JP2008515133A - ある量の導電性材料を浮揚させる装置および方法 - Google Patents
ある量の導電性材料を浮揚させる装置および方法 Download PDFInfo
- Publication number
- JP2008515133A JP2008515133A JP2007528625A JP2007528625A JP2008515133A JP 2008515133 A JP2008515133 A JP 2008515133A JP 2007528625 A JP2007528625 A JP 2007528625A JP 2007528625 A JP2007528625 A JP 2007528625A JP 2008515133 A JP2008515133 A JP 2008515133A
- Authority
- JP
- Japan
- Prior art keywords
- coil
- coils
- conductive material
- current
- electromagnetic field
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/02—Induction heating
- H05B6/22—Furnaces without an endless core
- H05B6/32—Arrangements for simultaneous levitation and heating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- General Induction Heating (AREA)
- Physical Vapour Deposition (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
- Furnace Details (AREA)
- Lubricants (AREA)
Abstract
Description
Claims (14)
- ある量の導電性材料を浮揚させるため装置であって、コイル中の変動する電流を使用して前記材料を浮揚状態に維持するためのコイルを備えてなり、前記装置が、第一コイルおよび第二コイルの2個のコイルを備えてなり、両方のコイルが使用中に交流電磁場を発生させ、前記第一および第二コイルの前記交流電磁場が互いに反作用し、前記第一および第二コイルが、前記第一コイルと前記第二コイルとの間で浮揚状態に維持されている前記導電性材料が蒸発するように配置される、装置。
- 前記コイルが、実質的に同じ中央線を有する、請求項1に記載の装置。
- 前記コイルが、すべて実質的に閉じたループである巻線を有する、請求項1または2に記載の装置。
- 前記コイルが、それぞれ個別の電流供給源を有する、請求項1〜3のいずれか一項に記載の装置。
- 前記コイル同士が、接続され、なおかつ同じ電流供給源を有する、請求項1〜3のいずれか一項に記載の装置。
- 前記コイル同士が反対の方向で巻かれている、請求項5に記載の装置。
- 前記第一コイルが実質的に前記第二コイルの上方に位置する、請求項1〜6のいずれか一項に記載の装置。
- 前記第一コイルが、前記第二コイルと同じ数の巻線またはそれより少ない巻線を有する、請求項7に記載の装置。
- 前記第一および第二コイルが、鏡像対称性の関係にある、請求項1〜8のいずれか一項に記載の装置。
- 請求項1〜9のいずれか一項に記載の装置を使用して、ある量の浮揚された導電性材料を発生する方法であって、前記2個のコイルにより発生した電磁場の間に前記導電性材料を捕獲し、前記コイル中の電流および周波数で加熱することにより、蒸発させる、方法。
- 前記蒸発した導電性材料が、基材を被覆するために実質的に前記コイルの中央線の方向に沿って方向付けられる、請求項10に記載の方法。
- 前記コイル同士が一緒に操作され、前記蒸発した導電性材料が1または2の自由度で方向付けられる、請求項11に記載の方法。
- 前記コイルが6の自由度で操作される、請求項12に記載の方法。
- 前記2個のコイル中の前記電磁場の強度が、前記電磁場中に捕獲された前記導電性材料が、前記コイルの中央線に向かって押し進められるようなものである、請求項10〜13のいずれか一項に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/923,505 US7323229B2 (en) | 2002-02-21 | 2004-08-23 | Method and device for coating a substrate |
US10/923,505 | 2004-08-23 | ||
PCT/EP2005/005905 WO2006021245A1 (en) | 2004-08-23 | 2005-05-31 | Apparatus and method for levitation of an amount of conductive material |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2008515133A true JP2008515133A (ja) | 2008-05-08 |
JP2008515133A5 JP2008515133A5 (ja) | 2012-06-28 |
JP5064222B2 JP5064222B2 (ja) | 2012-10-31 |
Family
ID=34971215
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007528625A Expired - Fee Related JP5064222B2 (ja) | 2004-08-23 | 2005-05-31 | ある量の導電性材料を浮揚させる装置および方法 |
Country Status (16)
Country | Link |
---|---|
EP (1) | EP1785010B1 (ja) |
JP (1) | JP5064222B2 (ja) |
KR (1) | KR101143067B1 (ja) |
CN (1) | CN101006751B (ja) |
AT (1) | ATE428290T1 (ja) |
AU (1) | AU2005276729B2 (ja) |
BR (1) | BRPI0514545A (ja) |
CA (1) | CA2576541C (ja) |
DE (1) | DE602005013791D1 (ja) |
ES (1) | ES2324921T3 (ja) |
HK (1) | HK1109292A1 (ja) |
MX (1) | MX2007002191A (ja) |
PL (1) | PL1785010T3 (ja) |
RU (1) | RU2370921C2 (ja) |
UA (1) | UA89792C2 (ja) |
WO (1) | WO2006021245A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013545900A (ja) * | 2010-12-13 | 2013-12-26 | ポスコ | 連続コーティング装置 |
JP2018529029A (ja) * | 2015-07-31 | 2018-10-04 | ヒルバーグ アンド パートナー ゲーエムベーハー | 誘導気化器、気化器システムおよび帯状の基板をコーティングするための気化方法 |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100961371B1 (ko) * | 2007-12-28 | 2010-06-07 | 주식회사 포스코 | 실러 접착성 및 내식성이 우수한 아연계 합금도금강판과 그제조방법 |
DE102009042972A1 (de) | 2009-09-16 | 2011-03-24 | Technische Universität Ilmenau | Vorrichtung und Verfahren zum Manipulieren einer levitierten elektrisch leitfähigen Substanz |
KR101639812B1 (ko) * | 2009-09-29 | 2016-07-15 | 주식회사 포스코 | 소재의 부양 가열 장치 |
KR101639813B1 (ko) * | 2009-10-08 | 2016-07-15 | 주식회사 포스코 | 연속 코팅 장치 |
DE102011018675A1 (de) | 2011-04-18 | 2012-10-18 | Technische Universität Ilmenau | Vorrichtung und Verfahren zum aktiven Manipulieren einer elektrisch leitfähigen Substanz |
KR101359218B1 (ko) * | 2011-12-27 | 2014-02-06 | 주식회사 포스코 | 부양 가열장치 |
KR101365467B1 (ko) * | 2012-04-24 | 2014-02-24 | 한국표준과학연구원 | 박막 증착 장치 |
RU2522666C2 (ru) * | 2012-06-27 | 2014-07-20 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Юго-Западный государственный университет" (ЮЗГУ) | Устройство для левитации некоторого количества материала |
RU2693852C2 (ru) * | 2017-11-07 | 2019-07-05 | Федеральное государственное бюджетное образовательное учреждение высшего образования " Юго-Западный государственный университет" (ЮЗГУ) | Устройство для левитации некоторого количества материала |
PL233811B1 (pl) * | 2017-12-11 | 2019-11-29 | Politechnika Slaska Im Wincent | Urzadzenie do wieloskalowego topienia lewitacyjnego |
DE102018117302A1 (de) * | 2018-07-17 | 2020-01-23 | Ald Vacuum Technologies Gmbh | Schwebeschmelzverfahren mit einem ringförmigen Element |
KR20200076389A (ko) | 2018-12-19 | 2020-06-29 | 주식회사 포스코 | Pvd 도금 공정에서의 도금층 제어 장치 및 방법 |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2686864A (en) * | 1951-01-17 | 1954-08-17 | Westinghouse Electric Corp | Magnetic levitation and heating of conductive materials |
JPS621863A (ja) * | 1985-06-28 | 1987-01-07 | Ishikawajima Harima Heavy Ind Co Ltd | 金属蒸発装置 |
JPS6318057A (ja) * | 1986-07-10 | 1988-01-25 | Ishikawajima Harima Heavy Ind Co Ltd | 成膜装置 |
JPH02192688A (ja) * | 1988-09-30 | 1990-07-30 | Deutsche Forsch & Vers Luft Raumfahrt Ev | 導電性物質を融かして位置させる装置 |
JPH0797680A (ja) * | 1993-09-30 | 1995-04-11 | Kao Corp | 薄膜形成装置 |
JPH07245182A (ja) * | 1994-03-02 | 1995-09-19 | Fuji Electric Co Ltd | 浮揚溶解装置とその出湯方法 |
JPH07252639A (ja) * | 1994-03-15 | 1995-10-03 | Kao Corp | 金属薄膜体の製造方法 |
JPH08104981A (ja) * | 1994-10-05 | 1996-04-23 | Sumitomo Electric Ind Ltd | Pvd装置 |
JPH08199345A (ja) * | 1995-01-30 | 1996-08-06 | Mitsubishi Electric Corp | 成膜装置及び成膜方法 |
JP2004100002A (ja) * | 2002-09-11 | 2004-04-02 | Ulvac Japan Ltd | 蒸発源及びこれを用いた薄膜形成装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2957064A (en) * | 1958-09-30 | 1960-10-18 | Westinghouse Electric Corp | Stabilizing of levitation melting |
BE655473A (ja) * | 1963-11-21 | 1900-01-01 | ||
DE3836239A1 (de) * | 1988-10-25 | 1990-04-26 | Deutsche Forsch Luft Raumfahrt | Vorrichtung zum behaelterlosen positionieren und schmelzen von elektrisch leitenden materialien |
NL1020059C2 (nl) * | 2002-02-21 | 2003-08-25 | Corus Technology B V | Werkwijze en inrichting voor het bekleden van een substraat. |
-
2005
- 2005-05-31 AU AU2005276729A patent/AU2005276729B2/en not_active Ceased
- 2005-05-31 JP JP2007528625A patent/JP5064222B2/ja not_active Expired - Fee Related
- 2005-05-31 DE DE602005013791T patent/DE602005013791D1/de active Active
- 2005-05-31 RU RU2007110642/09A patent/RU2370921C2/ru not_active IP Right Cessation
- 2005-05-31 BR BRPI0514545-7A patent/BRPI0514545A/pt not_active IP Right Cessation
- 2005-05-31 CN CN2005800280853A patent/CN101006751B/zh not_active Expired - Fee Related
- 2005-05-31 AT AT05754666T patent/ATE428290T1/de active
- 2005-05-31 PL PL05754666T patent/PL1785010T3/pl unknown
- 2005-05-31 KR KR1020077006446A patent/KR101143067B1/ko active IP Right Grant
- 2005-05-31 EP EP05754666A patent/EP1785010B1/en not_active Not-in-force
- 2005-05-31 ES ES05754666T patent/ES2324921T3/es active Active
- 2005-05-31 WO PCT/EP2005/005905 patent/WO2006021245A1/en active Application Filing
- 2005-05-31 CA CA2576541A patent/CA2576541C/en not_active Expired - Fee Related
- 2005-05-31 UA UAA200702502A patent/UA89792C2/ru unknown
- 2005-05-31 MX MX2007002191A patent/MX2007002191A/es active IP Right Grant
-
2007
- 2007-12-31 HK HK07114323.2A patent/HK1109292A1/xx not_active IP Right Cessation
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2686864A (en) * | 1951-01-17 | 1954-08-17 | Westinghouse Electric Corp | Magnetic levitation and heating of conductive materials |
JPS621863A (ja) * | 1985-06-28 | 1987-01-07 | Ishikawajima Harima Heavy Ind Co Ltd | 金属蒸発装置 |
JPS6318057A (ja) * | 1986-07-10 | 1988-01-25 | Ishikawajima Harima Heavy Ind Co Ltd | 成膜装置 |
JPH02192688A (ja) * | 1988-09-30 | 1990-07-30 | Deutsche Forsch & Vers Luft Raumfahrt Ev | 導電性物質を融かして位置させる装置 |
JPH0797680A (ja) * | 1993-09-30 | 1995-04-11 | Kao Corp | 薄膜形成装置 |
JPH07245182A (ja) * | 1994-03-02 | 1995-09-19 | Fuji Electric Co Ltd | 浮揚溶解装置とその出湯方法 |
JPH07252639A (ja) * | 1994-03-15 | 1995-10-03 | Kao Corp | 金属薄膜体の製造方法 |
JPH08104981A (ja) * | 1994-10-05 | 1996-04-23 | Sumitomo Electric Ind Ltd | Pvd装置 |
JPH08199345A (ja) * | 1995-01-30 | 1996-08-06 | Mitsubishi Electric Corp | 成膜装置及び成膜方法 |
JP2004100002A (ja) * | 2002-09-11 | 2004-04-02 | Ulvac Japan Ltd | 蒸発源及びこれを用いた薄膜形成装置 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013545900A (ja) * | 2010-12-13 | 2013-12-26 | ポスコ | 連続コーティング装置 |
JP2018529029A (ja) * | 2015-07-31 | 2018-10-04 | ヒルバーグ アンド パートナー ゲーエムベーハー | 誘導気化器、気化器システムおよび帯状の基板をコーティングするための気化方法 |
Also Published As
Publication number | Publication date |
---|---|
CN101006751A (zh) | 2007-07-25 |
MX2007002191A (es) | 2007-05-08 |
AU2005276729A1 (en) | 2006-03-02 |
JP5064222B2 (ja) | 2012-10-31 |
UA89792C2 (ru) | 2010-03-10 |
EP1785010A1 (en) | 2007-05-16 |
KR20070067097A (ko) | 2007-06-27 |
WO2006021245A1 (en) | 2006-03-02 |
ATE428290T1 (de) | 2009-04-15 |
BRPI0514545A (pt) | 2008-06-17 |
KR101143067B1 (ko) | 2012-05-08 |
EP1785010B1 (en) | 2009-04-08 |
HK1109292A1 (en) | 2008-05-30 |
AU2005276729B2 (en) | 2010-08-26 |
DE602005013791D1 (de) | 2009-05-20 |
RU2007110642A (ru) | 2008-09-27 |
CN101006751B (zh) | 2011-04-27 |
RU2370921C2 (ru) | 2009-10-20 |
PL1785010T3 (pl) | 2009-08-31 |
CA2576541C (en) | 2012-01-10 |
ES2324921T3 (es) | 2009-08-19 |
CA2576541A1 (en) | 2006-03-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5064222B2 (ja) | ある量の導電性材料を浮揚させる装置および方法 | |
US10196736B2 (en) | Heating apparatus, and coating device comprising same | |
JP5797275B2 (ja) | 連続コーティング装置 | |
JP2008515133A5 (ja) | ||
JP2008534775A (ja) | コーティング材料を蒸発若しくは昇華させるための加熱装置とコーティング装置と方法 | |
KR101639813B1 (ko) | 연속 코팅 장치 | |
JP5740485B2 (ja) | 乾式コーティング装置 | |
KR101888269B1 (ko) | 가열 어셈블리 | |
US7973267B2 (en) | Apparatus and method for levitation of an amount of conductive material | |
KR20190044050A (ko) | 가열 어셈블리 | |
KR101355817B1 (ko) | 전자기 부양 금속 박막 증착 장치 | |
KR20180062918A (ko) | 가열 어셈블리 | |
KR20180062891A (ko) | 가열 어셈블리 | |
KR101888270B1 (ko) | 가열 어셈블리 | |
CN111304600A (zh) | 蒸发装置和方法 | |
JP4515158B2 (ja) | 電子ビームガンおよびプラズマ装置 | |
JPH04120269A (ja) | 金属の蒸着方法および蒸着装置 | |
JPS621863A (ja) | 金属蒸発装置 | |
CN111699276A (zh) | 用于金属和陶瓷材料沉积的增材制造系统和方法 | |
JP2008297587A (ja) | 成膜装置及び成膜方法 | |
JPS63259835A (ja) | 磁気記録媒体の製造装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20080331 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20110222 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20110516 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20111115 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20120213 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20120220 |
|
A524 | Written submission of copy of amendment under article 19 pct |
Free format text: JAPANESE INTERMEDIATE CODE: A524 Effective date: 20120514 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20120713 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20120808 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5064222 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20150817 Year of fee payment: 3 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |