JP2008114342A - Work loader of substrate working machine - Google Patents

Work loader of substrate working machine Download PDF

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Publication number
JP2008114342A
JP2008114342A JP2006300586A JP2006300586A JP2008114342A JP 2008114342 A JP2008114342 A JP 2008114342A JP 2006300586 A JP2006300586 A JP 2006300586A JP 2006300586 A JP2006300586 A JP 2006300586A JP 2008114342 A JP2008114342 A JP 2008114342A
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Japan
Prior art keywords
substrate
processing
rotary table
finger
stocker
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Pending
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JP2006300586A
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Japanese (ja)
Inventor
Katsuhiko Tatsuta
勝彦 辰田
Hajime Saida
一 斉田
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Nakamura Tome Precision Industry Co Ltd
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Nakamura Tome Precision Industry Co Ltd
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Priority to JP2006300586A priority Critical patent/JP2008114342A/en
Priority to CNB2007100894517A priority patent/CN100522469C/en
Priority to TW096111726A priority patent/TW200822109A/en
Priority to KR1020070041220A priority patent/KR100951494B1/en
Publication of JP2008114342A publication Critical patent/JP2008114342A/en
Pending legal-status Critical Current

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B27/00Other grinding machines or devices
    • B24B27/0069Other grinding machines or devices with means for feeding the work-pieces to the grinding tool, e.g. turntables, transfer means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23QDETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q7/00Arrangements for handling work specially combined with or arranged in, or specially adapted for use in connection with, machine tools, e.g. for conveying, loading, positioning, discharging, sorting
    • B23Q7/04Arrangements for handling work specially combined with or arranged in, or specially adapted for use in connection with, machine tools, e.g. for conveying, loading, positioning, discharging, sorting by means of grippers
    • B23Q7/043Construction of the grippers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23QDETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q7/00Arrangements for handling work specially combined with or arranged in, or specially adapted for use in connection with, machine tools, e.g. for conveying, loading, positioning, discharging, sorting
    • B23Q7/04Arrangements for handling work specially combined with or arranged in, or specially adapted for use in connection with, machine tools, e.g. for conveying, loading, positioning, discharging, sorting by means of grippers
    • B23Q7/046Handling workpieces or tools
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23QDETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q7/00Arrangements for handling work specially combined with or arranged in, or specially adapted for use in connection with, machine tools, e.g. for conveying, loading, positioning, discharging, sorting
    • B23Q7/14Arrangements for handling work specially combined with or arranged in, or specially adapted for use in connection with, machine tools, e.g. for conveying, loading, positioning, discharging, sorting co-ordinated in production lines
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B27/00Other grinding machines or devices
    • B24B27/06Grinders for cutting-off
    • B24B27/0641Grinders for cutting-off for grinding holes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23QDETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q2707/00Automatic supply or removal of metal workpieces
    • B23Q2707/02Drive
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23QDETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q2707/00Automatic supply or removal of metal workpieces
    • B23Q2707/04Automatic supply or removal of metal workpieces by means of grippers also magnetic or pneumatic gripping

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Feeding Of Workpieces (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a work loader capable of carrying in and out a substrate at a working position in a short time to be mounted in a substrate working machine having short working machine, regarding the work loader provided in the substrate working machine for a disk substrate to be an information recording medium and others. <P>SOLUTION: This work loader is provided with at least three holding bases 30 arranged at equal intervals on the same circumference with a vertical direction turning shaft as a center, a rotary table 28 intermittently rotating in one direction around the turning shaft, a first hand for carrying the substrate 9 before working from a stocker to a standby position 4, and a second hand for carrying the worked substrate from a cleaning position 6 to the stocker. The standby position is a position where the turning direction upstream side holding base 30 is located when the one holding base 30 is located at a working position 5 by the intermittent rotation of the rotary table 28. The cleaning position is a position where the turning direction downstream side holding base 30 is located when the one holding base 30 is located at the working position 5 by the intermittent rotation of the rotary table 28. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

この発明は、情報記録媒体として用いるディスクの基板に中心孔を明ける孔明け機その他の基板加工機に設けられるワークローダ(以下単に「ローダ」という。)に関するもので、ストッカから加工前基板を取出して加工位置に搬入し、加工済基板を当該加工位置からストッカに搬出する動作を行う装置に関するものである。   The present invention relates to a work loader (hereinafter simply referred to as a “loader”) provided in a drilling machine or other substrate processing machine for forming a central hole in a substrate of a disk used as an information recording medium. The present invention relates to an apparatus for carrying in an operation of carrying in a processing position and carrying out a processed substrate from the processing position to a stocker.

ディスク基板の孔明け機は、加工位置に面を水平にして搬入されたディスク基板を、外形基準でセンタリング(位置決め)し、上下に配置した円筒ないしリング状の口金(把持体)でディスク基板を挟持した後、上口金の中心に配置した下向きカップ状の回転砥石の周縁で、ホールソーで板に孔を明ける要領で、ディスク基板の中心に孔明け加工を行う工作機械である。孔を明けた後に出る円板状の切屑は、下口金の中空部を通って排出される。   The disc substrate drilling machine centeres (positions) the disc substrate loaded with its surface level at the processing position on the basis of the outer shape, and uses a cylindrical or ring-shaped base (grip body) arranged vertically to hold the disc substrate. This is a machine tool that performs drilling at the center of the disk substrate in the manner of drilling a plate with a hole saw at the periphery of a downward cup-shaped rotating grindstone arranged at the center of the upper base after being clamped. The disc-shaped chips that come out after drilling the holes are discharged through the hollow portion of the lower base.

ディスク基板の孔明け機には、加工位置に隣接して加工前後のディスク基板を貯留するストッカと、このストッカと加工位置との間でディスク基板の搬送を行うローダとが設けられている。一般的には、多数のディスク基板を収納したカセットの複数個をストッカ上に搭載し、ローダで加工前基板と加工済基板のロードアンロードを順次行って、ストッカに貯留されたディスク基板の連続加工を行っている。   The disk substrate drilling machine is provided with a stocker that stores the disk substrate before and after processing adjacent to the processing position, and a loader that transports the disk substrate between the stocker and the processing position. In general, a plurality of cassettes containing a large number of disk substrates are mounted on the stocker, and the unloading and unloading of the unprocessed substrate and processed substrate are performed sequentially with a loader, and the disk substrates stored in the stocker are continuously loaded. Processing is in progress.

従来、孔明け機のローダとして、加工前基板用と加工済基板用との2本のフィンガを備えたX−Y走行式のハンドが用いられていた。フィンガは、加工位置に装備されている口金その他の部材との干渉を避けるために、ハンド本体から加工位置に向かって延びており、このフィンガの先端にワークを吸着保持するための下方を向いた複数の吸着パッドが設けられている。複数の吸着パッドは、ディスク基板の半径方向の中間部2箇所ないし3箇所を吸着する位置に設けて、加工位置に設けられている工具や口金との干渉を避けている。   Conventionally, an XY traveling type hand provided with two fingers for a pre-processed substrate and a processed substrate has been used as a loader of a drilling machine. The finger extends from the hand body toward the processing position in order to avoid interference with the base and other members installed at the processing position, and faces downward to attract and hold the workpiece at the tip of the finger. A plurality of suction pads are provided. The plurality of suction pads are provided at positions where two or three intermediate portions in the radial direction of the disk substrate are sucked to avoid interference with a tool or a base provided at the processing position.

ディスク基板は、搬送用のカセットに面を垂直にして収容されている。一方、ディスク基板の加工は、面を水平にして行われる。ローダの上記フィンガは、水平方向と90度下向き方向とに揺動可能になっており、フィンガを下向きに揺動させてカセットとの間でディスク基板の取出し及び挿入を行い、水平にした状態で加工位置との間でディスク基板の搬入搬出を行う。   The disk substrate is accommodated in a transport cassette with its surface vertical. On the other hand, the disk substrate is processed with the surface horizontal. The finger of the loader can swing in a horizontal direction and a downward direction of 90 degrees, and the disk substrate is taken out and inserted between the cassette by swinging the finger downward and in a horizontal state. Carry in and out of the disk substrate to and from the processing position.

図4を参照して、この種の従来構造のローダの動作を説明する。ハンド12は、トラバース腕17のY方向移動と当該腕上での当該ハンドのX方向移動とにより、加工前基板を収納したカセット上に移動して、搬入フィンガ3aを下向きにして下降させ、フィンガ先端の吸着パッドで加工前基板9aを1枚吸着する。次に搬入フィンガ3aを上昇し、更に水平に戻した後、ハンド12が加工位置へと移動する。そして、搬出フィンガ3bの先端を加工位置に挿入し、搬出フィンガ3bの下降動作により、その先端の吸着パッドで加工済基板9bを吸着した後、当該基板から図示していない上口金を離隔させ、次いで搬出フィンガ3bを上動して、下口金から加工済基板9bを取り上げる。   The operation of this type of conventional loader will be described with reference to FIG. The hand 12 is moved onto the cassette containing the unprocessed substrate by the movement of the traverse arm 17 in the Y direction and the movement of the hand on the arm in the X direction, and the loading finger 3a is lowered to move the finger downward. One substrate 9a before processing is sucked by the suction pad at the tip. Next, after the carry-in finger 3a is raised and returned to the horizontal state, the hand 12 moves to the machining position. Then, the tip of the carry-out finger 3b is inserted into the processing position, and the processed substrate 9b is sucked by the suction pad at the tip by the lowering operation of the carry-out finger 3b, and then the upper base (not shown) is separated from the substrate, Next, the carry-out finger 3b is moved up to pick up the processed substrate 9b from the lower base.

次にハンド12は、搬入フィンガ3aの先端をを加工位置に挿入して当該フィンガの下降により、加工前基板9aを下口金の上に載せ、上口金を下降して基板9aを挟持した後、吸着パッドの吸着を解いて搬入フィンガ3aを上昇させ、加工前基板9aを加工機に受け渡す。次にハンド12は、ストッカと加工位置との間に設けられている清掃位置(加工済基板に付着している加工液や塵埃を除去する位置)に加工済基板9bを搬送し、この清掃位置で加工済基板9bに付着している加工液(一般的には水)を除去して乾燥させた後、加工済基板9bを収容するカセット上へと移動する。   Next, the hand 12 inserts the tip of the carry-in finger 3a into the processing position, and by lowering the finger, the pre-processing substrate 9a is placed on the lower base and the upper base is lowered to sandwich the substrate 9a. The suction of the suction pad is released, the carry-in finger 3a is raised, and the substrate 9a before processing is transferred to the processing machine. Next, the hand 12 transports the processed substrate 9b to a cleaning position (position for removing the processing liquid and dust adhering to the processed substrate) provided between the stocker and the processing position. Then, the processing liquid (generally water) adhering to the processed substrate 9b is removed and dried, and then moved onto a cassette for storing the processed substrate 9b.

そして、搬出フィンガ3bを下向きにした後、下降して当該フィンガ先端の吸着パッドの吸着を解くことにより、加工済基板を9bカセットに収納する。その後、搬出フィンガ3bを上昇して水平に戻し、次の加工前基板の取り出し位置に移動する。   Then, after the unloading finger 3b is turned downward, the processed substrate is stored in the 9b cassette by lowering and releasing the suction of the suction pad at the tip of the finger. Thereafter, the carry-out finger 3b is raised and returned to the horizontal position, and is moved to the next position for taking out the substrate before processing.

以上の動作を繰り返すことにより、ストッカ上のカセットに収納されたディスク基板の連続加工を行う。
特開2000‐153425号公報 特開2006‐26874号公報
By repeating the above operation, continuous processing of the disk substrate stored in the cassette on the stocker is performed.
JP 2000-153425 A JP 2006-26874 A

上記の従来のローダでは、加工位置で基板が加工されている間にローダは加工済基板を清掃位置に搬送し、清掃動作を待って加工済基板をカセットに挿入し、加工前基板が収容されたカセット上へと移動し、加工前基板を取り上げて加工位置の方へ移動するという動作を行わなければならない。   In the conventional loader described above, while the substrate is being processed at the processing position, the loader transports the processed substrate to the cleaning position, waits for the cleaning operation, inserts the processed substrate into the cassette, and stores the unprocessed substrate. It is necessary to perform an operation of moving onto the cassette, picking up the substrate before processing and moving it toward the processing position.

基板の周縁の面取加工を行う面取加工機では、1枚の基板の加工に30秒程度の加工時間が必要なので、ローダはこの間に上記の動作を行うことができる。しかし、ディスク基板の孔明け加工の加工時間は、15秒程度であり、本願出願人が現在開発中の孔明け加工機によれば、加工時間を10秒前後に短縮できる。このような加工時間の短縮が実現すると、ローダが加工時間内に上記の動作を行うことができず、基板の加工が終了した後、加工機がローダの搬送動作の完了を待たなければならなくなる。   In a chamfering machine that chamfers the periphery of a substrate, a processing time of about 30 seconds is required for processing a single substrate, so the loader can perform the above-described operation during this time. However, the processing time for drilling the disk substrate is about 15 seconds, and according to the drilling machine currently under development by the applicant of the present application, the processing time can be shortened to around 10 seconds. When such a reduction in processing time is realized, the loader cannot perform the above-described operation within the processing time, and the processing machine must wait for completion of the loader transport operation after the processing of the substrate is completed. .

すなわち、基板加工機の生産性が加工機の能力によってではなく、ローダのワーク搬送時間によって決定されることとなり、基板加工機の加工時間を短縮したことによる生産性の向上が期待できなくなる。   That is, the productivity of the substrate processing machine is determined not by the ability of the processing machine but by the work transfer time of the loader, and it becomes impossible to expect an improvement in productivity due to the reduction of the processing time of the substrate processing machine.

そこでこの発明は、ディスク基板の孔明け機のように、加工時間の短い基板加工機に搭載するための、短時間で加工位置に基板の搬入搬出を行うことができるローダを得ることを課題としている。   Therefore, the present invention has an object to obtain a loader capable of loading and unloading a substrate to and from a processing position in a short time for mounting on a substrate processing machine with a short processing time, such as a disk substrate drilling machine. Yes.

上記課題を解決したこの出願の請求項1の発明に係る基板加工機のワークローダは、鉛直方向の旋回軸27を中心とする同一円周上に等間隔に配置された少なくとも3個の保持台30を備えて前記旋回軸回りに一方向に間歇回転するロータリーテーブル28と、加工前基板をストッカ1から待機位置4へ搬送する第1ハンド12aと、加工済基板を清掃位置6からストッカ1へと搬送する第2ハンド12bとを備え、前記待機位置4は、前記ロータリーテーブルの間歇回転により保持台の1個が加工位置5に位置したときにその旋回方向上流側の保持台が位置する位置であり、前記清掃位置6は、前記ロータリーテーブルの間歇回転により保持台の1個が加工位置5に位置したときにその旋回方向下流側の保持台が位置する位置であることを特徴とするものである。   The work loader for a substrate processing machine according to claim 1 of the present application that solves the above-described problems is provided with at least three holding bases arranged at equal intervals on the same circumference around the vertical turning shaft 27. 30, a rotary table 28 that rotates intermittently around the pivot axis in one direction, a first hand 12 a that transports a substrate before processing from the stocker 1 to the standby position 4, and a processed substrate from the cleaning position 6 to the stocker 1. The standby position 4 is a position where the holding table on the upstream side in the turning direction is positioned when one of the holding tables is positioned at the processing position 5 by intermittent rotation of the rotary table. The cleaning position 6 is a position where the holding table on the downstream side in the turning direction is positioned when one of the holding tables is positioned at the processing position 5 by intermittent rotation of the rotary table. It is an butterfly.

基板には、液晶ディスプレイに用いる大型のガラス基板、カード型の情報記録媒体用やICなどの電子デバイス用の小型の基板など、各種のものがあるが、この発明のワークローダは、比較的小型の基板を加工する加工機のワークローダに適しており、特に加工時に面内での方向を規定する必要のないディスク状基板の加工機、特に加工サイクルの速い孔明け機のワークローダとして好適である。   There are various types of substrates such as large glass substrates used for liquid crystal displays, small substrates for card-type information recording media and electronic devices such as ICs, etc. The work loader of the present invention is relatively small It is suitable as a work loader of a processing machine that processes a large number of substrates, especially as a work loader of a disk-shaped substrate processing machine that does not need to specify the in-plane direction during processing, especially a drilling machine with a high processing cycle. is there.

ロータリーテーブル28に設ける保持台30は、通常は3個でよいが、加工済基板の乾燥や清掃に加工時間より長い時間が必要である場合など、保持台を4個として加工位置の下流側に第1と第2の2段階の清掃位置を設ける構造とすることが可能である。なお、清掃位置6は、加工済基板に付着している切削液や切粉などの除去を行う位置で、一般的には、当該位置に配置したノズルから噴出される噴射空気で基板表面の切削液や塵埃を吹き飛ばして除去する構造である。必要があれば、この清掃位置に加工テーブルとの間で基板を掴み換える掴み換え装置を設けて、ロータリーテーブルの保持台で保持されている部分に切削液や塵埃が清掃されないで残ることがないようにする。   The number of holding tables 30 provided on the rotary table 28 is usually three. However, when a longer time than the processing time is required for drying and cleaning of the processed substrate, four holding tables are provided on the downstream side of the processing position. It is possible to adopt a structure in which first and second two-stage cleaning positions are provided. The cleaning position 6 is a position where the cutting fluid and chips adhering to the processed substrate are removed, and in general, the substrate surface is cut by the jet air ejected from the nozzle disposed at the position. It is a structure that blows away liquid and dust. If necessary, a gripping device is provided at this cleaning position to grip the substrate to and from the processing table, so that cutting fluid and dust do not remain uncleaned in the portion held by the rotary table holder. Like that.

ロータリーテーブルの保持台30には、吸着パッドや基板の外周を把持する弾性フィンガ(基板が挿入されたときに撓んで開き、この撓みの復帰力で基板を挟持するフィンガ)などの保持具(図示していない)を設けてロータリーテーブル28が回転したときに基板が保持台30から脱落しないようにする。加工位置での基板の保持は、加工位置5に設けた口金21、22で行うのが好ましい。センタリング装置25も加工位置5に設けるのが好ましい。位置決め精度や基板の保持剛性を高くできるからである。   The holding table 30 of the rotary table is provided with a holder (such as a finger that flexes and opens when the substrate is inserted and clamps the substrate with the return force of the deflection) that grips the suction pad and the outer periphery of the substrate (see FIG. (Not shown) so that the substrate does not fall off the holding table 30 when the rotary table 28 rotates. The holding of the substrate at the processing position is preferably performed by the caps 21 and 22 provided at the processing position 5. The centering device 25 is also preferably provided at the processing position 5. This is because positioning accuracy and substrate holding rigidity can be increased.

ロータリーテーブルの保持台30に設ける上記保持具は、加工位置に設けられている口金21、22やセンタリング装置の把持爪25a、25bに干渉しない構造のものとする。これは例えば、口金21、22の半径方向外側に位置する吸着パッドや、センタリング装置の把持爪25a、25bの把持方向と直行する方向でディスク外周を把持する弾性フィンガなどである。   The holder provided on the rotary table holder 30 has a structure that does not interfere with the caps 21 and 22 provided at the processing position and the gripping claws 25a and 25b of the centering device. This is, for example, a suction pad positioned on the outer side in the radial direction of the caps 21 and 22, or an elastic finger that grips the outer periphery of the disk in a direction perpendicular to the gripping direction of the gripping claws 25a and 25b of the centering device.

上記構造のローダによれば、搬入ハンド12aが待機位置4から加工前基板のカセット18上に移動して加工前基板を取り出して待機位置4へと戻る動作と、搬出ハンド12bが清掃位置6から加工済基板のカセット18に基板を挿入して清掃位置6に戻る動作との、それぞれの動作が基板の加工時間内で完了すればよく、これらの動作は、従来のローダの動作に比べて遥かに短時間で終了するので、加工時間の短い加工においても、ローダの動作時間によって加工機の生産性が制限されることがなくなり、ディスク基板の孔明け加工のような基板加工において、生産性の高い基板加工が実現できる効果がある。   According to the loader having the above-described structure, the carry-in hand 12a moves from the standby position 4 onto the unprocessed substrate cassette 18 to take out the pre-processed substrate and return to the standby position 4, and the carry-out hand 12b moves from the cleaning position 6. The operations of inserting the substrate into the processed substrate cassette 18 and returning to the cleaning position 6 may be completed within the processing time of the substrate, and these operations are far more than the operation of the conventional loader. Therefore, even in processing with a short processing time, the productivity of the processing machine is not limited by the operating time of the loader, and productivity in substrate processing such as drilling of a disc substrate is reduced. There is an effect that high substrate processing can be realized.

なお、加工済基板の乾燥ないし清掃時間が加工時間より長くなる場合は、ロータリーテーブル28の保持台を4〜5個にして、清掃位置6を2〜3箇所にしてやればよいので、乾燥ないし清掃時間によって加工機の生産性が制限されることもない。   In addition, when drying or cleaning time of the processed substrate is longer than the processing time, it is only necessary to use 4 to 5 holders for the rotary table 28 and 2 to 3 cleaning positions 6, so that drying or cleaning is performed. The productivity of the processing machine is not limited by time.

以下、この発明の好ましい実施形態の一例を示す添付図面を参照して、この発明を更に具体的に説明する。図1は装置の斜視図、図2は要部の模式的な平面図、図3はハンドの斜視図である。   Hereinafter, the present invention will be described more specifically with reference to the accompanying drawings showing an example of a preferred embodiment of the present invention. 1 is a perspective view of the apparatus, FIG. 2 is a schematic plan view of the main part, and FIG. 3 is a perspective view of the hand.

図1、2に示すように、図示の孔明け装置は、平面矩形のストッカ1と、その一つの辺の外側に配置された加工位置5を備えている。加工位置5は、ワークを挟持するリング状の上下の口金21、22と、上口金21の軸心に配置された垂直方向の砥石軸23と、この砥石軸23の下端に装着された下向きカップ状の孔明け砥石24と、位置決め具25とを備えている。位置決め具25は、対向辺をV字形にして向き合う一対の把持爪25a、25bを備え、互いに接近する方向に移動して下口金22上に搭載されたディスク基板を挟むことにより、外周基準で加工されるディスク基板のセンタリングを行う。このセンタリングが行われた後、上口金21が下降して下口金22との間でディスク基板をクランプし、孔明け砥石24が回転しながら下降することにより、ディスク基板の中心に内周孔を加工する。   As shown in FIGS. 1 and 2, the illustrated drilling device includes a planar rectangular stocker 1 and a processing position 5 disposed outside one side thereof. The machining position 5 includes ring-shaped upper and lower caps 21 and 22 for sandwiching a workpiece, a vertical grinding wheel shaft 23 arranged at the axis of the upper cap 21, and a downward cup attached to the lower end of the grinding wheel shaft 23. And a positioning tool 25 are provided. The positioning tool 25 includes a pair of gripping claws 25a and 25b facing each other with a V-shaped opposite side. The positioning tool 25 moves in a direction approaching each other and sandwiches a disk substrate mounted on the lower base 22, thereby processing on the basis of the outer periphery. The disc substrate to be centered is centered. After this centering is performed, the upper base 21 is lowered and the disk substrate is clamped between the lower base 22 and the drilling grindstone 24 is lowered while rotating, thereby forming an inner peripheral hole at the center of the disk substrate. Process.

加工前及び加工済のディスク基板9は、カセット18(18a、18b)に収容された状態でストッカ1上に搭載されている。カセット18は、上面が開放され、内側にU字形の支持鍔を等間隔に備えた複数列の受枠(収納部)19を備えている。ディスク基板9は、この受枠の支持鍔に周縁部を支えられて、ディスク面を垂直方向にして面直角方向に並べた状態で収容されている。   The unprocessed and processed disk substrate 9 is mounted on the stocker 1 in a state of being accommodated in the cassette 18 (18a, 18b). The cassette 18 is provided with a plurality of rows of receiving frames (housing units) 19 having an open upper surface and U-shaped support rods at equal intervals on the inside. The disk substrate 9 is housed in a state where the peripheral edge portion is supported by the support frame of the receiving frame, and the disk surface is arranged in a direction perpendicular to the surface with the disk surface vertical.

ストッカ1の加工位置5側には、垂直方向の旋回軸27回りに旋回可能、かつ図示しない駆動装置で図2の矢印A方向に180度ずつ間歇回転するロータリーテーブル28が設けられている。図のロータリーテーブル28は、頂点に突出部を有する正三角形状で、その突出部に各1個の保持台30が旋回軸27を中心とする同一円周上に120度間隔で設けられている。   On the processing position 5 side of the stocker 1, there is provided a rotary table 28 that can be swung around a swivel axis 27 in the vertical direction and that can rotate intermittently 180 degrees in the direction of arrow A in FIG. The rotary table 28 shown in the figure has an equilateral triangle shape having protrusions at the apexes, and one holding table 30 is provided at the protrusions at intervals of 120 degrees on the same circumference around the turning shaft 27. .

ロータリーテーブル28は、3個の保持台の1個が加工位置5で停止するように120度ずつ間歇回転しており、その停止時に加工位置5からロータリーテーブル28の旋回方向下流側の保持台が位置する位置が清掃位置6とされ、旋回方向上流側の保持台が位置する位置が待機位置4となっている。清掃位置6には、清掃用空気を噴出するための空気ノズルなどが設けられるが、従来公知の構造であるので、図示及び説明は省略する。   The rotary table 28 is rotated intermittently by 120 degrees so that one of the three holding bases stops at the processing position 5, and the holding base on the downstream side in the turning direction of the rotary table 28 from the processing position 5 at the time of the stop. The position where the position is located is the cleaning position 6, and the position where the holding table on the upstream side in the turning direction is located is the standby position 4. The cleaning position 6 is provided with an air nozzle or the like for ejecting cleaning air, but since it has a conventionally known structure, illustration and description are omitted.

ストッカ1の反加工位置側上方には、図のY方向に細長いトラバースガイド16が図示しない門形構造で設けられており、加工位置5に向いて延びる2本のトラバース腕17a、17bの基端が、トラバースガイド16に沿って移動自在に支持されている。トラバース腕17a、17bには、その延在方向(図のX方向)に走行するハンド12a、12bが設けられている。ハンド12a、12bは、X方向サーボモータ32a、32bの回転によりトラバース腕17a、17bに沿って移動位置決めされ、トラバース腕17a、17bは、それぞれのY方向サーボモータ33a、33bの回転によりトラバースガイド16に沿って移動位置決めされる。   A traverse guide 16 that is elongated in the Y direction in the figure is provided above the side opposite to the processing position of the stocker 1 in a portal structure (not shown), and the base ends of two traverse arms 17a and 17b extending toward the processing position 5 Is supported so as to be movable along the traverse guide 16. The traverse arms 17a and 17b are provided with hands 12a and 12b that travel in the extending direction (X direction in the figure). The hands 12a and 12b are moved and positioned along the traverse arms 17a and 17b by the rotation of the X-direction servomotors 32a and 32b. Is moved and positioned along.

ハンド12a、12bは、それぞれ一本のフィンガ3a、3bを備えており、各フィンガは、その先端にディスク基板9を真空吸着する吸着パッド(図には表れていない。)を備えている。   The hands 12a and 12b are each provided with one finger 3a and 3b, and each finger is provided with a suction pad (not shown in the figure) for vacuum-sucking the disk substrate 9 at its tip.

フィンガ3aは、図3に示すように、水平方向の軸10回りに回動自在で、かつ揺動シリンダ11のロッドにそれぞれ連結されており、揺動シリンダ11のロッド14の進退により、図に示す水平方向と90度下向きに揺動した下向き方向とに向きを変えることができる。フィンガ3aは、昇降ガイドを内蔵した昇降シリンダ13を介してハンド12のフレームに装着されている。フィンガ3bも、フィンガ3aと同じ構造でハンド12bに装着されている。   As shown in FIG. 3, the fingers 3 a are rotatable about a horizontal axis 10 and are connected to the rods of the swing cylinder 11. The orientation can be changed between a horizontal direction shown and a downward direction swinging downward by 90 degrees. The finger 3a is attached to the frame of the hand 12 via an elevating cylinder 13 incorporating an elevating guide. The finger 3b is also attached to the hand 12b with the same structure as the finger 3a.

昇降シリンダ13によるフィンガ3aの昇降動作は、カセット18aにフィンガ12aを上方から差込んでディスク基板9を取出すとき、及び、デスク基板9を待機位置4の保持台に搭載するときに行われる。また、フィンガ3bの昇降動作は、デスク基板9を乾燥位置6の保持台から取上げるとき、及び、ディスク基板9をカセット18bに上方から挿入するときに行われる。   The raising / lowering operation of the finger 3 a by the raising / lowering cylinder 13 is performed when the disk substrate 9 is taken out by inserting the finger 12 a into the cassette 18 a from above, and when the desk substrate 9 is mounted on the holding base at the standby position 4. The raising and lowering operation of the finger 3b is performed when the desk substrate 9 is picked up from the holding table at the drying position 6 and when the disk substrate 9 is inserted into the cassette 18b from above.

ストッカ1上のカセット18aに面を垂直方向にして収容された加工前基板は、下向きとなって下方移動したフィンガ3aの吸着パッドで吸着保持された後、フィンガ3aを上昇させることにより、カセット18aから引き出される。次にフィンガ3aを水平方向にし、ハンド12の移動とフィンガ3aの下降動作により、ディスク基板9を待機位置4の保持台上に載せる。ロータリーテーブル28は、先行するディスク基板の加工が終了し、上下の口金21、22が加工済基板から離隔した時点で、図2の矢印A方向に120度回動する。この回動により、加工済基板は清掃位置6へと移動し、待機位置4に搭載された加工前基板が加工位置5へと移動する。待機位置4には、空の保持台が移動してくる。加工位置5に移動したディスク基板は、前述した従来装置と同様の手順で孔明け加工される。   The pre-processed substrate accommodated in the cassette 18a on the stocker 1 with its surface vertical is sucked and held by the suction pad of the finger 3a moved downward and moved upward, and then the cassette 3a is lifted. Drawn from. Next, the finger 3a is set in the horizontal direction, and the disk substrate 9 is placed on the holding table at the standby position 4 by the movement of the hand 12 and the lowering operation of the finger 3a. The rotary table 28 rotates 120 degrees in the direction of arrow A in FIG. 2 when the processing of the preceding disk substrate is completed and the upper and lower caps 21 and 22 are separated from the processed substrate. By this rotation, the processed substrate moves to the cleaning position 6, and the unprocessed substrate mounted at the standby position 4 moves to the processing position 5. An empty holding base moves to the standby position 4. The disk substrate moved to the processing position 5 is punched in the same procedure as the above-described conventional apparatus.

清掃位置6では、移動してきた加工済基板に付着している加工液や切粉その他の塵埃を噴射空気で吹飛ばし、更に基板に付着している水分を蒸発させる。乾燥した加工済基板は、フィンガ3bの下降と当該フィンガの吸着パッドでの基板の吸着及び当該フィンガの上昇という一連の動作で、清掃位置6の保持台から取上げられる。待機位置4の保持台には、フィンガ3aにより次の加工前基板が搭載される。   At the cleaning position 6, the working fluid, cutting chips and other dust adhering to the processed substrate that has moved are blown off by the jet air, and the water adhering to the substrate is evaporated. The dried processed substrate is picked up from the holding table at the cleaning position 6 by a series of operations of lowering the finger 3b, sucking the substrate with the suction pad of the finger, and raising the finger. The next pre-processing substrate is mounted on the holding table at the standby position 4 by the fingers 3a.

加工位置5での加工か終了して口金21、22が離隔すると、ロータリーテーブル28が120度旋回して加工済基板を清掃位置6に送り、待機位置4の保持台に新たに搭載された加工前基板を加工位置5に送る。加工位置5でのディスク基板の孔明けと清掃位置6での加工済基板の乾燥とは並行して行われ、この間にフィンガ3aは新たな加工前基板を待機位置4の保持台に搭載し、フィンガ3bは清掃位置6の保持台から取上げた加工済基板を孔明け済ディスクを収容するカセットに戻す。この戻し動作は、ハンド12bがカセット上に移動し、フィンガ3bを下向きにし、次いでフィンガ3bが下降した後、当該フィンガ先端の吸着パッドの吸着を解くことにより行われる。   When the processing at the processing position 5 is completed and the caps 21 and 22 are separated, the rotary table 28 is rotated 120 degrees to send the processed substrate to the cleaning position 6 and newly mounted on the holding table at the standby position 4. The front substrate is sent to the processing position 5. The drilling of the disk substrate at the processing position 5 and the drying of the processed substrate at the cleaning position 6 are performed in parallel. During this time, the finger 3a mounts a new unprocessed substrate on the holding table at the standby position 4, The finger 3b returns the processed substrate picked up from the holding table at the cleaning position 6 to the cassette for storing the drilled disc. This returning operation is performed by moving the hand 12b onto the cassette, turning the finger 3b downward, and then lowering the finger 3b and then releasing the suction of the suction pad at the tip of the finger.

以上の動作を繰り返すことにより、簾突起状のカセット18aに収納された加工前ディスク基板が次々と加工されてカセット18bに収容され、1個のカセット内の基板の加工が終了したら次のカセットへと移動して、ストッカ1に搭載された基板を連続加工する。なお、カセット18aと18bとは、別のカセットである必要はなく、一般的には、加工前ディスクを取出した空のカセットないし加工前ディスクを取出したカセットの空の部分に、加工済ディスクを順次収納するという動作である。   By repeating the above operation, the disk substrate before processing stored in the ridge-shaped cassette 18a is processed one after another and stored in the cassette 18b, and when processing of the substrate in one cassette is completed, it moves to the next cassette. The substrate mounted on the stocker 1 is continuously processed. Note that the cassettes 18a and 18b do not have to be separate cassettes. In general, a processed disk is placed in an empty cassette from which a pre-processing disk has been taken out or an empty part of a cassette from which a pre-processing disk has been taken out. This is an operation of sequentially storing.

実施例を示す斜視図The perspective view which shows an Example 図1の装置の要部の平面図1 is a plan view of the main part of the apparatus of FIG. ハンドの例を示す斜視図Perspective view showing an example of a hand 従来装置のハンドの例を示す斜視図A perspective view showing an example of a hand of a conventional device

符号の説明Explanation of symbols

1 ストッカ
3a,3b フィンガ
4 待機位置
5 加工位置
6 清掃位置
9 基板
16 トラバースガイド
17 トラバース腕
12a,12b ハンド
24 砥石
27 旋回軸
28 ロータリーテーブル
30 保持台
1 Stocker
3a, 3b Finger 4 Standby position 5 Processing position 6 Cleaning position 9 Substrate
16 Traverse Guide
17 Traverse arms
12a, 12b hand
24 Whetstone
27 Rotating axis
28 Rotary table
30 Holding stand

Claims (2)

鉛直方向の旋回軸(27)を中心とする同一円周上に等間隔に配置された少なくとも3個の保持台(30)を備えて前記旋回軸回りに一方向に間歇回転するロータリーテーブル(28)と、加工前基板をストッカ(1)から待機位置(4)へ搬送する第1ハンド(12a)と、加工済基板を清掃位置(6)からストッカ(1)へと搬送する第2ハンド(12b)とを備え、
前記待機位置(4)は、前記ロータリーテーブルの間歇回転により保持台の1個が加工位置(5)に位置したときにその旋回方向上流側の保持台が位置する位置であり、
前記清掃位置(6)は、前記ロータリーテーブルの間歇回転により保持台の1個が加工位置(5)に位置したときにその旋回方向下流側の保持台が位置する位置であることを特徴とする、基板加工機のワークローダ。
A rotary table (28) provided with at least three holding bases (30) arranged at equal intervals on the same circumference centering on the vertical turning axis (27) and intermittently rotating in one direction around the turning axis (28) ), A first hand (12a) for transporting the substrate before processing from the stocker (1) to the standby position (4), and a second hand for transporting the processed substrate from the cleaning position (6) to the stocker (1) ( 12b)
The standby position (4) is a position where the holding table on the upstream side in the turning direction is positioned when one of the holding tables is positioned at the machining position (5) by intermittent rotation of the rotary table.
The cleaning position (6) is a position where the holding table on the downstream side in the turning direction is positioned when one of the holding tables is positioned at the processing position (5) by intermittent rotation of the rotary table. , Work loader for substrate processing machine.
基板加工機がディスク基板の孔明け機である、請求項1記載のワークローダ。   The work loader according to claim 1, wherein the substrate processing machine is a disk substrate drilling machine.
JP2006300586A 2006-11-06 2006-11-06 Work loader of substrate working machine Pending JP2008114342A (en)

Priority Applications (4)

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JP2006300586A JP2008114342A (en) 2006-11-06 2006-11-06 Work loader of substrate working machine
CNB2007100894517A CN100522469C (en) 2006-11-06 2007-03-23 Work-piece unloader for substrate processor
TW096111726A TW200822109A (en) 2006-11-06 2007-04-03 Work loader of substrate working machine
KR1020070041220A KR100951494B1 (en) 2006-11-06 2007-04-27 Loader for hole cutting machine

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KR101037063B1 (en) * 2008-12-30 2011-05-26 에이펫(주) Substrate processing apparatus
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CN108454119B (en) * 2017-03-31 2019-11-22 苏州亚思科精密数控有限公司 A kind of operating method of riveter disc type automatic loading/unloading and positioning device

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