JP2008533746A5 - - Google Patents
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- Publication number
- JP2008533746A5 JP2008533746A5 JP2008502141A JP2008502141A JP2008533746A5 JP 2008533746 A5 JP2008533746 A5 JP 2008533746A5 JP 2008502141 A JP2008502141 A JP 2008502141A JP 2008502141 A JP2008502141 A JP 2008502141A JP 2008533746 A5 JP2008533746 A5 JP 2008533746A5
- Authority
- JP
- Japan
- Prior art keywords
- container
- temperature control
- temperature
- liquid
- control apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007788 liquid Substances 0.000 claims 7
- 239000012530 fluid Substances 0.000 claims 2
- 238000007789 sealing Methods 0.000 claims 2
- 238000001816 cooling Methods 0.000 claims 1
- 238000001704 evaporation Methods 0.000 claims 1
- 230000008020 evaporation Effects 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 230000003134 recirculating effect Effects 0.000 claims 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US66307205P | 2005-03-17 | 2005-03-17 | |
| US66300005P | 2005-03-17 | 2005-03-17 | |
| US60/663,072 | 2005-03-17 | ||
| US60/663,000 | 2005-03-17 | ||
| PCT/US2006/010037 WO2006099619A2 (en) | 2005-03-17 | 2006-03-17 | Temperature control unit for bubblers |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008533746A JP2008533746A (ja) | 2008-08-21 |
| JP2008533746A5 true JP2008533746A5 (https=) | 2009-05-07 |
| JP5156621B2 JP5156621B2 (ja) | 2013-03-06 |
Family
ID=36992481
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008502141A Expired - Fee Related JP5156621B2 (ja) | 2005-03-17 | 2006-03-17 | バブラー用温度制御装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US8118939B2 (https=) |
| EP (1) | EP1866458A4 (https=) |
| JP (1) | JP5156621B2 (https=) |
| TW (1) | TWI431449B (https=) |
| WO (1) | WO2006099619A2 (https=) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2432371B (en) * | 2005-11-17 | 2011-06-15 | Epichem Ltd | Improved bubbler for the transportation of substances by a carrier gas |
| US20080018004A1 (en) * | 2006-06-09 | 2008-01-24 | Air Products And Chemicals, Inc. | High Flow GaCl3 Delivery |
| US8568529B2 (en) * | 2009-04-10 | 2013-10-29 | Applied Materials, Inc. | HVPE chamber hardware |
| CN102597310B (zh) | 2009-11-02 | 2015-02-04 | 西格玛-奥吉奇有限责任公司 | 固态前体输送组件以及相关方法 |
| EA028837B1 (ru) * | 2009-11-30 | 2018-01-31 | Петер Сентиваньи | Способ и устройство для обработки газов |
| CN102467136B (zh) * | 2010-10-31 | 2015-03-25 | 扬州百思德新材料有限公司 | 反应釜温度控制装置 |
| DE102012015045A1 (de) * | 2012-07-31 | 2014-02-06 | Dockweiler Ag | Vorrichtung zum Temperieren eines Gefäßes in einer Kammer |
| US20150053375A1 (en) * | 2013-08-20 | 2015-02-26 | Noah Precision, Llc | Multi-loop temperature control system for a semiconductor manufacture process |
| JP6094513B2 (ja) * | 2014-02-28 | 2017-03-15 | 東京エレクトロン株式会社 | 処理ガス発生装置、処理ガス発生方法、基板処理方法及び記憶媒体 |
| FI129579B (en) * | 2019-06-28 | 2022-05-13 | Beneq Oy | Precursor source arrangement and atomic layer deposition apparatus |
| EP3786321A3 (de) | 2019-08-27 | 2021-03-17 | Albert-Ludwigs-Universität Freiburg | Verfahren und vorrichtung zur herstellung einer schicht und damit versehenes substrat |
| WO2021097047A1 (en) * | 2019-11-12 | 2021-05-20 | Heat X, LLC | Magnetic induction water heater/chiller with separate heating/chilling zones |
| US20230154766A1 (en) * | 2021-11-18 | 2023-05-18 | Applied Materials, Inc. | Pre-clean chamber assembly architecture for improved serviceability |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3470902A (en) * | 1967-03-01 | 1969-10-07 | Atomic Energy Commission | Liquid flow control device |
| US4269057A (en) * | 1979-10-24 | 1981-05-26 | The United States Of America As Represented By The Secretary Of The Army | Multipurpose humidity controlled agent generator |
| US4441925A (en) * | 1981-04-04 | 1984-04-10 | Hiroshi Ishizuka | Method and an apparatus for producing titanium metal from titanium tetrachloride |
| JPS5995170U (ja) * | 1982-12-17 | 1984-06-28 | 富士通株式会社 | 化学気相成長装置 |
| JPS62104022A (ja) * | 1985-10-30 | 1987-05-14 | Seiko Epson Corp | 液体原料気化装置 |
| US4612772A (en) * | 1985-11-04 | 1986-09-23 | Jones David E | Thermo-electric temperature controller for liquid chemical bubbler containers |
| US4911101A (en) * | 1988-07-20 | 1990-03-27 | General Electric Company | Metal organic molecular beam epitaxy (MOMBE) apparatus |
| JPH0760258B2 (ja) * | 1988-09-28 | 1995-06-28 | 富士写真フイルム株式会社 | ハロゲン化銀カラー写真感光材料の処理方法 |
| EP0366601B1 (de) * | 1988-10-21 | 1993-12-22 | Büchi Laboratoriums-Technik AG | Rotationsverdampfer |
| JPH0644098Y2 (ja) * | 1989-02-27 | 1994-11-14 | 黒谷 信子 | 半導体ウェハーの洗浄用バブラー |
| JPH0697081A (ja) * | 1992-09-10 | 1994-04-08 | Fujitsu Ltd | 気相成長装置 |
| JP2791424B2 (ja) * | 1993-03-19 | 1998-08-27 | 工業技術院長 | 半導体加工装置 |
| TW359943B (en) * | 1994-07-18 | 1999-06-01 | Silicon Valley Group Thermal | Single body injector and method for delivering gases to a surface |
| US5968379A (en) * | 1995-07-14 | 1999-10-19 | Applied Materials, Inc. | High temperature ceramic heater assembly with RF capability and related methods |
| JPH10130845A (ja) * | 1996-10-29 | 1998-05-19 | Mitsubishi Heavy Ind Ltd | 化学蒸着用蒸気発生装置 |
| JP2948791B2 (ja) * | 1998-01-22 | 1999-09-13 | アプライド マテリアルズ インコーポレイテッド | 液体貯蔵容器の交換方法 |
| FI118805B (fi) * | 2000-05-15 | 2008-03-31 | Asm Int | Menetelmä ja kokoonpano kaasufaasireaktantin syöttämiseksi reaktiokammioon |
| US6561498B2 (en) * | 2001-04-09 | 2003-05-13 | Lorex Industries, Inc. | Bubbler for use in vapor generation systems |
| TW539822B (en) * | 2001-07-03 | 2003-07-01 | Asm Inc | Source chemical container assembly |
| US6790475B2 (en) * | 2002-04-09 | 2004-09-14 | Wafermasters Inc. | Source gas delivery |
| US7077388B2 (en) * | 2002-07-19 | 2006-07-18 | Asm America, Inc. | Bubbler for substrate processing |
| JP2004327534A (ja) * | 2003-04-22 | 2004-11-18 | Nec Kansai Ltd | 有機金属原料気相成長装置 |
| KR20050004379A (ko) * | 2003-07-02 | 2005-01-12 | 삼성전자주식회사 | 원자층 증착용 가스 공급 장치 |
-
2006
- 2006-03-17 TW TW095109180A patent/TWI431449B/zh not_active IP Right Cessation
- 2006-03-17 EP EP06738999A patent/EP1866458A4/en not_active Withdrawn
- 2006-03-17 JP JP2008502141A patent/JP5156621B2/ja not_active Expired - Fee Related
- 2006-03-17 US US11/378,664 patent/US8118939B2/en not_active Expired - Fee Related
- 2006-03-17 WO PCT/US2006/010037 patent/WO2006099619A2/en not_active Ceased
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