JP2008527076A - 反射防止ポリマー膜コーティングにおいて使用するための低屈折率コーティング組成物および製造方法 - Google Patents
反射防止ポリマー膜コーティングにおいて使用するための低屈折率コーティング組成物および製造方法 Download PDFInfo
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- 239000005011 phenolic resin Substances 0.000 description 1
- 229920002285 poly(styrene-co-acrylonitrile) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920005597 polymer membrane Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 229920000909 polytetrahydrofuran Chemical group 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 238000003847 radiation curing Methods 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 230000035807 sensation Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- SKRWFPLZQAAQSU-UHFFFAOYSA-N stibanylidynetin;hydrate Chemical compound O.[Sn].[Sb] SKRWFPLZQAAQSU-UHFFFAOYSA-N 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 238000004627 transmission electron microscopy Methods 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 229920003249 vinylidene fluoride hexafluoropropylene elastomer Polymers 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/42—Introducing metal atoms or metal-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F259/00—Macromolecular compounds obtained by polymerising monomers on to polymers of halogen containing monomers as defined in group C08F14/00
- C08F259/08—Macromolecular compounds obtained by polymerising monomers on to polymers of halogen containing monomers as defined in group C08F14/00 on to polymers containing fluorine
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/42—Block-or graft-polymers containing polysiloxane sequences
- C08G77/442—Block-or graft-polymers containing polysiloxane sequences containing vinyl polymer sequences
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L51/00—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
- C08L51/003—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers grafted on to macromolecular compounds obtained by reactions only involving unsaturated carbon-to-carbon bonds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/10—Block or graft copolymers containing polysiloxane sequences
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- General Chemical & Material Sciences (AREA)
- Paints Or Removers (AREA)
- Laminated Bodies (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Surface Treatment Of Optical Elements (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/027,372 US20060147729A1 (en) | 2004-12-30 | 2004-12-30 | Transferable antireflection material for use on optical display |
| US11/027,189 US7374812B2 (en) | 2004-12-30 | 2004-12-30 | Low refractive index coating composition for use in antireflection polymer film coatings and manufacturing method |
| PCT/US2005/044114 WO2007053158A2 (en) | 2004-12-30 | 2005-12-07 | Low refractive index coating composition for use in antireflection polymer film coatings and manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008527076A true JP2008527076A (ja) | 2008-07-24 |
| JP2008527076A5 JP2008527076A5 (enExample) | 2009-01-22 |
Family
ID=38006335
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007549398A Withdrawn JP2008527076A (ja) | 2004-12-30 | 2005-12-07 | 反射防止ポリマー膜コーティングにおいて使用するための低屈折率コーティング組成物および製造方法 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP2008527076A (enExample) |
| TW (1) | TW200631994A (enExample) |
| WO (1) | WO2007053158A2 (enExample) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011021157A (ja) * | 2009-07-17 | 2011-02-03 | Dainippon Toryo Co Ltd | 塗料組成物 |
| JP2014228829A (ja) * | 2013-05-27 | 2014-12-08 | 日油株式会社 | 反射防止フィルム |
| WO2019146948A1 (ko) * | 2018-01-24 | 2019-08-01 | 주식회사 엘지화학 | 반사 방지 필름, 편광판 및 디스플레이 장치 |
| US11428848B2 (en) | 2018-01-24 | 2022-08-30 | Lg Chem, Ltd. | Anti-reflective film, polarizing plate, and display apparatus |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104212223B (zh) * | 2014-09-02 | 2016-04-13 | 中国铁道科学研究院铁道建筑研究所 | 一种高速铁路无砟轨道硅酮嵌缝材料的界面剂及其制备方法 |
| CN105330867B (zh) * | 2015-12-07 | 2017-11-17 | 浙江汉邦化工有限公司 | 一种有机氟硅表面处理剂及其制备方法 |
| KR102055928B1 (ko) * | 2016-03-14 | 2019-12-13 | 주식회사 엘지화학 | 광경화성 및 열경화성을 갖는 코팅 조성물, 저굴절층 및 반사 방지 필름 |
| CN115612411B (zh) * | 2022-12-20 | 2023-05-12 | 中国电子科技集团公司第四十六研究所 | 具有高抗剥强度的热固热塑复合树脂粘结片及制备方法 |
| CN118222176A (zh) * | 2022-12-21 | 2024-06-21 | 明基材料股份有限公司 | 低折射率光学树脂 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6097846A (ja) * | 1983-11-02 | 1985-05-31 | 持田商工株式会社 | 含フツ素エラストマ−で被覆されたゴム弾性体 |
| EP1238309A1 (en) * | 1999-11-17 | 2002-09-11 | E.I. Du Pont De Nemours And Company | Ultraviolet and vacuum ultraviolet transparent polymer compositions and their uses |
-
2005
- 2005-12-07 WO PCT/US2005/044114 patent/WO2007053158A2/en not_active Ceased
- 2005-12-07 JP JP2007549398A patent/JP2008527076A/ja not_active Withdrawn
- 2005-12-26 TW TW094146574A patent/TW200631994A/zh unknown
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011021157A (ja) * | 2009-07-17 | 2011-02-03 | Dainippon Toryo Co Ltd | 塗料組成物 |
| JP2014228829A (ja) * | 2013-05-27 | 2014-12-08 | 日油株式会社 | 反射防止フィルム |
| WO2019146948A1 (ko) * | 2018-01-24 | 2019-08-01 | 주식회사 엘지화학 | 반사 방지 필름, 편광판 및 디스플레이 장치 |
| US11428848B2 (en) | 2018-01-24 | 2022-08-30 | Lg Chem, Ltd. | Anti-reflective film, polarizing plate, and display apparatus |
| US11506820B2 (en) | 2018-01-24 | 2022-11-22 | Lg Chem, Ltd. | Anti-reflective film, polarizing plate, and display apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2007053158A3 (en) | 2007-09-07 |
| WO2007053158A2 (en) | 2007-05-10 |
| TW200631994A (en) | 2006-09-16 |
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