JP2008513797A - 鏡面域を有する基準面を備えた干渉系 - Google Patents
鏡面域を有する基準面を備えた干渉系 Download PDFInfo
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- JP2008513797A JP2008513797A JP2007532867A JP2007532867A JP2008513797A JP 2008513797 A JP2008513797 A JP 2008513797A JP 2007532867 A JP2007532867 A JP 2007532867A JP 2007532867 A JP2007532867 A JP 2007532867A JP 2008513797 A JP2008513797 A JP 2008513797A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02049—Interferometers characterised by particular mechanical design details
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02056—Passive reduction of errors
- G01B9/02057—Passive reduction of errors by using common path configuration, i.e. reference and object path almost entirely overlapping
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/0209—Low-coherence interferometers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
- G01N21/45—Refractivity; Phase-affecting properties, e.g. optical path length using interferometric methods; using Schlieren methods
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9515—Objects of complex shape, e.g. examined with use of a surface follower device
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N2021/178—Methods for obtaining spatial resolution of the property being measured
- G01N2021/1785—Three dimensional
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9515—Objects of complex shape, e.g. examined with use of a surface follower device
- G01N2021/9516—Objects of complex shape, e.g. examined with use of a surface follower device whereby geometrical features are being masked
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/06—Illumination; Optics
- G01N2201/063—Illuminating optical parts
- G01N2201/0636—Reflectors
Abstract
Description
本発明は、干渉系であって、照明ビーム路を形成するための、光源と照明光学系とを備えた照明岐路が設けられており、結像ビーム路を形成するための、測定しようとする測定対象面を備えた測定対象を測定するための基準エレメントを有する測定対象岐路が設けられており、測定しようとする測定対象が、照明の直接到達しない測定対象面を有しており、基準エレメントを有する基準岐路が設けられており、検出器を有する検出岐路が設けられており、ビームスプリッタが設けられている形式のものに関する。
|ΛR−ΛO|<lC (1)
であると、再びまとめられる光のフィールドは、測定可能な干渉を有することができる。このことは、測定中、光のフィールドの光路長差が測定対象または基準エレメントの移動に起因して光軸に沿って変化されると、適用される。同時に再びまとめられる光のフィールドの強度は、面状に測定を行う検出器、一般的にはCCDカメラで測定される。建設的または破壊的な干渉は白色光源のコヒーレント長の内側でしか行われないので、干渉によって生じる強度変調の画素評価、強度コレログラムによって、各画素に関する一義的な高さ情報が送られる。このことは、画素全体に行われ、測定対象の完全な高さ情報が得られる。
δ≧0.61λm/NA (2)
この課題を解決するための本発明の装置によれば、基準エレメントが、単数または複数の鏡面域を有している。これによって光ビームがアンダカットされた面に到達し、したがって残りの面と同じ測定過程で測定を行うことができる。特にアンダカットされた面の位置は、残りの面に対して相対的に特定することができる。
次に図面につき本発明の実施例を詳しく説明する。
Claims (7)
- 干渉系であって、
照明ビーム路(60)を形成するための、光源(21)と照明光学系(22)とを備えた照明岐路(20)が設けられており、結像ビーム路(70)を形成するための、測定しようとする測定対象面(45)を備えた測定対象(41)を測定するための基準エレメント(42)を有する測定対象岐路(40)が設けられており、測定しようとする測定対象(41)が、照明の直接到達しない測定対象面(45)を有しており、基準エレメント(11)を有する基準岐路(10)が設けられており、検出器(31)を有する検出岐路(30)が設けられており、ビームスプリッタ(50)が設けられている形式のものにおいて、
基準エレメント(42)が、単数または複数の鏡面域(46)を有していることを特徴とする、干渉系。 - 鏡面域(46)が、測定対象(41)に適合されていて、鏡面域(46)が、測定対象面(45)の、測定しようとする部分面と同様に、結像ビーム路(70)の光軸に対する垂線に対して半分の角度で形成されている、請求項1記載の装置。
- 鏡面域(46)が、基準エレメント(42)と一体的に結合されている、請求項1または2記載の装置。
- 鏡面域(46)が、分離したユニットとして形成されていて、かつたとえば接着またはねじ止めによって基準エレメント(42)と機械的に結合されている、請求項1または2記載の装置。
- 基準エレメント(42)において、鏡面域(46)の傍に、測定対象面(45)を測定するための第2の基準面(47)が形成されている、請求項1から4までのいずれか1項記載の装置。
- 基準エレメント(42)において、鏡面域(46)の傍に、少なくとも1つの第2の測定対象面(43)を測定するための少なくとも1つの第2の基準面(44)が形成されている、請求項1から5までのいずれか1項記載の装置。
- 照明ビーム路(60)を形成するための、光源(21)と照明光学系(22)とを備えた照明岐路(20)が設けられており、結像ビーム路(70)を形成するための、測定しようとする測定対象面(45)を備えた測定対象(41)を測定するための基準エレメント(42)を有する測定対象岐路(40)が設けられており、測定しようとする測定対象(41)が、照明の直接到達しない測定対象面(45)を有しており、基準エレメント(11)を有する基準岐路(10)が設けられており、検出器(31)を有する検出岐路(30)が設けられており、ビームスプリッタ(50)が設けられている、干渉系(1)を運転する方法において、
測定対象面(43)から反射される光ビームを、所属の基準面(44)から反射される光ビームと干渉させ、照明の直接届かない測定対象面(45)から反射される光ビームを、追加的に鏡面域(46)を介して反射させ、所属の基準面(47)から反射される光ビームと干渉させることを特徴とする、干渉系を運転する方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102004045802A DE102004045802B4 (de) | 2004-09-22 | 2004-09-22 | Interferometrisches System mit Referenzfläche mit einer verspiegelten Zone |
DE102004045802.2 | 2004-09-22 | ||
PCT/EP2005/053445 WO2006032553A1 (de) | 2004-09-22 | 2005-07-18 | Interferometrisches system mit referenzfläche mit einer verspiegelten zone |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008513797A true JP2008513797A (ja) | 2008-05-01 |
JP4988577B2 JP4988577B2 (ja) | 2012-08-01 |
Family
ID=35094158
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2007532867A Expired - Fee Related JP4988577B2 (ja) | 2004-09-22 | 2005-07-18 | 鏡面域を有する基準面を備えた干渉系 |
Country Status (7)
Country | Link |
---|---|
US (1) | US8035821B2 (ja) |
EP (1) | EP1794572B1 (ja) |
JP (1) | JP4988577B2 (ja) |
CN (1) | CN101023338B (ja) |
BR (1) | BRPI0514385A (ja) |
DE (2) | DE102004045802B4 (ja) |
WO (1) | WO2006032553A1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102009027456B4 (de) | 2009-07-03 | 2022-07-14 | Robert Bosch Gmbh | Vorrichtung zur Vermessung konischer Oberflächen |
CZ2015348A3 (cs) * | 2015-05-22 | 2017-01-11 | Fyzikální ústav AV ČR, v.v.i. | Zařízení pro bezkontaktní měření tvaru předmětu |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB673971A (ja) * | 1900-01-01 | |||
JPS4970649A (ja) * | 1972-10-02 | 1974-07-09 | ||
JPS63259404A (ja) * | 1987-04-16 | 1988-10-26 | Toshiba Corp | 深さ測定装置 |
US6268921B1 (en) * | 1998-09-10 | 2001-07-31 | Csem Centre Suisse D'electronique Et De Microtechnique Sa | Interferometric device for recording the depth optical reflection and/or transmission characteristics of an object |
US6721094B1 (en) * | 2001-03-05 | 2004-04-13 | Sandia Corporation | Long working distance interference microscope |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4108944A1 (de) * | 1991-03-19 | 1992-09-24 | Haeusler Gerd | Verfahren und einrichtung zur beruehrungslosen erfassung der oberflaechengestalt von diffus streuenden objekten |
DE19721843C1 (de) * | 1997-05-26 | 1999-02-11 | Bosch Gmbh Robert | Interferometrische Meßvorrichtung |
DE19738900B4 (de) * | 1997-09-05 | 2005-07-14 | Robert Bosch Gmbh | Interferometrische Meßvorrichtung zur Formvermessung an rauhen Oberflächen |
DE19808273A1 (de) * | 1998-02-27 | 1999-09-09 | Bosch Gmbh Robert | Interferometrische Meßeinrichtung zum Erfassen der Form oder des Abstandes insbesondere rauher Oberflächen |
DE102004045807B4 (de) * | 2004-09-22 | 2007-04-05 | Robert Bosch Gmbh | Optische Messvorrichtung zur Vermessung von gekrümmten Flächen |
-
2004
- 2004-09-22 DE DE102004045802A patent/DE102004045802B4/de not_active Expired - Fee Related
-
2005
- 2005-07-18 EP EP05776031A patent/EP1794572B1/de not_active Expired - Fee Related
- 2005-07-18 BR BRPI0514385-3A patent/BRPI0514385A/pt not_active IP Right Cessation
- 2005-07-18 JP JP2007532867A patent/JP4988577B2/ja not_active Expired - Fee Related
- 2005-07-18 CN CN200580031809XA patent/CN101023338B/zh not_active Expired - Fee Related
- 2005-07-18 DE DE502005010962T patent/DE502005010962D1/de active Active
- 2005-07-18 WO PCT/EP2005/053445 patent/WO2006032553A1/de active Application Filing
- 2005-07-18 US US11/663,614 patent/US8035821B2/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB673971A (ja) * | 1900-01-01 | |||
JPS4970649A (ja) * | 1972-10-02 | 1974-07-09 | ||
JPS63259404A (ja) * | 1987-04-16 | 1988-10-26 | Toshiba Corp | 深さ測定装置 |
US6268921B1 (en) * | 1998-09-10 | 2001-07-31 | Csem Centre Suisse D'electronique Et De Microtechnique Sa | Interferometric device for recording the depth optical reflection and/or transmission characteristics of an object |
US6721094B1 (en) * | 2001-03-05 | 2004-04-13 | Sandia Corporation | Long working distance interference microscope |
Also Published As
Publication number | Publication date |
---|---|
US8035821B2 (en) | 2011-10-11 |
WO2006032553A1 (de) | 2006-03-30 |
US20090201511A1 (en) | 2009-08-13 |
CN101023338A (zh) | 2007-08-22 |
EP1794572A1 (de) | 2007-06-13 |
DE102004045802B4 (de) | 2009-02-05 |
BRPI0514385A (pt) | 2008-06-10 |
DE502005010962D1 (de) | 2011-03-24 |
CN101023338B (zh) | 2012-01-18 |
EP1794572B1 (de) | 2011-02-09 |
JP4988577B2 (ja) | 2012-08-01 |
DE102004045802A1 (de) | 2006-03-30 |
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Free format text: JAPANESE INTERMEDIATE CODE: R250 |
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LAPS | Cancellation because of no payment of annual fees |