JP2008517751A - ゼオライト層で被覆された基板を生成する方法 - Google Patents
ゼオライト層で被覆された基板を生成する方法 Download PDFInfo
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- 239000000758 substrate Substances 0.000 title claims abstract description 90
- 239000010457 zeolite Substances 0.000 title claims abstract description 85
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 title claims abstract description 68
- 229910021536 Zeolite Inorganic materials 0.000 title claims abstract description 66
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 12
- 229910052751 metal Inorganic materials 0.000 claims abstract description 40
- 239000002184 metal Substances 0.000 claims abstract description 40
- 238000000034 method Methods 0.000 claims abstract description 31
- 239000000725 suspension Substances 0.000 claims abstract description 30
- 239000007900 aqueous suspension Substances 0.000 claims abstract description 26
- 238000002425 crystallisation Methods 0.000 claims abstract description 21
- 230000008025 crystallization Effects 0.000 claims abstract description 21
- 238000011065 in-situ storage Methods 0.000 claims abstract description 17
- 230000000737 periodic effect Effects 0.000 claims abstract description 6
- 238000010438 heat treatment Methods 0.000 claims abstract description 5
- 229910052782 aluminium Inorganic materials 0.000 claims description 29
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 28
- 239000000463 material Substances 0.000 claims description 17
- 229910052710 silicon Inorganic materials 0.000 claims description 10
- 239000010703 silicon Substances 0.000 claims description 10
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical group [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 8
- 241000269350 Anura Species 0.000 claims description 5
- 239000011243 crosslinked material Substances 0.000 claims description 5
- 239000000956 alloy Substances 0.000 claims description 3
- 229910045601 alloy Inorganic materials 0.000 claims description 3
- 239000000919 ceramic Substances 0.000 claims description 3
- 150000001875 compounds Chemical class 0.000 claims description 2
- 229910000851 Alloy steel Inorganic materials 0.000 claims 1
- 238000004132 cross linking Methods 0.000 abstract description 9
- 230000015572 biosynthetic process Effects 0.000 description 16
- 238000003786 synthesis reaction Methods 0.000 description 14
- 239000013078 crystal Substances 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 239000000203 mixture Substances 0.000 description 9
- 238000000576 coating method Methods 0.000 description 8
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 239000011230 binding agent Substances 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 239000011541 reaction mixture Substances 0.000 description 4
- 239000003463 adsorbent Substances 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 2
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical group [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 2
- 230000007812 deficiency Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000008188 pellet Substances 0.000 description 2
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910001428 transition metal ion Inorganic materials 0.000 description 2
- WSWCOQWTEOXDQX-MQQKCMAXSA-M (E,E)-sorbate Chemical compound C\C=C\C=C\C([O-])=O WSWCOQWTEOXDQX-MQQKCMAXSA-M 0.000 description 1
- 229910002012 Aerosil® Inorganic materials 0.000 description 1
- 239000004971 Cross linker Substances 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- -1 aluminum silicates Chemical class 0.000 description 1
- VXAUWWUXCIMFIM-UHFFFAOYSA-M aluminum;oxygen(2-);hydroxide Chemical compound [OH-].[O-2].[Al+3] VXAUWWUXCIMFIM-UHFFFAOYSA-M 0.000 description 1
- 238000004873 anchoring Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000012876 carrier material Substances 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000010335 hydrothermal treatment Methods 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- 239000002808 molecular sieve Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 229910052604 silicate mineral Inorganic materials 0.000 description 1
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 229940075554 sorbate Drugs 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 150000005621 tetraalkylammonium salts Chemical class 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
- C23C18/1212—Zeolites, glasses
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1229—Composition of the substrate
- C23C18/1241—Metallic substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1229—Composition of the substrate
- C23C18/1245—Inorganic substrates other than metallic
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1254—Sol or sol-gel processing
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2229/00—Aspects of molecular sieve catalysts not covered by B01J29/00
- B01J2229/60—Synthesis on support
- B01J2229/64—Synthesis on support in or on refractory materials
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01J2229/60—Synthesis on support
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J29/00—Catalysts comprising molecular sieves
- B01J29/82—Phosphates
- B01J29/84—Aluminophosphates containing other elements, e.g. metals, boron
- B01J29/85—Silicoaluminophosphates [SAPO compounds]
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10T428/00—Stock material or miscellaneous articles
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- Silicates, Zeolites, And Molecular Sieves (AREA)
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Abstract
Description
Claims (12)
- 金属を含む基板上にゼオライト層を生成する方法であって、以下の方法ステップを含む:
(1.1)数個の成分を含む水性懸濁液を生成し、
(1.2)1つの成分は、周期表の第三、第四、第五主族または第一〜第八副族の少なくとも1つの架橋元素を含み、
(1.3)前記金属を含む基板は、前記架橋元素の少なくとも1つを含み、
(1.4)前記水性懸濁液に、前記金属を含む基板を導入し、
(1.5)前記金属を含む基板上にゼオライト層をインサイチュウで結晶化させるため、前記水性懸濁液、およびその中に存在する前記金属を含む基板を加熱して、前記金属を含む基板から架橋元素を引き出し、前記ゼオライト層に含ませ、
(1.6)前記ゼオライト層を形成するために前記懸濁液中に存在する架橋元素は、不十分に存在して、前記懸濁液中での結晶化を大部分または完全に回避し、前記元素を前記基板によって主にまたは完全に提供する。 - 前記懸濁液中の架橋された材料フォーマーと前記懸濁液中のすべての架橋された材料フォーマーの合計のモル比は、0.5未満、0.4未満、0.3未満、0.2未満または0.1未満である、請求項1に記載の方法。
- 1つの架橋元素は、リン光体である、請求項1または2に記載の金属を含む基板上にゼオライト層を生成する方法。
- 前記金属を含む基板は、アルミニウム基板である、請求項1〜3の少なくとも1つに記載の金属を含む基板上にゼオライト層を生成する方法。
- 前記金属を含む基板は、アルミニウム、シリコン、リン光体、または周期表の第一〜第八副族の1つの元素を含む、または、アルミニウム、シリコン、リン光体、または周期表の第一〜第八副族の1つの元素を含む合金または化合物で被覆されている、請求項1〜3の少なくとも1つに記載の金属を含む基板上にゼオライト層を生成する方法。
- 前記金属を含む基板は、アルミニウムおよび/またはシリコンとの合金鋼である、請求項1〜3の少なくとも1つに記載の金属を含む基板上にゼオライト層を生成する方法。
- 前記基板は、アルミニウムおよび/またはシリコンを含むセラミック基板である、請求項1〜3の少なくとも1つに記載の金属を含む基板上にゼオライト層を生成する方法。
- 前記水性懸濁液は、さらに、少なくとも1つの有機ステンシル分子または1つの有機鋳型分子を含む、請求項1〜7の少なくとも1つに記載の金属を含む基板上にゼオライト層を生成する方法。
- 前記水性懸濁液および、該水性懸濁液に存在する前記金属を含む基板を、50℃〜250℃の温度に、特に好ましくは100℃〜200℃で、例えば、密閉容器中で加熱する、請求項1〜8の少なくとも1つに記載の金属を含む基板上にゼオライト層を生成する方法。
- 前記水性懸濁液をゲルに変化させ、該ゲルを前記基板に塗布する、請求項1〜9の少なくとも1つに記載の金属を含む基板上にゼオライト層を生成する方法。
- 請求項1〜10の少なくとも1つに記載の方法によって、ゼオライト層で被覆される、金属を含む基板材料の熱交換器。
- 前記ゼオライト層は、SAPO材料、微孔ALPO材料、または微孔MeALPO材料である、請求項11に記載の熱交換器。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102004052976A DE102004052976A1 (de) | 2004-10-29 | 2004-10-29 | Verfahren zur Herstellung eines mit einer Zeolith-Schicht beschichteten Substrats |
DE102004052976.0 | 2004-10-29 | ||
PCT/EP2005/011610 WO2006048211A2 (de) | 2004-10-29 | 2005-10-29 | Verfahren zur herstellung eines mit einer zeolith-schicht beschichteten substrats |
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JP2008517751A true JP2008517751A (ja) | 2008-05-29 |
JP4939423B2 JP4939423B2 (ja) | 2012-05-23 |
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JP2007538346A Active JP4939423B2 (ja) | 2004-10-29 | 2005-10-29 | ゼオライト層で被覆された基板を生成する方法 |
Country Status (9)
Country | Link |
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US (1) | US8053032B2 (ja) |
EP (2) | EP1761657B1 (ja) |
JP (1) | JP4939423B2 (ja) |
KR (1) | KR101225397B1 (ja) |
CN (1) | CN101057005B (ja) |
AT (1) | ATE471998T1 (ja) |
DE (2) | DE102004052976A1 (ja) |
ES (2) | ES2348213T3 (ja) |
WO (1) | WO2006048211A2 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
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KR20160039224A (ko) * | 2013-07-31 | 2016-04-08 | 소르테크 아게 | 흡착 모듈 |
JP2019501290A (ja) * | 2015-12-18 | 2019-01-17 | ファーレンハイト ゲーエムベーハー | アルミニウム含有金属基板上にアルミノシリケート−ゼオライト層を形成する方法およびそれによって得られる基板の使用 |
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DE102006030199A1 (de) * | 2006-06-30 | 2008-01-03 | Klingenburg Gmbh | Feuchtigkeits- und/oder Wärmeaustauschvorrichtung, z.B. Plattenwärmetauscher, Sorptionsrotor, Adsorptionsentfeuchtungsrotor od.dgl. |
DE102006043715A1 (de) | 2006-09-18 | 2008-03-27 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Adsorptionswärmepumpe mit Wärmespeicher |
DE102007056587A1 (de) * | 2007-11-23 | 2009-05-28 | Sortech Ag | Funktionelles Kompositmaterial |
KR100941521B1 (ko) * | 2008-01-30 | 2010-02-10 | 한국건설기술연구원 | 재료의 표면에 제올라이트를 코팅하는 방법 및 상기 방법을통하여 얻어진 제올라이트 코팅 성형체 |
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JP6695803B2 (ja) | 2014-01-10 | 2020-05-20 | ブライ・エアー・アジア・ピーヴイティー・リミテッド | ハイブリッド吸着装置熱交換デバイスの製造方法 |
DE102015200373A1 (de) | 2015-01-13 | 2016-07-14 | Bayerische Motoren Werke Aktiengesellschaft | Verfahren zum Herstellen eines Wasserstoff-Fahrzeugtanks mit einem Zeolith auf der Tankwand |
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KR20160039224A (ko) * | 2013-07-31 | 2016-04-08 | 소르테크 아게 | 흡착 모듈 |
JP2016525670A (ja) * | 2013-07-31 | 2016-08-25 | ゾルテッヒ アーゲー | 吸着モジュール |
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JP2019501290A (ja) * | 2015-12-18 | 2019-01-17 | ファーレンハイト ゲーエムベーハー | アルミニウム含有金属基板上にアルミノシリケート−ゼオライト層を形成する方法およびそれによって得られる基板の使用 |
JP7022435B2 (ja) | 2015-12-18 | 2022-02-18 | ファーレンハイト ゲーエムベーハー | アルミニウム含有金属基板上にアルミノシリケート-ゼオライト層を形成する方法およびそれによって得られる基板の使用 |
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WO2006048211A2 (de) | 2006-05-11 |
US8053032B2 (en) | 2011-11-08 |
KR20070084291A (ko) | 2007-08-24 |
CN101057005A (zh) | 2007-10-17 |
US20090090491A1 (en) | 2009-04-09 |
EP2241652B1 (de) | 2019-03-13 |
JP4939423B2 (ja) | 2012-05-23 |
ES2348213T3 (es) | 2010-12-01 |
EP2241652A2 (de) | 2010-10-20 |
ES2730720T3 (es) | 2019-11-12 |
DE102004052976A1 (de) | 2006-05-04 |
EP2241652A3 (de) | 2015-08-05 |
KR101225397B1 (ko) | 2013-01-22 |
EP1761657A2 (de) | 2007-03-14 |
DE502005009800D1 (de) | 2010-08-05 |
ATE471998T1 (de) | 2010-07-15 |
EP1761657B1 (de) | 2010-06-23 |
CN101057005B (zh) | 2010-06-16 |
WO2006048211A3 (de) | 2006-10-12 |
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