JP2008510075A5 - - Google Patents

Download PDF

Info

Publication number
JP2008510075A5
JP2008510075A5 JP2007527909A JP2007527909A JP2008510075A5 JP 2008510075 A5 JP2008510075 A5 JP 2008510075A5 JP 2007527909 A JP2007527909 A JP 2007527909A JP 2007527909 A JP2007527909 A JP 2007527909A JP 2008510075 A5 JP2008510075 A5 JP 2008510075A5
Authority
JP
Japan
Prior art keywords
substrate
alternating
titanium
aluminum
density
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007527909A
Other languages
English (en)
Japanese (ja)
Other versions
JP4987717B2 (ja
JP2008510075A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2005/028956 external-priority patent/WO2007001337A2/en
Publication of JP2008510075A publication Critical patent/JP2008510075A/ja
Publication of JP2008510075A5 publication Critical patent/JP2008510075A5/ja
Application granted granted Critical
Publication of JP4987717B2 publication Critical patent/JP4987717B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2007527909A 2004-08-18 2005-08-12 コーティングを有する基板及びその調製方法 Expired - Fee Related JP4987717B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US60239404P 2004-08-18 2004-08-18
US60/602,394 2004-08-18
PCT/US2005/028956 WO2007001337A2 (en) 2004-08-18 2005-08-12 Coated substrates and methods for their preparation

Publications (3)

Publication Number Publication Date
JP2008510075A JP2008510075A (ja) 2008-04-03
JP2008510075A5 true JP2008510075A5 (enExample) 2008-09-25
JP4987717B2 JP4987717B2 (ja) 2012-07-25

Family

ID=37595557

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007527909A Expired - Fee Related JP4987717B2 (ja) 2004-08-18 2005-08-12 コーティングを有する基板及びその調製方法

Country Status (6)

Country Link
US (1) US7736728B2 (enExample)
EP (2) EP2546388A1 (enExample)
JP (1) JP4987717B2 (enExample)
KR (1) KR101210859B1 (enExample)
CN (1) CN100558940C (enExample)
WO (1) WO2007001337A2 (enExample)

Families Citing this family (69)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2693248T3 (es) * 2004-12-24 2018-12-10 Hexacath Pieza mecánica con deformabilidad mejorada
KR101317695B1 (ko) * 2005-05-09 2013-10-15 나노 이프린트 리미티드 전자 소자
US9166197B2 (en) * 2005-08-29 2015-10-20 The Hong Kong University Of Science And Technology Metallic anode treated by carbon tetrafluoride plasma for organic light emitting device
US20100178490A1 (en) * 2007-03-28 2010-07-15 Glenn Cerny Roll-to-roll plasma enhanced chemical vapor deposition method of barrier layers comprising silicon and carbon
WO2009023482A1 (en) * 2007-08-16 2009-02-19 Dow Corning Corporation Dichroic filters formed using silicon carbide based layers
CN102171384B (zh) * 2008-05-28 2013-12-25 乔治洛德方法研究和开发液化空气有限公司 碳化硅基抗反射涂层
US7985188B2 (en) 2009-05-13 2011-07-26 Cv Holdings Llc Vessel, coating, inspection and processing apparatus
MX345403B (es) 2009-05-13 2017-01-30 Sio2 Medical Products Inc Revestimiento por pecvd utilizando un precursor organosilícico.
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
CN102373427A (zh) * 2010-08-18 2012-03-14 鸿富锦精密工业(深圳)有限公司 铝合金表面防腐处理方法及其制品
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
TWI477636B (zh) * 2010-12-30 2015-03-21 Hon Hai Prec Ind Co Ltd 鋁及鋁合金表面防腐處理方法及其鋁製品
JP5740179B2 (ja) * 2011-02-28 2015-06-24 日東電工株式会社 透明ガスバリアフィルム、透明ガスバリアフィルムの製造方法、有機エレクトロルミネッセンス素子、太陽電池および薄膜電池
US8574728B2 (en) 2011-03-15 2013-11-05 Kennametal Inc. Aluminum oxynitride coated article and method of making the same
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
US20130177760A1 (en) * 2011-07-11 2013-07-11 Lotus Applied Technology, Llc Mixed metal oxide barrier films and atomic layer deposition method for making mixed metal oxide barrier films
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
AU2012318242A1 (en) 2011-11-11 2013-05-30 Sio2 Medical Products, Inc. Passivation, pH protective or lubricity coating for pharmaceutical package, coating process and apparatus
CN108480155A (zh) * 2011-12-30 2018-09-04 米其林集团总公司 来自多层薄膜的改进的内衬阻挡层
EP2846755A1 (en) 2012-05-09 2015-03-18 SiO2 Medical Products, Inc. Saccharide protective coating for pharmaceutical package
US10832904B2 (en) 2012-06-12 2020-11-10 Lam Research Corporation Remote plasma based deposition of oxygen doped silicon carbide films
US12334332B2 (en) 2012-06-12 2025-06-17 Lam Research Corporation Remote plasma based deposition of silicon carbide films using silicon-containing and carbon-containing precursors
US20180347035A1 (en) 2012-06-12 2018-12-06 Lam Research Corporation Conformal deposition of silicon carbide films using heterogeneous precursor interaction
US9234276B2 (en) 2013-05-31 2016-01-12 Novellus Systems, Inc. Method to obtain SiC class of films of desired composition and film properties
US10325773B2 (en) 2012-06-12 2019-06-18 Novellus Systems, Inc. Conformal deposition of silicon carbide films
US10211310B2 (en) 2012-06-12 2019-02-19 Novellus Systems, Inc. Remote plasma based deposition of SiOC class of films
US20150297800A1 (en) 2012-07-03 2015-10-22 Sio2 Medical Products, Inc. SiOx BARRIER FOR PHARMACEUTICAL PACKAGE AND COATING PROCESS
CA2890066C (en) 2012-11-01 2021-11-09 Sio2 Medical Products, Inc. Coating inspection method
EP2920567B1 (en) 2012-11-16 2020-08-19 SiO2 Medical Products, Inc. Method and apparatus for detecting rapid barrier coating integrity characteristics
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
AU2013352436B2 (en) 2012-11-30 2018-10-25 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition on medical syringes, cartridges, and the like
JP6002784B2 (ja) * 2012-12-28 2016-10-05 兼房株式会社 刃物
US9017809B2 (en) 2013-01-25 2015-04-28 Kennametal Inc. Coatings for cutting tools
US9138864B2 (en) 2013-01-25 2015-09-22 Kennametal Inc. Green colored refractory coatings for cutting tools
WO2014134577A1 (en) 2013-03-01 2014-09-04 Sio2 Medical Products, Inc. Plasma or cvd pre-treatment for lubricated pharmaceutical package, coating process and apparatus
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
WO2014164928A1 (en) 2013-03-11 2014-10-09 Sio2 Medical Products, Inc. Coated packaging
WO2014144926A1 (en) 2013-03-15 2014-09-18 Sio2 Medical Products, Inc. Coating method
US9703011B2 (en) 2013-05-07 2017-07-11 Corning Incorporated Scratch-resistant articles with a gradient layer
US9366784B2 (en) 2013-05-07 2016-06-14 Corning Incorporated Low-color scratch-resistant articles with a multilayer optical film
US9684097B2 (en) 2013-05-07 2017-06-20 Corning Incorporated Scratch-resistant articles with retained optical properties
US9110230B2 (en) 2013-05-07 2015-08-18 Corning Incorporated Scratch-resistant articles with retained optical properties
US9359261B2 (en) 2013-05-07 2016-06-07 Corning Incorporated Low-color scratch-resistant articles with a multilayer optical film
CN105720207B (zh) * 2013-06-29 2017-09-15 艾克斯特朗欧洲公司 用于高性能涂层的沉积的方法以及封装的电子器件
US9427808B2 (en) 2013-08-30 2016-08-30 Kennametal Inc. Refractory coatings for cutting tools
US9371579B2 (en) 2013-10-24 2016-06-21 Lam Research Corporation Ground state hydrogen radical sources for chemical vapor deposition of silicon-carbon-containing films
US11066745B2 (en) 2014-03-28 2021-07-20 Sio2 Medical Products, Inc. Antistatic coatings for plastic vessels
US9335444B2 (en) 2014-05-12 2016-05-10 Corning Incorporated Durable and scratch-resistant anti-reflective articles
US11267973B2 (en) 2014-05-12 2022-03-08 Corning Incorporated Durable anti-reflective articles
US9790593B2 (en) 2014-08-01 2017-10-17 Corning Incorporated Scratch-resistant materials and articles including the same
KR101562966B1 (ko) * 2014-08-27 2015-10-23 코닝정밀소재 주식회사 디스플레이 장치용 기판
KR101606172B1 (ko) * 2014-09-05 2016-03-24 코닝정밀소재 주식회사 디스플레이 장치용 기판
JP6587384B2 (ja) * 2014-11-14 2019-10-09 東レエンジニアリング株式会社 封止膜の形成方法および封止膜
US20160314964A1 (en) 2015-04-21 2016-10-27 Lam Research Corporation Gap fill using carbon-based films
CN108138316A (zh) 2015-08-18 2018-06-08 Sio2医药产品公司 具有低氧气传输速率的药物和其他包装
CN105261681B (zh) * 2015-09-08 2019-02-22 安徽三安光电有限公司 一种半导体元件及其制备方法
EP3300520B1 (en) 2015-09-14 2020-11-25 Corning Incorporated High light transmission and scratch-resistant anti-reflective articles
US9786491B2 (en) 2015-11-12 2017-10-10 Asm Ip Holding B.V. Formation of SiOCN thin films
KR102378021B1 (ko) 2016-05-06 2022-03-23 에이에스엠 아이피 홀딩 비.브이. SiOC 박막의 형성
US9837270B1 (en) 2016-12-16 2017-12-05 Lam Research Corporation Densification of silicon carbide film using remote plasma treatment
KR102805403B1 (ko) 2017-05-05 2025-05-13 에이에스엠 아이피 홀딩 비.브이. 산소 함유 박막의 형성을 제어하기 위한 플라즈마 강화 증착 공정
CN115233183B (zh) 2017-05-16 2025-01-10 Asmip控股有限公司 电介质上氧化物的选择性peald
US11157717B2 (en) * 2018-07-10 2021-10-26 Next Biometrics Group Asa Thermally conductive and protective coating for electronic device
US10840087B2 (en) 2018-07-20 2020-11-17 Lam Research Corporation Remote plasma based deposition of boron nitride, boron carbide, and boron carbonitride films
JP7228028B2 (ja) 2018-08-17 2023-02-22 コーニング インコーポレイテッド 薄い耐久性の反射防止構造を有する無機酸化物物品
CN113195786A (zh) 2018-10-19 2021-07-30 朗姆研究公司 用于间隙填充的远程氢等离子体暴露以及掺杂或未掺杂硅碳化物沉积
US20220009824A1 (en) 2020-07-09 2022-01-13 Corning Incorporated Anti-glare substrate for a display article including a textured region with primary surface features and secondary surface features imparting a surface roughness that increases surface scattering
KR102675554B1 (ko) * 2022-06-29 2024-06-14 웨이브로드 주식회사 그룹3족 질화물 반도체 소자용 템플릿

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MX9303141A (es) 1992-05-28 1994-04-29 Polar Materials Inc Metodos y aparatos para depositar recubrimientos de barrera.
WO1996020045A1 (en) * 1994-12-28 1996-07-04 Toray Industries, Inc. Coating method and coating apparatus
DE69628441T2 (de) 1995-10-13 2004-04-29 Dow Global Technologies, Inc., Midland Verfahren zur herstellung von beschichteten kunststoffoberflächen
HUP0100072A3 (en) 1997-10-27 2002-11-28 Reddys Lab Ltd Dr Phenoxazine, phenthiazine derivatives, their use in medicine; process for their preparation and pharmaceutical compositions containing them
US6627532B1 (en) * 1998-02-11 2003-09-30 Applied Materials, Inc. Method of decreasing the K value in SiOC layer deposited by chemical vapor deposition
US6667553B2 (en) 1998-05-29 2003-12-23 Dow Corning Corporation H:SiOC coated substrates
US6159871A (en) 1998-05-29 2000-12-12 Dow Corning Corporation Method for producing hydrogenated silicon oxycarbide films having low dielectric constant
DE69935050D1 (de) * 1998-07-23 2007-03-22 Konica Corp Durchsichtiges Element zur Dämpfung von elektromagnetischen Wellen
US6531398B1 (en) * 2000-10-30 2003-03-11 Applied Materials, Inc. Method of depositing organosillicate layers
US20020137323A1 (en) 2001-01-03 2002-09-26 Loboda Mark Jon Metal ion diffusion barrier layers
JP2004526318A (ja) * 2001-03-23 2004-08-26 ダウ・コーニング・コーポレイション 水素化シリコンオキシカーバイド膜を生産するための方法
US7074489B2 (en) * 2001-05-23 2006-07-11 Air Products And Chemicals, Inc. Low dielectric constant material and method of processing by CVD
JP4338495B2 (ja) * 2002-10-30 2009-10-07 富士通マイクロエレクトロニクス株式会社 シリコンオキシカーバイド、半導体装置、および半導体装置の製造方法
JP4746829B2 (ja) * 2003-01-31 2011-08-10 ルネサスエレクトロニクス株式会社 半導体装置およびその製造方法
JP2004235548A (ja) * 2003-01-31 2004-08-19 Nec Electronics Corp 半導体装置およびその製造方法
US20040197474A1 (en) * 2003-04-01 2004-10-07 Vrtis Raymond Nicholas Method for enhancing deposition rate of chemical vapor deposition films
JP4864307B2 (ja) * 2003-09-30 2012-02-01 アイメック エアーギャップを選択的に形成する方法及び当該方法により得られる装置
US6878616B1 (en) * 2003-11-21 2005-04-12 International Business Machines Corporation Low-k dielectric material system for IC application
EP1799877B2 (en) * 2004-08-18 2016-04-20 Dow Corning Corporation Sioc:h coated substrates

Similar Documents

Publication Publication Date Title
JP2008510075A5 (enExample)
ES2526084T3 (es) Herramienta de corte con revestimiento superficial que tiene capa de revestimiento duro con excelente resistencia al desportillado y resistencia a la fractura
WO2007001337A3 (en) Coated substrates and methods for their preparation
JP2009518183A5 (enExample)
CL2011000770A1 (es) Recubrimiento absorbente solar que comprende un sustrato de material metalico, al menos una capa metalica reflectora, una estructura multicapas absorbente depositada sobre la capa metalica reflectora, compuesta por capas dielectricas y por capas metalicas que tienen igual o diferente espesor y/o composicion entre si, y donde dichas capas dielectricas estan depositadas mediante sputtering reactivo, mientras que las capas metalicas estan depositadas por sputtering dc.
JP2008544878A5 (enExample)
JP2005503947A5 (enExample)
JP2008515674A5 (enExample)
JP2009519816A5 (enExample)
JP2005041205A5 (enExample)
JP2008513256A5 (enExample)
JP2007512552A5 (enExample)
JP2013524299A5 (enExample)
JP2011507736A5 (enExample)
JP2009512776A5 (enExample)
MX2007003145A (es) Membrana cementicia, flexible y enrollable y metodo para su fabricacion.
JP2007520740A5 (enExample)
TW200605289A (en) Semiconductor device
JP2003213455A5 (enExample)
WO2010029369A3 (en) Multi-layer adhesive interfaces
DE50207785D1 (de) Projektionsschirm aus einem verbundglas
JPWO2022244243A5 (enExample)
WO2009085683A3 (en) Fluoropolymer multi-layer articles
WO2006023437A3 (en) Sioc:h coated substrates and methods for their preparation
JP2008524028A5 (enExample)