JP2008540960A - 高エネルギで且つ高温度のガス用の隔離弁 - Google Patents

高エネルギで且つ高温度のガス用の隔離弁 Download PDF

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Publication number
JP2008540960A
JP2008540960A JP2008511229A JP2008511229A JP2008540960A JP 2008540960 A JP2008540960 A JP 2008540960A JP 2008511229 A JP2008511229 A JP 2008511229A JP 2008511229 A JP2008511229 A JP 2008511229A JP 2008540960 A JP2008540960 A JP 2008540960A
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JP
Japan
Prior art keywords
valve
movable element
opening
fluid
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2008511229A
Other languages
English (en)
Japanese (ja)
Inventor
ベセン,マシュー・エム
スミス,ドナルド・ケイ
コリンズ,ロン・ジュニア,ダブリュー
ピセラ,ジャロスロー
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MKS Instruments Inc
Original Assignee
MKS Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by MKS Instruments Inc filed Critical MKS Instruments Inc
Publication of JP2008540960A publication Critical patent/JP2008540960A/ja
Pending legal-status Critical Current

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Classifications

    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16KVALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K11/00Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves
    • F16K11/02Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit
    • F16K11/08Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit comprising only taps or cocks
    • F16K11/085Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit comprising only taps or cocks with cylindrical plug
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/452Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by activating reactive gas streams before their introduction into the reaction chamber, e.g. by ionisation or addition of reactive species
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16KVALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K11/00Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves
    • F16K11/02Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit
    • F16K11/08Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit comprising only taps or cocks
    • F16K11/085Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit comprising only taps or cocks with cylindrical plug
    • F16K11/0856Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit comprising only taps or cocks with cylindrical plug having all the connecting conduits situated in more than one plane perpendicular to the axis of the plug
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16KVALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K5/00Plug valves; Taps or cocks comprising only cut-off apparatus having at least one of the sealing faces shaped as a more or less complete surface of a solid of revolution, the opening and closing movement being predominantly rotary
    • F16K5/04Plug valves; Taps or cocks comprising only cut-off apparatus having at least one of the sealing faces shaped as a more or less complete surface of a solid of revolution, the opening and closing movement being predominantly rotary with plugs having cylindrical surfaces; Packings therefor
    • F16K5/0421Fixed plug and turning sleeve
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16KVALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K51/00Other details not peculiar to particular types of valves or cut-off apparatus

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Details Of Valves (AREA)
  • Sliding Valves (AREA)
  • Temperature-Responsive Valves (AREA)
  • Lift Valve (AREA)
  • Valve Housings (AREA)
JP2008511229A 2005-05-09 2006-05-08 高エネルギで且つ高温度のガス用の隔離弁 Pending JP2008540960A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/124,704 US20060249702A1 (en) 2005-05-09 2005-05-09 Isolation valve for energetic and high temperature gases
PCT/US2006/017700 WO2006122015A2 (en) 2005-05-09 2006-05-08 Isolation valve for energetic and high temperature gasses

Publications (1)

Publication Number Publication Date
JP2008540960A true JP2008540960A (ja) 2008-11-20

Family

ID=36923399

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008511229A Pending JP2008540960A (ja) 2005-05-09 2006-05-08 高エネルギで且つ高温度のガス用の隔離弁

Country Status (7)

Country Link
US (1) US20060249702A1 (zh)
EP (1) EP1886050A2 (zh)
JP (1) JP2008540960A (zh)
KR (1) KR20080011284A (zh)
CN (1) CN101198812A (zh)
TW (1) TW200706785A (zh)
WO (1) WO2006122015A2 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017516964A (ja) * 2014-05-23 2017-06-22 オイル システム 液体移送装置

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8632689B2 (en) * 2011-10-27 2014-01-21 Applied Materials, Inc. Temperature control with stacked proportioning valve
WO2015009709A1 (en) * 2013-07-18 2015-01-22 Postevka Valentin Cylindrical valve assembly
CN106382134B (zh) * 2015-07-29 2018-11-02 上海电气电站设备有限公司 无芯式汽轮机进汽阀
CN106015683A (zh) * 2016-08-05 2016-10-12 维都利阀门有限公司 耐冲蚀可调节型旋塞阀

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5751066A (en) * 1980-07-22 1982-03-25 Stanadyne Inc Valve structure

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1043935A (en) * 1911-03-20 1912-11-12 Harlyn Hitchcock Valve.
US1160342A (en) * 1914-02-17 1915-11-16 Walter E Taft Faucet or valve.
US1695014A (en) * 1925-05-18 1928-12-11 Alfred G Heggem Valve
US1792906A (en) * 1927-08-16 1931-02-17 Henry C Heilos Valve
US3276466A (en) * 1962-05-18 1966-10-04 Lockheed Aircraft Corp Rotary hot gas valve
US3971402A (en) * 1975-04-21 1976-07-27 Gallo William C Rotary valve assembly
US4206778A (en) * 1979-01-15 1980-06-10 Gallo William C Rotary valve assembly having a dual purpose valve element
KR100491875B1 (ko) * 2003-02-20 2005-05-31 대명엔지니어링 주식회사 반도체 제조공정용 배기가스 배출밸브

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5751066A (en) * 1980-07-22 1982-03-25 Stanadyne Inc Valve structure

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017516964A (ja) * 2014-05-23 2017-06-22 オイル システム 液体移送装置

Also Published As

Publication number Publication date
EP1886050A2 (en) 2008-02-13
KR20080011284A (ko) 2008-02-01
US20060249702A1 (en) 2006-11-09
WO2006122015A2 (en) 2006-11-16
WO2006122015A3 (en) 2007-01-18
TW200706785A (en) 2007-02-16
CN101198812A (zh) 2008-06-11

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