JP2008533746A5 - - Google Patents

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Publication number
JP2008533746A5
JP2008533746A5 JP2008502141A JP2008502141A JP2008533746A5 JP 2008533746 A5 JP2008533746 A5 JP 2008533746A5 JP 2008502141 A JP2008502141 A JP 2008502141A JP 2008502141 A JP2008502141 A JP 2008502141A JP 2008533746 A5 JP2008533746 A5 JP 2008533746A5
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JP
Japan
Prior art keywords
container
temperature control
temperature
liquid
control apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2008502141A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008533746A (ja
JP5156621B2 (ja
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Publication date
Application filed filed Critical
Priority claimed from PCT/US2006/010037 external-priority patent/WO2006099619A2/en
Publication of JP2008533746A publication Critical patent/JP2008533746A/ja
Publication of JP2008533746A5 publication Critical patent/JP2008533746A5/ja
Application granted granted Critical
Publication of JP5156621B2 publication Critical patent/JP5156621B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2008502141A 2005-03-17 2006-03-17 バブラー用温度制御装置 Expired - Fee Related JP5156621B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US66307205P 2005-03-17 2005-03-17
US66300005P 2005-03-17 2005-03-17
US60/663,072 2005-03-17
US60/663,000 2005-03-17
PCT/US2006/010037 WO2006099619A2 (en) 2005-03-17 2006-03-17 Temperature control unit for bubblers

Publications (3)

Publication Number Publication Date
JP2008533746A JP2008533746A (ja) 2008-08-21
JP2008533746A5 true JP2008533746A5 (https=) 2009-05-07
JP5156621B2 JP5156621B2 (ja) 2013-03-06

Family

ID=36992481

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008502141A Expired - Fee Related JP5156621B2 (ja) 2005-03-17 2006-03-17 バブラー用温度制御装置

Country Status (5)

Country Link
US (1) US8118939B2 (https=)
EP (1) EP1866458A4 (https=)
JP (1) JP5156621B2 (https=)
TW (1) TWI431449B (https=)
WO (1) WO2006099619A2 (https=)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2432371B (en) * 2005-11-17 2011-06-15 Epichem Ltd Improved bubbler for the transportation of substances by a carrier gas
US20080018004A1 (en) * 2006-06-09 2008-01-24 Air Products And Chemicals, Inc. High Flow GaCl3 Delivery
US8568529B2 (en) * 2009-04-10 2013-10-29 Applied Materials, Inc. HVPE chamber hardware
CN102597310B (zh) 2009-11-02 2015-02-04 西格玛-奥吉奇有限责任公司 固态前体输送组件以及相关方法
EA028837B1 (ru) * 2009-11-30 2018-01-31 Петер Сентиваньи Способ и устройство для обработки газов
CN102467136B (zh) * 2010-10-31 2015-03-25 扬州百思德新材料有限公司 反应釜温度控制装置
DE102012015045A1 (de) * 2012-07-31 2014-02-06 Dockweiler Ag Vorrichtung zum Temperieren eines Gefäßes in einer Kammer
US20150053375A1 (en) * 2013-08-20 2015-02-26 Noah Precision, Llc Multi-loop temperature control system for a semiconductor manufacture process
JP6094513B2 (ja) * 2014-02-28 2017-03-15 東京エレクトロン株式会社 処理ガス発生装置、処理ガス発生方法、基板処理方法及び記憶媒体
FI129579B (en) * 2019-06-28 2022-05-13 Beneq Oy Precursor source arrangement and atomic layer deposition apparatus
EP3786321A3 (de) 2019-08-27 2021-03-17 Albert-Ludwigs-Universität Freiburg Verfahren und vorrichtung zur herstellung einer schicht und damit versehenes substrat
WO2021097047A1 (en) * 2019-11-12 2021-05-20 Heat X, LLC Magnetic induction water heater/chiller with separate heating/chilling zones
US20230154766A1 (en) * 2021-11-18 2023-05-18 Applied Materials, Inc. Pre-clean chamber assembly architecture for improved serviceability

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Publication number Priority date Publication date Assignee Title
US3470902A (en) * 1967-03-01 1969-10-07 Atomic Energy Commission Liquid flow control device
US4269057A (en) * 1979-10-24 1981-05-26 The United States Of America As Represented By The Secretary Of The Army Multipurpose humidity controlled agent generator
US4441925A (en) * 1981-04-04 1984-04-10 Hiroshi Ishizuka Method and an apparatus for producing titanium metal from titanium tetrachloride
JPS5995170U (ja) * 1982-12-17 1984-06-28 富士通株式会社 化学気相成長装置
JPS62104022A (ja) * 1985-10-30 1987-05-14 Seiko Epson Corp 液体原料気化装置
US4612772A (en) * 1985-11-04 1986-09-23 Jones David E Thermo-electric temperature controller for liquid chemical bubbler containers
US4911101A (en) * 1988-07-20 1990-03-27 General Electric Company Metal organic molecular beam epitaxy (MOMBE) apparatus
JPH0760258B2 (ja) * 1988-09-28 1995-06-28 富士写真フイルム株式会社 ハロゲン化銀カラー写真感光材料の処理方法
EP0366601B1 (de) * 1988-10-21 1993-12-22 Büchi Laboratoriums-Technik AG Rotationsverdampfer
JPH0644098Y2 (ja) * 1989-02-27 1994-11-14 黒谷 信子 半導体ウェハーの洗浄用バブラー
JPH0697081A (ja) * 1992-09-10 1994-04-08 Fujitsu Ltd 気相成長装置
JP2791424B2 (ja) * 1993-03-19 1998-08-27 工業技術院長 半導体加工装置
TW359943B (en) * 1994-07-18 1999-06-01 Silicon Valley Group Thermal Single body injector and method for delivering gases to a surface
US5968379A (en) * 1995-07-14 1999-10-19 Applied Materials, Inc. High temperature ceramic heater assembly with RF capability and related methods
JPH10130845A (ja) * 1996-10-29 1998-05-19 Mitsubishi Heavy Ind Ltd 化学蒸着用蒸気発生装置
JP2948791B2 (ja) * 1998-01-22 1999-09-13 アプライド マテリアルズ インコーポレイテッド 液体貯蔵容器の交換方法
FI118805B (fi) * 2000-05-15 2008-03-31 Asm Int Menetelmä ja kokoonpano kaasufaasireaktantin syöttämiseksi reaktiokammioon
US6561498B2 (en) * 2001-04-09 2003-05-13 Lorex Industries, Inc. Bubbler for use in vapor generation systems
TW539822B (en) * 2001-07-03 2003-07-01 Asm Inc Source chemical container assembly
US6790475B2 (en) * 2002-04-09 2004-09-14 Wafermasters Inc. Source gas delivery
US7077388B2 (en) * 2002-07-19 2006-07-18 Asm America, Inc. Bubbler for substrate processing
JP2004327534A (ja) * 2003-04-22 2004-11-18 Nec Kansai Ltd 有機金属原料気相成長装置
KR20050004379A (ko) * 2003-07-02 2005-01-12 삼성전자주식회사 원자층 증착용 가스 공급 장치

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