TW200706785A - Isolation valve for energetic and high-temperature gases - Google Patents

Isolation valve for energetic and high-temperature gases

Info

Publication number
TW200706785A
TW200706785A TW095116276A TW95116276A TW200706785A TW 200706785 A TW200706785 A TW 200706785A TW 095116276 A TW095116276 A TW 095116276A TW 95116276 A TW95116276 A TW 95116276A TW 200706785 A TW200706785 A TW 200706785A
Authority
TW
Taiwan
Prior art keywords
moveable element
aperture
energetic
isolation valve
temperature gases
Prior art date
Application number
TW095116276A
Other languages
English (en)
Inventor
Matthew M Besen
Donald K Smith
Ron W Collins Jr
Jaroslaw Pisera
Original Assignee
Mks Instr Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mks Instr Inc filed Critical Mks Instr Inc
Publication of TW200706785A publication Critical patent/TW200706785A/zh

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K11/00—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves
    • F16K11/02—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit
    • F16K11/08—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit comprising only taps or cocks
    • F16K11/085—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit comprising only taps or cocks with cylindrical plug
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/452—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by activating reactive gas streams before their introduction into the reaction chamber, e.g. by ionisation or addition of reactive species
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K11/00—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves
    • F16K11/02—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit
    • F16K11/08—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit comprising only taps or cocks
    • F16K11/085—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit comprising only taps or cocks with cylindrical plug
    • F16K11/0856—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit comprising only taps or cocks with cylindrical plug having all the connecting conduits situated in more than one plane perpendicular to the axis of the plug
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K5/00—Plug valves; Taps or cocks comprising only cut-off apparatus having at least one of the sealing faces shaped as a more or less complete surface of a solid of revolution, the opening and closing movement being predominantly rotary
    • F16K5/04—Plug valves; Taps or cocks comprising only cut-off apparatus having at least one of the sealing faces shaped as a more or less complete surface of a solid of revolution, the opening and closing movement being predominantly rotary with plugs having cylindrical surfaces; Packings therefor
    • F16K5/0421—Fixed plug and turning sleeve
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K51/00—Other details not peculiar to particular types of valves or cut-off apparatus

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Details Of Valves (AREA)
  • Temperature-Responsive Valves (AREA)
  • Sliding Valves (AREA)
  • Lift Valve (AREA)
  • Valve Housings (AREA)
TW095116276A 2005-05-09 2006-05-08 Isolation valve for energetic and high-temperature gases TW200706785A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/124,704 US20060249702A1 (en) 2005-05-09 2005-05-09 Isolation valve for energetic and high temperature gases

Publications (1)

Publication Number Publication Date
TW200706785A true TW200706785A (en) 2007-02-16

Family

ID=36923399

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095116276A TW200706785A (en) 2005-05-09 2006-05-08 Isolation valve for energetic and high-temperature gases

Country Status (7)

Country Link
US (1) US20060249702A1 (zh)
EP (1) EP1886050A2 (zh)
JP (1) JP2008540960A (zh)
KR (1) KR20080011284A (zh)
CN (1) CN101198812A (zh)
TW (1) TW200706785A (zh)
WO (1) WO2006122015A2 (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8632689B2 (en) * 2011-10-27 2014-01-21 Applied Materials, Inc. Temperature control with stacked proportioning valve
EP3022412A4 (en) * 2013-07-18 2017-03-29 Postevka, Valentin Cylindrical valve assembly
FR3021307B1 (fr) * 2014-05-23 2016-07-01 Cryl Dispositif de transfert d'un liquide
CN106382134B (zh) * 2015-07-29 2018-11-02 上海电气电站设备有限公司 无芯式汽轮机进汽阀
CN106015683A (zh) * 2016-08-05 2016-10-12 维都利阀门有限公司 耐冲蚀可调节型旋塞阀

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1043935A (en) * 1911-03-20 1912-11-12 Harlyn Hitchcock Valve.
US1160342A (en) * 1914-02-17 1915-11-16 Walter E Taft Faucet or valve.
US1695014A (en) * 1925-05-18 1928-12-11 Alfred G Heggem Valve
US1792906A (en) * 1927-08-16 1931-02-17 Henry C Heilos Valve
US3276466A (en) * 1962-05-18 1966-10-04 Lockheed Aircraft Corp Rotary hot gas valve
US3971402A (en) * 1975-04-21 1976-07-27 Gallo William C Rotary valve assembly
US4206778A (en) * 1979-01-15 1980-06-10 Gallo William C Rotary valve assembly having a dual purpose valve element
US4319735A (en) * 1980-07-22 1982-03-16 Stanadyne, Inc. Faucet valves
KR100491875B1 (ko) * 2003-02-20 2005-05-31 대명엔지니어링 주식회사 반도체 제조공정용 배기가스 배출밸브

Also Published As

Publication number Publication date
US20060249702A1 (en) 2006-11-09
CN101198812A (zh) 2008-06-11
JP2008540960A (ja) 2008-11-20
WO2006122015A2 (en) 2006-11-16
KR20080011284A (ko) 2008-02-01
EP1886050A2 (en) 2008-02-13
WO2006122015A3 (en) 2007-01-18

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