JP2008533475A5 - - Google Patents

Download PDF

Info

Publication number
JP2008533475A5
JP2008533475A5 JP2008501240A JP2008501240A JP2008533475A5 JP 2008533475 A5 JP2008533475 A5 JP 2008533475A5 JP 2008501240 A JP2008501240 A JP 2008501240A JP 2008501240 A JP2008501240 A JP 2008501240A JP 2008533475 A5 JP2008533475 A5 JP 2008533475A5
Authority
JP
Japan
Prior art keywords
measurement
diffractive structure
periodic
wavefront
coherence
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2008501240A
Other languages
English (en)
Japanese (ja)
Other versions
JP5253998B2 (ja
JP2008533475A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2006/002494 external-priority patent/WO2006097330A1/en
Publication of JP2008533475A publication Critical patent/JP2008533475A/ja
Publication of JP2008533475A5 publication Critical patent/JP2008533475A5/ja
Application granted granted Critical
Publication of JP5253998B2 publication Critical patent/JP5253998B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2008501240A 2005-03-17 2006-03-17 波面計測及び散乱光測定方法及び装置、ならびに関連装置及び製造方法 Expired - Fee Related JP5253998B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US66234805P 2005-03-17 2005-03-17
US60/662,348 2005-03-17
PCT/EP2006/002494 WO2006097330A1 (en) 2005-03-17 2006-03-17 Methods and apparatus for measuring wavefronts and for determining scattered light, and related devices and manufacturing methods

Publications (3)

Publication Number Publication Date
JP2008533475A JP2008533475A (ja) 2008-08-21
JP2008533475A5 true JP2008533475A5 (enExample) 2009-05-07
JP5253998B2 JP5253998B2 (ja) 2013-07-31

Family

ID=36337559

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008501240A Expired - Fee Related JP5253998B2 (ja) 2005-03-17 2006-03-17 波面計測及び散乱光測定方法及び装置、ならびに関連装置及び製造方法

Country Status (5)

Country Link
US (1) US8134716B2 (enExample)
EP (1) EP1869420A1 (enExample)
JP (1) JP5253998B2 (enExample)
KR (1) KR20070112858A (enExample)
WO (1) WO2006097330A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2179328B1 (en) 2007-08-10 2014-10-01 Carl Zeiss SMT GmbH Method and apparatus for measuring scattered light on an optical system
CN105606341A (zh) * 2015-12-24 2016-05-25 中国电子科技集团公司第四十一研究所 一种快速记录红外探测器光谱响应率的装置及方法
DE102017216679A1 (de) * 2017-09-20 2019-03-21 Carl Zeiss Smt Gmbh Mikrolithographische Projektionsbelichtungsanlage
US10571261B1 (en) 2018-08-10 2020-02-25 Raytheon Company Lateral shearing interferometer for auto alignment beam sensing
DE102018124396A1 (de) * 2018-10-02 2020-04-02 Carl Zeiss Smt Gmbh Metrologiesystem und Verfahren zur Vermessung eines Anregungs-Laserstrahls in einer EUV-Plasmaquelle
KR20230098810A (ko) * 2020-11-13 2023-07-04 에이에스엠엘 네델란즈 비.브이. 측정 시스템 및 사용 방법
DE102020215540B4 (de) * 2020-12-09 2022-07-07 Uwe Schellhorn Verfahren zum Bestimmen einer Abbildungsqualität eines Abbildungssystems, Vorrichtung sowie Projektionsbelichtungsanlage

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4518854A (en) * 1982-06-17 1985-05-21 Itek Corporation Combined shearing interferometer and Hartmann wavefront sensor
JP2002202223A (ja) * 2000-12-28 2002-07-19 Matsushita Electric Ind Co Ltd 収差検出方法と収差検出装置
DE10258142A1 (de) * 2002-12-04 2004-06-24 Carl Zeiss Smt Ag Vorrichtung zur optischen Vermessung eines Abbildungssystems
DE10316123A1 (de) * 2003-04-04 2004-10-14 Carl Zeiss Smt Ag Vorrichtung und Verfahren zur Wellenfrontvermessung eines optischen Abbildungssystems durch phasenschiebende Interferometrie
WO2005008754A1 (ja) * 2003-07-18 2005-01-27 Nikon Corporation フレア計測方法、露光方法、及びフレア計測用のマスク
DE102004010825A1 (de) * 2004-02-27 2005-04-21 Zeiss Carl Smt Ag Verfahren und Vorrichtung zur Kohärenzgradbestimmung von Strahlung

Similar Documents

Publication Publication Date Title
CN106324995B (zh) 光刻机原位快速高空间分辨率波像差检测装置及方法
TWI751179B (zh) 用於干涉性地量測光學成像系統的成像品質之量測方法與量測系統
JP2023506946A (ja) 暗視野デジタルホログラフィ顕微鏡および関連する計測方法
JP2011513703A (ja) 物体の表面トポグラフィを測定するための装置および方法
JP6605736B2 (ja) 波面解析のデバイス及び方法
US10444004B2 (en) Phase shift interferometer
JP2004061515A (ja) 光学系による偏光状態への影響を決定する方法及び装置と、分析装置
JP2018511783A (ja) ミラー検査用の検査装置および方法
JP2013092402A5 (enExample)
JP2005043353A (ja) 偏光固有調査方法、光学的結像システムおよび校正方法
JP2014190705A5 (enExample)
CN109870129A (zh) 一种基于相位偏折原理的晶圆表面粗糙度检测装置
CN110709778A (zh) 量测设备
JP2008533475A5 (enExample)
JP2009506335A (ja) 位相マスクの干渉測定装置および同方法
JP2016527501A5 (enExample)
JP2011124345A5 (enExample)
JP2006324311A5 (enExample)
US10042264B2 (en) Measuring device for determining a polarisation parameter
JP2011059017A (ja) 変位分布計測方法、装置及びプログラム
CN102163008B (zh) 系统误差自校准的光刻机投影物镜波像差的在线检测方法
CN102620680A (zh) 一种三平面绝对测量光学面形的检测装置及方法
JP5253998B2 (ja) 波面計測及び散乱光測定方法及び装置、ならびに関連装置及び製造方法
JP2006237494A5 (enExample)
JP2011232243A (ja) 計測装置