JP2008156735A5 - - Google Patents
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- Publication number
- JP2008156735A5 JP2008156735A5 JP2006349496A JP2006349496A JP2008156735A5 JP 2008156735 A5 JP2008156735 A5 JP 2008156735A5 JP 2006349496 A JP2006349496 A JP 2006349496A JP 2006349496 A JP2006349496 A JP 2006349496A JP 2008156735 A5 JP2008156735 A5 JP 2008156735A5
- Authority
- JP
- Japan
- Prior art keywords
- pole piece
- magnetic pole
- permanent magnet
- outer peripheral
- height
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000002093 peripheral effect Effects 0.000 claims description 8
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 4
- 239000000696 magnetic material Substances 0.000 claims description 2
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006349496A JP4509097B2 (ja) | 2006-12-26 | 2006-12-26 | マグネトロンスパッタリング用磁気回路 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006349496A JP4509097B2 (ja) | 2006-12-26 | 2006-12-26 | マグネトロンスパッタリング用磁気回路 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008156735A JP2008156735A (ja) | 2008-07-10 |
| JP2008156735A5 true JP2008156735A5 (enExample) | 2010-02-12 |
| JP4509097B2 JP4509097B2 (ja) | 2010-07-21 |
Family
ID=39657971
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006349496A Active JP4509097B2 (ja) | 2006-12-26 | 2006-12-26 | マグネトロンスパッタリング用磁気回路 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4509097B2 (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103328683B (zh) * | 2011-01-24 | 2015-04-15 | 日立金属株式会社 | 用于磁控管溅射的磁场发生装置 |
| US9378934B2 (en) | 2011-05-30 | 2016-06-28 | Hitachi Metals, Ltd. | Racetrack-shaped magnetic-field-generating apparatus for magnetron sputtering |
| CN103184421A (zh) * | 2011-12-30 | 2013-07-03 | 鸿富锦精密工业(深圳)有限公司 | 真空溅射靶磁芯 |
| WO2013115030A1 (ja) * | 2012-01-30 | 2013-08-08 | 日立金属株式会社 | マグネトロンスパッタリング用磁場発生装置 |
| KR101654660B1 (ko) * | 2012-07-11 | 2016-09-07 | 캐논 아네르바 가부시키가이샤 | 스퍼터링 장치 및 자석 유닛 |
| DE112014000416T5 (de) * | 2013-02-15 | 2015-10-15 | Hitachi Metals Ltd. | Magnetfeld-erzeugende Vorrichtung für Magnetron Sputtern |
| KR101662659B1 (ko) * | 2014-11-21 | 2016-10-06 | 에이티 주식회사 | 마그네트 유니트가 구성된 다극 마그네트론 캐소드 |
| JP6261682B2 (ja) * | 2016-08-09 | 2018-01-17 | 住友化学株式会社 | 電子デバイスの製造方法 |
| KR102420329B1 (ko) * | 2018-02-13 | 2022-07-14 | 한국알박(주) | 마그네트론 스퍼터링 장치의 자석 집합체 |
| CN108377607B (zh) * | 2018-03-07 | 2024-05-10 | 中国原子能科学研究院 | 一种用于离子源等离子体测试实验装置的电磁铁系统 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02163372A (ja) * | 1988-12-19 | 1990-06-22 | Mitsubishi Kasei Corp | マグネトロンスパッタ装置 |
| JPH02270963A (ja) * | 1989-04-12 | 1990-11-06 | Mitsubishi Kasei Corp | マグネトロンスパッタ装置 |
| JPH0734244A (ja) * | 1993-07-16 | 1995-02-03 | Ube Ind Ltd | マグネトロン型スパッタカソード |
-
2006
- 2006-12-26 JP JP2006349496A patent/JP4509097B2/ja active Active
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