JP2008086766A5 - - Google Patents

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Publication number
JP2008086766A5
JP2008086766A5 JP2007253093A JP2007253093A JP2008086766A5 JP 2008086766 A5 JP2008086766 A5 JP 2008086766A5 JP 2007253093 A JP2007253093 A JP 2007253093A JP 2007253093 A JP2007253093 A JP 2007253093A JP 2008086766 A5 JP2008086766 A5 JP 2008086766A5
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JP
Japan
Prior art keywords
layer
semiconductor layer
copper
gradient coil
depositing
Prior art date
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Granted
Application number
JP2007253093A
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English (en)
Japanese (ja)
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JP5072516B2 (ja
JP2008086766A (ja
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Publication date
Priority claimed from US11/538,662 external-priority patent/US7436180B2/en
Application filed filed Critical
Publication of JP2008086766A publication Critical patent/JP2008086766A/ja
Publication of JP2008086766A5 publication Critical patent/JP2008086766A5/ja
Application granted granted Critical
Publication of JP5072516B2 publication Critical patent/JP5072516B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2007253093A 2006-10-04 2007-09-28 Ｍｒｉ画像のアーチファクトを低減させた傾斜コイル装置並びに傾斜コイルの製作方法 Expired - Fee Related JP5072516B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/538,662 2006-10-04
US11/538,662 US7436180B2 (en) 2006-10-04 2006-10-04 Gradient coil apparatus and method of fabricating a gradient coil to reduce artifacts in MRI images

Publications (3)

Publication Number Publication Date
JP2008086766A JP2008086766A (ja) 2008-04-17
JP2008086766A5 true JP2008086766A5 (enExample) 2012-08-30
JP5072516B2 JP5072516B2 (ja) 2012-11-14

Family

ID=39156877

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007253093A Expired - Fee Related JP5072516B2 (ja) 2006-10-04 2007-09-28 Ｍｒｉ画像のアーチファクトを低減させた傾斜コイル装置並びに傾斜コイルの製作方法

Country Status (4)

Country Link
US (1) US7436180B2 (enExample)
JP (1) JP5072516B2 (enExample)
CN (1) CN101158714B (enExample)
DE (1) DE102007047354A1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2483890A (en) * 2010-09-22 2012-03-28 Tesla Engineering Ltd MRIS gradient coil assembly with screening layers connected to respective coil layers
CN102736044A (zh) * 2012-07-19 2012-10-17 南京麦菲电子科技有限公司 超导磁共振成像装置用的梯度线圈制作方法
CN111896903A (zh) 2014-09-05 2020-11-06 海珀菲纳研究股份有限公司 噪声抑制方法和设备
WO2016077417A1 (en) 2014-11-11 2016-05-19 Hyperfine Research, Inc. Low field magnetic resonance methods and apparatus
DE102015202165B3 (de) * 2015-02-06 2016-05-04 Siemens Aktiengesellschaft Gradientenspulenanordnung, Magnetresonanzeinrichtung und Verfahren zur Bedämpfung einer Gradientenspulenanordnung
US9727953B2 (en) * 2015-06-30 2017-08-08 General Electric Company Method and apparatus for ring artifact repair of magnetic resonance images
US10539637B2 (en) 2016-11-22 2020-01-21 Hyperfine Research, Inc. Portable magnetic resonance imaging methods and apparatus
US10627464B2 (en) 2016-11-22 2020-04-21 Hyperfine Research, Inc. Low-field magnetic resonance imaging methods and apparatus
MX2019005955A (es) 2016-11-22 2019-07-10 Hyperfine Res Inc Sistemas y metodos para deteccion automatizada en imagenes de resonancia magnetica.
US10585154B1 (en) * 2018-01-29 2020-03-10 Quantum Valley Investment Fund LP Nuclear magnetic resonance diffraction
CN112038035B (zh) * 2020-09-18 2022-03-25 中国科学院合肥物质科学研究院 一种基于层间叠片整体热传导的密绕型超导磁体制冷装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0267752A (ja) * 1988-09-01 1990-03-07 Nec Corp 半導体装置
US5235283A (en) 1991-02-07 1993-08-10 Siemens Aktiengesellschaft Gradient coil system for a nuclear magnetic resonance tomography apparatus which reduces acoustic noise
JPH04337614A (ja) * 1991-05-15 1992-11-25 Toshiba Corp 傾斜磁場コイルの製造方法
US5760584A (en) * 1996-08-16 1998-06-02 General Electric Company Shield for MR system RF coil provided with multiple capacitive channels for RF current flow
US6311389B1 (en) * 1998-07-01 2001-11-06 Kabushiki Kaisha Toshiba Gradient magnetic coil apparatus and method of manufacturing the same
JP4004038B2 (ja) * 2002-08-12 2007-11-07 株式会社東芝 コイル装置及び磁気共鳴イメージング装置
US7094684B2 (en) * 2002-09-20 2006-08-22 Semiconductor Energy Laboratory Co., Ltd. Manufacturing method of semiconductor device
US7026233B2 (en) * 2003-08-06 2006-04-11 Taiwan Semiconductor Manufacturing Company, Ltd. Method for reducing defects in post passivation interconnect process
US6812705B1 (en) * 2003-12-05 2004-11-02 General Electric Company Coolant cooled RF body coil
JP2005346981A (ja) 2004-05-31 2005-12-15 Toshiba Corp 電力ケーブルの性能劣化防止方法およびこの性能劣化防止方法を実施する電力ケーブル
DE102005020689B3 (de) 2005-05-03 2006-07-06 Siemens Ag Verfahren zur Herstellung einer Isolierplatte
US7190170B1 (en) 2006-03-24 2007-03-13 General Electric Company Particle doped magnetic coil
JP2007312959A (ja) * 2006-05-25 2007-12-06 Hitachi Medical Corp 磁気共鳴イメージング装置

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