JP2009004074A - 4つのダブル・ゲートのトランジスタを備える非対称sramセル - Google Patents

4つのダブル・ゲートのトランジスタを備える非対称sramセル Download PDF

Info

Publication number
JP2009004074A
JP2009004074A JP2008147062A JP2008147062A JP2009004074A JP 2009004074 A JP2009004074 A JP 2009004074A JP 2008147062 A JP2008147062 A JP 2008147062A JP 2008147062 A JP2008147062 A JP 2008147062A JP 2009004074 A JP2009004074 A JP 2009004074A
Authority
JP
Japan
Prior art keywords
transistor
gate electrode
memory cell
transistors
gate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2008147062A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009004074A5 (enExample
Inventor
Bastien Giraud
バスティアン、ジロー
Amara Amara
アマラ、アマラ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Publication of JP2009004074A publication Critical patent/JP2009004074A/ja
Publication of JP2009004074A5 publication Critical patent/JP2009004074A5/ja
Withdrawn legal-status Critical Current

Links

Images

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • G11C11/40Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
    • G11C11/41Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming static cells with positive feedback, i.e. cells not needing refreshing or charge regeneration, e.g. bistable multivibrator or Schmitt trigger
    • G11C11/412Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming static cells with positive feedback, i.e. cells not needing refreshing or charge regeneration, e.g. bistable multivibrator or Schmitt trigger using field-effect transistors only

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Static Random-Access Memory (AREA)
  • Semiconductor Memories (AREA)
JP2008147062A 2007-06-04 2008-06-04 4つのダブル・ゲートのトランジスタを備える非対称sramセル Withdrawn JP2009004074A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0703955A FR2916895B1 (fr) 2007-06-04 2007-06-04 Cellule memoire sram asymetrique a 4 transistors double grille

Publications (2)

Publication Number Publication Date
JP2009004074A true JP2009004074A (ja) 2009-01-08
JP2009004074A5 JP2009004074A5 (enExample) 2011-06-30

Family

ID=38935890

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008147062A Withdrawn JP2009004074A (ja) 2007-06-04 2008-06-04 4つのダブル・ゲートのトランジスタを備える非対称sramセル

Country Status (5)

Country Link
US (1) US7733688B2 (enExample)
EP (1) EP2003650B1 (enExample)
JP (1) JP2009004074A (enExample)
DE (1) DE602008000257D1 (enExample)
FR (1) FR2916895B1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8072797B2 (en) * 2008-07-07 2011-12-06 Certichip Inc. SRAM cell without dedicated access transistors
US8363455B2 (en) 2008-12-04 2013-01-29 David Rennie Eight transistor soft error robust storage cell
TWI470631B (zh) * 2011-06-01 2015-01-21 Univ Nat Chiao Tung 雙埠次臨界靜態隨機存取記憶體單元
CN116230053B (zh) * 2023-03-01 2023-12-22 芯立嘉集成电路(杭州)有限公司 一种四晶体管静态随机存取存储器和存取方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6442060B1 (en) 2000-05-09 2002-08-27 Monolithic System Technology, Inc. High-density ratio-independent four-transistor RAM cell fabricated with a conventional logic process
KR100560948B1 (ko) 2004-03-31 2006-03-14 매그나칩 반도체 유한회사 6 트랜지스터 듀얼 포트 에스램 셀
JP4795653B2 (ja) * 2004-06-15 2011-10-19 ルネサスエレクトロニクス株式会社 半導体記憶装置
US7532501B2 (en) * 2005-06-02 2009-05-12 International Business Machines Corporation Semiconductor device including back-gated transistors and method of fabricating the device
US7313012B2 (en) * 2006-02-27 2007-12-25 International Business Machines Corporation Back-gate controlled asymmetrical memory cell and memory using the cell
FR2898432B1 (fr) * 2006-03-10 2008-04-11 Commissariat Energie Atomique Cellules memoire en technologie cmos double-grille dotee de transistors a deux grilles independantes
FR2910999B1 (fr) * 2006-12-28 2009-04-03 Commissariat Energie Atomique Cellule memoire dotee de transistors double-grille, a grilles independantes et asymetriques
US7710765B2 (en) * 2007-09-27 2010-05-04 Micron Technology, Inc. Back gated SRAM cell

Also Published As

Publication number Publication date
US20080298118A1 (en) 2008-12-04
EP2003650A1 (fr) 2008-12-17
EP2003650B1 (fr) 2009-11-04
US7733688B2 (en) 2010-06-08
FR2916895A1 (fr) 2008-12-05
DE602008000257D1 (de) 2009-12-17
FR2916895B1 (fr) 2009-08-28

Similar Documents

Publication Publication Date Title
JP4822791B2 (ja) 半導体記憶装置
JP3906166B2 (ja) 半導体記憶装置
US7511989B2 (en) Memory cells in double-gate CMOS technology provided with transistors with two independent gates
US8654572B2 (en) 10T SRAM cell with near dual port functionality
US8159863B2 (en) 6T SRAM cell with single sided write
US20110103137A1 (en) Source controlled sram
US8164945B2 (en) 8T SRAM cell with two single sided ports
JP2002368135A (ja) 半導体記憶装置
US7474583B2 (en) Semiconductor memory device
JP2010140534A (ja) 半導体記憶装置
US10062419B2 (en) Digtial circuit structures
JP5057757B2 (ja) 半導体集積回路
JP2009004074A (ja) 4つのダブル・ゲートのトランジスタを備える非対称sramセル
JP2008047190A (ja) 半導体装置
US8179715B2 (en) 8T SRAM cell with four load transistors
US8339839B2 (en) SRAM cell for single sided write
JP2007323770A (ja) Sram
JP2008135169A (ja) 半導体記憶装置
JP4127523B2 (ja) 半導体集積回路およびその駆動方法
JP2011090782A (ja) 半導体記憶装置
CN119724290A (zh) 存储器器件、写入辅助电路和方法
JP2013054793A (ja) Sramおよびその制御方法
JP2011071530A (ja) 半導体記憶装置
JP2011076673A (ja) 半導体記憶装置
JP2011018438A (ja) 半導体装置

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20110517

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20110517

A761 Written withdrawal of application

Free format text: JAPANESE INTERMEDIATE CODE: A761

Effective date: 20120919

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20120919