JP2008122844A5 - - Google Patents

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Publication number
JP2008122844A5
JP2008122844A5 JP2006309100A JP2006309100A JP2008122844A5 JP 2008122844 A5 JP2008122844 A5 JP 2008122844A5 JP 2006309100 A JP2006309100 A JP 2006309100A JP 2006309100 A JP2006309100 A JP 2006309100A JP 2008122844 A5 JP2008122844 A5 JP 2008122844A5
Authority
JP
Japan
Prior art keywords
photosensitive composition
film
resist pattern
protective film
phototool
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006309100A
Other languages
English (en)
Japanese (ja)
Other versions
JP5079310B2 (ja
JP2008122844A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2006309100A priority Critical patent/JP5079310B2/ja
Priority claimed from JP2006309100A external-priority patent/JP5079310B2/ja
Priority to TW96142700A priority patent/TWI426351B/zh
Priority to CN 200710187256 priority patent/CN101183212B/zh
Publication of JP2008122844A publication Critical patent/JP2008122844A/ja
Publication of JP2008122844A5 publication Critical patent/JP2008122844A5/ja
Application granted granted Critical
Publication of JP5079310B2 publication Critical patent/JP5079310B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2006309100A 2006-11-15 2006-11-15 ソルダーレジスト露光用フォトツール及びそれを用いて露光処理されるソルダーレジストパターンの形成方法 Active JP5079310B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2006309100A JP5079310B2 (ja) 2006-11-15 2006-11-15 ソルダーレジスト露光用フォトツール及びそれを用いて露光処理されるソルダーレジストパターンの形成方法
TW96142700A TWI426351B (zh) 2006-11-15 2007-11-12 Photolithography (Phototool) and the formation of resistance to resistance pattern
CN 200710187256 CN101183212B (zh) 2006-11-15 2007-11-15 光工具以及阻焊图案的形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006309100A JP5079310B2 (ja) 2006-11-15 2006-11-15 ソルダーレジスト露光用フォトツール及びそれを用いて露光処理されるソルダーレジストパターンの形成方法

Publications (3)

Publication Number Publication Date
JP2008122844A JP2008122844A (ja) 2008-05-29
JP2008122844A5 true JP2008122844A5 (enrdf_load_stackoverflow) 2010-01-07
JP5079310B2 JP5079310B2 (ja) 2012-11-21

Family

ID=39448532

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006309100A Active JP5079310B2 (ja) 2006-11-15 2006-11-15 ソルダーレジスト露光用フォトツール及びそれを用いて露光処理されるソルダーレジストパターンの形成方法

Country Status (2)

Country Link
JP (1) JP5079310B2 (enrdf_load_stackoverflow)
CN (1) CN101183212B (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9081276B2 (en) 2010-09-29 2015-07-14 Kaneka Corporation Photosensitive resin composition production kit, and use thereof
CN103901722B (zh) * 2014-04-28 2017-02-22 无锡德贝尔光电材料有限公司 一种碱性显像型感光树脂组合物及其制备方法
JP6486571B1 (ja) * 2017-06-06 2019-03-20 日本化薬株式会社 電子部品用接着剤
JP7039229B2 (ja) * 2017-09-28 2022-03-22 富士フイルム株式会社 転写フィルムの製造方法、レジストパターンの形成方法、及び、導電性配線パターンの製造方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0717737B2 (ja) * 1987-11-30 1995-03-01 太陽インキ製造株式会社 感光性熱硬化性樹脂組成物及びソルダーレジストパターン形成方法
JP3574524B2 (ja) * 1996-02-23 2004-10-06 積水化学工業株式会社 フォトマスク保護用粘着フィルムの製造方法
TWI226814B (en) * 1999-12-16 2005-01-11 Matsushita Electric Ind Co Ltd A removable film, a substrate with film, a process for forming the removable film and a process for the manufacturing of the circuit board
JP2001296666A (ja) * 2000-04-12 2001-10-26 Orc Mfg Co Ltd 基板露光方法および露光装置
JP2003029417A (ja) * 2001-07-12 2003-01-29 Matsushita Electric Ind Co Ltd プリント配線板の製造方法
JP3876991B2 (ja) * 2002-08-07 2007-02-07 三菱化学株式会社 青紫色レーザー感光性レジスト材層を有する画像形成材及びそのレジスト画像形成方法
TW200417294A (en) * 2002-11-28 2004-09-01 Taiyo Ink Mfg Co Ltd Photo- and thermo-setting resin composition and printed wiring boards made by using the same
JP4852225B2 (ja) * 2003-10-20 2012-01-11 大日本印刷株式会社 露光装置および露光方法
TW200519535A (en) * 2003-11-27 2005-06-16 Taiyo Ink Mfg Co Ltd Hardenable resin composition, hardened body thereof, and printed circuit board
US7682775B2 (en) * 2004-03-05 2010-03-23 E. I. Du Pont De Nemours And Company Process for preparing a flexographic printing plate
TWI403761B (zh) * 2005-02-15 2013-08-01 Fujifilm Corp 透光性導電性膜之製法
JP2008122845A (ja) * 2006-11-15 2008-05-29 Taiyo Ink Mfg Ltd ソルダーレジストパターンの形成方法

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