JP5253998B2 - 波面計測及び散乱光測定方法及び装置、ならびに関連装置及び製造方法 - Google Patents

波面計測及び散乱光測定方法及び装置、ならびに関連装置及び製造方法 Download PDF

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JP5253998B2
JP5253998B2 JP2008501240A JP2008501240A JP5253998B2 JP 5253998 B2 JP5253998 B2 JP 5253998B2 JP 2008501240 A JP2008501240 A JP 2008501240A JP 2008501240 A JP2008501240 A JP 2008501240A JP 5253998 B2 JP5253998 B2 JP 5253998B2
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Prior art keywords
measurement
wavefront
periodic
coherence
diffractive
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Expired - Fee Related
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JP2008501240A
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English (en)
Japanese (ja)
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JP2008533475A5 (enExample
JP2008533475A (ja
Inventor
エマー，ボルフガンク
ハイドナー，ヘルムト
ベグマン，ウルリヒ
Original Assignee
カール・ツァイス・エスエムティー・ゲーエムベーハー
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/44—Raman spectrometry; Scattering spectrometry ; Fluorescence spectrometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
    • G01J9/0215—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods by shearing interferometric methods
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70941—Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2008501240A 2005-03-17 2006-03-17 波面計測及び散乱光測定方法及び装置、ならびに関連装置及び製造方法 Expired - Fee Related JP5253998B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US66234805P 2005-03-17 2005-03-17
US60/662,348 2005-03-17
PCT/EP2006/002494 WO2006097330A1 (en) 2005-03-17 2006-03-17 Methods and apparatus for measuring wavefronts and for determining scattered light, and related devices and manufacturing methods

Publications (3)

Publication Number Publication Date
JP2008533475A JP2008533475A (ja) 2008-08-21
JP2008533475A5 JP2008533475A5 (enExample) 2009-05-07
JP5253998B2 true JP5253998B2 (ja) 2013-07-31

Family

ID=36337559

Family Applications (1)

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JP2008501240A Expired - Fee Related JP5253998B2 (ja) 2005-03-17 2006-03-17 波面計測及び散乱光測定方法及び装置、ならびに関連装置及び製造方法

Country Status (5)

Country Link
US (1) US8134716B2 (enExample)
EP (1) EP1869420A1 (enExample)
JP (1) JP5253998B2 (enExample)
KR (1) KR20070112858A (enExample)
WO (1) WO2006097330A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2179328B1 (en) 2007-08-10 2014-10-01 Carl Zeiss SMT GmbH Method and apparatus for measuring scattered light on an optical system
CN105606341A (zh) * 2015-12-24 2016-05-25 中国电子科技集团公司第四十一研究所 一种快速记录红外探测器光谱响应率的装置及方法
DE102017216679A1 (de) * 2017-09-20 2019-03-21 Carl Zeiss Smt Gmbh Mikrolithographische Projektionsbelichtungsanlage
US10571261B1 (en) 2018-08-10 2020-02-25 Raytheon Company Lateral shearing interferometer for auto alignment beam sensing
DE102018124396A1 (de) * 2018-10-02 2020-04-02 Carl Zeiss Smt Gmbh Metrologiesystem und Verfahren zur Vermessung eines Anregungs-Laserstrahls in einer EUV-Plasmaquelle
KR20230098810A (ko) * 2020-11-13 2023-07-04 에이에스엠엘 네델란즈 비.브이. 측정 시스템 및 사용 방법
DE102020215540B4 (de) * 2020-12-09 2022-07-07 Uwe Schellhorn Verfahren zum Bestimmen einer Abbildungsqualität eines Abbildungssystems, Vorrichtung sowie Projektionsbelichtungsanlage

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4518854A (en) * 1982-06-17 1985-05-21 Itek Corporation Combined shearing interferometer and Hartmann wavefront sensor
JP2002202223A (ja) * 2000-12-28 2002-07-19 Matsushita Electric Ind Co Ltd 収差検出方法と収差検出装置
DE10258142A1 (de) * 2002-12-04 2004-06-24 Carl Zeiss Smt Ag Vorrichtung zur optischen Vermessung eines Abbildungssystems
DE10316123A1 (de) * 2003-04-04 2004-10-14 Carl Zeiss Smt Ag Vorrichtung und Verfahren zur Wellenfrontvermessung eines optischen Abbildungssystems durch phasenschiebende Interferometrie
WO2005008754A1 (ja) * 2003-07-18 2005-01-27 Nikon Corporation フレア計測方法、露光方法、及びフレア計測用のマスク
DE102004010825A1 (de) * 2004-02-27 2005-04-21 Zeiss Carl Smt Ag Verfahren und Vorrichtung zur Kohärenzgradbestimmung von Strahlung

Also Published As

Publication number Publication date
EP1869420A1 (en) 2007-12-26
US8134716B2 (en) 2012-03-13
WO2006097330A1 (en) 2006-09-21
US20080231840A1 (en) 2008-09-25
KR20070112858A (ko) 2007-11-27
JP2008533475A (ja) 2008-08-21

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