A1 (enExample)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010275179A (ja) * 2009-04-28 2010-12-09 Tsurumi Soda Co Ltd セリウムの回収方法
JP5574527B2 (ja) * 2009-12-25 2014-08-20 日揮触媒化成株式会社 酸化セリウム微粒子の製造方法
CN107474799B (zh) 2010-03-12 2020-12-29 昭和电工材料株式会社 悬浮液、研磨液套剂、研磨液以及使用它们的基板的研磨方法
US9881801B2 (en) 2010-11-22 2018-01-30 Hitachi Chemical Company, Ltd. Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrate
KR101476943B1 (ko) 2010-11-22 2014-12-24 히타치가세이가부시끼가이샤 슬러리, 연마액 세트, 연마액, 기판의 연마 방법 및 기판
CN103221503A (zh) * 2010-11-22 2013-07-24 日立化成株式会社 磨粒的制造方法、悬浮液的制造方法以及研磨液的制造方法
SG11201405091TA (en) 2012-02-21 2014-09-26 Hitachi Chemical Co Ltd Polishing agent, polishing agent set, and substrate polishing method
KR102004570B1 (ko) 2012-02-21 2019-07-26 히타치가세이가부시끼가이샤 연마제, 연마제 세트 및 기체의 연마 방법
JP5943073B2 (ja) 2012-05-22 2016-06-29 日立化成株式会社 スラリー、研磨液セット、研磨液及び基体の研磨方法
WO2013175859A1 (ja) 2012-05-22 2013-11-28 日立化成株式会社 スラリー、研磨液セット、研磨液、基体の研磨方法及び基体
JP5943072B2 (ja) 2012-05-22 2016-06-29 日立化成株式会社 スラリー、研磨液セット、研磨液及び基体の研磨方法
WO2014156114A1 (ja) * 2013-03-25 2014-10-02 Hoya株式会社 情報記録媒体用ガラス基板の製造方法
WO2014208379A1 (ja) * 2013-06-27 2014-12-31 コニカミノルタ株式会社 研磨材、研磨材の製造方法及び研磨加工方法
JP2019131447A (ja) * 2018-02-02 2019-08-08 ヒロセホールディングス株式会社 酸化セリウム微粒子の製造方法
US11384254B2 (en) * 2020-04-15 2022-07-12 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing composition containing composite silica particles, method of making the silica composite particles and method of polishing a substrate
KR102490006B1 (ko) * 2020-08-31 2023-01-18 솔브레인 주식회사 산화 세륨 입자, 이를 포함하는 화학적 기계적 연마 슬러리 조성물 및 반도체 소자의 제조 방법
WO2022257153A1 (en) * 2021-06-11 2022-12-15 Dic Corporation Ceria particles and method for producing the same
TW202438447A (zh) * 2022-12-23 2024-10-01 日商東麗股份有限公司 氧化鈰的奈米粒子及其製造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5174984A (en) * 1987-06-29 1992-12-29 Rhone-Poulenc Chimie Ceric oxide with new morphological characteristics and method for obtaining same
JP2746861B2 (ja) * 1995-11-20 1998-05-06 三井金属鉱業株式会社 酸化セリウム超微粒子の製造方法
WO1997029510A1 (fr) * 1996-02-07 1997-08-14 Hitachi Chemical Company, Ltd. Abrasif d'oxyde de cerium, microplaquette semi-conductrice, dispositif semi-conducteur, procede pour les produire et procede pour polir les substrats
JP2000203834A (ja) * 1998-12-28 2000-07-25 Kose Corp 超微粒子酸化セリウム及び超微粒子金属酸化物・酸化セリウム複合体、その製造方法並びにそれを配合した樹脂組成物及び化粧料
JP2001253709A (ja) * 2000-03-09 2001-09-18 Sumitomo Chem Co Ltd 結晶性酸化第二セリウム粒子の製造方法
JP4067759B2 (ja) * 2000-11-17 2008-03-26 株式会社コーセー 酸化亜鉛固溶酸化セリウムの製造方法
JP2006249129A (ja) * 2005-03-08 2006-09-21 Hitachi Chem Co Ltd 研磨剤の製造方法及び研磨剤
EP1838620B1 (en) * 2005-10-14 2016-12-14 Lg Chem, Ltd. Method for preparing a cerium oxide powder for a chemical mechanical polishing slurry

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