KR100785802B1 - 입체 형상 측정장치 - Google Patents
입체 형상 측정장치 Download PDFInfo
- Publication number
- KR100785802B1 KR100785802B1 KR1020070052290A KR20070052290A KR100785802B1 KR 100785802 B1 KR100785802 B1 KR 100785802B1 KR 1020070052290 A KR1020070052290 A KR 1020070052290A KR 20070052290 A KR20070052290 A KR 20070052290A KR 100785802 B1 KR100785802 B1 KR 100785802B1
- Authority
- KR
- South Korea
- Prior art keywords
- beam splitter
- reference plane
- measurement
- measurement object
- dimensional shape
- Prior art date
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
- G01B9/02027—Two or more interferometric channels or interferometers
- G01B9/02028—Two or more reference or object arms in one interferometer
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/0209—Low-coherence interferometers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
- G01B2290/35—Mechanical variable delay line
Abstract
Description
Claims (5)
- 광원(1)과,상기 광원(1)으로부터의 조명광을 분할시키는 빔분할기(2)와,상기 빔분할기(2)로부터의 조명광이 조사되며 최고점과 최저점 단차를 가지는 측정 대상물(3)과,상기 빔분할기(2)로부터의 조명광이 조사되는 기준면(4)과,상기 측정 대상 표면과 상기 기준면(4)으로부터 반사되어 합쳐진 간섭무늬를 촬영하는 촬영장치(5), 및상기 촬영장치(5)를 통해 촬영된 영상을 처리하는 제어 컴퓨터(7)를 포함하는 입체 형상 측정장치에 있어서,상기 기준면(4)은;상기 측정 대상물(3)의 최고점의 반사거리 및 상기 측정 대상물(3)의 최저점 반사거리와 각각 동일한 반사거리를 제공하는 반사거리 조절수단(6)을 더 구비함을 특징으로 하는 입체 형상 측정장치.
- 제 1항에 있어서,상기 반사거리 조절수단(6)은 상기 측정 대상물(3)의 단차와 동일한 두께를 가지는 보조 빔분할기(61)인 것을 특징으로 하는 입체 형상 측정장치.
- 제 1항에 있어서,상기 반사거리 조절수단(6)은;상기 빔분할기(2)와 상기 기준면(4) 사이에 구비되는 보조 빔분할기(61)와,상기 보조 빔분할기(61)를 전후방으로 미소 구동시키는 미소 구동기(62)를 포함하여 구성됨을 특징으로 하는 입체 형상 측정장치.
- 제 1항에 있어서,상기 반사거리 조절수단(6)은;상기 빔분할기(2)와 상기 기준면(4) 사이에 구비되고 상호 두께가 다르며 선택적으로 상기 기준면(4) 전방에 배치되는 다수의 보조 빔분할기(61)를 포함하여 구성됨을 특징으로 하는 입체 형상 측정장치.
- 제 2항 내지 제 4항 중 어느 한 항에 있어서,상기 보조 빔분할기(61)는;각각 측정 대상물(3)의 최고점의 반사율과 상기 측정 대상물(3)의 최저점 반사율에 대응되는 반사율을 가지도록 반사율 조절이 가능하게 구성됨을 특징으로 하는 입체 형상 측정장치.
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020070052290A KR100785802B1 (ko) | 2007-05-29 | 2007-05-29 | 입체 형상 측정장치 |
JP2010510208A JP2010528314A (ja) | 2007-05-29 | 2008-05-28 | 立体形状測定装置 |
EP08753702.3A EP2153167A4 (en) | 2007-05-29 | 2008-05-28 | DEVICE FOR MEASURING A THREE-DIMENSIONAL FORM |
US12/601,973 US20100171963A1 (en) | 2007-05-29 | 2008-05-28 | Apparatus for measurement of three-dimensional shape |
TW097119684A TW200907294A (en) | 2007-05-29 | 2008-05-28 | Apparatus for measurement of three-dimensional shape |
PCT/KR2008/002968 WO2008147098A1 (en) | 2007-05-29 | 2008-05-28 | Apparatus for measurement of three-dimensional shape |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020070052290A KR100785802B1 (ko) | 2007-05-29 | 2007-05-29 | 입체 형상 측정장치 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR100785802B1 true KR100785802B1 (ko) | 2007-12-13 |
Family
ID=39141057
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020070052290A KR100785802B1 (ko) | 2007-05-29 | 2007-05-29 | 입체 형상 측정장치 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20100171963A1 (ko) |
EP (1) | EP2153167A4 (ko) |
JP (1) | JP2010528314A (ko) |
KR (1) | KR100785802B1 (ko) |
TW (1) | TW200907294A (ko) |
WO (1) | WO2008147098A1 (ko) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010134669A1 (ko) * | 2009-05-22 | 2010-11-25 | 주식회사 인텍플러스 | 입체 형상 측정장치 |
KR101254297B1 (ko) | 2011-11-09 | 2013-04-12 | 주식회사 나노시스템 | 형상 및 두께 측정시스템과 형상 및 두께 측정방법 |
US8493570B2 (en) | 2007-12-14 | 2013-07-23 | Intekplus Co., Ltd. | Three-dimensional shape measuring apparatus |
KR101845255B1 (ko) * | 2016-09-09 | 2018-05-28 | 선문대학교 산학협력단 | 미켈슨 간섭계의 3차원 형상 측정장치 |
KR101902348B1 (ko) | 2017-04-13 | 2018-09-28 | 연세대학교 산학협력단 | Mlcc 엑추에이터를 이용한 디지털 홀로그래피 시스템 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6169339B2 (ja) * | 2012-10-04 | 2017-07-26 | 株式会社日立製作所 | 形状計測方法及び装置 |
CN109906410B (zh) | 2016-11-02 | 2021-11-30 | Asml荷兰有限公司 | 高度传感器、光刻设备和用于制造器件的方法 |
CN113639661B (zh) * | 2021-08-11 | 2022-10-14 | 中国科学院长春光学精密机械与物理研究所 | 形貌检测系统及形貌检测方法 |
Family Cites Families (15)
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JPH0454405A (ja) * | 1990-06-25 | 1992-02-21 | Toyota Autom Loom Works Ltd | 光学式変位計 |
JPH06241717A (ja) * | 1993-02-15 | 1994-09-02 | Yusaku Fujii | 干渉計 |
JPH06273113A (ja) * | 1993-03-22 | 1994-09-30 | Osamu Kamatani | 干渉計 |
JP3579142B2 (ja) * | 1995-09-08 | 2004-10-20 | 株式会社モリテックス | 光ファイバ干渉型伸縮量測定装置 |
JPH10274623A (ja) * | 1997-03-31 | 1998-10-13 | Hitachi Ltd | 無侵襲生体光計測装置 |
DE19819762A1 (de) * | 1998-05-04 | 1999-11-25 | Bosch Gmbh Robert | Interferometrische Meßeinrichtung |
JP3410051B2 (ja) * | 1999-08-20 | 2003-05-26 | 理化学研究所 | 形状測定方法及び装置 |
DE10041041A1 (de) * | 2000-08-22 | 2002-03-07 | Zeiss Carl | Interferometeranordnung und Interferometrisches Verfahren |
JP2002286410A (ja) * | 2001-03-26 | 2002-10-03 | Fuji Photo Optical Co Ltd | 干渉計装置 |
JP3511097B2 (ja) * | 2001-09-04 | 2004-03-29 | 金沢大学長 | 光干渉を用いた形状測定方法および形状測定装置 |
CA2390072C (en) * | 2002-06-28 | 2018-02-27 | Adrian Gh Podoleanu | Optical mapping apparatus with adjustable depth resolution and multiple functionality |
US7023563B2 (en) * | 2003-02-14 | 2006-04-04 | Chian Chiu Li | Interferometric optical imaging and storage devices |
WO2005060677A2 (en) * | 2003-12-18 | 2005-07-07 | Zygo Corporation | Interferometric microscopy using reflective optics for complex surface shapes |
JP4409331B2 (ja) * | 2004-03-30 | 2010-02-03 | 株式会社トプコン | 光画像計測装置 |
JP2005331349A (ja) * | 2004-05-19 | 2005-12-02 | Ricoh Co Ltd | 動的形状測定装置、測定方法および測定誤差補正方法 |
-
2007
- 2007-05-29 KR KR1020070052290A patent/KR100785802B1/ko active IP Right Grant
-
2008
- 2008-05-28 TW TW097119684A patent/TW200907294A/zh unknown
- 2008-05-28 WO PCT/KR2008/002968 patent/WO2008147098A1/en active Application Filing
- 2008-05-28 JP JP2010510208A patent/JP2010528314A/ja active Pending
- 2008-05-28 EP EP08753702.3A patent/EP2153167A4/en not_active Withdrawn
- 2008-05-28 US US12/601,973 patent/US20100171963A1/en not_active Abandoned
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8493570B2 (en) | 2007-12-14 | 2013-07-23 | Intekplus Co., Ltd. | Three-dimensional shape measuring apparatus |
EP2232196A4 (en) * | 2007-12-14 | 2016-09-14 | Intekplus Co Ltd | APPARATUS FOR MEASURING A THREE DIMENSIONAL FORM |
WO2010134669A1 (ko) * | 2009-05-22 | 2010-11-25 | 주식회사 인텍플러스 | 입체 형상 측정장치 |
KR101116295B1 (ko) * | 2009-05-22 | 2012-03-14 | (주) 인텍플러스 | 입체 형상 측정장치 |
KR101254297B1 (ko) | 2011-11-09 | 2013-04-12 | 주식회사 나노시스템 | 형상 및 두께 측정시스템과 형상 및 두께 측정방법 |
KR101845255B1 (ko) * | 2016-09-09 | 2018-05-28 | 선문대학교 산학협력단 | 미켈슨 간섭계의 3차원 형상 측정장치 |
KR101902348B1 (ko) | 2017-04-13 | 2018-09-28 | 연세대학교 산학협력단 | Mlcc 엑추에이터를 이용한 디지털 홀로그래피 시스템 |
Also Published As
Publication number | Publication date |
---|---|
EP2153167A4 (en) | 2016-04-27 |
US20100171963A1 (en) | 2010-07-08 |
TW200907294A (en) | 2009-02-16 |
EP2153167A1 (en) | 2010-02-17 |
WO2008147098A1 (en) | 2008-12-04 |
JP2010528314A (ja) | 2010-08-19 |
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