JP2008117929A - Adhesive tape for solder resist protection, its manufacturing method, and surface roughness control method of solder resist - Google Patents
Adhesive tape for solder resist protection, its manufacturing method, and surface roughness control method of solder resist Download PDFInfo
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- JP2008117929A JP2008117929A JP2006299508A JP2006299508A JP2008117929A JP 2008117929 A JP2008117929 A JP 2008117929A JP 2006299508 A JP2006299508 A JP 2006299508A JP 2006299508 A JP2006299508 A JP 2006299508A JP 2008117929 A JP2008117929 A JP 2008117929A
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- 230000003746 surface roughness Effects 0.000 title claims abstract description 75
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- 239000004820 Pressure-sensitive adhesive Substances 0.000 claims description 84
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Images
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- Adhesive Tapes (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
Abstract
Description
本発明は、ソルダレジスト保護用粘着テープ、その製造方法及びソルダレジスト表面粗さ制御方法に関する。更に詳しくは、ソルダレジスト層の保護と、同時にソルダレジスト層とこれに接着されるものとの接合信頼性の向上とを、少ない工程で達成することができる、粘着剤層の表面粗さの制御がされているソルダレジスト保護用粘着テープ、離型フィルムをラミネートする前記ソルダレジスト保護用粘着テープの製造方法及び前記ソルダレジスト保護用粘着テープを未露光ソルダレジストに貼付し未露光ソルダレジスト面を特定の表面粗さに制御するソルダレジストの表面粗さ制御方法に関する。 The present invention relates to an adhesive tape for protecting a solder resist, a method for producing the same, and a method for controlling the surface roughness of the solder resist. More specifically, the surface roughness of the pressure-sensitive adhesive layer can be achieved in a small number of steps, which can protect the solder resist layer and at the same time improve the reliability of the bonding between the solder resist layer and the solder resist layer. Solder resist protecting adhesive tape, method for producing the solder resist protecting adhesive tape for laminating the release film, and applying the solder resist protecting adhesive tape to the unexposed solder resist to identify the unexposed solder resist surface The present invention relates to a method for controlling the surface roughness of a solder resist that controls the surface roughness of the solder.
プリント基板の製造工程において基板の表面保護、ショート防止等のために基板表面にソルダレジスト層を設けている。このソルダレジスト層には、主として液状の感光性レジストが用いられる。
このソルダレジスト層は、樹脂を介して他の部品と接着されたり、銅メッキにより配線パターンの作成がなされたりと、さまざまな物質と密着又は接着するものであるため、ソルダレジスト層の表面はこれらのものとの一定の接着性や密着性を持つことが必要である。
In the printed circuit board manufacturing process, a solder resist layer is provided on the substrate surface to protect the surface of the substrate and prevent short circuits. A liquid photosensitive resist is mainly used for the solder resist layer.
This solder resist layer adheres to or adheres to various substances, such as being bonded to other parts via resin, or creating a wiring pattern by copper plating. It is necessary to have a certain degree of adhesion and adhesion with the thing.
従来より、ソルダレジスト層は液状レジストを基板全面に塗布して乾燥することによって形成され、これをフォトマスクでマスクし、露光、現像した後に未露光部分を溶解除去して配線パターンを形成するものである。高タック液状レジストの基板両面塗布の際は、これによって密着露光時のフォトマスクへレジストが付着することが問題となっている。フォトマスクへのレジスト付着防止のために、フォトマスク保護用粘着テープが使用されている。フォトマスク保護用粘着テープは、テープ基材背面に液状レジスト付着防止のための離型処理層が設けられている。 Conventionally, a solder resist layer is formed by applying a liquid resist to the entire surface of a substrate and drying it, masking this with a photomask, exposing and developing, and then dissolving and removing unexposed portions to form a wiring pattern. It is. When the high-tack liquid resist is coated on both sides of the substrate, this causes a problem that the resist adheres to the photomask at the time of contact exposure. In order to prevent the resist from adhering to the photomask, an adhesive tape for protecting the photomask is used. In the photomask protective adhesive tape, a release treatment layer for preventing liquid resist adhesion is provided on the back surface of the tape substrate.
フォトマスク保護用粘着テープは一般的にポリエステルフィルム等の透明フィルムの片面に粘着剤層、反対面に離型処理層(一般的にオルガノポリシロキサン(すなわちシリコーン)離型剤)が設けられている。 Photomask protective adhesive tape is generally provided with a pressure-sensitive adhesive layer on one side of a transparent film such as a polyester film, and a release treatment layer (generally an organopolysiloxane (ie silicone) release agent) on the opposite side. .
液状レジストが塗布された基板はフォトマスク保護用粘着テープの貼合されたフォトマスクでマスクされ、真空中で密着露光、現像した後に未露光部分を溶解除去して配線パターンが形成される。 The substrate coated with the liquid resist is masked with a photomask having a photomask protecting adhesive tape bonded thereto, and after contact exposure and development in a vacuum, an unexposed portion is dissolved and removed to form a wiring pattern.
図1は上記従来の基板製造プロセスの一例を示すフローシートであり、フォトマスク1にフォトマスク保護用粘着テープが貼合され、液状レジストが塗布された基板と密着露光される。 FIG. 1 is a flow sheet showing an example of the above-described conventional substrate manufacturing process, in which a photomask protecting adhesive tape is bonded to a photomask 1 and closely exposed to a substrate coated with a liquid resist.
上記の方法によると、フォトマスク保護用粘着テープの離型処理層が液状レジストと密着するため、露光後のソルダレジスト層の表面粗さは離型処理層の表面粗さによって形成されるが、その場合のソルダレジスト層の表面粗さは1.0μm以下となり、基板表面と封止樹脂との密着性が低下する。フォトマスク保護用粘着テープの基材フィルムの表面粗さを大きくする方法も考えられるが、離型処理層がコーティングされるため表面粗さの制御が困難である。 According to the above method, because the release treatment layer of the adhesive mask for photomask protection is in close contact with the liquid resist, the surface roughness of the solder resist layer after exposure is formed by the surface roughness of the release treatment layer, In this case, the surface roughness of the solder resist layer is 1.0 μm or less, and the adhesion between the substrate surface and the sealing resin is lowered. Although the method of enlarging the surface roughness of the base film of the adhesive tape for photomask protection is also conceivable, it is difficult to control the surface roughness because the release treatment layer is coated.
基板表面の粗さを制御する方法として、基板表面をナシ地に処理する方法が提案されている。(特許文献1参照。)この方法によると、ソルダレジスト表面をジェットスクラブ法、液体ホーニング法、ワイヤブラシ法、クレンジング法、サンディング法、あるいは研削除去などの様に別プロセスで表面粗さを制御している。 As a method for controlling the roughness of the substrate surface, a method of treating the substrate surface with pear has been proposed. (See Patent Document 1.) According to this method, the surface roughness of the solder resist surface is controlled by a separate process such as jet scrub method, liquid honing method, wire brush method, cleansing method, sanding method, or grinding removal. ing.
しかし、この方法では、別プロセス付与によってしかソルダレジスト層の表面粗さを任意に制御できないため、工程数が増加する、別プロセスによる汚染が発生するあるいはコストアップ等の問題があった。 However, in this method, since the surface roughness of the solder resist layer can be arbitrarily controlled only by applying another process, there is a problem that the number of steps increases, contamination due to another process occurs, or the cost increases.
本発明の目的は、上記従来技術に鑑み、ソルダレジスト層の保護と、同時にソルダレジスト層とこれに接着されるものとの接合信頼性の向上とを、少ない工程で達成することができる、粘着剤層の表面粗さの制御がされているソルダレジスト保護用粘着テープ、離型フィルムをラミネートする前記ソルダレジスト保護用粘着テープの製造方法及び前記ソルダレジスト保護用粘着テープを未露光ソルダレジストに貼付し未露光ソルダレジスト面を特定の表面粗さに制御するソルダレジストの表面粗さ制御方法により、従来技術の問題点が解決されることを見出し、本発明を完成するに至った。 An object of the present invention is to provide a pressure-sensitive adhesive that can achieve the protection of the solder resist layer and the improvement of the bonding reliability of the solder resist layer and the material bonded to the solder resist layer in a small number of steps, in view of the prior art. Solder resist protecting adhesive tape whose surface roughness is controlled, a method for producing the solder resist protecting adhesive tape for laminating a release film, and pasting the solder resist protecting adhesive tape to an unexposed solder resist The present inventors have found that the problems of the prior art can be solved by a solder resist surface roughness control method for controlling the unexposed solder resist surface to a specific surface roughness, thereby completing the present invention.
本発明者らは、上記の課題を解決するために鋭意研究した結果、基材フィルム(A)と、基材フィルム(A)の片面に形成される粘着剤層(B)と、粘着剤層(B)に貼合される離型フィルム(C)とからなるソルダレジスト保護用粘着テープであって、粘着剤層(B)の離型フィルム(C)と接する面は、粘着剤層(B)を貼付してソルダレジスト層を保護するとき、ソルダレジスト層がこれに接着されるものと強固に接着し得るに十分な表面粗さを有するソルダレジスト保護用粘着テープ、基材フィルム(A)の片面に粘着剤層(B)を形成した後、さらにその上に、粘着剤層(B)と接する面における中心線平均粗さによる表面粗さ(Ra)が1.0μm〜3.0μmである離型フィルム(C)をラミネートするソルダレジスト保護用粘着テープの製造方法及び前記ソルダレジスト保護用粘着テープを用いてソルダレジストの表面粗さを制御する方法であって、該ソルダレジスト保護用粘着テープの離型フィルム(C)を剥離した後、粘着剤層(B)を未露光ソルダレジストに貼付し、未露光ソルダレジストの粘着剤層(B)と接する面を中心線平均粗さによる表面粗さ(Ra)で1.0μm〜3.0μmに制御するソルダレジストの表面粗さ制御方法により、ソルダレジスト層の保護と同時に該層の表面粗さを制御し、ソルダレジスト層とこれに接着されるものとの接合信頼性の向上を少ない工程で達成でき、従来技術の問題点が解決されることを見出し、本発明を完成するに至った。 As a result of diligent research to solve the above problems, the present inventors have found that the base film (A), the pressure-sensitive adhesive layer (B) formed on one side of the base film (A), and the pressure-sensitive adhesive layer It is a pressure sensitive adhesive tape for solder resist protection consisting of a release film (C) to be bonded to (B), and the surface of the pressure sensitive adhesive layer (B) in contact with the release film (C) is the pressure sensitive adhesive layer (B ) Is applied to protect the solder resist layer, the solder resist protective pressure-sensitive adhesive tape having a surface roughness sufficient to allow the solder resist layer to adhere firmly to the solder resist layer and the base film (A) After forming the pressure-sensitive adhesive layer (B) on one side of the surface, the surface roughness (Ra) by the center line average roughness on the surface in contact with the pressure-sensitive adhesive layer (B) is 1.0 μm to 3.0 μm. Viscosity for solder resist protection to laminate a certain release film (C) A method for manufacturing a adhesive tape and a method for controlling the surface roughness of a solder resist using the adhesive tape for protecting a solder resist, wherein the release film (C) of the adhesive tape for protecting a solder resist is peeled off and then adhered. The adhesive layer (B) is affixed to the unexposed solder resist, and the surface of the unexposed solder resist in contact with the adhesive layer (B) is 1.0 μm to 3.0 μm in terms of surface roughness (Ra) based on the center line average roughness. By controlling the surface roughness of the solder resist to be controlled, the surface roughness of the layer is controlled at the same time as the protection of the solder resist layer, thereby improving the bonding reliability between the solder resist layer and the material to be bonded to it with fewer steps. It has been found that the problems of the prior art can be solved and the present invention has been completed.
すなわち、本発明の第1の発明によれば、基材フィルム(A)と、基材フィルム(A)の片面に形成される粘着剤層(B)と、粘着剤層(B)に貼合される離型フィルム(C)とからなるソルダレジスト保護用粘着テープであって、
粘着剤層(B)の離型フィルム(C)と接する面は、粘着剤層(B)を貼付してソルダレジスト層を保護するとき、ソルダレジスト層がこれに接着されるものと強固に接着し得るに十分な表面粗さを有することを特徴とするソルダレジスト保護用粘着テープが提供される。
That is, according to the first invention of the present invention, the base film (A), the adhesive layer (B) formed on one side of the base film (A), and the adhesive layer (B) are bonded. Solder resist protecting adhesive tape consisting of a release film (C),
The surface of the pressure-sensitive adhesive layer (B) in contact with the release film (C) is firmly bonded to the surface to which the solder resist layer is adhered when the pressure-sensitive adhesive layer (B) is applied to protect the solder resist layer. An adhesive tape for protecting a solder resist characterized by having a sufficient surface roughness is provided.
また、本発明の第2の発明によれば、第1の発明において、粘着剤層(B)の離型フィルム(C)と接する面は、中心線平均粗さによる表面粗さ(Ra)が、1.0μm〜3.0μmであることを特徴とするソルダレジスト保護用粘着テープが提供される。 According to the second invention of the present invention, in the first invention, the surface of the pressure-sensitive adhesive layer (B) in contact with the release film (C) has a surface roughness (Ra) due to the center line average roughness. 1.0 μm to 3.0 μm, a solder resist protecting adhesive tape is provided.
また、本発明の第3の発明によれば、第1の発明において、離型フィルム(C)の粘着剤層(B)と接する面は、中心線平均粗さによる表面粗さ(Ra)が、1.0μm〜3.0μmであることを特徴とするソルダレジスト保護用粘着テープが提供される。 According to the third invention of the present invention, in the first invention, the surface in contact with the pressure-sensitive adhesive layer (B) of the release film (C) has a surface roughness (Ra) due to centerline average roughness. 1.0 μm to 3.0 μm, a solder resist protecting adhesive tape is provided.
また、本発明の第4の発明によれば、第1〜3のいずれか1項の発明において、離型フィルム(C)の粘着剤層(B)と接する面は、エンボス加工により表面粗さが制御されていることを特徴とするソルダレジスト保護用粘着テープ。が提供される。 According to the fourth invention of the present invention, in any one of the first to third inventions, the surface in contact with the pressure-sensitive adhesive layer (B) of the release film (C) is surface-roughened by embossing. An adhesive tape for protecting a solder resist, characterized in that is controlled. Is provided.
また、本発明の第5の発明によれば、第1〜3のいずれか1項の発明において、離型フィルム(C)の粘着剤層(B)と接する面は、マット加工により表面粗さが制御されていることを特徴とするソルダレジスト保護用粘着テープが提供される。 According to the fifth invention of the present invention, in the invention of any one of the first to third inventions, the surface of the release film (C) that contacts the pressure-sensitive adhesive layer (B) is roughened by mat processing. An adhesive tape for protecting a solder resist, characterized in that is controlled.
また、本発明の第6の発明によれば、基材フィルム(A)の片面に粘着剤層(B)を形成した後、さらにその上に、粘着剤層(B)と接する面における中心線平均粗さによる表面粗さ(Ra)が1.0μm〜3.0μmである離型フィルム(C)をラミネートすることを特徴とする第1〜5のいずれか1項の発明のソルダレジスト保護用粘着テープの製造方法が提供される。 According to the sixth aspect of the present invention, after the pressure-sensitive adhesive layer (B) is formed on one surface of the base film (A), the center line on the surface in contact with the pressure-sensitive adhesive layer (B) is further formed thereon. For protecting a solder resist according to any one of the first to fifth inventions, wherein a release film (C) having a surface roughness (Ra) based on an average roughness of 1.0 μm to 3.0 μm is laminated. A method for producing an adhesive tape is provided.
また、本発明の第7の発明によれば、第6の発明において、離型フィルム(C)の表面粗さ(Ra)は、エンボス加工またはマット加工により制御されていることを特徴とするソルダレジスト保護用粘着テープの製造方法が提供される。 According to a seventh aspect of the present invention, in the sixth aspect, the surface roughness (Ra) of the release film (C) is controlled by embossing or matting. A method for producing an adhesive tape for resist protection is provided.
また、本発明の第8の発明によれば、第1〜7のいずれか1項の発明のソルダレジスト保護用粘着テープを用いてソルダレジストの表面粗さを制御する方法であって、
該ソルダレジスト保護用粘着テープの離型フィルム(C)を剥離した後、粘着剤層(B)を未露光ソルダレジストに貼付し、未露光ソルダレジストの粘着剤層(B)と接する面を中心線平均粗さによる表面粗さ(Ra)で1.0μm〜3.0μmに制御することを特徴とするソルダレジストの表面粗さ制御方法が提供される。
According to an eighth aspect of the present invention, there is provided a method for controlling the surface roughness of a solder resist using the solder resist protective adhesive tape according to any one of the first to seventh aspects,
After peeling off the release film (C) of the adhesive tape for protecting the solder resist, the adhesive layer (B) is applied to the unexposed solder resist, and the surface in contact with the adhesive layer (B) of the unexposed solder resist is centered. There is provided a method for controlling the surface roughness of a solder resist, characterized in that the surface roughness (Ra) based on the line average roughness is controlled to 1.0 μm to 3.0 μm.
本発明のソルダレジスト保護用粘着テープは、粘着剤層の表面粗さの制御がされていることにより、ソルダレジスト層の保護と、ソルダレジスト層とこれに接着されるものとの接合信頼性の向上とを、少ない工程で同時に達成することができる。
また、本発明のソルダレジスト保護用粘着テープの製造方法は、前記粘着剤層の表面粗さの制御がされているソルダレジスト保護用粘着テープを、特定の離型フィルムをラミネートするという簡便な方法で製造することができる。
また、本発明のソルダレジストの表面粗さ制御方法は、前記ソルダレジスト保護用粘着テープの表面粗さの制御がされている粘着剤層を未露光ソルダレジストに貼付するという簡便な方法で、前記未露光ソルダレジスト面を特定の表面粗さに制御することができる。
これにより、ソルダレジスト層の保護と同時にソルダレジスト層に接着されるものとの接合信頼性の向上を少ない工程で達成でき、これを用いた基板において、剥離向上による水分の侵入の防止、耐湿性の改善、振動や加速度、高温などに対する耐環境性を向上させることができる。そのため、本発明は、特に両面にパターンがある2層基板やフレキシブルプリント基板に好適に用いられる。
The pressure-sensitive adhesive tape for solder resist protection of the present invention has a control of the surface roughness of the pressure-sensitive adhesive layer, so that the solder resist layer can be protected and the bonding reliability between the solder resist layer and the one bonded thereto can be improved. Improvement can be achieved simultaneously with fewer steps.
In addition, the method for producing a pressure-sensitive adhesive tape for solder resist protection of the present invention is a simple method of laminating a specific release film on a pressure-sensitive adhesive tape for solder resist protection in which the surface roughness of the pressure-sensitive adhesive layer is controlled. Can be manufactured.
Further, the method for controlling the surface roughness of the solder resist of the present invention is a simple method in which an adhesive layer in which the surface roughness of the adhesive tape for protecting the solder resist is controlled is attached to an unexposed solder resist, The unexposed solder resist surface can be controlled to a specific surface roughness.
As a result, it is possible to improve the bonding reliability of the solder resist layer to be bonded to the solder resist layer at the same time as the protection of the solder resist layer in a small number of steps. Environment resistance against vibration, acceleration, high temperature, etc. can be improved. Therefore, the present invention is suitably used for a two-layer board or a flexible printed board having a pattern on both sides.
以下、本発明のソルダレジスト保護用粘着テープについて、詳細に説明する。 Hereinafter, the adhesive resist protecting adhesive tape of the present invention will be described in detail.
1.ソルダレジスト保護用粘着テープ
本発明のソルダレジスト保護用粘着テープは、基材フィルム(A)と、基材フィルム(A)の片面に形成される粘着剤層(B)と、粘着剤層(B)に貼合される離型フィルム(C)とからなるソルダレジスト保護用粘着テープであって、粘着剤層(B)の離型フィルム(C)と接する面は、粘着剤層(B)を貼付してソルダレジスト層を保護するとき、ソルダレジスト層がこれに接着されるものと強固に接着し得るに十分な表面粗さを有することを特徴とするソルダレジスト保護用粘着テープである。本発明のソルダレジスト保護用粘着テープは、粘着剤層(B)の離型フィルム(C)と接する面が、離型フィルム(C)の粘着剤層(B)への貼付により、表面粗さの制御がされていることを特徴とするものである。
本発明のソルダレジスト保護用粘着テープに用いられる基材フィルム(C)及び粘着剤層(B)は、ソルダレジストを保護すること及びソルダレジストの表面粗さを制御することに加えて、ソルダレジストに貼付した後、さらにフォトマスクが積層され、露光、現像及び未露光部分の溶解除去等が行われることから、紫外線を含む光透過性が高いこと等も必要である。
1. Solder resist protecting adhesive tape The solder resist protecting adhesive tape of the present invention comprises a base film (A), an adhesive layer (B) formed on one side of the base film (A), and an adhesive layer (B ) Is a pressure-sensitive adhesive tape for solder resist protection composed of a release film (C) to be bonded to the surface of the pressure-sensitive adhesive layer (B) in contact with the release film (C). A solder resist protective pressure-sensitive adhesive tape characterized by having a surface roughness sufficient to adhere firmly to the solder resist layer adhered to the solder resist layer when affixed to protect the solder resist layer. The pressure-sensitive adhesive tape for solder resist protection of the present invention is such that the surface of the pressure-sensitive adhesive layer (B) in contact with the release film (C) has a surface roughness by sticking to the pressure-sensitive adhesive layer (B) of the release film (C). It is characterized by being controlled.
In addition to protecting the solder resist and controlling the surface roughness of the solder resist, the base film (C) and the pressure-sensitive adhesive layer (B) used for the adhesive tape for protecting the solder resist of the present invention are solder resist. After being affixed to the substrate, a photomask is further laminated, and exposure, development, dissolution removal of unexposed portions, and the like are performed. Therefore, it is necessary that the light transmittance including ultraviolet rays is high.
(1)基材フィルム(A)
上記基材フィルム(A)としては、紫外線を含む光透過性の高いものであれば特に限定されず、例えば、基材フィルムとしては、ポリエステル、ポリエチレンテレフタレート(PET)、ポリプロピレン、ポリエチレン、塩化ビニル、ポリスチレン、ポリイミド、ポリカーボネート、セロハン等の樹脂からなるもの等が挙げられる。
本発明に用いる基材フィルム(A)としては、透明フィルムである汎用のPET、ポリプロピレン等が好ましい。特に厚さ4〜25μm、より好ましくは6〜12μmのPETフィルムが、透明性、厚み精度の点からより好適である。
(1) Base film (A)
The base film (A) is not particularly limited as long as it has high light transmittance including ultraviolet rays, and examples of the base film include polyester, polyethylene terephthalate (PET), polypropylene, polyethylene, vinyl chloride, Examples thereof include those made of resins such as polystyrene, polyimide, polycarbonate, and cellophane.
As a base film (A) used for this invention, general purpose PET, polypropylene, etc. which are transparent films are preferable. In particular, a PET film having a thickness of 4 to 25 μm, more preferably 6 to 12 μm is more preferable from the viewpoint of transparency and thickness accuracy.
また、上記基材フィルム(A)には、本発明に悪影響を与えない限りにおいて、粘着剤との粘着性を向上させるためのプラズマ処理や、ロール状に巻き回された基材フィルムを巻き戻す際に基材フィルム同士が合着して巻き戻すことが難しくならないような滑り性の付与処理等の処理がされていてもよい。また、着色剤、充填剤、紫外線吸収剤、光安定剤、熱安定剤、艶調整剤、滑剤、帯電防止剤、抗菌剤、防黴剤、難燃剤、減摩剤等の各種の添加剤を適宜添加することもできる。 Moreover, as long as it does not have a bad influence on this invention, the said base film (A) unwinds the plasma processing for improving the adhesiveness with an adhesive, and the base film wound by roll shape. In some cases, a process such as a process of imparting slipperiness may be performed so that the base films are not attached to each other and unwound. Various additives such as colorants, fillers, UV absorbers, light stabilizers, heat stabilizers, gloss control agents, lubricants, antistatic agents, antibacterial agents, antifungal agents, flame retardants, and antifriction agents It can also be added as appropriate.
その他、上記基材フィルム(A)に帯電防止処理として、帯電防止剤をコートあるいは配合等することもできる。上記帯電防止処理によって、離型フィルムを剥離した際に、静電気の発生が抑制され、塵埃等の異物の付着による回路パターンの信頼性の低下を実質的になくすことができる。前記帯電防止処理手段は、所望の帯電防止性能を付与しえるものであればとくに限定されるものではないが、界面活性剤等の帯電防止剤を、基材フィルム内に配合する方法、基材フィルム表面に蒸着又はコートする方法等が挙げられる。 In addition, as the antistatic treatment, the base film (A) can be coated or blended with an antistatic agent. By the antistatic treatment, when the release film is peeled off, generation of static electricity is suppressed, and a decrease in circuit pattern reliability due to adhesion of foreign matters such as dust can be substantially eliminated. The antistatic treatment means is not particularly limited as long as it can provide the desired antistatic performance, but a method of blending an antistatic agent such as a surfactant into the base film, base material The method of vapor-depositing or coating on the film surface is mentioned.
(2)粘着剤層(B)
上記粘着剤層としては、ゴム系粘着剤、アクリル系粘着剤等を用いることができる。透明性、非変色性、解像度等の点からアクリル系粘着剤が好ましい。
(2) Adhesive layer (B)
As the pressure-sensitive adhesive layer, a rubber-based pressure-sensitive adhesive, an acrylic pressure-sensitive adhesive, or the like can be used. An acrylic pressure-sensitive adhesive is preferred from the viewpoints of transparency, non-discoloration, resolution, and the like.
アクリル系粘着剤としては、特に、アルキル基の炭素数4〜12の(メタ)アクリル酸アルキルエステルを主成分とし、これに少量の官能性モノマーや改質モノマーを共重合させて得られる共重合体が好適に用いられる。 As the acrylic pressure-sensitive adhesive, in particular, a copolymer obtained by copolymerizing an alkyl group (meth) acrylic acid alkyl ester having 4 to 12 carbon atoms as a main component and a small amount of a functional monomer or a modified monomer. Coalescence is preferably used.
上記(メタ)アクリル酸エステルとしては、アクリル酸n−ブチル、アクリル酸イソブチル、アクリル酸ヘキシル、アクリル酸オクチル、アクリル酸2−エチルヘキシル、アクリル酸イソオクチル、アクリル酸デシル、アクリル酸イソデシル、メタクリル酸2−エチルヘキシル、メタクリル酸イソオクチル、メタクリル酸デシル、メタクリル酸イソデシル、メタクリル酸ラウリル等が例示される。 Examples of the (meth) acrylic acid ester include n-butyl acrylate, isobutyl acrylate, hexyl acrylate, octyl acrylate, 2-ethylhexyl acrylate, isooctyl acrylate, decyl acrylate, isodecyl acrylate, 2-methacrylic acid 2- Examples include ethylhexyl, isooctyl methacrylate, decyl methacrylate, isodecyl methacrylate, lauryl methacrylate and the like.
上記官能性モノマーの例としては、水酸基を有するモノマー、カルボキシル基を有するモノマー、アミド基を有するモノマー、アミノ基を有するモノマー、ピロリドン環を有するモノマー等が挙げられる。水酸基を有するモノマーとしては、(メタ)アクリル酸2−ヒドロキシエチル、(メタ)アクリル酸ヒドロキシプロピル等の(メタ)アクリル酸ヒドロキシアルキル等が例示される。 Examples of the functional monomer include a monomer having a hydroxyl group, a monomer having a carboxyl group, a monomer having an amide group, a monomer having an amino group, and a monomer having a pyrrolidone ring. Examples of the monomer having a hydroxyl group include hydroxyalkyl (meth) acrylates such as 2-hydroxyethyl (meth) acrylate and hydroxypropyl (meth) acrylate.
カルボキシル基を有するモノマーとしては、アクリル酸、メタクリル酸等のα,β−不飽和カルボン酸、マレイン酸モノブチル等のマレイン酸モノアルキルエステル、マレイン酸、フマル酸、クロトン酸等が例示される。無水マレイン酸もマレイン酸と同様の(共)重合成分を与える。 Examples of the monomer having a carboxyl group include α, β-unsaturated carboxylic acids such as acrylic acid and methacrylic acid, monoalkyl maleates such as monobutyl maleate, maleic acid, fumaric acid, and crotonic acid. Maleic anhydride also provides the same (co) polymerization component as maleic acid.
アミド基を有するモノマーとしては、アクリルアミド、ジメチルアクリルアミド、ジエチルアクリルアミド等のアルキル(メタ)アクリルアミド、N−ブトキシメチルアクリルアミド、N−エトキシメチルアクリルアミド等のN−アルコキシメチル(メタ)アクリルアミド、ジアセトンアクリルアミド等が例示される。アミノ基を有するモノマーとしてはジメチルアミノエチルアクリレート等が例示される。ピロリドン環を有するモノマーとしてはN−ビニルピロリドン等が例示される。 Examples of monomers having an amide group include alkyl (meth) acrylamides such as acrylamide, dimethylacrylamide, and diethylacrylamide, N-alkoxymethyl (meth) acrylamides such as N-butoxymethylacrylamide, N-ethoxymethylacrylamide, and diacetone acrylamide. Illustrated. Examples of the monomer having an amino group include dimethylaminoethyl acrylate. Examples of the monomer having a pyrrolidone ring include N-vinylpyrrolidone.
特に好ましいアクリル系粘着剤としては、アクリル酸アルキルエステルとアクリル酸の共重合体が挙げられる。 A particularly preferred acrylic pressure-sensitive adhesive includes a copolymer of acrylic acid alkyl ester and acrylic acid.
本発明においては、特に、粘着剤への架橋剤の添加により重合体間に架橋が生じ、それにより粘着剤の内部凝集力が増大し、離型フィルムの表面粗さの粘着剤表面への転写性が向上するため、粘着剤へ架橋剤を添加することが望ましい。
このような架橋剤としては、イソシアネート系、エポキシ系、アジリジン系、有機金属系、キレート系、アミン系等の後添加型架橋剤や、ジ(メタ)アクリレート、トリ(メタ)アクリレート、テトラ(メタ)アクリレート、ジビニル系化合物等の共重合性架橋剤が例示される。
In the present invention, in particular, the addition of a crosslinking agent to the pressure-sensitive adhesive causes cross-linking between the polymers, thereby increasing the internal cohesive force of the pressure-sensitive adhesive, and transferring the surface roughness of the release film to the pressure-sensitive adhesive surface. It is desirable to add a cross-linking agent to the pressure-sensitive adhesive because the properties are improved.
Examples of such cross-linking agents include post-addition cross-linking agents such as isocyanate, epoxy, aziridine, organometallic, chelate and amine, di (meth) acrylate, tri (meth) acrylate, tetra (meth) ) Copolymerizable crosslinking agents such as acrylates and divinyl compounds are exemplified.
共重合性架橋剤の具体例としては、ヘキサメチレングリコールやオクタメチレングリコール等のポリメチレングリコール類と(メタ)アクリル酸とを結合させて得られるジ(メタ)アクリレート;ポリエチレングリコールやポリプロピレングリコール等のポリアルキレングリコール類と(メタ)アクリル酸とを結合させて得られるジ(メタ)アクリレート;トリメチロールプロパントリ(メタ)アクリレートやグリセリントリ(メタ)アクリレート等のトリ(メタ)アクリレート;およびペンタエリスリトールテトラ(メタ)アクリレート等のテトラ(メタ)アクリレートが挙げられる。
これらのうちでも、離型フィルムの凹凸を粘着剤表面に離型フィルムとのラミネート後に転写させるために、後添加型架橋剤が好ましく、具体的にはヘキサメチレンジイソシアネート(HMDI)が、特に好ましい。
Specific examples of the copolymerizable crosslinking agent include di (meth) acrylates obtained by combining polymethylene glycols such as hexamethylene glycol and octamethylene glycol and (meth) acrylic acid; polyethylene glycol, polypropylene glycol, and the like. Di (meth) acrylate obtained by combining polyalkylene glycols with (meth) acrylic acid; tri (meth) acrylate such as trimethylolpropane tri (meth) acrylate and glycerin tri (meth) acrylate; and pentaerythritol tetra Examples include tetra (meth) acrylates such as (meth) acrylate.
Among these, in order to transfer the unevenness of the release film onto the pressure-sensitive adhesive surface after lamination with the release film, a post-addition type crosslinking agent is preferable, and specifically, hexamethylene diisocyanate (HMDI) is particularly preferable.
上記架橋剤の配合量は、粘着剤100重量部を基準として、1.0〜5.0重量部の割合で混合するのが、粘着剤表面凹凸保持の点から望ましい。より好ましくは、2.0〜4.0重量部の割合で混合するのが望ましい。1.0重量部より少ないと離型フィルム剥離後に粘着剤表面の凹凸形状が変化することがあり、5.0重量部より多いと架橋反応に関与しない余分な架橋剤が粘着剤中に残るため、好ましくない。 The amount of the crosslinking agent is preferably 1.0 to 5.0 parts by weight based on 100 parts by weight of the pressure-sensitive adhesive from the viewpoint of maintaining the surface roughness of the pressure-sensitive adhesive. More preferably, it is desirable to mix at a ratio of 2.0 to 4.0 parts by weight. If the amount is less than 1.0 part by weight, the uneven shape of the pressure-sensitive adhesive surface may change after the release film is peeled off. If the amount is more than 5.0 parts by weight, an excess crosslinking agent that does not participate in the crosslinking reaction remains in the pressure-sensitive adhesive. It is not preferable.
すなわち、本発明における粘着剤層(B)としては、アクリル酸アルキルエステルとアクリル酸の共重合体に、架橋剤としてHMDIを2.0重量部加えた粘着剤が、好ましい組合わせである。この組合わせにより、本発明における粘着剤層として、一般に粘着剤層として必要な機能に加えて、特に、離型フィルム(C)を貼付及び剥離した際の粘着剤層表面の表面粗さ制御機能が好ましく発揮されるものとなる。本発明においては、離型フィルム(C)剥離後の粘着剤層の基材フィルムと接していない面における中心線平均粗さによる表面粗さ(Ra)が、1.0μm〜3.0μmであることが好ましい。 That is, as the pressure-sensitive adhesive layer (B) in the present invention, a pressure-sensitive adhesive in which 2.0 parts by weight of HMDI as a crosslinking agent is added to a copolymer of acrylic acid alkyl ester and acrylic acid is a preferable combination. By this combination, in addition to the functions generally required as a pressure-sensitive adhesive layer as the pressure-sensitive adhesive layer in the present invention, in particular, the surface roughness control function of the pressure-sensitive adhesive layer surface when the release film (C) is stuck and peeled off Is preferably exhibited. In this invention, the surface roughness (Ra) by centerline average roughness in the surface which is not in contact with the base film of the pressure-sensitive adhesive layer after release film (C) is 1.0 μm to 3.0 μm. It is preferable.
また、上記粘着剤には、必要に応じて粘着付与剤、可塑剤、安定剤といった添加剤を加えることもできる。これらは光線透過率、色相等の光学特性を損わない範囲で配合するのが好ましい。この他、上記粘着剤中に、帯電防止剤をコートあるいは配合することもできる。 Moreover, additives, such as a tackifier, a plasticizer, and a stabilizer, can be added to the pressure-sensitive adhesive as necessary. These are preferably blended within a range that does not impair optical properties such as light transmittance and hue. In addition, an antistatic agent can be coated or blended in the pressure-sensitive adhesive.
例えば、本発明においては、粘着力を向上させるために、いわゆるタッキファイアー成分を配合して用いることができる。タッキファイアー成分とは、粘着付与剤ともいい、エラストマーに配合されて粘着性の機能を向上させる物質であり、通常、分子量が数百から数千の無定形オリゴマーで、常温で液状または固形の熱可塑性樹脂である。 For example, in the present invention, in order to improve the adhesive strength, a so-called tackifier component can be blended and used. A tackifier component, also called a tackifier, is a substance that is blended into an elastomer to improve its adhesive function, and is usually an amorphous oligomer with a molecular weight of several hundred to several thousand, which is a liquid or solid heat at room temperature. It is a plastic resin.
タッキファイアーの種類は、特に限定されず、ロジン系樹脂、テルペン系樹脂に代表される天然樹脂系や、脂肪族系、芳香族系、共重合系の石油樹脂、フェノール系樹脂、キシレン樹脂等の合成樹脂系が例示される。これらは単独で用いても、2種類以上併用して用いても良い。 The type of tackifier is not particularly limited, such as natural resin typified by rosin resin, terpene resin, aliphatic, aromatic, copolymer petroleum resin, phenolic resin, xylene resin, etc. A synthetic resin system is exemplified. These may be used alone or in combination of two or more.
タッキファイアーは、通常、光の透過を阻害するため、ヘイズ値を大きくさせず、かつ好適な粘着性能を達成するためには、ロジン系樹脂、テルペンフェノール系樹脂を併用して用いることが好ましい。 The tackifier usually inhibits light transmission, so that it does not increase the haze value, and it is preferable to use a rosin resin and a terpene phenol resin together in order to achieve suitable adhesive performance.
タッキファイアー成分の配合量は、粘着剤100重量部に対して、5〜80重量部が好ましく、8〜50重量部であることがより好ましい。タッキファイアーの配合量が少なすぎると、必要な粘着力が得られず、逆に多すぎると、糊残りの問題が生じやすくなり、事実上使用することが困難になる。 5-80 weight part is preferable with respect to 100 weight part of adhesives, and, as for the compounding quantity of a tackifier component, it is more preferable that it is 8-50 weight part. If the amount of the tackifier is too small, the necessary adhesive strength cannot be obtained. On the other hand, if the amount is too large, the problem of adhesive residue tends to occur, and it becomes practically difficult to use.
本発明において、基材フィルム(A)と粘着剤層(B)の粘着力は、糊残りの点から、200gf/25mm以上であることが好ましい。また、以下に説明する離型フィルムとの粘着力は、粘着剤との容易な剥離製、粘着剤の表面凹凸形状の維持の点から、1.0〜10.0gf/25mmであることが好ましい。 In this invention, it is preferable that the adhesive force of a base film (A) and an adhesive layer (B) is 200 gf / 25mm or more from the point of adhesive residue. Moreover, it is preferable that the adhesive force with the mold release film demonstrated below is 1.0-10.0 gf / 25mm from the point of easy peeling manufacture with an adhesive, and the maintenance of the uneven surface shape of an adhesive. .
本発明の粘着剤層(B)は、基材フィルム(A)に塗布され形成されるものであるが、乾燥後の粘着剤層の厚みは1〜10μmの範囲が好ましく、より好ましくは、2〜8μmの範囲である。1μm未満であると、ソルダレジストへの接着強度が不足することがあり、一方、10μmを超えると、充分な光透過性が得られなくなることがある。 The pressure-sensitive adhesive layer (B) of the present invention is formed by being applied to the base film (A). The thickness of the pressure-sensitive adhesive layer after drying is preferably in the range of 1 to 10 μm, more preferably 2 It is in the range of ˜8 μm. If the thickness is less than 1 μm, the adhesive strength to the solder resist may be insufficient. On the other hand, if it exceeds 10 μm, sufficient light transmittance may not be obtained.
(3)離型フィルム(C)
本発明において、離型フィルム(C)は、上記粘着剤層に貼付し剥離した際に、粘着剤層(B)の表面粗さを制御するものである。
本発明に用いられる離型フィルム(C)としては、離型フィルム(C)の粘着剤層(B)と接する面における中心線平均粗さによる表面粗さ(Ra)が、基板の接合信頼性から、1.0μm〜3.0μmであることが好ましい。より好ましくは1.0〜2.0μmである。1.0μmより小さいと、基盤の接合信頼性向上の効果が現れにくく、3.0μmより大きいと、基板表面凹凸への封止樹脂含侵が不足することがあるため好ましくない。
(3) Release film (C)
In this invention, a release film (C) controls the surface roughness of an adhesive layer (B), when it affixes on the said adhesive layer and peels.
As the release film (C) used in the present invention, the surface roughness (Ra) due to the center line average roughness on the surface of the release film (C) in contact with the pressure-sensitive adhesive layer (B) is the bonding reliability of the substrate. Therefore, the thickness is preferably 1.0 μm to 3.0 μm. More preferably, it is 1.0-2.0 micrometers. If it is smaller than 1.0 μm, the effect of improving the bonding reliability of the substrate hardly appears, and if it is larger than 3.0 μm, the sealing resin impregnation into the substrate surface irregularities may be insufficient, which is not preferable.
前記離型フィルム(C)としては、合成樹脂フィルムあるいはポリエチレンラミネートされた紙に離型処理を施したもの等が使用可能であり、中でも汎用のPETフィルムにシリコーン離型剤を用いて離型処理を施したものが好適に用いられる。また、汎用のポリエチレン(PE)フィルムの場合には、離型処理を施さなくても使用できる。PEフィルムの場合は、粘着剤との剥離時に粘着剤表面に微細な凹凸を形成されることが確認されている。 As the release film (C), a synthetic resin film or a polyethylene-laminated paper subjected to a release treatment can be used, and among them, a general-purpose PET film is released using a silicone release agent. Those subjected to are preferably used. In the case of a general-purpose polyethylene (PE) film, it can be used without being subjected to a release treatment. In the case of a PE film, it has been confirmed that fine unevenness is formed on the surface of the pressure-sensitive adhesive when peeled from the pressure-sensitive adhesive.
離型フィルム(C)の表面粗さを任意に制御する方法としては、エンボス加工、マット加工などが好適である。その際の表面粗さは基板の接合信頼性から、中心線平均粗さによる表面粗さ(Ra)で1.0μm〜3.0μmであることが好ましい。 As a method for arbitrarily controlling the surface roughness of the release film (C), embossing, matting and the like are suitable. In this case, the surface roughness is preferably 1.0 μm to 3.0 μm in terms of the surface roughness (Ra) based on the average roughness of the center line from the bonding reliability of the substrate.
この離型フィルム(C)は、本発明のソルダレジスト保護用粘着テープをソルダレジスト表面に貼付する前に、粘着テープから剥離される。 This release film (C) is peeled off from the pressure-sensitive adhesive tape before the pressure-sensitive adhesive tape for protecting a solder resist of the present invention is applied to the surface of the solder resist.
2.ソルダレジスト保護用粘着テープの製造方法
本発明のソルダレジスト保護用粘着テープの製造方法は、基材フィルム(A)の片面に粘着剤層(B)を形成し、前記粘着剤層(B)の基材フィルム(A)と接していない面に、前記粘着剤層(B)と接する面における中心線平均粗さによる表面粗さ(Ra)が1.0μm〜3.0μmである離型フィルム(C)をラミネートすることを特徴とする。より好ましくは1.0〜2.0μmである。前述と同様、1.0μmより小さいと、基盤の接合信頼性向上の効果が現れにくく、3.0μmより大きいと、基板表面凹凸への封止樹脂含侵が不足することがあるため好ましくない。
2. The manufacturing method of the adhesive tape for solder resist protection The manufacturing method of the adhesive tape for solder resist protection of this invention forms an adhesive layer (B) in the single side | surface of a base film (A), and is the said adhesive layer (B). A release film having a surface roughness (Ra) of 1.0 μm to 3.0 μm on the surface that is not in contact with the base film (A) and having a center line average roughness on the surface in contact with the pressure-sensitive adhesive layer (B) ( C) is laminated. More preferably, it is 1.0-2.0 micrometers. Similarly to the above, if it is smaller than 1.0 μm, the effect of improving the bonding reliability of the substrate is hardly exhibited, and if it is larger than 3.0 μm, the impregnation of the sealing resin into the substrate surface irregularities may be insufficient.
前記基材フィルム(A)の片面に、粘着剤層(B)を形成する方法としては、調整した粘着剤溶液を、グラビアコーター、コンマコーター、ロールコーター等により基材フィルム上に層状に所望の厚みになるよう塗工し、乾燥後に離型フィルム(C)をラミネートすることで粘着テープが形成される。 As a method of forming the pressure-sensitive adhesive layer (B) on one side of the base film (A), the prepared pressure-sensitive adhesive solution is layered on the base film with a gravure coater, comma coater, roll coater or the like. The pressure-sensitive adhesive tape is formed by coating to a thickness and laminating the release film (C) after drying.
離型フィルム(C)のラミネート方法としては、本発明の目的を阻害しない限りにおいて、通常のラミネート方法を使用することができる。 As a method for laminating the release film (C), a normal laminating method can be used as long as the object of the present invention is not impaired.
3.ソルダレジストの表面粗さ制御方法
本発明のソルダレジストの表面粗さ制御方法は、ソルダレジスト保護用粘着テープの粘着剤層を未露光ソルダレジストに貼付し、未露光ソルダレジストの前記粘着剤層と接する面を中心線平均粗さによる表面粗さ(Ra)で1.0μm〜3.0μmに制御することを特徴とする。
3. Solder Resist Surface Roughness Control Method The solder resist surface roughness control method of the present invention is a method in which the adhesive layer of the adhesive tape for solder resist protection is applied to an unexposed solder resist, and the adhesive layer of the unexposed solder resist and The surface to be contacted is controlled to 1.0 μm to 3.0 μm by the surface roughness (Ra) by the center line average roughness.
具体的には、プリント基板等のソルダレジスト層を保護する際に、粘着剤が任意な表面粗さを有した基板保護用粘着テープを液状レジストに貼合して露光、現像した後に未露光部分を溶解除去して配線パターンを形成することにより、別プロセスを付与することなくソルダレジスト層の表面粗さを任意に制御することができ、プリント基板等の接合信頼性が向上するものである。 Specifically, when protecting a solder resist layer such as a printed circuit board, an unexposed portion after the adhesive is bonded to a liquid resist with an adhesive tape having an arbitrary surface roughness, exposed and developed. By dissolving and removing the film to form a wiring pattern, the surface roughness of the solder resist layer can be arbitrarily controlled without applying another process, and the bonding reliability of a printed circuit board or the like is improved.
図2に本発明による基板製造プロセスのフローシートを示す。未露光部分を溶解除去した後のソルダレジスト表面において、本発明のソルダレジスト保護用粘着テープの粘着剤層(B)が未露光のソルダレジスト表面に貼付されたことから、前記粘着剤層(B)の表面粗さが、ソルダレジスト表面に転写される。こうして、ソルダレジスト表面が任意の表面粗さに制御され、その後に、例えば、配線パターンを形成する際に、配線パターンの密着性がよく、プリント基板の接合信頼性が向上するものである。 FIG. 2 shows a flow sheet of a substrate manufacturing process according to the present invention. Since the adhesive layer (B) of the adhesive tape for protecting a solder resist of the present invention was applied to the surface of the unexposed solder resist on the solder resist surface after dissolving and removing the unexposed portion, the adhesive layer (B ) Is transferred to the surface of the solder resist. In this way, the surface of the solder resist is controlled to an arbitrary surface roughness, and thereafter, for example, when forming the wiring pattern, the adhesion of the wiring pattern is good, and the bonding reliability of the printed circuit board is improved.
以下、実施例により本発明を具体的に説明するが、本発明はこれに限定されるものではない。
なお、測定方法は以下の方法を用いた。
表面粗さRa:レーザー顕微鏡(キーエンス製、VK8500:倍率200倍、エリア1.4mm×1.0mm)を用いて測定した値である。
ソルダレジスト表面Gloss%:堀場製作所製、IG330の装置によって測定した値。数値が小さいほど表面が粗いことを示す。
封止樹脂の接合信頼性(接合強度):熱衝撃試験法(150℃−65℃×500サイクル)によって、樹脂剥離が発生しないものを○、樹脂剥離が発生したものを×として測定。
EXAMPLES Hereinafter, the present invention will be specifically described with reference to examples, but the present invention is not limited thereto.
The measurement method used was as follows.
Surface roughness Ra: a value measured using a laser microscope (manufactured by Keyence, VK8500: magnification 200 times, area 1.4 mm × 1.0 mm).
Solder resist surface Gloss%: Value measured by an apparatus of IG330 manufactured by HORIBA, Ltd. The smaller the value, the rougher the surface.
Bonding reliability (bonding strength) of encapsulating resin: Measured by a thermal shock test method (150 ° C.-65 ° C. × 500 cycles) as “O” when resin peeling did not occur and “X” when resin peeling occurred.
(実施例1)
粘着剤としてアクリル酸5重量部、アクリル酸ブチル95重量部を共重合させた粘着剤に、イソシアネート系架橋剤(日本ポリウレタン社製,商品名「コロネートL−45」)を2重量部加えた10%トルエン溶液を、12μmの基材フィルム1(帝人DF社製,E−12)に乾燥後の厚みが3μmとなるように塗布・乾燥し、表面粗さRaが1.7μmにマット処理された厚さ25μmのポリエステルフィルム2(帝人DF社製,TS−25)の離型処理面を貼り合わせて基板保護用粘着テープを得た。
(Example 1)
10 parts by adding 2 parts by weight of an isocyanate-based crosslinking agent (trade name “Coronate L-45” manufactured by Nippon Polyurethane Co., Ltd.) to an adhesive obtained by copolymerizing 5 parts by weight of acrylic acid and 95 parts by weight of butyl acrylate as an adhesive % Toluene solution was applied to a 12 μm substrate film 1 (E-12, manufactured by Teijin DF Co., Ltd.) and dried so that the thickness after drying was 3 μm, and matted to a surface roughness Ra of 1.7 μm. A release-treated surface of a 25 μm thick polyester film 2 (TS-25, manufactured by Teijin DF Co., Ltd.) was bonded to obtain an adhesive tape for protecting the substrate.
(実施例2)
実施例1で得たものと同じ粘着テープの粘着剤面に厚さ30μmのPEフィルム(タマポリ製,GF−30)を貼り合せて基板保護用粘着テープを得た。
(Example 2)
A PE film (manufactured by Tamapoly, GF-30) having a thickness of 30 μm was bonded to the pressure-sensitive adhesive surface of the same pressure-sensitive adhesive tape as that obtained in Example 1 to obtain a pressure-sensitive adhesive tape for substrate protection.
(比較例1)
実施例1で得たものと同じ粘着テープの粘着剤面に厚さ25μmのポリエステルフィルムフィルム(東洋紡績製,E−7002)を貼り合せて基板保護用粘着テープを得た。
比較例にて使用したポリエステルフィルムの表面粗さRaは0.05μmである。
(Comparative Example 1)
A polyester film film having a thickness of 25 μm (Toyobo Co., Ltd., E-7002) was bonded to the pressure-sensitive adhesive surface of the same pressure-sensitive adhesive tape as obtained in Example 1 to obtain a pressure-sensitive adhesive tape for substrate protection.
The surface roughness Ra of the polyester film used in the comparative example is 0.05 μm.
ガラスエポキシ基板に液状レジスト(太陽インキ製,AUS308)を乾燥後に35μmとなるようにスクリーン印刷した基板を80℃×30分乾燥を行い、上記実施例1、2比較例1に示した基板保護用粘着テープをラミネートし、UV露光装置にて500mJ照射を行った。 A substrate obtained by screen-printing a liquid resist (manufactured by Taiyo Ink, AUS308) on a glass epoxy substrate so as to be 35 μm after drying is dried at 80 ° C. for 30 minutes to protect the substrate shown in the above-mentioned Examples 1 and 2 Comparative Example 1. The adhesive tape was laminated and irradiated with 500 mJ with a UV exposure apparatus.
[評価]
上記各実施例および比較例で得られた基板保護用粘着テープの粘着剤面の表面粗さ及び、それらを用いて作製したガラスエポキシ基板につき、ソルダレジスト層の表面粗さ、Gloss、ソルダレジスト層と封止樹脂の接合強度を測定した。
これらの結果を表1に示す。
[Evaluation]
The surface roughness of the adhesive surface of the adhesive tape for protecting a substrate obtained in each of the above Examples and Comparative Examples, and the surface roughness of the solder resist layer, Gloss, the solder resist layer for the glass epoxy substrate produced using them. The bonding strength of the sealing resin was measured.
These results are shown in Table 1.
表1から明らかなように、実施例1〜2で得られた基板保護用粘着テープを用いて作成した基板の接合強度は比較例1で得られたものに比べて良好な結果を示した。
つまり、実施例1又は2と比較例1とを対比すると、本発明の製造方法の特定事項である、「前記粘着剤層の基材フィルムと接していない面が、離型フィルムの貼付と剥離とにより表面粗さの制御がされている」との要件を満たさない方法で製造した比較例1では、本発明のソルダレジスト保護用粘着テープを用いた実施例1又は2では、粘着剤の表面粗さを制御することにより、ソルダレジスト表面粗さを制御することができ、表面粗さが制御されたソルダレジストを用いた封止樹脂の接合強度信頼性が向上していることがわかる。
As is clear from Table 1, the bonding strength of the substrates prepared using the substrate protecting adhesive tapes obtained in Examples 1 and 2 showed better results than those obtained in Comparative Example 1.
That is, when Example 1 or 2 is compared with Comparative Example 1, which is a specific matter of the production method of the present invention, “the surface of the pressure-sensitive adhesive layer that is not in contact with the substrate film is attached and peeled off from the release film. In Comparative Example 1 manufactured by a method that does not satisfy the requirement that the surface roughness is controlled by the above, in Example 1 or 2 using the adhesive tape for solder resist protection of the present invention, the surface of the adhesive It can be seen that by controlling the roughness, the solder resist surface roughness can be controlled, and the bonding strength reliability of the sealing resin using the solder resist whose surface roughness is controlled is improved.
1 :基材フィルム
2 :粘着剤層
3 :離型フィルム
1: Base film 2: Adhesive layer 3: Release film
Claims (8)
粘着剤層(B)の離型フィルム(C)と接する面は、粘着剤層(B)を貼付してソルダレジスト層を保護するとき、ソルダレジスト層がこれに接着されるものと強固に接着し得るに十分な表面粗さを有することを特徴とするソルダレジスト保護用粘着テープ。 A solder resist comprising a base film (A), a pressure-sensitive adhesive layer (B) formed on one side of the base film (A), and a release film (C) bonded to the pressure-sensitive adhesive layer (B). A protective adhesive tape,
The surface of the pressure-sensitive adhesive layer (B) in contact with the release film (C) is firmly bonded to the surface to which the solder resist layer is adhered when the pressure-sensitive adhesive layer (B) is applied to protect the solder resist layer. An adhesive tape for protecting a solder resist, characterized by having a sufficient surface roughness.
該ソルダレジスト保護用粘着テープの離型フィルム(C)を剥離した後、粘着剤層(B)を未露光ソルダレジストに貼付し、未露光ソルダレジストの粘着剤層(B)と接する面を中心線平均粗さによる表面粗さ(Ra)で1.0μm〜3.0μmに制御することを特徴とするソルダレジストの表面粗さ制御方法。
A method for controlling the surface roughness of a solder resist using the adhesive tape for solder resist protection according to claim 1,
After peeling off the release film (C) of the adhesive tape for protecting the solder resist, the adhesive layer (B) is applied to the unexposed solder resist, and the surface in contact with the adhesive layer (B) of the unexposed solder resist is centered. A method for controlling the surface roughness of a solder resist, characterized in that the surface roughness (Ra) based on line average roughness is controlled to 1.0 μm to 3.0 μm.
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JP2010238917A (en) * | 2009-03-31 | 2010-10-21 | Toppan Printing Co Ltd | Photosensitive resist protecting tape, method of manufacturing semiconductor package substrate, and semiconductor package substrate |
JP2010278194A (en) * | 2009-05-28 | 2010-12-09 | Sekisui Chem Co Ltd | Adhesive tape for protecting solder resist, and method of controlling surface smoothness of solder resist |
JP2012042633A (en) * | 2010-08-18 | 2012-03-01 | Mitsubishi Paper Mills Ltd | Method for manufacturing resist pattern |
JP2014058634A (en) * | 2012-09-19 | 2014-04-03 | Sekisui Chem Co Ltd | Adhesive tape for protection of solder resist |
KR102434919B1 (en) * | 2022-04-01 | 2022-08-24 | 주식회사 노바텍 | Producing method of cover member for shield case and cover member for shield case produced by the same |
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KR102434919B1 (en) * | 2022-04-01 | 2022-08-24 | 주식회사 노바텍 | Producing method of cover member for shield case and cover member for shield case produced by the same |
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