JP2008500711A - 垂直の放出方向を有する面放出型の半導体レーザ素子 - Google Patents
垂直の放出方向を有する面放出型の半導体レーザ素子 Download PDFInfo
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- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18355—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a defined polarisation
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- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18386—Details of the emission surface for influencing the near- or far-field, e.g. a grating on the surface
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Abstract
Description
図1 本発明による半導体レーザ素子の第1の実施例を概略的な断面図で示す。
Claims (21)
- 面放出型の半導体レーザ素子であって、
たとえば、電気ポンピング式の半導体レーザ素子であり、
垂直の放出方向を有し、かつレーザ放射を外部の光学的な共振器(4,5)によって生成するために構成されている形式のものにおいて、
横方向の主延在方向と、放射生成のために設けられた活性ゾーン(3)とを有する半導体層シーケンス(2)を備えた半導体ボディを有し、
該共振器内に放射透過性のコンタクト層(6)が配置されており、該半導体ボディに導電接続されていることを特徴とする、半導体レーザ素子。 - 前記コンタクト層(6)は酸化物を含む、請求項1記載の半導体レーザ素子。
- 前記コンタクト層(6)はTCO材料を含む、請求項1または2記載の半導体レーザ素子。
- 前記コンタクト層(6)はZnOまたはITOを含む、請求項1から3までのいずれか1項記載の半導体レーザ素子。
- 前記コンタクト層(6)は前記半導体ボディ上に配置されている、請求項1から4までのいずれか1項記載の半導体レーザ素子。
- 前記コンタクト層(6)は、前記活性ゾーン(3)と共振器(4,5)の外部ミラー(5)との間の直接的な経路に配置されている、請求項1から5までのいずれか1項記載の半導体レーザ素子。
- 前記共振器はブラッグミラー(4)を境界とする、請求項1から6までのいずれか1項記載の半導体レーザ素子。
- 前記半導体ボディは、前記コンタクト層(6)に対向する面に、少なくとも1つのp導電型の層を有する、請求項1から7までのいずれか1項記載の半導体レーザ素子。
- 前記活性ゾーンにおいて生成される放射の波長は不可視スペクトル領域にあり、たとえば赤外線スペクトル領域にある、請求項1から8までの少なくとも1項記載の半導体レーザ素子。
- 前記コンタクト層(6)によって電気ポンピングされる半導体レーザ素子である、請求項1から9までのいずれか1項記載の半導体レーザ素子。
- 前記半導体ボディは事前製造され、
前記コンタクト層(6)はその後で、該半導体ボディ上に取り付けられる、請求項1から10までのいずれか1項記載の半導体レーザ素子。 - 前記半導体ボディは担体(1)上に配置されている、請求項1から11までのいずれか1項記載の半導体レーザ素子。
- 前記担体(1)は、前記半導体層シーケンスの成長基板と異なる、請求項12記載の半導体レーザ素子。
- 前記担体(1)はヒートシンクとして形成されている、請求項12または13記載の半導体レーザ素子。
- 半導体ボディとコンタクト層(6)との間に、または該コンタクト層(6)の半導体ボディと反対側の面に、光学的なコーティングが設けられている、請求項1から14までのいずれか1項記載の半導体レーザ素子。
- 前記共振器に選択素子(13)が設けられているか、または前記コンタクト層(6)が選択素子(13)として構成されている、請求項1から15までのいずれか1項記載の半導体レーザ素子。
- 前記選択素子(13)は、前記共振器に存在する放射の波長選択および/または偏光選択を行うために構成されている、請求項16記載の半導体レーザ素子。
- 前記選択素子(13)は格子構造(130)を有する、請求項16または17記載の半導体レーザ素子。
- 前記格子構造(130)は少なくとも部分的に前記コンタクト層(6)に形成される、請求項18記載の半導体レーザ素子。
- 前記共振器に非線形の光学的エレメントが配置され、
該光学的エレメントは、たとえば周波数変換用の光学的エレメントである、請求項1から19までのいずれか1項記載の半導体レーザ素子。 - 前記活性ゾーンにおいて生成される放射の波長は、200nm〜2000nmの間のスペクトル領域にある、請求項1から20までの少なくとも1項記載の半導体レーザ素子。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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DE102004026163 | 2004-05-28 | ||
DE102004040077A DE102004040077A1 (de) | 2004-05-28 | 2004-08-18 | Oberflächenemittierendes Halbleiterlaserbauelement mit einer vertikalen Emissionsrichtung |
PCT/DE2005/000791 WO2005117070A2 (de) | 2004-05-28 | 2005-04-29 | Oberflächenemittierendes halbleiterlaserbauelement mit einer vertikalen emissionsrichtung |
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JP2008500711A true JP2008500711A (ja) | 2008-01-10 |
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US (1) | US7620088B2 (ja) |
EP (1) | EP1763913A2 (ja) |
JP (1) | JP2008500711A (ja) |
KR (1) | KR20070020091A (ja) |
DE (1) | DE102004040077A1 (ja) |
WO (1) | WO2005117070A2 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113851932A (zh) * | 2016-12-29 | 2021-12-28 | 欧司朗光电半导体有限公司 | 半导体激光二极管 |
WO2022196394A1 (ja) * | 2021-03-19 | 2022-09-22 | 住友電気工業株式会社 | フォトニック結晶面発光レーザおよびその製造方法 |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
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CN101636887B (zh) * | 2007-03-16 | 2012-10-10 | 皇家飞利浦电子股份有限公司 | 垂直延伸腔表面发射激光器以及用于制造该激光器的发光部件的方法 |
WO2008135903A2 (en) | 2007-05-07 | 2008-11-13 | Philips Intellectual Property & Standards Gmbh | Laser sensor for self-mixing interferometry with increased detection range |
DE102008030818B4 (de) * | 2008-06-30 | 2022-03-03 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Oberflächenemittierender Halbleiterlaser mit mehreren aktiven Zonen |
DE102008036254A1 (de) * | 2008-08-04 | 2010-02-11 | Osram Opto Semiconductors Gmbh | Halbleiterlaser |
DE102010018322B3 (de) * | 2010-04-27 | 2011-04-07 | Laib, Thorsten, Dr. | Optischer Sensor zur Detektion der Konzentration von Substanzen in Fluiden basierend auf der Rückkopplung von Laserlicht in einen Laser |
DE102012203583B4 (de) * | 2012-03-07 | 2021-03-18 | Pictiva Displays International Limited | Organisches Licht emittierendes Bauelement |
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JP2000196189A (ja) * | 1998-12-24 | 2000-07-14 | Toshiba Corp | 面発光型半導体レーザ |
US20030031221A1 (en) * | 2000-04-05 | 2003-02-13 | Coretek, Inc. | Single mode operation of microelectromechanically tunable, half-symmetric, vertical cavity surface emitting lasers |
WO2003030316A2 (de) * | 2001-09-28 | 2003-04-10 | Osram Opto Semiconductors Gmbh | Optisch gepumpter vertikal emittierender halbleiterlaser |
JP2003304033A (ja) * | 2002-03-28 | 2003-10-24 | Osram Opto Semiconductors Gmbh | 光ポンピング可能な垂直エミッタを有する面発光半導体レーザ装置 |
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JP3095545B2 (ja) | 1992-09-29 | 2000-10-03 | 株式会社東芝 | 面発光型半導体発光装置およびその製造方法 |
US5724376A (en) * | 1995-11-30 | 1998-03-03 | Hewlett-Packard Company | Transparent substrate vertical cavity surface emitting lasers fabricated by semiconductor wafer bonding |
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US6778582B1 (en) * | 2000-03-06 | 2004-08-17 | Novalux, Inc. | Coupled cavity high power semiconductor laser |
DE10048443B4 (de) * | 2000-09-29 | 2007-09-06 | Osram Opto Semiconductors Gmbh | Oberflächenemittierender Halbleiter-Laser (VCSEL) mit erhöhter Strahlungsausbeute |
US6862301B2 (en) | 2001-12-31 | 2005-03-01 | Finisar Corporation | Tunable laser assembly |
DE10203809B4 (de) | 2002-01-31 | 2010-05-27 | Osram Opto Semiconductors Gmbh | Strahlungsemittierendes Halbleiterbauelement |
-
2004
- 2004-08-18 DE DE102004040077A patent/DE102004040077A1/de not_active Withdrawn
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2005
- 2005-04-29 JP JP2007513668A patent/JP2008500711A/ja active Pending
- 2005-04-29 US US11/597,951 patent/US7620088B2/en not_active Expired - Fee Related
- 2005-04-29 WO PCT/DE2005/000791 patent/WO2005117070A2/de active Application Filing
- 2005-04-29 EP EP05753554A patent/EP1763913A2/de not_active Withdrawn
- 2005-04-29 KR KR1020067027640A patent/KR20070020091A/ko not_active Application Discontinuation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2000196189A (ja) * | 1998-12-24 | 2000-07-14 | Toshiba Corp | 面発光型半導体レーザ |
US20030031221A1 (en) * | 2000-04-05 | 2003-02-13 | Coretek, Inc. | Single mode operation of microelectromechanically tunable, half-symmetric, vertical cavity surface emitting lasers |
WO2003030316A2 (de) * | 2001-09-28 | 2003-04-10 | Osram Opto Semiconductors Gmbh | Optisch gepumpter vertikal emittierender halbleiterlaser |
JP2003304033A (ja) * | 2002-03-28 | 2003-10-24 | Osram Opto Semiconductors Gmbh | 光ポンピング可能な垂直エミッタを有する面発光半導体レーザ装置 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113851932A (zh) * | 2016-12-29 | 2021-12-28 | 欧司朗光电半导体有限公司 | 半导体激光二极管 |
WO2022196394A1 (ja) * | 2021-03-19 | 2022-09-22 | 住友電気工業株式会社 | フォトニック結晶面発光レーザおよびその製造方法 |
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KR20070020091A (ko) | 2007-02-16 |
EP1763913A2 (de) | 2007-03-21 |
US7620088B2 (en) | 2009-11-17 |
WO2005117070A2 (de) | 2005-12-08 |
WO2005117070A3 (de) | 2006-05-11 |
DE102004040077A1 (de) | 2005-12-22 |
US20080165811A1 (en) | 2008-07-10 |
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