JP2008091560A - Wiring board, multilayer wiring board, and electronic device, and manufacturing method of these - Google Patents

Wiring board, multilayer wiring board, and electronic device, and manufacturing method of these Download PDF

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JP2008091560A
JP2008091560A JP2006269808A JP2006269808A JP2008091560A JP 2008091560 A JP2008091560 A JP 2008091560A JP 2006269808 A JP2006269808 A JP 2006269808A JP 2006269808 A JP2006269808 A JP 2006269808A JP 2008091560 A JP2008091560 A JP 2008091560A
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wiring board
insulating
metal
layer
wiring layer
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JP4814750B2 (en
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Kazuhito Kanezashi
一仁 金指
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Kyocera Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a wiring board and a multilayer wiring board which suppress the possibilities of corrosion of electrode interconnections formed on the surface of an insulation substrate and of short circuits between the electrode interconnections, and also to provide a manufacturing method of the multilayer wiring board and an electronic device having a high reliability. <P>SOLUTION: The wiring board includes a plurality of electrode interconnections 2 on the surface of the insulation substrate 1. The electrode interconnections 2 include a metal interconnection layer 2a formed on the surface of the insulation substrate 1. The wiring board also includes an insulation portion 4 for covering the metal interconnection layer 2a over the width direction of that layer 2a. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、半導体素子や水晶振動子等の電子部品を搭載するための配線基板、多層配線基板及び電子装置、並びにこれらの製造方法に関する。   The present invention relates to a wiring board, a multilayer wiring board and an electronic device for mounting an electronic component such as a semiconductor element or a crystal resonator, and a method for manufacturing them.

従来、半導体素子や水晶振動子等の電子部品を搭載するための配線基板は、例えば、酸化アルミニウム質焼結体等の電気絶縁材料からなる絶縁基板の表面に、タングステンやモリブデン等の金属粉末メタライズから成る配線導体を配設することにより構成されている。   Conventionally, wiring boards for mounting electronic components such as semiconductor elements and crystal resonators are made of metal powder metallization such as tungsten and molybdenum on the surface of an insulating substrate made of an electrically insulating material such as an aluminum oxide sintered body. It is comprised by arrange | positioning the wiring conductor which consists of.

このような配線基板は、絶縁基板用のセラミックグリーンシートのいくつかに、スクリーン印刷法等の印刷手段により配線導体用のメタライズペーストを印刷塗布した後、これらのセラミックグリーンシートを複数枚積層し、高温で焼成することにより形成される。   Such a wiring board is obtained by applying a metallized paste for a wiring conductor to some of the ceramic green sheets for an insulating substrate by printing means such as a screen printing method, and then laminating a plurality of these ceramic green sheets, It is formed by firing at a high temperature.

そして、このような配線基板は、電子部品を搭載するとともに、電子部品の各電極を半田やボンディングワイヤ等の電気的接続手段を介して、各電極に対応する各配線導体に電気的に接続することにより電子装置として形成される。そして、電子装置は、必要に応じて、電子部品を金属やセラミックス、ガラス等からなる蓋体、あるいはポッティング樹脂で覆われて封止される。   And such a wiring board mounts an electronic component, and electrically connects each electrode of the electronic component to each wiring conductor corresponding to each electrode through an electrical connection means such as solder or a bonding wire. Thus, an electronic device is formed. In the electronic device, the electronic component is covered and sealed with a lid made of metal, ceramics, glass, or the like, or a potting resin as necessary.

また、配線基板は、配線導体が酸化腐食するのを有効に防止するとともに、配線導体と電子部品との接合、および配線導体と金(Au)ワイヤや半田バンプ等の電気的接続、および配線導体と外部の回路基板との接合を強固なものとすること等を目的として、通常、配線導体の絶縁基板の外表面に露出する部分は、耐蝕性に優れる金属層が被着されており、例えば、このような金属層として、ニッケルめっき層および金めっき層等からなるめっき層が配線導体の露出する表面に順次被着されている。   In addition, the wiring board effectively prevents the wiring conductor from being oxidatively corroded, and also joins the wiring conductor and the electronic component, and electrically connects the wiring conductor and gold (Au) wire or solder bump, and the wiring conductor. For the purpose of strengthening the bonding between the circuit board and the external circuit board, a portion exposed to the outer surface of the insulating substrate of the wiring conductor is usually coated with a metal layer having excellent corrosion resistance, for example, As such a metal layer, a plating layer made of a nickel plating layer, a gold plating layer, or the like is sequentially deposited on the exposed surface of the wiring conductor.

配線導体の表面にめっき層を効率良く被着するため、絶縁基板の表面にて複数の配線導体同士を電気的に接続するめっき導通用パターンを形成しておき、電解めっき法により複数の配線導体の露出する表面にめっき層を被着するということが行われている。そして、複数の配線導体の露出した表面にめっき層を被着した後、切削装置等を用いた切削加工等により、めっき導通用パターンの一部を分断するように切削除去することにより、複数の配線導体同士が電気的に独立される(特許文献1参照)。   In order to efficiently deposit the plating layer on the surface of the wiring conductor, a plating conduction pattern for electrically connecting the plurality of wiring conductors is formed on the surface of the insulating substrate, and the plurality of wiring conductors are formed by electrolytic plating. A plating layer is applied to the exposed surface of the film. Then, after depositing the plating layer on the exposed surface of the plurality of wiring conductors, by cutting and cutting so as to divide a part of the plating conduction pattern by cutting using a cutting device or the like, The wiring conductors are electrically independent from each other (see Patent Document 1).

特開平7−122838号公報Japanese Patent Laid-Open No. 7-122838

しかしながら、めっき導通用パターンを分断するように切削除去した際、この切削面においてメタライズ層とニッケルめっき層と金めっき層とが接した状態で露出することとなり、異種金属間の局部電池作用により切削面に腐食が発生するという問題を有していた。   However, when the plating conduction pattern is cut and removed so as to be divided, the metallized layer, the nickel plating layer, and the gold plating layer are exposed in contact with the cutting surface. There was a problem that corrosion occurred on the surface.

また、近年の電子装置の高密度化に伴い、配線基板において、配線導体同士が高密度に形成されており、切削加工等によりめっき導通用パターンを切削除去する際、この切削面において、切削装置の切削刃等によりニッケルめっき層や金めっき層が切削方向にひきのばされ、針状の突起を形成してしまい、隣接する配線導体同士を短絡させてしまうことがあるという問題を有していた。   In addition, with the recent increase in the density of electronic devices, wiring conductors are formed at a high density in a wiring board. When the plating conduction pattern is removed by cutting or the like, the cutting device The nickel plating layer and the gold plating layer are drawn in the cutting direction by the cutting blades of the metal, forming needle-like protrusions, which may cause short circuit between adjacent wiring conductors. It was.

本発明は、上記従来技術の問題点に鑑み案出されたもので、その目的は、絶縁基板の表面に形成された電極配線が腐食する可能性および電極配線同士が短絡する可能性を抑制した配線基板および多層配線基板、ならびに多層配線基板の製造方法を提供することにある。また、信頼性に優れた電子装置を提供することにある。   The present invention has been devised in view of the above-described problems of the prior art, and its purpose is to suppress the possibility that the electrode wiring formed on the surface of the insulating substrate corrodes and the possibility that the electrode wirings are short-circuited. An object of the present invention is to provide a wiring board, a multilayer wiring board, and a method for manufacturing the multilayer wiring board. Another object is to provide an electronic device with excellent reliability.

本発明の配線基板は、絶縁基板の表面に複数の電極配線を備える配線基板において、前記電極配線は、前記絶縁基板の表面に形成された金属配線層を含み、該金属配線層の幅方向にわたって、該金属配線層を被覆する絶縁部を有することを特徴とするものである。   The wiring board of the present invention is a wiring board having a plurality of electrode wirings on the surface of the insulating substrate, wherein the electrode wiring includes a metal wiring layer formed on the surface of the insulating substrate, and extends across the width direction of the metal wiring layer. And an insulating portion covering the metal wiring layer.

また、好ましくは、前記絶縁部は、一対の絶縁部を含み、該一対の絶縁部は前記金属配線層の延設方向に予め定める間隔をあけて設けられることを特徴とするものである。   Preferably, the insulating portion includes a pair of insulating portions, and the pair of insulating portions are provided at predetermined intervals in the extending direction of the metal wiring layer.

本発明の多層配線基板は、本発明の配線基板の前記金属配線層上で、且つ前記絶縁部に隣接した領域に金属被覆層が形成され、前記金属配線層が、前記絶縁部により被覆された領域内にて、該絶縁部とともに切断されることを特徴とするものである。   In the multilayer wiring board of the present invention, a metal coating layer is formed on the metal wiring layer of the wiring board of the present invention and in a region adjacent to the insulating portion, and the metal wiring layer is covered with the insulating portion. The region is cut together with the insulating portion within the region.

本発明の多層配線基板は、本発明の配線基板の前記金属配線層上で、且つ前記一対の絶縁部のそれぞれに隣接した領域に金属被覆層が形成され、前記金属配線層が、前記一対の絶縁部間の領域にて切断されることを特徴とするものである。   In the multilayer wiring board of the present invention, a metal coating layer is formed on the metal wiring layer of the wiring board of the present invention and in a region adjacent to each of the pair of insulating portions. It cut | disconnects in the area | region between insulation parts, It is characterized by the above-mentioned.

また、好ましくは、前記複数の金属配線層がメタライズ層からなり、前記金属被覆層が金を含んでなることを特徴とするものである。   Preferably, the plurality of metal wiring layers are made of a metallized layer, and the metal coating layer contains gold.

また、好ましくは、前記絶縁部と前記絶縁基板との色調が異なることを特徴とするものである。   Preferably, the color tone of the insulating part is different from that of the insulating substrate.

本発明の電子装置は、本発明の多層配線基板の表面に電子部品が搭載され、搭載された電子部品は、前記電極配線と電気的に接続されていることを特徴とするものである。   The electronic device of the present invention is characterized in that an electronic component is mounted on the surface of the multilayer wiring board of the present invention, and the mounted electronic component is electrically connected to the electrode wiring.

本発明の多層配線基板の製造方法は、絶縁基板の表面に複数の電極配線を備える多層配線基板の製造方法において、前記絶縁基板表面に金属配線層を形成し、形成された金属配線層上に、該金属配線層の幅方向にわたって該金属配線層を被覆する絶縁部を形成し、前記金属配線層上で、且つ前記絶縁部に隣接した領域に電解めっきによって金属被覆層を形成し、前記金属配線層を、前記絶縁部により被覆された領域内にて、該絶縁部とともに切断することを特徴とするものである。   The method for manufacturing a multilayer wiring board according to the present invention is a method for manufacturing a multilayer wiring board having a plurality of electrode wirings on the surface of an insulating substrate, wherein a metal wiring layer is formed on the surface of the insulating substrate, and the metal wiring layer is formed Forming an insulating portion covering the metal wiring layer over the width direction of the metal wiring layer, forming a metal coating layer on the metal wiring layer and in a region adjacent to the insulating portion by electrolytic plating, and The wiring layer is cut together with the insulating portion in a region covered with the insulating portion.

また、好ましくは、前記絶縁部は、一対の絶縁部を含み、該一対の絶縁部は前記金属配線層の延設方向に予め定める間隔をあけて設けられているとともに、前記金属配線層が、前記一対の絶縁部間の領域にて切断されることを特徴とするものである。   Preferably, the insulating portion includes a pair of insulating portions, and the pair of insulating portions are provided with a predetermined interval in the extending direction of the metal wiring layer, and the metal wiring layer includes: It cut | disconnects in the area | region between said pair of insulation parts.

本発明の配線基板は、電極配線が、絶縁基板の表面に形成された金属配線層を含み、該金属配線層の幅方向にわたって、金属配線層を被覆する絶縁部を有することから、電解めっき法により金属配線層の露出する表面に金属被膜層を被着させた際、絶縁部により被覆された領域には金属被膜層が被覆されない。   In the wiring board of the present invention, the electrode wiring includes a metal wiring layer formed on the surface of the insulating substrate, and has an insulating portion that covers the metal wiring layer in the width direction of the metal wiring layer. When the metal coating layer is applied to the exposed surface of the metal wiring layer, the metal coating layer is not covered in the region covered with the insulating portion.

したがって、絶縁部に沿って金属配線層を切削加工等により切削除去する際、金属配線層の切削面においては、絶縁基板と金属配線層と絶縁部とが隣接して露出され、メタライズ層、ニッケルめっき層、金めっき層等といった異なる金属層が隣接した状態で露出されることがなく、切削面において異種金属間の局部電池作用による腐食が発生する可能性を抑制することができる。   Therefore, when the metal wiring layer is cut and removed along the insulating portion by cutting or the like, the insulating substrate, the metal wiring layer, and the insulating portion are exposed adjacent to each other on the cutting surface of the metal wiring layer, and the metallized layer, nickel Different metal layers such as a plating layer and a gold plating layer are not exposed in an adjacent state, and it is possible to suppress the possibility of corrosion due to local cell action between different metals on the cutting surface.

また、絶縁部と金属配線層とを切削除去する際、絶縁部により被覆された領域にはニッケルめっき層や金めっき層等の金属被膜層が被着形成されていないので、切削面においては、切削加工等による金属被膜層ののびによる針状の突起が発生することがなく、隣接する電極配線同士がこの針状の突起により短絡する可能性を抑制することができる。   In addition, when the insulating portion and the metal wiring layer are removed by cutting, a metal coating layer such as a nickel plating layer or a gold plating layer is not formed on the region covered with the insulating portion. There is no occurrence of needle-like protrusions due to spreading of the metal coating layer due to cutting or the like, and the possibility of short-circuiting between adjacent electrode wirings due to the needle-like protrusions can be suppressed.

また、好ましくは、絶縁部は、一対の絶縁部を含み、一対の絶縁部は金属配線層の延設方向に予め定める間隔をあけて設けられることから、電解めっき法により金属配線層の露出する表面に金属被覆層を被着させた際、一対の絶縁部間の金属配線層の露出した領域には金属被覆層が被着される。   Preferably, the insulating portion includes a pair of insulating portions, and the pair of insulating portions are provided at predetermined intervals in the extending direction of the metal wiring layer, so that the metal wiring layer is exposed by an electrolytic plating method. When the metal coating layer is deposited on the surface, the metal coating layer is deposited on the exposed region of the metal wiring layer between the pair of insulating portions.

したがって、絶縁部に沿って金属配線層を切削加工等により切削除去する際、一対の絶縁部間を介して金属配線層と絶縁部との位置を良好認識させることができ、切削加工等により金属配線層と絶縁部とを良好に切削除去することができ、金属被膜層が被着された複数の電極配線を効率良く電気的に独立させることができる。   Therefore, when the metal wiring layer is cut and removed along the insulating portion by cutting or the like, the position of the metal wiring layer and the insulating portion can be well recognized through the pair of insulating portions. The wiring layer and the insulating portion can be satisfactorily cut and removed, and the plurality of electrode wirings coated with the metal coating layer can be efficiently and electrically independent.

本発明の多層配線基板は、配線基板の金属配線層上で、且つ絶縁部に隣接した領域に金属被覆層が形成され、金属配線層が、絶縁部により被覆された領域内にて、絶縁部とともに切断されていることから、切削面においては、金属配線層または金属被膜層の異なる金属が隣接して露出する領域がないとともに、切削加工等による金属被覆層ののびによる針状の突起が発生していないので、電極配線の腐食や電極配線間の短絡の可能性を抑制し、信頼性に優れた多層配線基板とすることができる。   In the multilayer wiring board of the present invention, a metal coating layer is formed in a region adjacent to the insulating portion on the metal wiring layer of the wiring substrate, and the insulating portion is formed in the region where the metal wiring layer is covered by the insulating portion. In addition, there is no area where the different metal of the metal wiring layer or metal coating layer is adjacently exposed on the cutting surface, and needle-like protrusions are generated due to the extension of the metal coating layer by cutting or the like. Therefore, the possibility of the corrosion of the electrode wiring and the short circuit between the electrode wirings can be suppressed, and the multilayer wiring board having excellent reliability can be obtained.

本発明の多層配線基板は、金属配線層上で、且つ一対の絶縁部のそれぞれに隣接した領域に金属被覆層が形成され、金属配線層が、一対の絶縁部間の領域にて切断されることから、電極配線の切削面においては、金属配線層または金属被膜層の異なる金属が隣接する領域がないとともに、切削加工等による金属被膜層ののびによる針状の突起が発生していないので、電極配線の腐食や電極配線間の短絡の可能性を抑制し、信頼性に優れた多層配線基板とすることができる。   In the multilayer wiring board of the present invention, a metal coating layer is formed on a metal wiring layer and in a region adjacent to each of the pair of insulating portions, and the metal wiring layer is cut at a region between the pair of insulating portions. Therefore, in the cutting surface of the electrode wiring, there is no region where the metal of the metal wiring layer or the metal coating layer is adjacent, and there is no needle-like protrusion due to the extension of the metal coating layer by cutting or the like. The possibility of the corrosion of the electrode wiring and the short circuit between the electrode wirings can be suppressed, and a multilayer wiring board having excellent reliability can be obtained.

また、好ましくは、複数の金属配線層がメタライズ層からなり、金属被覆層が金を含んでなることから、メタライズ層に比較して、のびの発生しやすい金を金属被覆層に用いても、切削加工の際に金ののびによる針状の突起の発生を抑制し、電極配線同士の短絡を抑制することができる。   Preferably, the plurality of metal wiring layers are formed of a metallized layer, and the metal coating layer contains gold. It is possible to suppress the occurrence of needle-like protrusions due to the spread of gold during the cutting process, and to suppress a short circuit between the electrode wires.

また、好ましくは、前記絶縁部と前記絶縁基板との色調が異なることから、金属配線層と絶縁部とを切削除去する際、絶縁基板と金属配線層と絶縁部との色調の違いにより切削深さを目視や画像認識装置により良好に認識させやすくなり、金属配線層を良好に切削除去して、複数の電極配線を効率良く電気的に独立させることができる。   Preferably, since the color tone of the insulating part and the insulating substrate is different, when the metal wiring layer and the insulating part are removed by cutting, the cutting depth depends on the color tone of the insulating substrate, the metal wiring layer, and the insulating part. The thickness can be easily recognized by visual observation or an image recognition device, the metal wiring layer can be cut and removed well, and a plurality of electrode wirings can be efficiently and electrically independent.

本発明の電子装置は、本発明の多層配線基板の表面に電子部品が搭載され、搭載された電子部品は、電極配線と電気的に接続されていることから、多層配線基板が、切削面における腐食や短絡の可能性を抑制したものとされているので、信頼性に優れた電子装置とすることができる。   In the electronic device of the present invention, an electronic component is mounted on the surface of the multilayer wiring board of the present invention, and the mounted electronic component is electrically connected to the electrode wiring. Since the possibility of corrosion or short circuit is suppressed, an electronic device with excellent reliability can be obtained.

本発明の多層配線基板の製造方法は、絶縁基板の表面に複数の電極配線を備える多層配線基板の製造方法において、絶縁基板表面に金属配線層を形成し、形成された金属配線層上に、金属配線層の幅方向にわたって金属配線層を被覆する絶縁部を形成し、金属配線層上で、且つ絶縁部に隣接した領域に電解めっきによって金属被覆層を形成する。そして形成された金属配線層を、絶縁部により被覆された領域内にて、絶縁部とともに切断することから、絶縁部により電解めっき法により金属被覆層が被着されていない領域を金属配線層上に形成することができるので、絶縁部および金属配線層を切削除去した際、切断面において異なる金属層が接して露出する領域がないとともに、金属被覆層ののびによる針状の突起の発生を抑制することができ、多層配線基板に腐食や短絡の可能性を抑制したものとすることができる
また、好ましくは、絶縁部は、一対の絶縁部を含み、一対の絶縁部は金属配線層の延設方向に予め定める間隔をあけて設けられているとともに、金属配線層が、一対の絶縁部間の領域にて切断されることから、一対の絶縁部間の金属配線層の露出した領域には金属被覆層が被着されるので、絶縁部に沿って金属配線層を切削加工等により切削除去する際、一対の絶縁部間を介して金属配線層と絶縁部との位置を良好認識させることができ、切削加工等により金属配線層と絶縁部とを良好に切削除去することができ、金属被膜層が被着された複数の電極配線を効率良く電気的に独立させた多層配線基板とすることができる。
The method for manufacturing a multilayer wiring board of the present invention is a method for manufacturing a multilayer wiring board comprising a plurality of electrode wirings on the surface of an insulating substrate, wherein a metal wiring layer is formed on the surface of the insulating substrate, and on the formed metal wiring layer, An insulating part that covers the metal wiring layer is formed over the width direction of the metal wiring layer, and the metal coating layer is formed by electrolytic plating on the metal wiring layer and in a region adjacent to the insulating part. Since the formed metal wiring layer is cut together with the insulating portion in the region covered with the insulating portion, the region where the metal covering layer is not deposited by the electrolytic plating method on the insulating portion is formed on the metal wiring layer. Therefore, when the insulating part and the metal wiring layer are cut and removed, there is no area where the different metal layer contacts and is exposed on the cut surface, and the occurrence of needle-like protrusions due to the extension of the metal coating layer is suppressed. Preferably, the insulating portion includes a pair of insulating portions, and the pair of insulating portions is an extension of the metal wiring layer. Since the metal wiring layer is cut at the region between the pair of insulating portions, the metal wiring layer between the pair of insulating portions is exposed in the exposed region. Metal coating Since the layer is deposited, when the metal wiring layer is cut and removed along the insulating part by cutting or the like, the position of the metal wiring layer and the insulating part can be recognized well between the pair of insulating parts. The metal wiring layer and the insulating portion can be satisfactorily cut and removed by cutting or the like, and a plurality of electrode wirings coated with the metal coating layer can be efficiently and electrically separated to provide a multilayer wiring board. it can.

本発明の実施形態を以下に詳細に説明する。図1は、本発明の実施の形態である多層配線基板を示す平面図であり、図2(a)は、図1の多層配線基板の切断面線A−A’における断面図であり、図2(b)は、図2(a)のB部における要部拡大断面図である。これらの図に示すように、多層配線基板は、絶縁基板1、電極配線2、金属配線層2a、金属被膜層2b、2c、導通用導体3、および絶縁部4を有する。   Embodiments of the present invention are described in detail below. FIG. 1 is a plan view showing a multilayer wiring board according to an embodiment of the present invention, and FIG. 2A is a cross-sectional view taken along line AA ′ of the multilayer wiring board of FIG. 2 (b) is an enlarged cross-sectional view of a main part in a B part in FIG. 2 (a). As shown in these drawings, the multilayer wiring board includes an insulating substrate 1, an electrode wiring 2, a metal wiring layer 2a, metal coating layers 2b and 2c, a conductive conductor 3, and an insulating portion 4.

本発明の配線基板は、絶縁基板1の表面に複数の電極配線2を備えており、電極配線2が、絶縁基板1の表面に形成された金属配線層2aを含む。金属配線層2aの幅方向にわたって、金属配線層2aを被覆する絶縁部4が設けられている。   The wiring board of the present invention includes a plurality of electrode wirings 2 on the surface of the insulating substrate 1, and the electrode wiring 2 includes a metal wiring layer 2 a formed on the surface of the insulating substrate 1. An insulating portion 4 that covers the metal wiring layer 2a is provided across the width direction of the metal wiring layer 2a.

なお、多層配線基板は、図1および図2のように、金属配線層2a上に金属被膜層2b,2cを被着した状態のものを示す。すなわち、金属配線層2aに金属被膜層2b,2cを被着していない状態を配線基板とし、金属配線層2aに金属被膜層2b,2cを被着した状態を多層配線基板とする。   As shown in FIGS. 1 and 2, the multilayer wiring board is shown in a state where the metal coating layers 2b and 2c are deposited on the metal wiring layer 2a. That is, a state in which the metal coating layers 2b and 2c are not deposited on the metal wiring layer 2a is a wiring substrate, and a state in which the metal coating layers 2b and 2c are deposited on the metal wiring layer 2a is a multilayer wiring substrate.

本発明の絶縁基板1は、セラミックスからなり、例えば、酸化アルミニウム質焼結体、ムライト質焼結体、窒化アルミニウム質焼結体、炭化珪素質焼結体等の電気絶縁材料から成る。絶縁基板1が、酸化アルミニウム質焼結体から成る場合には、アルミナ(Al)、シリカ(SiO)、カルシア(CaO)、マグネシア(MgO)等の原料粉末に適当な有機溶剤、溶媒を添加混合して泥漿状となすとともにこれを従来周知のドクターブレード法やカレンダーロール法等を採用し、シート状に成形することによってセラミックグリーンシート(セラミック生シート)を得、次にセラミックグリーンシートに適当な打ち抜き加工を施すとともに必要に応じて複数枚積層し、高温(約1500〜1800℃)で焼成することによって製作される。 The insulating substrate 1 of the present invention is made of ceramics, and is made of an electrically insulating material such as an aluminum oxide sintered body, a mullite sintered body, an aluminum nitride sintered body, or a silicon carbide sintered body. When the insulating substrate 1 is made of an aluminum oxide sintered body, an organic solvent suitable for a raw material powder such as alumina (Al 2 O 3 ), silica (SiO 2 ), calcia (CaO), magnesia (MgO), A solvent is added and mixed to make a mud-like shape, and a ceramic green sheet (ceramic green sheet) is obtained by forming the sheet into a sheet shape by using a conventionally known doctor blade method or calendar roll method. The sheet is manufactured by performing an appropriate punching process, stacking a plurality of sheets as necessary, and firing at a high temperature (about 1500 to 1800 ° C.).

電極配線2は、電子部品を外部に電気的に接続するための導電路である。例えば、図2に示すように、金属配線層2aの絶縁基板1の外部表面に露出した部分には、金属被覆層2b,2cが被着されている。金属配線層2aは、タングステンやモリブデン、銅、銀等の金属粉末メタライズから成り、絶縁基板1用のセラミックグリーンシートにスクリーン印刷法等の印刷手段により金属配線層2a用のメタライズペーストを印刷塗布し、絶縁基板1用のセラミックグリーンシートと同時焼成することによって所定の領域に被着形成される。金属配線層2a用のメタライズペーストは、主成分の金属粉末に有機バインダー、有機溶剤、必要に応じて分散剤等を加えてボールミル、三本ロールミル、プラネタリーミキサー等の混練手段により混合および混練することで製作される。セラミックグリーンシートの焼結挙動に合わせたり、焼結後の積層基板との接合強度を高めたりするためにガラスやセラミックスの粉末を添加しても良い。   The electrode wiring 2 is a conductive path for electrically connecting an electronic component to the outside. For example, as shown in FIG. 2, metal coating layers 2 b and 2 c are deposited on the exposed portion of the metal wiring layer 2 a on the outer surface of the insulating substrate 1. The metal wiring layer 2a is made of metal powder metallization such as tungsten, molybdenum, copper, silver, etc., and a metallized paste for the metal wiring layer 2a is printed on the ceramic green sheet for the insulating substrate 1 by printing means such as a screen printing method. Then, it is deposited on a predetermined region by simultaneous firing with the ceramic green sheet for the insulating substrate 1. The metallized paste for the metal wiring layer 2a is mixed and kneaded by kneading means such as a ball mill, a three-roll mill, a planetary mixer, etc. with an organic binder, an organic solvent and, if necessary, a dispersant added to the main component metal powder. It is manufactured by. Glass or ceramic powder may be added to match the sintering behavior of the ceramic green sheet or to increase the bonding strength with the laminated substrate after sintering.

また、絶縁基板1の表面および内部に形成された金属配線層2aは、必要に応じて絶縁基板1を厚み方向に貫通する貫通導体5により電気的に接続されている。このような貫通導体5は、金属配線層2aを形成するためのメタライズペーストの印刷塗布に先立って絶縁基板1用のセラミックグリーンシートに金型やパンチングによる打ち抜き方法またはレーザ加工等の加工方法により貫通導体用の貫通孔を形成し、この貫通導体用の貫通孔に貫通導体5用のメタライズペーストをスクリーン印刷法等の印刷手段により充填しておくとともにこれを絶縁基板1用のセラミックグリーンシートと同時焼成することによって各領域に形成される。貫通導体用のメタライズペーストは金属配線層2a用のメタライズペーストと同様にして作製されるが、有機バインダーや有機溶剤の量により充填に適した粘度に調製される。   Moreover, the metal wiring layer 2a formed on the surface and inside of the insulating substrate 1 is electrically connected by a through conductor 5 that penetrates the insulating substrate 1 in the thickness direction as necessary. Such a through conductor 5 penetrates a ceramic green sheet for the insulating substrate 1 by a punching method using a die or punching or a processing method such as laser processing prior to printing and application of a metallized paste for forming the metal wiring layer 2a. A through-hole for the conductor is formed, and the metallized paste for the through-conductor 5 is filled in the through-hole for the through-conductor by a printing means such as a screen printing method and simultaneously with the ceramic green sheet for the insulating substrate 1. Formed in each region by firing. The metallized paste for the through conductor is prepared in the same manner as the metallized paste for the metal wiring layer 2a, but is prepared to have a viscosity suitable for filling depending on the amount of the organic binder or organic solvent.

金属被膜層2b,2cは、金属配線層2aの絶縁基板1の外部表面に露出された部分に、ニッケル(Ni)、金(Au)、銀(Ag)等の耐蝕性に優れる金属を1〜20μm程度の厚みで被着させておくことにより形成される。金属被膜層2b,2cは、金属配線層2aが酸化腐食するのを有効に防止できるとともに、電極配線2と電子部品との固着または電極配線2とボンディングワイヤや半田バンプ等の電気的接続、電極配線2と外部電気回路板の配線導体との接合を強固なものとすることができる。例えば、金属配線層2aの露出する表面に、金属配線層2bとして厚さ1〜10μm程度のNiめっき層を被着させ、金属配線層2bの表面に、金属配線層2cとして厚さ0.1〜3μm程度のAuめっき層を順次被着させている。   The metal coating layers 2b and 2c are formed of a metal having excellent corrosion resistance such as nickel (Ni), gold (Au), silver (Ag), etc. on the exposed portion of the metal wiring layer 2a on the outer surface of the insulating substrate 1. It is formed by depositing with a thickness of about 20 μm. The metal coating layers 2b and 2c can effectively prevent the metal wiring layer 2a from being oxidatively corroded, and the electrode wiring 2 can be fixed to the electronic component, or the electrode wiring 2 can be electrically connected to the bonding wire or the solder bump. The connection between the wiring 2 and the wiring conductor of the external electric circuit board can be strengthened. For example, a Ni plating layer having a thickness of about 1 to 10 μm is deposited as the metal wiring layer 2b on the exposed surface of the metal wiring layer 2a, and the metal wiring layer 2c has a thickness of 0.1 as the metal wiring layer 2b. An Au plating layer of about 3 μm is sequentially deposited.

なお、金属被膜層2b,2cは、2層に限定されるものではなく、1層または3層以上の金属被覆層からなるものであっても構わない。例えば、金属配線層2aの絶縁基板1の外部表面に露出された部分に、Niめっき層とPdめっき層とAuめっき層とを順次被着させた多層配線基板、Niめっき層とPdめっき層とCuめっき層とを順次被着させた多層配線基板、Niめっき層とAuめっき層とAgめっき層とを順次被着させた多層配線基板であっても良く、金属配線層2aの露出した表面にその他の金属からなる金属被覆層を被着させた多層配線基板であっても構わない。   The metal coating layers 2b and 2c are not limited to two layers, and may be composed of one or three or more metal coating layers. For example, a multilayer wiring board in which a Ni plating layer, a Pd plating layer, and an Au plating layer are sequentially deposited on a portion of the metal wiring layer 2a exposed on the outer surface of the insulating substrate 1, a Ni plating layer and a Pd plating layer It may be a multilayer wiring board in which a Cu plating layer is sequentially deposited, or a multilayer wiring board in which a Ni plating layer, an Au plating layer, and an Ag plating layer are sequentially deposited, on the exposed surface of the metal wiring layer 2a. It may be a multilayer wiring board on which a metal coating layer made of another metal is applied.

導通用導体3は、複数の電極配線2を電気的に接続するため、絶縁基板1の表面に設けられる。この導通用導体3が導電路となって複数の電極配線2を電気的に接続することで、電解めっき法により、金属配線層2aの絶縁基板1の外部表面に露出された部分に、金属被膜層2b,2cを被着することができる。なお、導通用導体3は、上述した金属配線層2aと同様な方法により絶縁基板1の表面の所定の領域に被着形成することができる。   The conducting conductor 3 is provided on the surface of the insulating substrate 1 in order to electrically connect the plurality of electrode wirings 2. The conductive conductor 3 serves as a conductive path to electrically connect the plurality of electrode wirings 2, so that a metal coating is formed on a portion of the metal wiring layer 2 a exposed on the outer surface of the insulating substrate 1 by electrolytic plating. Layers 2b and 2c can be applied. The conductive conductor 3 can be deposited on a predetermined region of the surface of the insulating substrate 1 by a method similar to that of the metal wiring layer 2a described above.

電極配線2は、導通用導体3により絶縁基板1の表面に電気的に短絡した状態で形成されるので、配線基板をめっき浴に浸漬した後、電解めっき法により金属配線層2aの絶縁基板1の外部表面に露出された部分に金属被膜層2b,2cを被着形成することができ、絶縁基板1の表面に金属配線層2aと金属被膜層2b,2cとが積層されてなる電極配線2を形成することができる。   Since the electrode wiring 2 is formed in a state of being electrically short-circuited on the surface of the insulating substrate 1 by the conductive conductor 3, the insulating substrate 1 of the metal wiring layer 2a is formed by electrolytic plating after the wiring substrate is immersed in a plating bath. The metal coating layers 2b and 2c can be deposited on the exposed portion of the outer surface of the metal substrate, and the electrode wiring 2 is formed by laminating the metal wiring layer 2a and the metal coating layers 2b and 2c on the surface of the insulating substrate 1. Can be formed.

また、導通用導体3は、電解めっき法により電極配線2に金属被覆層2b,2cを被着形成するために配設されているが、電極配線2の全ての金属被覆層2b,2cを電解めっき法により被着させている必要はなく、金属被膜層2b,2cを薄く被着形成させたい場合等、必要に応じて金属配線層2a上に順次被着される金属被覆層のいくつかを無電解めっき法等により被着させていても構わない。例えば、電解めっき法により金属配線層2a上に金属被膜層2bを被着した後、無電解めっき法により金属被膜層2b上に金属被膜層2cを被着させたものであっても構わない。   Further, the conductive conductor 3 is disposed for depositing and forming the metal coating layers 2b and 2c on the electrode wiring 2 by electrolytic plating, but all the metal coating layers 2b and 2c of the electrode wiring 2 are electrolyzed. It is not necessary to deposit the metal coating layers 2b and 2c by a plating method. For example, when it is desired to form the metal coating layers 2b and 2c thinly, some of the metal coating layers sequentially deposited on the metal wiring layer 2a as necessary. It may be deposited by an electroless plating method or the like. For example, the metal coating layer 2b may be deposited on the metal wiring layer 2a by the electrolytic plating method, and then the metal coating layer 2c may be deposited on the metal coating layer 2b by the electroless plating method.

絶縁部4は、導通用導体3の幅方向にわたって金属配線層2aの導通用導体3の表面を、被覆するように設けられる。なお、ここでいう導通用導体3の幅方向とは、導通用導体3が電極配線2間に延設されて延びる方向(以下では、延設方向という)に交差する方向であり、電極配線2間に配設された導通用導体3の幅の方向のことである。すなわち、絶縁部4により被覆されることにより幅方向にわたって導通用導体3が露出していない領域を有していることを示している。また、絶縁部4の延設方向長さは、後述する導通用導体3と絶縁部4とを切削除去する際の切削領域Nの延設方向長さよりも長くなるように設けておけば良く、例えば、切削加工により導通用導体3と絶縁部4とを切削除去する際の切削刃等の幅よりも広くなるように設定しておけば良い。なお、ここでいう切削領域Nとは、図1および図2に一点鎖線により示された領域であって、後に導通用導体3と絶縁部4とを切削除去する領域である。   The insulating portion 4 is provided so as to cover the surface of the conductive conductor 3 of the metal wiring layer 2 a over the width direction of the conductive conductor 3. Here, the width direction of the conducting conductor 3 is a direction intersecting with a direction in which the conducting conductor 3 extends between the electrode wirings 2 (hereinafter referred to as an extending direction). This is the direction of the width of the conductive conductor 3 disposed between them. That is, it has shown that it has the area | region where the conductor 3 for conduction | electrical_connection is not exposed over the width direction by being coat | covered with the insulating part 4. FIG. Further, the extending direction length of the insulating part 4 may be provided so as to be longer than the extending direction length of the cutting region N when the conductive conductor 3 and the insulating part 4 described later are cut and removed. For example, what is necessary is just to set so that it may become wider than the width | variety of the cutting blade etc. at the time of cutting and removing the conductor 3 for conduction | electrical_connection and the insulation part 4 by cutting. Here, the cutting region N is a region indicated by a one-dot chain line in FIGS. 1 and 2, and is a region in which the conductive conductor 3 and the insulating portion 4 are cut and removed later.

絶縁部4は、酸化アルミニウム質焼結体、ムライト質焼結体、窒化アルミニウム質焼結体、炭化珪素質焼結体等の電気絶縁材料から成り、絶縁基板1用のセラミックグリーンシート上に印刷された導通用導体3用のメタライズペーストを、幅方向にわたって被覆するようにスクリーン印刷法等の印刷手段により、絶縁部4用のセラミックペーストを印刷塗布し、そのセラミックペーストを絶縁基板1用のセラミックグリーンシートと同時焼成することによって所定の領域に被着される。   The insulating portion 4 is made of an electrically insulating material such as an aluminum oxide sintered body, a mullite sintered body, an aluminum nitride sintered body, or a silicon carbide sintered body, and is printed on a ceramic green sheet for the insulating substrate 1. The ceramic paste for the insulating portion 4 is printed and applied by a printing means such as a screen printing method so that the metallized paste for the conductive conductor 3 is covered in the width direction, and the ceramic paste is applied to the ceramic for the insulating substrate 1. It is applied to a predetermined area by simultaneous firing with the green sheet.

絶縁部4用のセラミックペーストは、主成分のセラミック粉末に有機バインダー、有機溶剤、必要に応じて分散剤等を加えてボールミル、三本ロールミル、プラネタリーミキサー等の混練手段により混合および混練することで製作される。   The ceramic paste for the insulating part 4 is mixed and kneaded by kneading means such as a ball mill, a three-roll mill, a planetary mixer, etc., with an organic binder, an organic solvent, and a dispersant as necessary added to the ceramic powder of the main component. Will be produced.

なお、絶縁部4は、絶縁基板1とともに同時に焼成して形成されるため、絶縁基板1と実質的に同一成分からなることが好ましい。すなわち、絶縁基板1が酸化アルミニウム質焼結体からなる場合は、絶縁基板1は酸化アルミニウム質焼結体からなり、絶縁基板1が窒化アルミニウム質焼結体からなる場合は、絶縁部4は窒化アルミニウム質焼結体からなることが好ましい。   The insulating portion 4 is preferably formed by firing together with the insulating substrate 1, so that it is preferably made of substantially the same component as the insulating substrate 1. That is, when the insulating substrate 1 is made of an aluminum oxide sintered body, the insulating substrate 1 is made of an aluminum oxide sintered body, and when the insulating substrate 1 is made of an aluminum nitride sintered body, the insulating portion 4 is nitrided. It is preferably made of an aluminum sintered body.

これにより、配線基板をめっき浴に浸漬し、金属配線層2aの露出した表面に電解めっき法により金属被覆層2b,2cを被着させて多層配線基板とした際、導通用導体3の絶縁部4が被覆された領域には、金属被覆層2b,2cが被着されず、絶縁部4と導通用導体3と絶縁基板1とが厚み方向に隣接して配設しており、この領域においては、異なる金属層が隣接する領域が存在しないこととなる。そして、絶縁部4が被覆された領域の延設方向長さよりも短い切削領域Nにおいて、導通用導体3と絶縁部4とを切削除去することで、複数の電極配線2が電気的に独立することとなる。   Thus, when the wiring board is immersed in a plating bath and the metal coating layers 2b and 2c are deposited on the exposed surface of the metal wiring layer 2a by electrolytic plating to form a multilayer wiring board, the insulating portion of the conductive conductor 3 is obtained. In the region covered with 4, the metal coating layers 2 b and 2 c are not deposited, and the insulating portion 4, the conductive conductor 3 and the insulating substrate 1 are arranged adjacent to each other in the thickness direction. This means that there is no region where different metal layers are adjacent to each other. Then, in the cutting region N shorter than the length in the extending direction of the region covered with the insulating portion 4, the conductive conductor 3 and the insulating portion 4 are cut and removed, whereby the plurality of electrode wirings 2 are electrically independent. It will be.

図3および図4は、図1および図2に示される切削領域Nにおいて導通用導体3と絶縁部4とを切削除去した状態の多層配線基板を示す図である。図3は、導通用導体3と絶縁部4とを切削除去した状態の多層配線基板を示す平面図である。また、図4(a)は、図3の切断面線C−C’における断面図であり、図4(b)は、図4(a)のD部における要部拡大断面図である。なお、図4に示すように、導通用導体3と絶縁部4とを切削除去する際、絶縁基板1の表層の一部が切削除去されていても構わない。   3 and 4 are diagrams showing the multilayer wiring board in a state in which the conductive conductor 3 and the insulating portion 4 are cut and removed in the cutting region N shown in FIGS. 1 and 2. FIG. 3 is a plan view showing the multilayer wiring board in a state where the conductive conductor 3 and the insulating portion 4 are removed by cutting. 4A is a cross-sectional view taken along the section line C-C ′ of FIG. 3, and FIG. 4B is an enlarged cross-sectional view of a main part in a D portion of FIG. 4A. As shown in FIG. 4, when the conductive conductor 3 and the insulating portion 4 are cut and removed, a part of the surface layer of the insulating substrate 1 may be cut and removed.

これにより、多層配線基板を絶縁部4に沿って導通用導体3を切削除去した際、切削面においては、絶縁基板1と導通用導体3と絶縁部4とが順次積層された状態で露出されており、金属配線層2aまたは金属被覆層2b,2cの異なる金属層が隣接して露出されることがなく、切削面に異種金属層による腐食が発生する可能性を抑制することができる。   As a result, when the conductive conductor 3 is removed by cutting along the insulating portion 4 in the multilayer wiring board, the insulating substrate 1, the conductive conductor 3, and the insulating portion 4 are exposed in a state of being sequentially laminated on the cut surface. Thus, different metal layers of the metal wiring layer 2a or the metal coating layers 2b and 2c are not exposed adjacently, and it is possible to suppress the possibility of corrosion due to the different metal layer on the cutting surface.

また、導通用導体3と絶縁部4とを切削除去する際、切削領域Nには金属被覆層2b,2cが形成されていないので、切削加工等により切削面に金属被覆層2b,2cののびによる針状の突起が発生することがなく、隣接する電極配線2同士が短絡する可能性を抑制することができる。すなわち、絶縁部4には、のびが発生しやすい金等からなる金属被覆層2b,2cが配設されておらず、絶縁部4により被覆された領域に配設されているメタライズ層からなる導通用導体3は、切削加工等によるのびが発生しにくいので、切削加工により隣接する電極配線2同士が短絡する可能性を抑制することができる。従って、多層配線基板に腐食や短絡が発生する可能性を抑制したものとすることができる。なお、導通用導体3および絶縁部4を切削除去する方法としては、研削加工や切削加工により切削除去する方法に限らず、これら以外の方法を用いても良い。   Further, when the conductive conductor 3 and the insulating portion 4 are removed by cutting, the metal coating layers 2b and 2c are not formed in the cutting region N, so that the metal coating layers 2b and 2c are spread on the cutting surface by cutting or the like. Therefore, the possibility that the adjacent electrode wirings 2 are short-circuited can be suppressed. In other words, the insulating portion 4 is not provided with the metal coating layers 2b and 2c made of gold or the like, which is likely to be stretched, and the conductive portion made of the metallized layer disposed in the region covered with the insulating portion 4. Since the common conductor 3 does not easily stretch due to cutting or the like, it is possible to suppress the possibility that the adjacent electrode wirings 2 are short-circuited by cutting. Therefore, it is possible to suppress the possibility that corrosion or a short circuit occurs in the multilayer wiring board. Note that the method of cutting and removing the conductive conductor 3 and the insulating portion 4 is not limited to the method of cutting and removing by grinding or cutting, and other methods may be used.

次に本発明の他の実施形態について説明する。本実施形態は、図1などに示した配線基板および多層配線基板とは、特に絶縁部4の構成が異なっており、共通する構成についての詳細な説明は省略する。   Next, another embodiment of the present invention will be described. This embodiment is different from the wiring board and the multilayer wiring board shown in FIG. 1 in particular in the configuration of the insulating portion 4, and a detailed description of the common configuration is omitted.

本実施形態では、絶縁部4は、少なくとも一対の絶縁部4を含み、一対の絶縁部4は導通用導体3の延設方向に予め定める間隔を空けて設けられていても良い。図5は、本実施形態の多層配線基板を示す平面図であり、図6(a)は、図5の配線基板の切断面線E−E’における断面図であり、図6(b)は、図5(a)のF部における要部拡大断面図である。なお、この場合においても、上述と同様に、金属配線層2aに金属被膜層2b,2cを被着していない状態を配線基板とし、金属配線層2aに金属被膜層2b,2cを被着した状態を多層配線基板とする。   In the present embodiment, the insulating part 4 includes at least a pair of insulating parts 4, and the pair of insulating parts 4 may be provided with a predetermined interval in the extending direction of the conducting conductor 3. FIG. 5 is a plan view showing the multilayer wiring board of the present embodiment, FIG. 6A is a cross-sectional view taken along the cutting plane line EE ′ of the wiring board of FIG. 5, and FIG. FIG. 6 is an enlarged cross-sectional view of a main part in an F part in FIG. Also in this case, as described above, the state in which the metal coating layers 2b and 2c are not deposited on the metal wiring layer 2a is used as the wiring board, and the metal coating layers 2b and 2c are deposited on the metal wiring layer 2a. The state is a multilayer wiring board.

図5および図6において、一対の絶縁部4の導通用導体3の延設方向に予め定める間隔は、切削領域Nの延設方向長さよりも短く設定されている。すなわち、導通用導体3の延設方向に予め定める間隔は、切削加工により導通用導体3と絶縁部4とを切削除去する際の切削刃等の幅よりも短くなるように設定しておけば良い。なお、一対の絶縁部4の全体の長さ(一対の絶縁部4のそれぞれの延設方向の長さと一対の絶縁部4の導通用導体3の延設方向に予め定める間隔とを合計した全体の長さ)は、導通用導体3と絶縁部4とを切削除去する際の切削領域Nの延設方向長さよりも長くなるように設けておけば良い。   5 and 6, a predetermined interval in the extending direction of the conductive conductor 3 of the pair of insulating portions 4 is set to be shorter than the extending direction length of the cutting region N. In other words, the predetermined interval in the extending direction of the conducting conductor 3 should be set to be shorter than the width of the cutting blade or the like when the conducting conductor 3 and the insulating portion 4 are removed by cutting. good. The total length of the pair of insulating portions 4 (the total of the lengths of the pair of insulating portions 4 in the extending direction and the interval predetermined in the extending direction of the conducting conductor 3 of the pair of insulating portions 4) May be provided so as to be longer than the length in the extending direction of the cutting region N when the conductive conductor 3 and the insulating portion 4 are removed by cutting.

これにより、配線基板をめっき浴に浸漬し、金属配線層2aの露出した表面に電解めっき法により金属被覆層2b,2cを被着させて多層配線基板とした際、導通用導体3の絶縁部4が被覆された領域には、金属被覆層2b,2cが被着されず、絶縁部4と導通用導体3と絶縁基板1とが厚み方向に隣接して配設しており、この領域においては、異なる金属層が隣接する領域が存在しないこととなる。なお、導通用導体3の一対の絶縁部4間においては、露出する部分に金属被覆層2b,2cが被着される。   Thus, when the wiring board is immersed in a plating bath and the metal coating layers 2b and 2c are deposited on the exposed surface of the metal wiring layer 2a by electrolytic plating to form a multilayer wiring board, the insulating portion of the conductive conductor 3 is obtained. In the region covered with 4, the metal coating layers 2 b and 2 c are not deposited, and the insulating portion 4, the conductive conductor 3 and the insulating substrate 1 are arranged adjacent to each other in the thickness direction. This means that there is no region where different metal layers are adjacent to each other. In addition, between the pair of insulating portions 4 of the conductive conductor 3, the metal coating layers 2b and 2c are attached to the exposed portions.

図7および図8は、図5および図6に示される切削領域Nにおける導通用導体3と絶縁部4とを切削除去した状態の多層配線基板を示す図である。図7は、導通用導体3と絶縁部4とを切削除去した状態を示す平面図である。また、図8(a)は、図7の切断面線G−G’における断面図であり、図8(b)は、図8(a)のH部における要部拡大断面図である。多層配線基板を絶縁部4に沿って導通用導体3を切削除去した際、切削面においては、絶縁基板1と導通用導体3と絶縁部4とが順次積層された状態で露出されており、異なる金属層が隣接して露出されることがない。切削面において、金属配線層2aまたは金属被覆層2b,2cの異なる金属層が隣接して露出されることがないので、切削面に異種金属層による腐食が発生する可能性を抑制することができる。   FIGS. 7 and 8 are views showing the multilayer wiring board in a state in which the conductive conductor 3 and the insulating portion 4 in the cutting region N shown in FIGS. 5 and 6 are cut and removed. FIG. 7 is a plan view showing a state in which the conductive conductor 3 and the insulating portion 4 are removed by cutting. FIG. 8A is a cross-sectional view taken along a cutting plane line G-G ′ in FIG. 7, and FIG. 8B is an enlarged cross-sectional view of a main part in the H portion in FIG. When the conductor 3 for conduction is cut and removed along the insulating portion 4 in the multilayer wiring board, the insulating substrate 1, the conductor 3 for conduction, and the insulating portion 4 are exposed in a state of being sequentially laminated on the cut surface. Different metal layers are not exposed adjacently. Since the metal layer different from the metal wiring layer 2a or the metal coating layers 2b and 2c is not exposed on the cutting surface, the possibility that the cutting surface is corroded by the different metal layer can be suppressed. .

また、導通用導体3と絶縁部4とを切削除去すれば良く、切削面には金属被覆層2b,2cが形成されていないので、切削加工等により切削面に金属被覆層ののびによる針状の突起が発生することがなく、隣接する電極配線2同士が短絡する可能性を抑制することができる。   Further, the conductive conductor 3 and the insulating portion 4 may be removed by cutting, and the metal coating layers 2b and 2c are not formed on the cutting surface. Therefore, the needle shape is formed by extending the metal coating layer on the cutting surface by cutting or the like. Therefore, the possibility that the adjacent electrode wirings 2 are short-circuited can be suppressed.

また、絶縁基板1に対して電解めっき法を行った際に一対の絶縁部4間の領域には金属被覆層2b,2cが被着されることとなるので、一対の絶縁部4間によって、切削すべき位置を良好認識させることができ、良好に切削加工等により導通用導体3を切削除去することができ、金属被覆層2b、2cが被着された複数の電極配線2を効率良く電気的に独立させることができる。従って、多層配線基板に腐食や短絡が発生する可能性を抑制したものとすることができる。   In addition, when the electroplating method is performed on the insulating substrate 1, the metal coating layers 2 b and 2 c are deposited in the region between the pair of insulating portions 4. The position to be cut can be recognized well, the conductive conductor 3 can be cut and removed well by cutting or the like, and the plurality of electrode wirings 2 to which the metal coating layers 2b and 2c are deposited can be efficiently electrically connected. Can be made independent. Therefore, it is possible to suppress the possibility that corrosion or a short circuit occurs in the multilayer wiring board.

また、絶縁部4と絶縁基板1との色調が異なるように形成することが好ましい。これにより、導通用導体3と絶縁部4とを切削除去する際、絶縁基板1と絶縁部4との色調の違いにより切削深さを目視や画像認識装置により良好に認識させやすくなり、導通用導体3を良好に切削除去して、複数の電極配線を効率良く電気的に独立させることができる。すなわち、切削深さが導通用導体3に達しておらず、導通用導体3が完全に切削除去できていない状態(複数の電極配線2が電気的に接続されたままの状態)にしてしまうことや、深く切削しすぎることにより、絶縁基板1の内部に形成されている金属配線層2aを切削除去して、電極配線2が電気的に短絡してしまうことを抑制することができる。   Moreover, it is preferable to form so that the color tone of the insulation part 4 and the insulated substrate 1 may differ. Accordingly, when the conductive conductor 3 and the insulating portion 4 are removed by cutting, the cutting depth can be easily recognized by visual observation or an image recognition device due to the color difference between the insulating substrate 1 and the insulating portion 4. The conductor 3 can be satisfactorily cut and removed, and the plurality of electrode wirings can be made electrically independent efficiently. That is, the cutting depth does not reach the conducting conductor 3, and the conducting conductor 3 cannot be completely removed by cutting (a state in which the plurality of electrode wirings 2 are electrically connected). Alternatively, by cutting too deeply, the metal wiring layer 2a formed inside the insulating substrate 1 can be removed by cutting, and the electrode wiring 2 can be prevented from being electrically short-circuited.

このような絶縁基板1と異なる色調の絶縁部4は、絶縁部4に絶縁基板1に添加されている顔料とは異なる色調となる顔料を添加したり、絶縁基板1に添加されている顔料を添加しない等をしておけば良い。例えば、絶縁基板1が白色である場合、絶縁部4用のセラミックペーストにクロム等の粉末を添加しておくことにより、絶縁基板1用のセラミックグリーンシートとともに焼成した際、白色の絶縁基板1の表面に暗色の絶縁部4を形成することができる。なお、目視や画像認識装置で絶縁基板1と絶縁部4とを良好に認識させるために、絶縁基板1と絶縁部4とのコントラスト比は20%以上とすることが好ましい。   The insulating portion 4 having a color tone different from that of the insulating substrate 1 is added with a pigment having a color tone different from that of the pigment added to the insulating substrate 1 to the insulating portion 4 or a pigment added to the insulating substrate 1. Do not add it. For example, when the insulating substrate 1 is white, by adding a powder such as chromium to the ceramic paste for the insulating portion 4, when the insulating substrate 1 is fired together with the ceramic green sheet for the insulating substrate 1, A dark insulating portion 4 can be formed on the surface. It should be noted that the contrast ratio between the insulating substrate 1 and the insulating portion 4 is preferably 20% or more so that the insulating substrate 1 and the insulating portion 4 can be recognized well by visual observation or an image recognition device.

また、本発明の他の実施形態としては、図9Aおよび図9Bに示すように、導通用導体3同士を連結部6により電気的に接続した構成であっても構わない。図9A(a)は、本発明の他の実施形態である多層配線基板を示す平面図であり、図9A(b)は、図9A(a)に示す多層配線基板における絶縁部4を図示しない状態の平面図である。なお、連結部6は、導通用導体3の一部であり、導通用導体3と同様にして形成される。導通用導体3が連結部6を介して接続されることで、複数の金属配線層2aおよび導通用導体3に印加される電流のばらつきを小さくし、電極配線2の金属被覆層2b,2cの厚みばらつきを小さくすることができる。また、図9B(c)は、図9A(a)の多層配線基板を切削領域Nにおいて導通用導体3、絶縁部4および連結部6を切削除去した状態の多層配線基板を示す平面図である。切削除去により、多層配線基板を腐食や短絡が発生する可能性を抑制したものとすることができる。また、図9A(a)に示すように、導通用導体3とともに、連結部6の表面にも絶縁部4を形成し、連結部6と絶縁部4とを同一ライン上に形成しておくことで、導通用導体3と連結部6と絶縁部4とを一筆書き状に切削除去することができるので、複数の電極配線2を効率良く電気的に独立させることができる。なお、図9A(b)においては、複数の電極配線2を良好に電気的に独立させるため、連結部6の幅は、切削領域Nの延設方向長さよりも狭く、例えば、切削加工により導通用導体3と絶縁部4とを切削除去する際の切削刃等の幅よりも狭くしている。   Further, as another embodiment of the present invention, as shown in FIGS. 9A and 9B, a configuration in which the conducting conductors 3 are electrically connected to each other by a connecting portion 6 may be used. FIG. 9A (a) is a plan view showing a multilayer wiring board according to another embodiment of the present invention, and FIG. 9A (b) does not show the insulating portion 4 in the multilayer wiring board shown in FIG. 9A (a). It is a top view of a state. The connecting portion 6 is a part of the conducting conductor 3 and is formed in the same manner as the conducting conductor 3. By connecting the conductive conductor 3 via the connecting portion 6, variation in current applied to the plurality of metal wiring layers 2 a and the conductive conductor 3 is reduced, and the metal coating layers 2 b and 2 c of the electrode wiring 2 are reduced. Variation in thickness can be reduced. FIG. 9B (c) is a plan view showing the multilayer wiring board in a state in which the conductive conductor 3, the insulating portion 4, and the connecting portion 6 are cut and removed from the multilayer wiring board of FIG. 9A (a) in the cutting region N. . By cutting and removing, it is possible to suppress the possibility that the multilayer wiring board is corroded or short-circuited. Further, as shown in FIG. 9A (a), together with the conductive conductor 3, an insulating portion 4 is formed on the surface of the connecting portion 6, and the connecting portion 6 and the insulating portion 4 are formed on the same line. Thus, since the conductive conductor 3, the connecting portion 6, and the insulating portion 4 can be cut and removed in a single stroke, the plurality of electrode wirings 2 can be made electrically independent efficiently. In FIG. 9A (b), the width of the connecting portion 6 is narrower than the length in the extending direction of the cutting region N in order to satisfactorily electrically isolate the plurality of electrode wirings 2 and is, for example, guided by cutting. The common conductor 3 and the insulating portion 4 are made narrower than the width of a cutting blade or the like when cutting and removing.

本発明のさらに他の実施形態である電子装置は、上述の多層配線基板の表面に電子部品が搭載され、搭載された電子部品は、電極配線2と電気的に接続されている。これにより、多層配線基板は、切削面における腐食や短絡の可能性を抑制したものとされているので、信頼性に優れた電子装置とすることができる。   In an electronic device according to still another embodiment of the present invention, an electronic component is mounted on the surface of the multilayer wiring board described above, and the mounted electronic component is electrically connected to the electrode wiring 2. As a result, the multilayer wiring board suppresses the possibility of corrosion or short-circuiting on the cut surface, so that an electronic device with excellent reliability can be obtained.

なお、電子部品としては、IC(Integrated Circuit)チップやLSI(Large Scale Integrated Circuit)チップ等の半導体素子、水晶振動子や圧電振動子等の圧電素子、各種センサ等が搭載される。電子部品の搭載は、電子部品がフリップチップ型の半導体素子である場合には、はんだバンプや金バンプ、または導電性樹脂(異方性導電樹脂等)を介して、半導体素子の電極と電極配線2とを電気的に接続することにより行なわれる。また、電子部品がワイヤボンディング型の半導体素子である場合には、ガラス、樹脂、ろう材等の接合材により多層配線基板表面に半導体素子を固定した後、ボンディングワイヤを介して半導体素子の電極と電極配線2とを電気的に接続することにより行なわれる。また、電子部品が水晶振動子等の圧電素子である場合には、導電性樹脂により圧電素子の固定および圧電素子の電極と電極配線2との電気的な接続を行なう。   As electronic components, semiconductor elements such as IC (Integrated Circuit) chips and LSI (Large Scale Integrated Circuit) chips, piezoelectric elements such as crystal oscillators and piezoelectric vibrators, various sensors, and the like are mounted. When the electronic component is a flip-chip type semiconductor device, the electrodes and electrode wiring of the semiconductor device are connected via solder bumps, gold bumps, or conductive resin (anisotropic conductive resin, etc.). 2 is electrically connected. When the electronic component is a wire bonding type semiconductor element, the semiconductor element is fixed to the surface of the multilayer wiring board with a bonding material such as glass, resin, or brazing material, and then the electrode of the semiconductor element is connected via the bonding wire. This is performed by electrically connecting the electrode wiring 2. When the electronic component is a piezoelectric element such as a crystal resonator, the piezoelectric element is fixed and the electrode of the piezoelectric element and the electrode wiring 2 are electrically connected by a conductive resin.

そして、電子部品は、必要に応じて封止される。封止はエポキシ樹脂等のポッティング樹脂により電子部品を覆うことにより行なったり、電子部品を覆うようにして載置した樹脂や金属、セラミックス等からなる蓋体をガラス、樹脂、ろう材等の接着剤により配線基板に取着することにより行われる。   And an electronic component is sealed as needed. Sealing is performed by covering the electronic component with a potting resin such as epoxy resin, or a lid made of resin, metal, ceramics, etc. placed so as to cover the electronic component, and an adhesive such as glass, resin, brazing material, etc. By attaching to the wiring board.

なお、本発明は上述の実施形態に限定されず、本発明の要旨を逸脱しない範囲内で種々の変更を施すことは何ら差し支えない。例えば、絶縁基板1は、平板形状以外のものであっても良く、例えば、絶縁基板1の上面または下面に電子部品を収納するための凹部(キャビティ)を備えているものであっても構わない。また、図1〜図9においては、電極配線2は、絶縁基板1の一方主面と他方主面とに形成されているが、絶縁基板1の側面に形成したものであっても構わない。また、配線基板は、1つの配線基板に、複数種類の金属被覆層2b,2cが被着された電極配線2を備えるものであっても良い。例えば、配線基板が、金属配線層2a上にNiめっき層とAuめっき層とが順次被着された複数の電極配線2と金属配線層2a上にNiめっき層とAgめっき層とが順次被着された複数の電極配線2とを備えるものであっても良い。このような配線基板は、同じ金属被覆層を被着させる複数の電極配線2のいくつかを電気的に接続する第1の導通用導体と、残りの複数の電極配線2を電気的に接続する第2の導通用導体とをそれぞれ形成しておき、それぞれの導通用導体に幅方向にわたって被覆する絶縁部4を形成しておけば良い。これにより、第1の導通用導体に電気的に接続された電極配線2の金属被覆層2b,2cと第2の導通用導体に電気的に接続された電極配線2の金属被覆層2b,2cとを異なる種類に構成とすることができる。また、電極配線2に限るものではなく、絶縁基板1の表面に被着されている金属配線層2a等のメタライズ層上に電解めっき法により金属被覆層2b,2cを被着した後、電気的に独立させる場合に用いることができる。   The present invention is not limited to the above-described embodiment, and various modifications can be made without departing from the scope of the present invention. For example, the insulating substrate 1 may have a shape other than a flat plate shape. For example, the insulating substrate 1 may have a recess (cavity) for housing electronic components on the upper surface or the lower surface of the insulating substrate 1. . 1 to 9, the electrode wiring 2 is formed on one main surface and the other main surface of the insulating substrate 1, but may be formed on the side surface of the insulating substrate 1. Further, the wiring board may be provided with the electrode wiring 2 in which a plurality of types of metal coating layers 2b and 2c are attached to one wiring board. For example, a wiring board has a plurality of electrode wirings 2 in which a Ni plating layer and an Au plating layer are sequentially deposited on the metal wiring layer 2a, and a Ni plating layer and an Ag plating layer are sequentially deposited on the metal wiring layer 2a. The plurality of electrode wirings 2 may be provided. Such a wiring board electrically connects the first plurality of conductive conductors that electrically connect some of the plurality of electrode wirings 2 to which the same metal coating layer is applied and the remaining plurality of electrode wirings 2. The second conductive conductors may be formed in advance, and the insulating portions 4 that cover the respective conductive conductors in the width direction may be formed. Thereby, the metal coating layers 2b and 2c of the electrode wiring 2 electrically connected to the first conductive conductor and the metal coating layers 2b and 2c of the electrode wiring 2 electrically connected to the second conductive conductor. Can be configured in different types. Further, the present invention is not limited to the electrode wiring 2, and after the metal coating layers 2b and 2c are deposited on the metallized layer such as the metal wiring layer 2a deposited on the surface of the insulating substrate 1 by electrolytic plating, It can be used when making them independent.

本発明の実施の形態である多層配線基板を示す平面図であるIt is a top view which shows the multilayer wiring board which is embodiment of this invention (a)図1の多層配線基板の切断面線A−A’における断面図であり、(b)図2(a)のB部における要部拡大断面図である。(A) It is sectional drawing in cutting plane line A-A 'of the multilayer wiring board of FIG. 1, (b) It is a principal part expanded sectional view in the B section of Fig.2 (a). 切削領域Nにおいて導通用導体3と絶縁部4とを切削除去した状態の多層配線基板を示す平面図である。FIG. 3 is a plan view showing a multilayer wiring board in a state in which a conducting conductor 3 and an insulating portion 4 are cut and removed in a cutting region N. (a)図3の多層配線基板の切断面線C−C’における断面図であり、(b)図4(a)のD部における要部拡大断面図である。(A) It is sectional drawing in the cutting plane line C-C 'of the multilayer wiring board of FIG. 3, (b) It is a principal part expanded sectional view in the D section of Fig.4 (a). 他の実施形態の多層配線基板を示す平面図である。It is a top view which shows the multilayer wiring board of other embodiment. (a)図5の多層配線基板の切断面線E−E’における断面図であり、(b)図6(a)のF部における要部拡大断面図である。(A) It is sectional drawing in the cutting plane line E-E 'of the multilayer wiring board of FIG. 5, (b) It is a principal part expanded sectional view in the F section of Fig.6 (a). 切削領域Nにおいて導通用導体3と絶縁部4とを切削除去した状態の多層配線基板を示す平面図である。FIG. 3 is a plan view showing a multilayer wiring board in a state in which a conducting conductor 3 and an insulating portion 4 are cut and removed in a cutting region N. (a)図7の多層配線基板の切断面線G−G’における断面図であり、(b)図8(a)のH部における要部拡大断面図である。(A) It is sectional drawing in the cutting plane line G-G 'of the multilayer wiring board of FIG. 7, (b) It is a principal part expanded sectional view in the H section of Fig.8 (a). (a)本発明の他の実施形態である多層配線基板を示す平面図であり、(b)図9A(a)に示す配線基板における絶縁部4を図示しない状態の平面図である。(A) It is a top view which shows the multilayer wiring board which is other embodiment of this invention, (b) It is a top view of the state which does not show the insulation part 4 in the wiring board shown to FIG. 9A (a). (c)図9A(a)の多層配線基板を切削領域Nにおいて導通用導体3、絶縁部4および連結部6を切削除去した状態の配線基板を示す平面図である。FIG. 9C is a plan view showing the wiring board in a state in which the conductive conductor 3, the insulating part 4 and the connecting part 6 are cut and removed from the multilayer wiring board of FIG.

符号の説明Explanation of symbols

1 絶縁基板
2 電極配線
2a 金属配線層
2b、2c 金属被膜層
3 導通用導体
4 絶縁部
5 貫通導体
6 連結部
N 切削領域
DESCRIPTION OF SYMBOLS 1 Insulation board | substrate 2 Electrode wiring 2a Metal wiring layer 2b, 2c Metal coating layer 3 Conductor for conduction | electrical_connection 4 Insulation part 5 Penetration conductor 6 Connection part N Cutting area

Claims (9)

絶縁基板の表面に複数の電極配線を備える配線基板において、
前記電極配線は、前記絶縁基板の表面に形成された金属配線層を含み、
該金属配線層の幅方向にわたって、該金属配線層を被覆する絶縁部を有することを特徴とする配線基板。
In a wiring board having a plurality of electrode wirings on the surface of an insulating substrate
The electrode wiring includes a metal wiring layer formed on the surface of the insulating substrate,
A wiring board comprising an insulating portion covering the metal wiring layer over the width direction of the metal wiring layer.
前記絶縁部は、一対の絶縁部を含み、該一対の絶縁部は前記金属配線層の延設方向に予め定める間隔をあけて設けられることを特徴とする請求項1記載の配線基板。 The wiring board according to claim 1, wherein the insulating portion includes a pair of insulating portions, and the pair of insulating portions are provided at predetermined intervals in the extending direction of the metal wiring layer. 請求項1に記載した配線基板の前記金属配線層上で、且つ前記絶縁部に隣接した領域に金属被覆層が形成され、
前記金属配線層が、前記絶縁部により被覆された領域内にて、該絶縁部とともに切断されることを特徴とする多層配線基板。
A metal coating layer is formed on the metal wiring layer of the wiring board according to claim 1 and in a region adjacent to the insulating portion,
The multilayer wiring board, wherein the metal wiring layer is cut together with the insulating portion in a region covered with the insulating portion.
請求項2に記載した配線基板の前記金属配線層上で、且つ前記一対の絶縁部のそれぞれに隣接した領域に金属被覆層が形成され、
前記金属配線層が、前記一対の絶縁部間の領域にて切断されることを特徴とする多層配線基板。
A metal coating layer is formed on the metal wiring layer of the wiring board according to claim 2 and in a region adjacent to each of the pair of insulating portions,
The multilayer wiring board, wherein the metal wiring layer is cut in a region between the pair of insulating portions.
前記複数の金属配線層がメタライズ層からなり、前記金属被覆層が金を含んでなることを特徴とする請求項3または請求項4に記載の多層配線基板。 5. The multilayer wiring board according to claim 3, wherein the plurality of metal wiring layers are made of a metallized layer, and the metal coating layer contains gold. 前記絶縁部と前記絶縁基板との色調が異なることを特徴とする請求項3乃至請求項5のいずれかに記載の多層配線基板。 The multilayer wiring board according to claim 3, wherein the color tone of the insulating portion and that of the insulating substrate are different. 請求項3乃至請求項6のいずれかに記載の多層配線基板の表面に電子部品が搭載され、搭載された電子部品は、前記電極配線と電気的に接続されていることを特徴とする電子装置。 An electronic device, wherein an electronic component is mounted on a surface of the multilayer wiring board according to any one of claims 3 to 6, and the mounted electronic component is electrically connected to the electrode wiring. . 絶縁基板の表面に複数の電極配線を備える多層配線基板の製造方法において、
前記絶縁基板表面に金属配線層を形成し、
形成された金属配線層上に、該金属配線層の幅方向にわたって該金属配線層を被覆する絶縁部を形成し、
前記金属配線層上で、且つ前記絶縁部に隣接した領域に電解めっきによって金属被覆層を形成し、
前記金属配線層を、前記絶縁部により被覆された領域内にて、該絶縁部とともに切断することを特徴とする多層配線基板の製造方法。
In the manufacturing method of the multilayer wiring board provided with a plurality of electrode wirings on the surface of the insulating substrate,
Forming a metal wiring layer on the surface of the insulating substrate;
On the formed metal wiring layer, an insulating portion that covers the metal wiring layer is formed over the width direction of the metal wiring layer,
Forming a metal coating layer by electrolytic plating on the metal wiring layer and in a region adjacent to the insulating portion;
A method for manufacturing a multilayer wiring board, comprising cutting the metal wiring layer together with the insulating portion in a region covered with the insulating portion.
前記絶縁部は、一対の絶縁部を含み、該一対の絶縁部は前記金属配線層の延設方向に予め定める間隔をあけて設けられているとともに、
前記金属配線層が、前記一対の絶縁部間の領域にて切断されることを特徴とする請求項8に記載の多層配線基板の製造方法。
The insulating portion includes a pair of insulating portions, and the pair of insulating portions are provided at predetermined intervals in the extending direction of the metal wiring layer,
The method for manufacturing a multilayer wiring board according to claim 8, wherein the metal wiring layer is cut at a region between the pair of insulating portions.
JP2006269808A 2006-09-29 2006-09-29 Multilayer wiring board, electronic device, and manufacturing method thereof Expired - Fee Related JP4814750B2 (en)

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JPH0799375A (en) * 1993-09-27 1995-04-11 Fujitsu Ltd Printed circuit board
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JP2003249743A (en) * 2002-02-26 2003-09-05 Seiko Epson Corp Wiring substrate and method of manufacturing the same, semiconductor device and electronic device
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Publication number Priority date Publication date Assignee Title
WO2022224841A1 (en) * 2021-04-20 2022-10-27 日本特殊陶業株式会社 Wiring substrate

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